CN108074835A - Wet process device - Google Patents
Wet process device Download PDFInfo
- Publication number
- CN108074835A CN108074835A CN201610983248.3A CN201610983248A CN108074835A CN 108074835 A CN108074835 A CN 108074835A CN 201610983248 A CN201610983248 A CN 201610983248A CN 108074835 A CN108074835 A CN 108074835A
- Authority
- CN
- China
- Prior art keywords
- liquid
- container
- opening
- removal unit
- wet process
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
Abstract
The present invention provides a kind of wet process device.The present invention by the way that liquid removal unit is arranged on the opening that two containers communicate, and then using two groups of nozzles in the opening by the liquid for belonging to two containers toward blowing inside respective container, avoid the liquid cross contamination of described two containers.The liquid removal unit is set against the opening of described two containers, and then solves the problems, such as that the liquid close to opening may be spilt to adjacent container.
Description
Technical field
The present invention relates to a kind of processing apparatus, the wet process for being especially adapted for use in panel industry and semiconductor industry fills
It puts.
Background technology
In panel industry and semiconductor industry, wet process develops quite ripe.However, it is limited to existing
Mechanism design, there are still many problems in practical operation.For example, wet process needs to be continuously applied different liquid
To a substrate, for example, the substrate may be etched using A etching liquids in a container, adjacent another
The substrate may be cleaned using pure water in container.In general, it is that the substrate is allowed to store different liquid multiple
It is sequentially transferred in the container of body and mobile, however, in order to ensure liquid will not bring from a container to another container and generate each other
The situation of pollution, it is necessary to using liquid removal device (being commonly called as air knife) when substrate leaves each container, institute can not be taken away
The liquid in container is stated into another container, to avoid polluting and the flaw of product.
With reference to figure 1-2, Fig. 1 illustrates the schematic diagram of the wet process device 10 of the prior art.Fig. 2 illustrates the wet of the prior art
The cross sectional side view of formula processing apparatus 10.The wet process device 10 includes a first container 11 and a main liquid removal list
Member 15.The first container 11 includes an opening 12 of a first side wall 19, for allowing a substrate 14 along first axle 13 from institute
Opening 12 is stated to leave or into the first container 10.The main liquid removal unit 15 is arranged on inside the first container 11
Close to the first side wall 19 and the region of the opening 12, and the main liquid removal unit 15 includes one first air port
16.The direction 21 in first air port 16 be towards lower left (be subject to the first axle 13, about 225 degree, it is however generally that, institute
Stating direction 21 can be between 180-270 degree), so that the liquid 18 on the substrate 14 is blown down.However, the side wall 19 is equipped with
The opening 12 so that the side wall 19 is more fragile, is not used to fix the main liquid removal unit 15.Therefore it is merely able to
Operation is fixed by other inner walls in the main liquid removal unit 15, and then makes main 15 nothing of liquid removal unit
Method is fixed on the side wall 11.Therefore, it will usually install a guide plate 17 additional in the top of the main liquid removal unit 15, it is described
Guide plate 17 can avoid gap of the liquid 18 between the main liquid removal unit 15 and the side wall 11 from dropping to institute
State substrate 14.Although can be dropped to avoid the liquid 18 of 17 top of the guide plate on the substrate 14, with when
Between pass through, how much liquid 18 still can be accumulated in the gap of the guide plate 17 and the side wall 11, and then be dropped in described
The technical issues of on substrate 14.
In conclusion the structure problem based on the side wall 11, can not be fixed on institute by the main liquid removal unit 15
It states on side wall 11.Allow to the main liquid removal unit 15 being fixed on the side wall 11, it is possible in the master
The technical issues of liquid 18 is accumulated between liquid removal unit 15 and the side wall, and then is dropped on the substrate 14.
The technical issues of above-mentioned, Producing reason essentially consisted in：The prior art is using each container as a list
Position, the side wall strength for being but limited to opening is weaker and can not set liquid removal unit close to the side wall, thus can not
The technical issues of effectively solving the accumulation of fluid close to the side wall and then spilling to adjacent container.
It is above-mentioned to solve the problems, such as therefore, it is necessary to provide a kind of wet process device.
The content of the invention
In view of this, present invention aims at a kind of wet process device is provided, by regarding two adjacent containers as one
A unit, thus the technical issues of liquid removal unit can not be fixed on the side wall of opening just do not existed.Used skill
Art scheme avoids the liquid removal unit being fixed on for liquid removal unit to be arranged on to the opening among two containers
It causes unstable on the side wall of the opening, and can completely abut against on the side wall, avoid liquid removal unit and side
Accumulation of fluid is generated between wall, while two groups of nozzles are set in opening, makes the liquid inside two containers will not cross contamination.
To reach above-mentioned purpose, the present invention provides a kind of wet process device, including a first container, a second container
An and main liquid removal unit.
The first container, one first opening including a first side wall, for allowing a substrate along first axle from described
First opening is left or into the first container.The first container is used to apply the first liquid to the substrate.Described
Two containers, one second opening including a second sidewall, corresponding first opening of the second opening are set, and described second opens
Mouth enters or leaves the second container for the substrate to be allowed to be open accordingly along the first axle from described second.It is described
Second container is used to apply second liquid to the substrate.The main liquid removal unit is arranged at the described of the first container
The first side wall, including several first jets, is arranged on the first liquid removal unit and is located at institute to the described first opening
State the first parameatal part.Several first jets are used to blow first liquid toward inside the first container.
In a preferred embodiment, the first liquid removal unit is arranged at the top of the substrate.
In a preferred embodiment, the direction of several first jets and the first angle of the first axle are between 180-
270 degree.
In a preferred embodiment, the first liquid removal unit further extends to described second and is open, and including
Several second nozzles are arranged on the corresponding second parameatal part of the first liquid removal unit, if described
Dry second nozzle is used to blow toward inside the second container by the second liquid.
In a preferred embodiment, the wet process device further includes a fixing device, for by first liquid
Unit is removed mutually to fix in the part of the second container and the second container.
In a preferred embodiment, the direction of several second nozzles and the second angle of the first axle are between 270-
360 degree.
In a preferred embodiment, the wet process device further includes a second liquid and removes unit, is arranged at described
One second sidewall of second container to the described second opening, the first liquid removal unit removes unit with the second liquid
It is connected in the described first opening and second opening.
In a preferred embodiment, the second liquid removes unit and further includes several second nozzles, is arranged on described
Second liquid removes the corresponding second parameatal part of unit, and several second nozzles are used for second liquid
Body is blown toward inside the second container.
In a preferred embodiment, the direction of several second nozzles and the second angle of the first axle are between 270-
360 degree.
In a preferred embodiment, the wet process device further includes a gas supply source for by first liquid
Body removes unit and provides several first jets and remove unit offer several second sprays by the second liquid
Mouth clean dried gas.
Compared to prior art, the present invention is by regarding two adjacent containers as a unit, therefore liquid removal unit
The technical issues of side wall of opening can not be fixed on, has not just existed.Used technical solution is to set liquid removal unit
The opening among two containers is put, avoids the liquid removal unit being fixed on the side wall of the opening and causes shakiness
It is fixed, and can completely abut against on the side wall, it avoids generating accumulation of fluid between liquid removal unit and side wall, while is opening
Two groups of nozzles at mouthful are set, make the liquid inside two containers will not cross contamination.
Description of the drawings
Fig. 1 illustrates the schematic diagram of the wet process device of the prior art；
Fig. 2 illustrates the cross sectional side view of the wet process device of the prior art；
Fig. 3 illustrates the partial cutaway schematic view of the wet process device of the first preferred embodiment of the present invention；
Fig. 4 illustrates the cross sectional side view of Fig. 3；
Fig. 5 illustrates the first angle of the present invention and the schematic diagram of the second angle；
Fig. 6 illustrates the partial cutaway schematic view of the wet process device of the second preferred embodiment of the present invention；And
Fig. 7 illustrates the cross sectional side view of Fig. 6.
Specific embodiment
The embodiment being described in detail referring to the drawings will cause advantages and features of the invention and realize that these are excellent
The method of point and feature is definitely.But the present invention is not limited to embodiment as disclosed below, the present invention can be with mutually not
Identical various modes are implemented, and embodiment as disclosed below is only used for making the disclosure more complete, contributes to
General technical staff of the technical field of the invention can be fully understood by the scope of the present invention, and the present invention is special according to application
Sharp scope and define.In the specification, identical reference numeral represents identical device assembly.
With reference to figure 3-5.Fig. 3, the cut-away section for illustrating the wet process device 100 of the first preferred embodiment of the present invention show
It is intended to.Fig. 4 illustrates the cross sectional side view of Fig. 3.Fig. 5 illustrates the signal of the first angle 124 and the second angle 224 of the present invention
Figure.
The wet process device 100 includes a first container 110, a second container 210, a main liquid removal unit
120th, a fixing device 290 and a gas supply source 320.The first container 110 includes the one first of a first side wall 112
Opening 160, for a substrate 140 to be allowed to be left or into the first container along first axle 130 from the described first opening 160
110.In subsequent instruction, it is assumed that the substrate 140 be by left and the first container 110 is left on the right side.The second container 210
One second opening 260 including a second sidewall 212, second opening 260 corresponds to first opening 160 and sets, described
Second opening 260 for allow the substrate 140 accordingly along the first axle 130 from described second opening 260 into or from
Open the second container 210.The first container 110 is used to apply the first liquid to the substrate 140.The second container
260 are used to apply second liquid to the substrate 140.Substantially described first liquid and the second liquid be it is different,
For example, first liquid is etching solution and the second liquid is pure water, and the mixing of two kinds of liquid can produce processing procedure
Raw undesirable influence.
The main liquid removal unit 120 is arranged at the first side wall 112 of the first container 110, described first
Opening 160 and second opening 260, and including several first jets 122 and several second nozzles 222, distinctly
Part and first liquid of the first liquid removal unit 120 around the described first opening 160 is arranged on to move
Except the part around corresponding second opening 260 of unit 120.Several first jets 122 are used for first liquid
Body is blown toward inside the first container 110.222 mouths of several second sprays are used to blow toward described second by the second liquid
Inside container 210.
In the preferred embodiment, the first liquid removal unit is to nestle up the first side wall 112 to be arranged at institute
The top of first substrate 140 is stated, in detail, the top for abutting against first opening 160 and second opening 260 is set
Put, therefore, the direction of several first jets 122 and the first angle 124 of the first axle 130 between 180-270 degree, because
First liquid can be blowed to left side (inside of the first container) by this；The direction of several second nozzles 222 with it is described
Second angle 224 of first axle 130 between 270-360 degree, therefore the second liquid can be blowed to right side (second container
It is internal).
Consider that the first side wall 112 and the second sidewall 222 are not suitable for fixed first liquid and move
Except unit 120, the first liquid removal unit 120 is fixed on the first container 110 in the part of the first container 110
Top side wall, the first liquid removal unit 120 is also by the fixing device in the part of the second container 210
290 are fixed on the side wall of top using hanging or other modes.It is noted that in other preferred embodiments, can also adopt
The fixation of the first liquid removal unit 120 is carried out with different fixed forms or different side walls.
The gas supply source 320 is used to provide several first jets by the first liquid removal unit 120
122 and 222 1 clean dried gas of several second nozzles (clean dry air, CDA).
With reference to figure 6-7.Fig. 6, the cut-away section for illustrating the wet process device 200 of the second preferred embodiment of the present invention show
It is intended to.Fig. 7 illustrates the cross sectional side view of Fig. 6.The difference of this preferred embodiment and first preferred embodiment is：The wet type
Processing apparatus 200 further includes a second liquid and removes unit 220, be arranged at a second sidewall 212 of the second container 210 to
Second opening 260, the first liquid removal unit 120 remove unit 220 with the second liquid and are opened described first
It is connected at mouth 160 and second opening 260.
Consider that the first side wall 112 and the second sidewall 222 are not suitable for fixed first liquid and move
Except unit 120, the first liquid removal unit 120 is fixed on the first container 110 in the part of the first container 110
Top side wall, it is also by described be fixed on that the second liquid, which removes unit 220 in the part of the second container 210,
The side wall of side.It is noted that in other preferred embodiments, also can be used different fixed forms or different side walls into
Row the first liquid removal unit 120 and the second liquid remove the fixation of unit 220.It is moved as first liquid
Screw may be employed between unit 220 or other fixed forms are fixed except unit 120 and the second liquid remove, and
It is not limited.
The gas supply source 320 is used to provide several first jets by the first liquid removal unit 120
122 and by the second liquid remove unit 220 the 222 1 clean dried gas of several second nozzles is provided.
Several first jets 122 and several second nozzles 222 are separately positioned on by the present invention described
At first opening 160 and second opening 260, even if in the first liquid removal unit 120 and the first side wall
Still accumulation of fluid is generated between 112 and the second sidewall 212, it still can be by being located relatively at the first side wall
112 and the outside of the second sidewall 212 several first jets 122 and several second nozzles 222 will described in
First liquid and the second liquid are respectively blowed to inside the first container 110 and the second container 210, are avoided
The cross staining of liquid.
The present invention is by regarding two adjacent containers as a unit, therefore liquid removal unit can not be fixed on opening
Side wall the technical issues of just do not existed.Used technical solution is that liquid removal unit is arranged among two containers
Opening, avoid the liquid removal unit being fixed on the side wall of the opening cause it is unstable, and can be complete
It abuts against on the side wall, avoids generating accumulation of fluid between liquid removal unit and side wall, while two groups of sprays are set in opening
Mouth makes the liquid inside two containers will not cross contamination.
Although the present invention has used preferred embodiment disclosed above, however, it is not to limit the invention, skill belonging to the present invention
Have usually intellectual in art field, without departing from the spirit and scope of the invention, may make various changes and modifications, because
The scope of protection of the present invention shall be subject to the definition of the patent scope appended hereto for this.
Claims (10)
1. a kind of wet process device, which is characterized in that including：
One the first container, one first opening including a first side wall, for a substrate to be allowed to be opened along first axle from described first
Mouth leaves or into the first container, and the first container is used to apply the first liquid to the substrate；
One second container, one second opening including a second sidewall, corresponding first opening of the second opening are set, institute
The second opening is stated for the substrate to be allowed to enter or leave described second from the described second opening accordingly along the first axle
Container, the second container are used to apply second liquid to the substrate；And
One first liquid removal unit is arranged at the first side wall of the first container to the described first opening, and including
Several first jets are arranged on the first liquid removal unit and are located at the described first parameatal part；
Wherein described several first jets are used to blow first liquid toward inside the first container.
2. wet process device as described in claim 1, which is characterized in that the first liquid removal unit is arranged at described
The top of substrate.
3. wet process device as claimed in claim 2, which is characterized in that the direction of several first jets and described the
First angle of one axis is between 180-270 degree.
4. wet process device as claimed in claim 2, which is characterized in that the first liquid removal unit further extends
To the described second opening, and including several second nozzles, it is arranged on the first liquid removal unit corresponding described second
Parameatal part, several second nozzles are used to blow toward inside the second container by the second liquid.
5. wet process device as claimed in claim 4, which is characterized in that the direction of several second nozzles and described the
Second angle of one axis is between 270-360 degree.
6. wet process device as claimed in claim 2 a, which is characterized in that fixing device is further included, for by described the
One liquid removal unit is mutually fixed in the part of the second container and the second container.
7. wet process device as claimed in claim 2, which is characterized in that further include a second liquid and remove unit, set
In a second sidewall to the described second opening for the second container, the first liquid removal unit and second liquid shifting
Except unit described first opening and second opening be connected.
8. wet process device as claimed in claim 7, which is characterized in that the second liquid removal unit further includes several
A second nozzle is arranged on the second liquid and removes the corresponding second parameatal part of unit, and described several the
Two nozzles are used to blow the second liquid toward inside the second container.
9. wet process device as claimed in claim 8, which is characterized in that the direction of several second nozzles and described the
Second angle of one axis is between 270-360 degree.
10. wet process device as claimed in claim 8, which is characterized in that further include a gas supply source for passing through institute
If it states the first liquid removal unit several first jets are provided and are removed described in unit offer by the second liquid
Dry second nozzle clean dried gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610983248.3A CN108074835A (en) | 2016-11-09 | 2016-11-09 | Wet process device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610983248.3A CN108074835A (en) | 2016-11-09 | 2016-11-09 | Wet process device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108074835A true CN108074835A (en) | 2018-05-25 |
Family
ID=62153952
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610983248.3A Pending CN108074835A (en) | 2016-11-09 | 2016-11-09 | Wet process device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108074835A (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0982592A (en) * | 1995-09-18 | 1997-03-28 | Dainippon Screen Mfg Co Ltd | Substrate processing equipment |
| CN1840997A (en) * | 2005-03-30 | 2006-10-04 | 大日本网目版制造株式会社 | Substrate treatment device |
| CN1894780A (en) * | 2003-12-19 | 2007-01-10 | 三星钻石工业股份有限公司 | Method of removing deposit from substrate and method of drying substrate, and device for removing deposit from substrate and device of drying substrate using these methods |
| CN101499408A (en) * | 2008-01-31 | 2009-08-05 | 大日本网屏制造株式会社 | Substrate processing apparatus and substrate processing method |
| JP2011129758A (en) * | 2009-12-18 | 2011-06-30 | Dainippon Screen Mfg Co Ltd | Substrate processing device |
| CN102626695A (en) * | 2011-09-28 | 2012-08-08 | 北京京东方光电科技有限公司 | Base board cleaning system |
| CN202655172U (en) * | 2012-05-18 | 2013-01-09 | 深圳市航盛电路科技股份有限公司 | Ammonia nitrogen discharge control device for alkaline etching line |
| CN204167277U (en) * | 2014-11-24 | 2015-02-18 | 合肥鑫晟光电科技有限公司 | A kind of liquid cutter cleaning device |
| CN104952765A (en) * | 2014-03-26 | 2015-09-30 | 斯克林集团公司 | Substrate processing apparatus, nozzle and substrate processing method |
| CN206293415U (en) * | 2016-11-09 | 2017-06-30 | 盟立自动化股份有限公司 | Wet process device |
-
2016
- 2016-11-09 CN CN201610983248.3A patent/CN108074835A/en active Pending
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0982592A (en) * | 1995-09-18 | 1997-03-28 | Dainippon Screen Mfg Co Ltd | Substrate processing equipment |
| CN1894780A (en) * | 2003-12-19 | 2007-01-10 | 三星钻石工业股份有限公司 | Method of removing deposit from substrate and method of drying substrate, and device for removing deposit from substrate and device of drying substrate using these methods |
| CN1840997A (en) * | 2005-03-30 | 2006-10-04 | 大日本网目版制造株式会社 | Substrate treatment device |
| CN100440446C (en) * | 2005-03-30 | 2008-12-03 | 大日本网目版制造株式会社 | Substrate treatment device |
| CN101499408A (en) * | 2008-01-31 | 2009-08-05 | 大日本网屏制造株式会社 | Substrate processing apparatus and substrate processing method |
| JP2011129758A (en) * | 2009-12-18 | 2011-06-30 | Dainippon Screen Mfg Co Ltd | Substrate processing device |
| CN102626695A (en) * | 2011-09-28 | 2012-08-08 | 北京京东方光电科技有限公司 | Base board cleaning system |
| CN202655172U (en) * | 2012-05-18 | 2013-01-09 | 深圳市航盛电路科技股份有限公司 | Ammonia nitrogen discharge control device for alkaline etching line |
| CN104952765A (en) * | 2014-03-26 | 2015-09-30 | 斯克林集团公司 | Substrate processing apparatus, nozzle and substrate processing method |
| CN204167277U (en) * | 2014-11-24 | 2015-02-18 | 合肥鑫晟光电科技有限公司 | A kind of liquid cutter cleaning device |
| CN206293415U (en) * | 2016-11-09 | 2017-06-30 | 盟立自动化股份有限公司 | Wet process device |
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Application publication date: 20180525 |