CN105710019A - Substrate vacuum drying device - Google Patents
Substrate vacuum drying device Download PDFInfo
- Publication number
- CN105710019A CN105710019A CN201610232396.1A CN201610232396A CN105710019A CN 105710019 A CN105710019 A CN 105710019A CN 201610232396 A CN201610232396 A CN 201610232396A CN 105710019 A CN105710019 A CN 105710019A
- Authority
- CN
- China
- Prior art keywords
- substrate
- chamber
- gripper shoe
- baffle plate
- minton dryer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0493—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases using vacuum
Landscapes
- Drying Of Solid Materials (AREA)
Abstract
The invention provides a substrate vacuum drying device, belongs to the technical field of display, and can solve the problems that during the photoresist drying curing process of a conventional vacuum drying device, the photoresist thickness is liable to be nonuniform, and the display is abnormal. The substrate vacuum drying device comprises a chamber, wherein the chamber comprises a chamber door for allowing a substrate to enter and come out of the chamber; the chamber also communicates with a gas pipeline; and a support plate used for supporting a substrate is arranged inside the chamber. When the substrate vacuum drying device is utilized, the substrate is placed on the support plate, and the support plate supports the substrate, so that the substrate does not deform, and the phenomenon that the photoresist thickness is nonuniform during the photoresist vacuum drying process is effectively avoided; and the substrate vacuum drying device provided by the invention is applicable to production of substrates of display products with different sizes and models.
Description
Technical field
The invention belongs to Display Technique field, be specifically related to a kind of substrate Minton dryer.
Background technology
Coating machine is used to be uniformly coated to photoresist a kind of process equipment of substrate, and Minton dryer is one of important component part of coating machine.
Existing Minton dryer, as it is shown in figure 1, include a chamber 1, the side of chamber 1 is provided with chamber door 11, is provided with multiple support bar 6 for supporting substrate 5 in chamber 1, and chamber 1 is also linked with vacuum-pumping tube 2 and air inlet pipe 8.Wherein, on the upside of substrate 5 after coating photoresist, multiple support bar 6 is connected on the downside of substrate 5, open chamber door, the substrate 5 being connected to support bar 6 is sent into chamber 1 by mechanical hand, is then shut off chamber door, evacuation, so that the solvent in photoresist fully volatilizees, finally make photoresist primary solidification on substrate 5 surface.
Inventor have found that in prior art, at least there are the following problems: in whole dry run, substrate 5 is supported by multiple support bars 6 always, sagging owing to action of gravity there will be in the region not having support bar 6, thus forming projection at substrate 5 strong point place, and support bar 6 is long for time of contact with substrate 5, the deformation of substrate 5 can be further exacerbated by vacuum so that the contact position place of substrate 5 is in uneven thickness with the photoresist of all the other positions, causes display quality bad.For avoiding this problem, it is normally supported bar 6 and must be supported at the clear area of substrate 5, namely do not do the position of display element.So when producing the substrate 5 of display product of different size, model, it is necessary to adjust the position of support bar 6, not only bring inconvenience to production, and once the position adjustment mistake of support bar 6, also can cause bigger loss.
Summary of the invention
The present invention is directed to existing Minton dryer, to be easily caused photoresist in photoresist dry solidification process in uneven thickness, causes the problem that display is abnormal, it is provided that a kind of substrate Minton dryer.
Solve the technology of the present invention problem be the technical scheme is that
A kind of substrate Minton dryer, including chamber, described chamber includes the chamber door for substrate discrepancy chamber, described chamber also UNICOM's gas pipeline, is provided with gripper shoe, for bearing substrate in described chamber.
Preferably, described gas pipeline includes pump-line and breather line, and described pump-line is for by evacuation in chamber, and described breather line is for passing into gas to chamber.
Preferably, described gripper shoe connects the first driver, and described first driver is used for driving gripper shoe to move.
Preferably, described first driver is cylinder.
Preferably, described gripper shoe is provided with hole, and described hole is for holding the support bar being attached on substrate.
Preferably, the position of the mouth of pipe of described chamber interior correspondence gas pipeline is provided with baffle plate, and the area of described baffle plate is more than the area of the mouth of pipe of chamber interior gas pipeline.
Preferably, described gas pipeline UNICOM is to the upper wall of chamber, and described baffle plate is arranged each parallel to the upper wall of chamber with gripper shoe, and gripper shoe is than the baffle plate upper wall further from chamber, and baffle plate does not all contact with gripper shoe and upper wall.
Preferably, the area of described baffle plate and gripper shoe is all higher than the area of substrate.
Preferably, described baffle plate connects the second driver, is used for driving baffle plate to move.
When the substrate Minton dryer of the present invention uses, by substrate dislocation gripper shoe, substrate each position can be all supported by gripper shoe, therefore substrate will not produce deformation, it is possible to is prevented effectively from and occurs that in process of vacuum drying photoresist is in uneven thickness at photoresist.The substrate Minton dryer of the present invention is applicable to produce the substrate of the display product of different size, model.
Accompanying drawing explanation
Fig. 1 is the structural representation of existing substrate Minton dryer；
Fig. 2 is the structural representation of the substrate Minton dryer of embodiments of the invention 1；
Fig. 3 is the schematic diagram of a kind of structure of the substrate Minton dryer of embodiments of the invention 2；
Fig. 4 is the schematic diagram of the another kind of structure of the substrate Minton dryer of embodiments of the invention 2；
Fig. 5 is the schematic diagram of the another kind of structure of the substrate Minton dryer of embodiments of the invention 2；
Wherein, accompanying drawing is labeled as: 1, chamber；11, chamber door；2, pump-line；3, baffle plate；4, the first driver；42, the second driver；5, substrate；6, support bar；7, gripper shoe；8, breather line.
Detailed description of the invention
For making those skilled in the art be more fully understood that technical scheme, below in conjunction with the drawings and specific embodiments, the present invention is described in further detail.
Embodiment 1:
The present embodiment provides a kind of substrate Minton dryer, as in figure 2 it is shown, include chamber 1, described chamber 1 includes coming in and going out for substrate 5 the chamber door 11 of chamber 1, and chamber 1 also UNICOM's gas pipeline is provided with gripper shoe 7, for bearing substrate 5 in chamber 1.
When the substrate Minton dryer of the present embodiment uses, by substrate 5 dislocation gripper shoe 7, gripper shoe 7 supports substrate 5, and substrate 5 will not produce deformation, it is possible to is prevented effectively from and occurs that in process of vacuum drying photoresist is in uneven thickness at photoresist.Substrate 5 Minton dryer of the present invention is applicable to produce the substrate 5 of the display product of different size, model.
Embodiment 2:
The present embodiment provides a kind of substrate Minton dryer, and as shown in Figure 2-5, including chamber 1, described chamber 1 includes coming in and going out for substrate 5 the chamber door 11 of chamber 1, and chamber 1 also UNICOM's gas pipeline is provided with gripper shoe 7, for bearing substrate 5 in chamber 1.
Wherein, chamber 1 provides an airtight space to carry out the vacuum drying of photoresist.The effect of gas pipeline is that the air in cavity is taken away formation vacuum environment, and has dried in backward chamber 1 and pass into gas.When the substrate Minton dryer of the present embodiment uses, by substrate 5 dislocation gripper shoe 7, gripper shoe 7 supports substrate 5, and therefore substrate 5 will not produce deformation, it is possible to is prevented effectively from and occurs that in process of vacuum drying photoresist is in uneven thickness at photoresist.Substrate 5 Minton dryer of the present invention is applicable to produce the substrate 5 of the display product of different size, model.
Preferably, gripper shoe 7 connects the first driver 4, and the first driver 4 is used for driving gripper shoe 7 to move.It is furthermore preferred that the first driver 4 is cylinder.
Preferably, gripper shoe 7 is provided with hole, and hole is for holding the support bar 6 linked on the substrate 5.
Wherein, being supported substrate 5 by gripper shoe 7 in substrate 5 Minton dryer shown in Fig. 2, although can be prevented effectively from and occur that in process of vacuum drying photoresist is in uneven thickness at photoresist, but substrate 5 comes in and goes out, chamber 1 is difficult to use mechanical hand and automatically operates.A kind of preferred version is provided, as it is shown on figure 3, support substrate 5 with support bar 6, it is achieved Robot actions substrate 5 comes in and goes out chamber 1 at this.
Concrete, mechanical hand will have support bar 6 to support substrate 5 to send into and cut out chamber door after chamber 1, gripper shoe 7 in chamber 1 is provided with hole, support bar 6 is through hole, now substrate 5 is still supported by support bar 6, then the first driver 4 drives gripper shoe 7 to move up, so that gripper shoe 7 upper surface flushes with support bar 6 or slightly above support bar 6, to ensure that gripper shoe 7 can support substrate 5 in process of vacuum drying.Proceeding by vacuum drying afterwards, in whole dry run, substrate 5 supports by gripper shoe 7.After having dried, passing into gas in chamber 1, open chamber door, the first driver 4 drives gripper shoe 7 to move down, then the substrate 5 supported by support bar 6 by mechanical hand removes chamber 1.At this, support bar 6 only enters or removes at substrate 5 in chamber 1 and works, and namely facilitates Robot actions substrate 5 to enter or remove chamber 1, and support bar 6 does not act the effect supporting substrate 5 in dry run, is overally supported substrate 5 by gripper shoe 7 in dry run.Therefore, when producing the substrate 5 of display product of different size, model, it is not necessary to adjust support bar 6 position on the substrate 5.
Preferably, gas pipeline includes pump-line 2 and breather line 8, and pump-line 2 is for by evacuation in chamber 1, and breather line 8 is for passing into gas to chamber 1.
It is to say, with the gas pipeline of chamber 1 UNICOM can only one of which, namely evacuation dries and has dried the ventilation of backward chamber 1 and adopts same pipeline.Can also as it is shown on figure 3, pump-line 2 be set to two different gas pipelines from breather line 8.After photoresist completes vacuum drying, in cavity, it is blown into gas to abolish the vacuum environment of chamber 1 by independent breather line 8.
Preferably, the position of the mouth of pipe of the internal corresponding gas pipeline of chamber 1 is provided with baffle plate 3, and the area of baffle plate 3 is more than the area of the mouth of pipe of chamber 1 inner gas tube.
It is to say, arrange baffle plate 3 in the position of the mouth of pipe near gas pipeline, making substrate 5 surface keep the air-flow of an even, the dry initial stage can avoid the relatively large air-flow of the position due to the mouth of pipe that uncured photoresist is impacted.
Preferably, the area of baffle plate 3 and gripper shoe 7 is all higher than the area of substrate 5.
Preferably, gas pipeline UNICOM is to the upper wall of chamber 1, and baffle plate 3 is arranged each parallel to the upper wall of chamber 1 with gripper shoe 7, and gripper shoe 7 is than the baffle plate 3 upper wall further from chamber 1, and baffle plate 3 does not all contact with gripper shoe 7 and upper wall.
It is to say, gas pipeline can UNICOM in any position of chamber 1, usual gas pipeline UNICOM is more conducive to convenient operation in the upper wall of chamber 1.
Preferably, baffle plate 3 connects the second driver 42, is used for driving baffle plate 3 to move.
That is, as shown in Figure 4, gripper shoe 7 can be fixed in chamber 1, before mechanical hand send substrate 5 to enter chamber 1, second driver 42 drives baffle plate 3 to move up, in order to reserve enough spaces on vertical direction mechanical hand and support bar 6, after waiting mechanical hand to leave chamber 1, second driver 42 drives baffle plate 3 to move down, it is to avoid uneven air-flow occurs in substrate 5 surface.In order to facilitate Robot actions, it is also moving up and down for needing support bar 6 in this case.It is of course also possible to as it is shown in figure 5, the first driver 4 drives gripper shoe 7, the second driver 42 drives baffle plate 3, with the use of.
Obviously, also many modifications may be made to for the detailed description of the invention of the various embodiments described above；Such as: the length of support bar, quantity can be adjusted according to the size of substrate, model, or the area of gripper shoe can be adjusted according to specifically actual.
It is understood that the principle that is intended to be merely illustrative of the present of embodiment of above and the illustrative embodiments that adopts, but the invention is not limited in this.For those skilled in the art, without departing from the spirit and substance in the present invention, it is possible to make various modification and improvement, these modification and improvement are also considered as protection scope of the present invention.
Claims (9)
1. a substrate Minton dryer, including chamber, described chamber includes the chamber door for substrate discrepancy chamber, described chamber also UNICOM's gas pipeline, it is characterised in that be provided with gripper shoe in described chamber, for bearing substrate.
2. substrate Minton dryer according to claim 1, it is characterised in that described gas pipeline includes pump-line and breather line, described pump-line is for by evacuation in chamber, and described breather line is for passing into gas to chamber.
3. substrate Minton dryer according to claim 1, it is characterised in that described gripper shoe connects the first driver, and described first driver is used for driving gripper shoe to move.
4. substrate Minton dryer according to claim 3, it is characterised in that described first driver is cylinder.
5. substrate Minton dryer according to claim 3, it is characterised in that described gripper shoe is provided with hole, described hole is for holding the support bar being attached on substrate.
6. substrate Minton dryer according to claim 1, it is characterised in that the position of the mouth of pipe of described chamber interior correspondence gas pipeline is provided with baffle plate, and the area of described baffle plate is more than the area of the mouth of pipe of chamber interior gas pipeline.
7. substrate Minton dryer according to claim 6, it is characterized in that, described gas pipeline UNICOM is to the upper wall of chamber, and described baffle plate is arranged each parallel to the upper wall of chamber with gripper shoe, gripper shoe is than the baffle plate upper wall further from chamber, and baffle plate does not all contact with gripper shoe and upper wall.
8. substrate Minton dryer according to claim 6, it is characterised in that the area of described baffle plate and gripper shoe is all higher than the area of substrate.
9. substrate Minton dryer according to claim 6, it is characterised in that described baffle plate connects the second driver, is used for driving baffle plate to move.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610232396.1A CN105710019A (en) | 2016-04-14 | 2016-04-14 | Substrate vacuum drying device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610232396.1A CN105710019A (en) | 2016-04-14 | 2016-04-14 | Substrate vacuum drying device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105710019A true CN105710019A (en) | 2016-06-29 |
Family
ID=56160203
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610232396.1A Pending CN105710019A (en) | 2016-04-14 | 2016-04-14 | Substrate vacuum drying device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105710019A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108905632A (en) * | 2018-07-16 | 2018-11-30 | 安徽智泓净化科技股份有限公司 | A kind of reverse osmosis functional membrane component seal glue quick curing method |
| CN111375514A (en) * | 2020-04-28 | 2020-07-07 | 江苏上达电子有限公司 | Precise edge-pasting spraying device suitable for COF substrate and using method thereof |
| CN111375529A (en) * | 2020-04-16 | 2020-07-07 | 江苏上达电子有限公司 | Stepping type coating machine for COF substrate and use method thereof |
| CN114643180A (en) * | 2022-02-28 | 2022-06-21 | 长电集成电路(绍兴)有限公司 | Photoresist curing device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105091506A (en) * | 2015-08-31 | 2015-11-25 | 武汉华星光电技术有限公司 | Vacuum drying device |
| CN105195397A (en) * | 2015-11-04 | 2015-12-30 | 京东方科技集团股份有限公司 | Vacuum drying system and vacuum drying method |
-
2016
- 2016-04-14 CN CN201610232396.1A patent/CN105710019A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105091506A (en) * | 2015-08-31 | 2015-11-25 | 武汉华星光电技术有限公司 | Vacuum drying device |
| CN105195397A (en) * | 2015-11-04 | 2015-12-30 | 京东方科技集团股份有限公司 | Vacuum drying system and vacuum drying method |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108905632A (en) * | 2018-07-16 | 2018-11-30 | 安徽智泓净化科技股份有限公司 | A kind of reverse osmosis functional membrane component seal glue quick curing method |
| CN108905632B (en) * | 2018-07-16 | 2020-12-08 | 安徽智泓净化科技股份有限公司 | Rapid curing method for membrane element sealant with reverse osmosis function |
| CN111375529A (en) * | 2020-04-16 | 2020-07-07 | 江苏上达电子有限公司 | Stepping type coating machine for COF substrate and use method thereof |
| CN111375514A (en) * | 2020-04-28 | 2020-07-07 | 江苏上达电子有限公司 | Precise edge-pasting spraying device suitable for COF substrate and using method thereof |
| CN114643180A (en) * | 2022-02-28 | 2022-06-21 | 长电集成电路(绍兴)有限公司 | Photoresist curing device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105710019A (en) | Substrate vacuum drying device | |
| TWI412407B (en) | Reduced pressure drying apparatus | |
| JP6498354B2 (en) | Glass bending apparatus and glass bending method using blower | |
| JP2007029984A (en) | Method and apparatus for spraying surface of cavity of casting die with release agent | |
| US20180275522A1 (en) | Proximity exposure device and exposure method thereof | |
| BR112017001769B1 (en) | Glass panel retention tool, glass panel bending method and tool use | |
| CN105084000A (en) | Glass placing and taking-out method | |
| CN103851887A (en) | PCB (printed circuit board) drying machine | |
| CN203896659U (en) | Communication cabinet with good ventilation and dust removal effects | |
| WO2019129038A1 (en) | Photoresist softbaking apparatus | |
| CN105371566A (en) | Air exhaust control system of freezing chamber | |
| CN204604296U (en) | The moulds of industrial equipment storage rack of engineering shop | |
| CN203945779U (en) | Multilayer half tone drying baker | |
| CN103234328B (en) | Method for baseplate drying under reduced pressure and device thereof | |
| JP2019525886A (en) | Suction support for glass | |
| ITBG20100068A1 (en) | PAINTING CABIN FOR MANUFACTURING PAINTING SYSTEMS. | |
| KR20010091687A (en) | Moulding system with paper slurry for making paper package | |
| JP2016161146A (en) | Reduced pressure drying device and substrate treatment system | |
| CN105015143A (en) | Multilayer screen printing plate stoving box | |
| CN114198993A (en) | Drying device for paperboard production | |
| CN203799174U (en) | Reduced-pressure drying device and array photolithographic process equipment | |
| JP2013082034A (en) | Sandblasting device | |
| CN101794067B (en) | Platen, high speed vacuum platen system and high speed vacuum forming method | |
| CN217266638U (en) | Forming die applied to paper pulp molded product | |
| CN220021054U (en) | Wafer material taking module |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20160629 |
|
| RJ01 | Rejection of invention patent application after publication |