JP2006108101A5 - - Google Patents

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Publication number
JP2006108101A5
JP2006108101A5 JP2005290366A JP2005290366A JP2006108101A5 JP 2006108101 A5 JP2006108101 A5 JP 2006108101A5 JP 2005290366 A JP2005290366 A JP 2005290366A JP 2005290366 A JP2005290366 A JP 2005290366A JP 2006108101 A5 JP2006108101 A5 JP 2006108101A5
Authority
JP
Japan
Prior art keywords
emitter electrode
carbide
silicon carbide
ionizer emitter
ionizer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005290366A
Other languages
English (en)
Japanese (ja)
Other versions
JP5021198B2 (ja
JP2006108101A (ja
Filing date
Publication date
Priority claimed from US10/956,316 external-priority patent/US7501765B2/en
Application filed filed Critical
Publication of JP2006108101A publication Critical patent/JP2006108101A/ja
Publication of JP2006108101A5 publication Critical patent/JP2006108101A5/ja
Application granted granted Critical
Publication of JP5021198B2 publication Critical patent/JP5021198B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP2005290366A 2004-10-01 2005-10-03 ガスイオナイザ用カーバイド材料から形成されるかまたはその材料でコーティングされるエミッタ電極 Expired - Lifetime JP5021198B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/956,316 US7501765B2 (en) 2004-10-01 2004-10-01 Emitter electrodes formed of chemical vapor deposition silicon carbide
US10/956,316 2004-10-01

Publications (3)

Publication Number Publication Date
JP2006108101A JP2006108101A (ja) 2006-04-20
JP2006108101A5 true JP2006108101A5 (https=) 2008-11-20
JP5021198B2 JP5021198B2 (ja) 2012-09-05

Family

ID=35447546

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005290366A Expired - Lifetime JP5021198B2 (ja) 2004-10-01 2005-10-03 ガスイオナイザ用カーバイド材料から形成されるかまたはその材料でコーティングされるエミッタ電極

Country Status (6)

Country Link
US (2) US7501765B2 (https=)
EP (1) EP1650844B1 (https=)
JP (1) JP5021198B2 (https=)
CN (1) CN1764028B (https=)
DE (1) DE602005001044T2 (https=)
TW (1) TWI281191B (https=)

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* Cited by examiner, † Cited by third party
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US8885317B2 (en) 2011-02-08 2014-11-11 Illinois Tool Works Inc. Micropulse bipolar corona ionizer and method
US8773837B2 (en) 2007-03-17 2014-07-08 Illinois Tool Works Inc. Multi pulse linear ionizer
US9380689B2 (en) * 2008-06-18 2016-06-28 Illinois Tool Works Inc. Silicon based charge neutralization systems
US20090316325A1 (en) * 2008-06-18 2009-12-24 Mks Instruments Silicon emitters for ionizers with high frequency waveforms
US8482898B2 (en) 2010-04-30 2013-07-09 Tessera, Inc. Electrode conditioning in an electrohydrodynamic fluid accelerator device
US9125284B2 (en) 2012-02-06 2015-09-01 Illinois Tool Works Inc. Automatically balanced micro-pulsed ionizing blower
USD743017S1 (en) 2012-02-06 2015-11-10 Illinois Tool Works Inc. Linear ionizing bar
US9918374B2 (en) 2012-02-06 2018-03-13 Illinois Tool Works Inc. Control system of a balanced micro-pulsed ionizer blower
RU2693560C2 (ru) * 2013-06-21 2019-07-03 Смитс Детекшен Монреаль Инк. Способ и устройство для покрытого оболочкой источника ионизации коронного разряда
JP6673931B2 (ja) * 2015-03-23 2020-03-25 イリノイ トゥール ワークス インコーポレイティド シリコンベース電荷中和システム
KR101787446B1 (ko) 2016-08-09 2017-10-18 송방원 정전방전 자동 테스트 시스템
AU2018280166A1 (en) * 2017-06-07 2019-11-21 Lawrence Livermore National Security, Llc. Plasma confinement system and methods for use
CN116598895A (zh) * 2023-06-05 2023-08-15 东莞松山湖国际机器人研究院有限公司 一种离子风发生装置的改性放电电极及其改性方法和应用

Family Cites Families (20)

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Publication number Priority date Publication date Assignee Title
DE3579966D1 (de) * 1984-05-14 1990-11-08 Telecommunications Sa Gaslaser.
US5229625A (en) * 1986-08-18 1993-07-20 Sharp Kabushiki Kaisha Schottky barrier gate type field effect transistor
JPS63130149A (ja) 1986-11-19 1988-06-02 Fuji Electric Co Ltd 電気集塵装置
US5008594A (en) * 1989-02-16 1991-04-16 Chapman Corporation Self-balancing circuit for convection air ionizers
JPH03188699A (ja) 1989-09-05 1991-08-16 Tetsuo Motohashi 除電装置用放電電極
US5447763A (en) * 1990-08-17 1995-09-05 Ion Systems, Inc. Silicon ion emitter electrodes
SE468195B (sv) 1991-03-04 1992-11-23 Holmbergs Fab Ab Brdr Laas till bilbaelte, saerskilt barnbaelte
JPH05152054A (ja) 1991-11-29 1993-06-18 Tokyo Tekko Kk 除電装置用放電電極とその製造方法
JP2703151B2 (ja) * 1992-07-01 1998-01-26 清二 加川 コロナ放電用電極、コロナ放電処理装置および多孔質フィルムの製造装置
JPH0636857A (ja) 1992-07-13 1994-02-10 Tokyo Tekko Co Ltd 除電装置用放電電極とその製造方法
JPH0770348B2 (ja) 1992-09-02 1995-07-31 東京鐵鋼株式会社 イオナイザー用放電電極の製造方法
JP3455984B2 (ja) * 1993-02-15 2003-10-14 東レ株式会社 帯電走行体の除電方法
JPH10208848A (ja) * 1997-01-22 1998-08-07 Kazuo Okano イオン発生装置用放電電極
US5938823A (en) * 1997-04-18 1999-08-17 Carrier Corporation Integrated electrostatic collection and microwave sterilization for bioaerosol air purification
US6215248B1 (en) 1997-07-15 2001-04-10 Illinois Tool Works Inc. Germanium emitter electrodes for gas ionizers
US6451157B1 (en) * 1999-09-23 2002-09-17 Lam Research Corporation Gas distribution apparatus for semiconductor processing
US7018947B2 (en) * 2000-02-24 2006-03-28 Shipley Company, L.L.C. Low resistivity silicon carbide
US20020127853A1 (en) * 2000-12-29 2002-09-12 Hubacek Jerome S. Electrode for plasma processes and method for manufacture and use thereof
JP4060577B2 (ja) * 2001-11-26 2008-03-12 サンクス株式会社 被除電対象物の除電方法および除電装置
JP2004288547A (ja) * 2003-03-24 2004-10-14 Matsushita Electric Ind Co Ltd 電界放出型電子源およびその製造方法および画像表示装置

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