CN1764028B - 碳化物材料形成或涂敷的气体电离器发射电极 - Google Patents
碳化物材料形成或涂敷的气体电离器发射电极 Download PDFInfo
- Publication number
- CN1764028B CN1764028B CN2005100983899A CN200510098389A CN1764028B CN 1764028 B CN1764028 B CN 1764028B CN 2005100983899 A CN2005100983899 A CN 2005100983899A CN 200510098389 A CN200510098389 A CN 200510098389A CN 1764028 B CN1764028 B CN 1764028B
- Authority
- CN
- China
- Prior art keywords
- emitter electrode
- corona
- electrode
- emission electrode
- ionizer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01T—SPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
- H01T19/00—Devices providing for corona discharge
- H01T19/04—Devices providing for corona discharge having pointed electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01T—SPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
- H01T23/00—Apparatus for generating ions to be introduced into non-enclosed gases, e.g. into the atmosphere
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Elimination Of Static Electricity (AREA)
- Chemical Vapour Deposition (AREA)
- Carbon And Carbon Compounds (AREA)
- Plasma Technology (AREA)
- Ceramic Products (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/956,316 US7501765B2 (en) | 2004-10-01 | 2004-10-01 | Emitter electrodes formed of chemical vapor deposition silicon carbide |
| US10/956,316 | 2004-10-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1764028A CN1764028A (zh) | 2006-04-26 |
| CN1764028B true CN1764028B (zh) | 2010-05-12 |
Family
ID=35447546
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2005100983899A Expired - Lifetime CN1764028B (zh) | 2004-10-01 | 2005-09-09 | 碳化物材料形成或涂敷的气体电离器发射电极 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US7501765B2 (https=) |
| EP (1) | EP1650844B1 (https=) |
| JP (1) | JP5021198B2 (https=) |
| CN (1) | CN1764028B (https=) |
| DE (1) | DE602005001044T2 (https=) |
| TW (1) | TWI281191B (https=) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8885317B2 (en) | 2011-02-08 | 2014-11-11 | Illinois Tool Works Inc. | Micropulse bipolar corona ionizer and method |
| US8773837B2 (en) | 2007-03-17 | 2014-07-08 | Illinois Tool Works Inc. | Multi pulse linear ionizer |
| US9380689B2 (en) * | 2008-06-18 | 2016-06-28 | Illinois Tool Works Inc. | Silicon based charge neutralization systems |
| US20090316325A1 (en) * | 2008-06-18 | 2009-12-24 | Mks Instruments | Silicon emitters for ionizers with high frequency waveforms |
| US8482898B2 (en) | 2010-04-30 | 2013-07-09 | Tessera, Inc. | Electrode conditioning in an electrohydrodynamic fluid accelerator device |
| US9125284B2 (en) | 2012-02-06 | 2015-09-01 | Illinois Tool Works Inc. | Automatically balanced micro-pulsed ionizing blower |
| USD743017S1 (en) | 2012-02-06 | 2015-11-10 | Illinois Tool Works Inc. | Linear ionizing bar |
| US9918374B2 (en) | 2012-02-06 | 2018-03-13 | Illinois Tool Works Inc. | Control system of a balanced micro-pulsed ionizer blower |
| RU2693560C2 (ru) * | 2013-06-21 | 2019-07-03 | Смитс Детекшен Монреаль Инк. | Способ и устройство для покрытого оболочкой источника ионизации коронного разряда |
| JP6673931B2 (ja) * | 2015-03-23 | 2020-03-25 | イリノイ トゥール ワークス インコーポレイティド | シリコンベース電荷中和システム |
| KR101787446B1 (ko) | 2016-08-09 | 2017-10-18 | 송방원 | 정전방전 자동 테스트 시스템 |
| AU2018280166A1 (en) * | 2017-06-07 | 2019-11-21 | Lawrence Livermore National Security, Llc. | Plasma confinement system and methods for use |
| CN116598895A (zh) * | 2023-06-05 | 2023-08-15 | 东莞松山湖国际机器人研究院有限公司 | 一种离子风发生装置的改性放电电极及其改性方法和应用 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3579966D1 (de) * | 1984-05-14 | 1990-11-08 | Telecommunications Sa | Gaslaser. |
| US5229625A (en) * | 1986-08-18 | 1993-07-20 | Sharp Kabushiki Kaisha | Schottky barrier gate type field effect transistor |
| JPS63130149A (ja) | 1986-11-19 | 1988-06-02 | Fuji Electric Co Ltd | 電気集塵装置 |
| US5008594A (en) * | 1989-02-16 | 1991-04-16 | Chapman Corporation | Self-balancing circuit for convection air ionizers |
| JPH03188699A (ja) | 1989-09-05 | 1991-08-16 | Tetsuo Motohashi | 除電装置用放電電極 |
| US5447763A (en) * | 1990-08-17 | 1995-09-05 | Ion Systems, Inc. | Silicon ion emitter electrodes |
| SE468195B (sv) | 1991-03-04 | 1992-11-23 | Holmbergs Fab Ab Brdr | Laas till bilbaelte, saerskilt barnbaelte |
| JPH05152054A (ja) | 1991-11-29 | 1993-06-18 | Tokyo Tekko Kk | 除電装置用放電電極とその製造方法 |
| JP2703151B2 (ja) * | 1992-07-01 | 1998-01-26 | 清二 加川 | コロナ放電用電極、コロナ放電処理装置および多孔質フィルムの製造装置 |
| JPH0636857A (ja) | 1992-07-13 | 1994-02-10 | Tokyo Tekko Co Ltd | 除電装置用放電電極とその製造方法 |
| JPH0770348B2 (ja) | 1992-09-02 | 1995-07-31 | 東京鐵鋼株式会社 | イオナイザー用放電電極の製造方法 |
| JP3455984B2 (ja) * | 1993-02-15 | 2003-10-14 | 東レ株式会社 | 帯電走行体の除電方法 |
| JPH10208848A (ja) * | 1997-01-22 | 1998-08-07 | Kazuo Okano | イオン発生装置用放電電極 |
| US5938823A (en) * | 1997-04-18 | 1999-08-17 | Carrier Corporation | Integrated electrostatic collection and microwave sterilization for bioaerosol air purification |
| US6215248B1 (en) | 1997-07-15 | 2001-04-10 | Illinois Tool Works Inc. | Germanium emitter electrodes for gas ionizers |
| US6451157B1 (en) * | 1999-09-23 | 2002-09-17 | Lam Research Corporation | Gas distribution apparatus for semiconductor processing |
| US7018947B2 (en) * | 2000-02-24 | 2006-03-28 | Shipley Company, L.L.C. | Low resistivity silicon carbide |
| US20020127853A1 (en) * | 2000-12-29 | 2002-09-12 | Hubacek Jerome S. | Electrode for plasma processes and method for manufacture and use thereof |
| JP4060577B2 (ja) * | 2001-11-26 | 2008-03-12 | サンクス株式会社 | 被除電対象物の除電方法および除電装置 |
| JP2004288547A (ja) * | 2003-03-24 | 2004-10-14 | Matsushita Electric Ind Co Ltd | 電界放出型電子源およびその製造方法および画像表示装置 |
-
2004
- 2004-10-01 US US10/956,316 patent/US7501765B2/en not_active Expired - Lifetime
-
2005
- 2005-08-12 DE DE602005001044T patent/DE602005001044T2/de not_active Expired - Lifetime
- 2005-08-12 EP EP05017593A patent/EP1650844B1/en not_active Expired - Lifetime
- 2005-09-09 CN CN2005100983899A patent/CN1764028B/zh not_active Expired - Lifetime
- 2005-09-30 TW TW094134198A patent/TWI281191B/zh not_active IP Right Cessation
- 2005-10-03 JP JP2005290366A patent/JP5021198B2/ja not_active Expired - Lifetime
-
2009
- 2009-02-26 US US12/393,760 patent/US8067892B2/en not_active Expired - Lifetime
Non-Patent Citations (3)
| Title |
|---|
| JP平6-36857A 1994.02.10 |
| JP平6-84581A 1994.03.25 |
| JP昭63-130149A 1988.06.02 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1650844B1 (en) | 2007-05-02 |
| CN1764028A (zh) | 2006-04-26 |
| DE602005001044T2 (de) | 2008-01-10 |
| TWI281191B (en) | 2007-05-11 |
| US7501765B2 (en) | 2009-03-10 |
| EP1650844A1 (en) | 2006-04-26 |
| JP5021198B2 (ja) | 2012-09-05 |
| DE602005001044D1 (de) | 2007-06-14 |
| US8067892B2 (en) | 2011-11-29 |
| US20060071599A1 (en) | 2006-04-06 |
| JP2006108101A (ja) | 2006-04-20 |
| US20090176431A1 (en) | 2009-07-09 |
| TW200612467A (en) | 2006-04-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20100512 |