JP5021198B2 - ガスイオナイザ用カーバイド材料から形成されるかまたはその材料でコーティングされるエミッタ電極 - Google Patents

ガスイオナイザ用カーバイド材料から形成されるかまたはその材料でコーティングされるエミッタ電極 Download PDF

Info

Publication number
JP5021198B2
JP5021198B2 JP2005290366A JP2005290366A JP5021198B2 JP 5021198 B2 JP5021198 B2 JP 5021198B2 JP 2005290366 A JP2005290366 A JP 2005290366A JP 2005290366 A JP2005290366 A JP 2005290366A JP 5021198 B2 JP5021198 B2 JP 5021198B2
Authority
JP
Japan
Prior art keywords
emitter electrode
ionizer
corona
electrode
silicon carbide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2005290366A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006108101A5 (https=
JP2006108101A (ja
Inventor
アール．カーティス ジェイムズ
エー．ゴルクジーカ ジョン
Original Assignee
イリノイ トゥール ワークス インコーポレイティド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by イリノイ トゥール ワークス インコーポレイティド filed Critical イリノイ トゥール ワークス インコーポレイティド
Publication of JP2006108101A publication Critical patent/JP2006108101A/ja
Publication of JP2006108101A5 publication Critical patent/JP2006108101A5/ja
Application granted granted Critical
Publication of JP5021198B2 publication Critical patent/JP5021198B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01T—SPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
    • H01T19/00—Devices providing for corona discharge
    • H01T19/04—Devices providing for corona discharge having pointed electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01T—SPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
    • H01T23/00—Apparatus for generating ions to be introduced into non-enclosed gases, e.g. into the atmosphere

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Elimination Of Static Electricity (AREA)
  • Chemical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Plasma Technology (AREA)
  • Ceramic Products (AREA)
JP2005290366A 2004-10-01 2005-10-03 ガスイオナイザ用カーバイド材料から形成されるかまたはその材料でコーティングされるエミッタ電極 Expired - Lifetime JP5021198B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/956,316 US7501765B2 (en) 2004-10-01 2004-10-01 Emitter electrodes formed of chemical vapor deposition silicon carbide
US10/956,316 2004-10-01

Publications (3)

Publication Number Publication Date
JP2006108101A JP2006108101A (ja) 2006-04-20
JP2006108101A5 JP2006108101A5 (https=) 2008-11-20
JP5021198B2 true JP5021198B2 (ja) 2012-09-05

Family

ID=35447546

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005290366A Expired - Lifetime JP5021198B2 (ja) 2004-10-01 2005-10-03 ガスイオナイザ用カーバイド材料から形成されるかまたはその材料でコーティングされるエミッタ電極

Country Status (6)

Country Link
US (2) US7501765B2 (https=)
EP (1) EP1650844B1 (https=)
JP (1) JP5021198B2 (https=)
CN (1) CN1764028B (https=)
DE (1) DE602005001044T2 (https=)
TW (1) TWI281191B (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8885317B2 (en) 2011-02-08 2014-11-11 Illinois Tool Works Inc. Micropulse bipolar corona ionizer and method
US8773837B2 (en) 2007-03-17 2014-07-08 Illinois Tool Works Inc. Multi pulse linear ionizer
US9380689B2 (en) * 2008-06-18 2016-06-28 Illinois Tool Works Inc. Silicon based charge neutralization systems
US20090316325A1 (en) * 2008-06-18 2009-12-24 Mks Instruments Silicon emitters for ionizers with high frequency waveforms
US8482898B2 (en) 2010-04-30 2013-07-09 Tessera, Inc. Electrode conditioning in an electrohydrodynamic fluid accelerator device
US9125284B2 (en) 2012-02-06 2015-09-01 Illinois Tool Works Inc. Automatically balanced micro-pulsed ionizing blower
USD743017S1 (en) 2012-02-06 2015-11-10 Illinois Tool Works Inc. Linear ionizing bar
US9918374B2 (en) 2012-02-06 2018-03-13 Illinois Tool Works Inc. Control system of a balanced micro-pulsed ionizer blower
RU2693560C2 (ru) * 2013-06-21 2019-07-03 Смитс Детекшен Монреаль Инк. Способ и устройство для покрытого оболочкой источника ионизации коронного разряда
JP6673931B2 (ja) * 2015-03-23 2020-03-25 イリノイ トゥール ワークス インコーポレイティド シリコンベース電荷中和システム
KR101787446B1 (ko) 2016-08-09 2017-10-18 송방원 정전방전 자동 테스트 시스템
AU2018280166A1 (en) * 2017-06-07 2019-11-21 Lawrence Livermore National Security, Llc. Plasma confinement system and methods for use
CN116598895A (zh) * 2023-06-05 2023-08-15 东莞松山湖国际机器人研究院有限公司 一种离子风发生装置的改性放电电极及其改性方法和应用

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3579966D1 (de) * 1984-05-14 1990-11-08 Telecommunications Sa Gaslaser.
US5229625A (en) * 1986-08-18 1993-07-20 Sharp Kabushiki Kaisha Schottky barrier gate type field effect transistor
JPS63130149A (ja) 1986-11-19 1988-06-02 Fuji Electric Co Ltd 電気集塵装置
US5008594A (en) * 1989-02-16 1991-04-16 Chapman Corporation Self-balancing circuit for convection air ionizers
JPH03188699A (ja) 1989-09-05 1991-08-16 Tetsuo Motohashi 除電装置用放電電極
US5447763A (en) * 1990-08-17 1995-09-05 Ion Systems, Inc. Silicon ion emitter electrodes
SE468195B (sv) 1991-03-04 1992-11-23 Holmbergs Fab Ab Brdr Laas till bilbaelte, saerskilt barnbaelte
JPH05152054A (ja) 1991-11-29 1993-06-18 Tokyo Tekko Kk 除電装置用放電電極とその製造方法
JP2703151B2 (ja) * 1992-07-01 1998-01-26 清二 加川 コロナ放電用電極、コロナ放電処理装置および多孔質フィルムの製造装置
JPH0636857A (ja) 1992-07-13 1994-02-10 Tokyo Tekko Co Ltd 除電装置用放電電極とその製造方法
JPH0770348B2 (ja) 1992-09-02 1995-07-31 東京鐵鋼株式会社 イオナイザー用放電電極の製造方法
JP3455984B2 (ja) * 1993-02-15 2003-10-14 東レ株式会社 帯電走行体の除電方法
JPH10208848A (ja) * 1997-01-22 1998-08-07 Kazuo Okano イオン発生装置用放電電極
US5938823A (en) * 1997-04-18 1999-08-17 Carrier Corporation Integrated electrostatic collection and microwave sterilization for bioaerosol air purification
US6215248B1 (en) 1997-07-15 2001-04-10 Illinois Tool Works Inc. Germanium emitter electrodes for gas ionizers
US6451157B1 (en) * 1999-09-23 2002-09-17 Lam Research Corporation Gas distribution apparatus for semiconductor processing
US7018947B2 (en) * 2000-02-24 2006-03-28 Shipley Company, L.L.C. Low resistivity silicon carbide
US20020127853A1 (en) * 2000-12-29 2002-09-12 Hubacek Jerome S. Electrode for plasma processes and method for manufacture and use thereof
JP4060577B2 (ja) * 2001-11-26 2008-03-12 サンクス株式会社 被除電対象物の除電方法および除電装置
JP2004288547A (ja) * 2003-03-24 2004-10-14 Matsushita Electric Ind Co Ltd 電界放出型電子源およびその製造方法および画像表示装置

Also Published As

Publication number Publication date
EP1650844B1 (en) 2007-05-02
CN1764028A (zh) 2006-04-26
DE602005001044T2 (de) 2008-01-10
TWI281191B (en) 2007-05-11
US7501765B2 (en) 2009-03-10
EP1650844A1 (en) 2006-04-26
DE602005001044D1 (de) 2007-06-14
CN1764028B (zh) 2010-05-12
US8067892B2 (en) 2011-11-29
US20060071599A1 (en) 2006-04-06
JP2006108101A (ja) 2006-04-20
US20090176431A1 (en) 2009-07-09
TW200612467A (en) 2006-04-16

Similar Documents

Publication Publication Date Title
US8067892B2 (en) Method of forming a corona electrode substantially of chemical vapor deposition silicon carbide and a method of ionizing gas using the same
US10422523B2 (en) Ionizer for a combustion system
TWI460017B (zh) 於電暈放電離子化棒中自氣體離子分離污染物
EP0386318B1 (en) Equipment for removing static electricity from charged articles existing in clean space
EP0386317A1 (en) Equipment for removing static electricity from charged articles existing in clean space
CN112789718B (zh) 静电去除基材表面异物的装置和方法
KR101023896B1 (ko) 이온 발생장치
CN106714434B (zh) 成对电极共面放电等离子体发生装置
KR101077289B1 (ko) 이오나이저
CN100489679C (zh) 交流电晕放电装置
CN101581844A (zh) 液晶面板基板的除电装置
TW419876B (en) Apparatus and method for producing high voltage to ionize gas
JP2023038948A (ja) シリコンベース電荷中和システム
JPH0479180A (ja) イオン化気体発生装置
JPH08250056A (ja) イオン発生装置およびこのイオン発生装置を用いた洗浄装置
US9551061B2 (en) In-situ triple junction formation to maintain electrode conductivity
JP2022040622A (ja) ガス浄化用放電電極及びその電極の塗布剤
Shin et al. A Study of The Surface Dielectric Barrier Discharge Design Conditions for Generating Negative Air Ions
CN1468044A (zh) 常压等离子体产生器
Chen et al. Rie Discharges
Radmilovic-Radjenovic et al. The effect of the ion-enhanced field emission on the water vapors in microgaps

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20081003

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20081003

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20101221

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20110318

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20110324

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110621

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110906

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20111205

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20111208

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120217

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120515

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120614

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

Ref document number: 5021198

Country of ref document: JP

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150622

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term