CN1761378A - Method of drilling a hole through Co2 laser directly - Google Patents

Method of drilling a hole through Co2 laser directly Download PDF

Info

Publication number
CN1761378A
CN1761378A CN 200510103274 CN200510103274A CN1761378A CN 1761378 A CN1761378 A CN 1761378A CN 200510103274 CN200510103274 CN 200510103274 CN 200510103274 A CN200510103274 A CN 200510103274A CN 1761378 A CN1761378 A CN 1761378A
Authority
CN
China
Prior art keywords
layer
copper
laser drill
anchor point
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN 200510103274
Other languages
Chinese (zh)
Inventor
杨志清
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HUSHI ELECTRONICS CO Ltd
Original Assignee
HUSHI ELECTRONICS CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by HUSHI ELECTRONICS CO Ltd filed Critical HUSHI ELECTRONICS CO Ltd
Priority to CN 200510103274 priority Critical patent/CN1761378A/en
Publication of CN1761378A publication Critical patent/CN1761378A/en
Pending legal-status Critical Current

Links

Images

Abstract

Drilling method of carbon dioxide laser includes steps: preparing locating point on layer next to the outer layer; before pressfitting added layer, browning oxidizing surface of target bonding pad; after pressfitting added layer, milling location hole / polishing edge, washing surface under high pressure; browning front surface of copper, thinning and coursing the surface before drilling hole by layer; first time to drill hole by laser; positioning film perforation by using plate location hole in original etching method for making window of copper, burning through copper foil and resin above the locating point on layer next to the outer layer so as to expose the locating point; second time to drill hole by laser; using the exposed locating point as position fixing to make micro hole inplate; washing surface under high pressure to remove browning layer after drill hole. The invention saves dry film and etching liquid, and raises process precision.

Description

Direct CO2 method for drilling holes
Technical field
The invention belongs to printed circuit board (PCB) (PCB) manufacturing technology field, relate to the method that a kind of employing CO2 (carbon dioxide) laser drilling machine directly carries out laser drill.
Background technology
In existing P CB course of manufacturing printed circuit board, as making the high density interconnect plate, need on the central layer of carrying out circuit, pressing increase layer, get out the micropore of aiming at target pad (being existing line layer disk figure on the central layer) with laser increasing on the layer then.What existing method for drilling holes adopted usually is traditional etching Conformal Mask (conformal) flow process, promptly earlier be covered with dry film at the plate face, utilize method imaging on dry film of image transfer again, after overexposure, development, etching, removing operation such as glue, need the Copper Foil in laser drill zone to etch away in the plate face, and then carry out laser drill.As shown in Figure 1, this etches open copper window method for drilling holes, specifically comprises the steps:
1) preceding processing procedure (pressing increases layer): central layer increases layer through pressing and obtains plate shown in A among Fig. 1;
2) pre-treatment (cleaning surfaces is scrubbed processing);
3) image transfer: obtain plate shown in B among Fig. 1 through press mold earlier, (be followed successively by photopolymer layer 1, table copper layer 2 on it from outside to inside, increase layer of material 3 and central layer 4, through hole 5 and target pad 10 are arranged on the central layer; Obtain plate shown in C among Fig. 1 through the exposure of engineering egative film with after developing again;
4) etching: obtain plate shown in D among Fig. 1 through etching, the copper window 6 that has lost out is arranged on it;
5) remove glue: after removing glue, obtain plate shown in E among Fig. 1;
6) detect;
7) laser drill: the copper window place that has lost out on outer (promptly pressing increase layer) carries out laser drill processing, obtains plate shown in F among Fig. 1 after the laser drill, and micropore 7 in the plate that laser drill processes is arranged on it.
The shortcoming of this method is:
1, cost is higher: need open copper window (conformal), through image transfer and etchant flow, consume dry film and etching liquid medicine;
2, precision is relatively poor: its precision is egative film precision (0.5mil in), open copper window aligning accuracy (in the 2mil) and laser drill precision (1mil is interior) three's sum.
Summary of the invention
The technical problem to be solved in the present invention is: a kind of copper window that need not to etch open is provided, and cost-saved, the direct CO2 method for drilling holes of raising laser drill precision.
Technical scheme of the present invention is as follows:
A kind of direct CO2 method for drilling holes, it comprises the following steps:
1) in inferior skin (being the central layer outermost layer) epigraph transfer process, designs and produces out the anchor point that is used to process micropore in the plate;
2) before the pressing brown oxidation processes is carried out on the surface of target pad layer;
3) preceding processing procedure (pressing increase layer): pressing increases layer on central layer, this increase layer comprise one deck prepreg (main component is a resin) and on one deck Copper Foil;
4) mill location hole/drag for limit: bore that target drone is got outer earth hole (being the location hole of power auger through hole) and to film perforation (being the egative film location hole of former etching Conformal Mask) with X ray;
5) high-pressure washing: clean is carried out on the copper surface;
6) table copper brown before the laser drill: thinning and roughening treatment are carried out in the copper surface;
7) laser drill for the first time: use film perforation is positioned, will be positioned at time Copper Foil and the resin of outer field anchor point top and ablate, expose the anchor point on time skin;
8) laser drill for the second time: position processing ejecting plate interior micropore in location with the anchor point on inferior skin that exposes after the processing of front;
9) high-pressure washing is carried out on the copper surface after the laser drill and wash away, make to remove the brown layer and handle.
Main points of the present invention are as follows:
1. laser drill processing adopts time outer anchor point of producing by image transfer of going up to locate, and has guaranteed the micropore that laser gets out and the Aligning degree of target pad, has improved the laser drill precision;
2. the surface treatment of target pad layer must be walked the brown processing, with the convenient anchor point that grasps;
3. carry out roughening treatment (or adopting Copper Foil of handling through surface coarsening) on thin table copper, can strengthen the absorbability of Copper Foil to laser energy, like this, CO2 laser drilling machine adds man-hour just can be with the energy of the last one directly to the Copper Foil processing of ablating.
4. table copper adopts 0.3 ounce copper foil, handles through brown, plays table copper and stings the effect of thin and alligatoring, and guaranteed uniformity.
Method of the present invention has following advantage:
1. cost reduces: without etching open copper window (conformal) flow process, operation and time have also been saved in the consumption of having saved dry film and etching liquid medicine;
2. machining accuracy improves: have only the mismachining tolerance of laser drilling machine in the process, improved machining accuracy.
Description of drawings:
Fig. 1 is the schematic diagram that tradition is opened copper window method for drilling holes;
Fig. 2 is a direct CO2 method for drilling holes schematic diagram of the present invention;
Fig. 3 is the photo of taking after the direct laser drill among the present invention;
Fig. 4 carries out surperficial reprocessing photo afterwards again among the present invention;
Fig. 5 is the photo after the direct laser drill re-plating of pressing RCC plate among the present invention;
Fig. 6 is the photo after the direct laser drill re-plating of pressing FR-4LDP plate among the present invention.
Embodiment
The invention will be further described below in conjunction with drawings and Examples.
The present invention carries out operation by the following method, is example with single order laser drill (1+n+1):
1) making anchor point on the inferior skin: carry out in the image transfer at inferior skin (being outermost one deck of central layer), on four angles, design and produce out the anchor point that is used to process micropore in the plate;
2) target pad layer surface oxidation before the pressing: can only walk brown and handle (normal operation condition), to improve the adhesion of copper-clad surface and resin face, simultaneously, the convenient anchor point that grasps;
3) pressing prepreg and Copper Foil: prepreg (pre-preg) is selected RCC (gum Copper Foil) or LDP (laser cloth) for use, (this is two kinds of layer materials that increase commonly used, main component is an insulating resin, also contain glass fabric among the LDP), Copper Foil is selected 0.3 ounce copper foil for use, (increase layer through pressing and obtain plate shown in A among Fig. 2);
4) mill location hole/drag for limit: bore that target drone is got outer earth hole (location hole of power auger through hole) and to film perforation (in the former etching Conformal Mask, be positioned on outer field four angles of central layer, be used for the hole that egative film is located on the plate face) with X ray;
5) high-pressure washing is opened brush: the 0.3 ounce copper foil high-pressure washing that need get ahead is opened brush, and it is residual to reduce glue, avoids brown to reveal copper;
6) table copper brown before the laser drill: with Bond film (a kind of brown liquid medicine brand, Germany Instituut Voor Agrotechnologisch Onderzoek (ATO-DLO) product) line carries out the brown operation, control copper is thick, to improve the roughness on copper surface, increase of the absorption of copper surface to laser, (after table copper brown, obtain plate shown in K among Fig. 2, be followed successively by table copper roughened layer 11, table copper layer 2 on it from outside to inside, increase layer of material 3 and central layer 4, through hole 5 and target pad 10 are arranged on the central layer);
7) the laser drill first step: use earlier film perforation is positioned,, will be positioned at time Copper Foil and the resin of outer field anchor point top and ablate, expose the anchor point 8 (shown in M plate among Fig. 2) on time skin with one group of laser drill program; Second step positioned with this group anchor point again, adopted another group laser drill program, and the location processes micropore 9 in the plate of aiming at target pad 10 (shown in N plate among Fig. 2);
8) high-pressure washing is carried out on the copper surface after the laser drill and wash away, make to remove the brown layer and handle (directly the photo of taking after the laser drill is seen Fig. 3, carries out surperficial reprocessing photo afterwards again and sees Fig. 4);
9) machine drilling: for referencial use with the Lapie that contracts that the laser drilling machine provides, make location hole with earth hole and get out through hole;
10) electroplate: at direct laser drill plate, the lateral erosion of hole wall may be bigger, and copper facing must be strengthened quality management and control (photo after the direct laser drill re-plating of pressing RCC plate is seen Fig. 5, and the photo after the direct laser drill re-plating of pressing FR-4LDP plate is seen Fig. 6).
As carrying out second order laser drill (2+n+2), then above-mentioned single order laser drill program the 10th) after the step electroplated and to finish and made circuit, one of pressing is new again increased layer, since the 2nd) go on foot and do again one time by said procedure.
Find out that from above directly the laser drill method is different from the characteristics that tradition etches open copper window laser drill method and mainly shows following several respects:
(1), anchor point and Aligning degree control
1. anchor point adopts the anchor point that comes out by the image transfer etching on the central layer to locate;
2. just the location is used earlier by what X ray brill target drone was got film perforation (being the egative film location hole of former etching Conformal Mask) is made location hole, (for preventing that anchor point comes off when ablating, (2.0 * 2.0mm) than anchor point periphery copper clad patterns (2.5 * 2.5mm) is little) for the machining area of anchor point to expose anchor point on the central layer after the laser ablation processing;
3. make micropore in the benchmark processing plate (for improving its positioning accuracy, anchor point need grasp 2 times) with anchor point;
4. adopt with one deck positioning principle, no matter want the several layers that increase of pressing, its laser drill location is that (the machine drilling location hole is still used earth hole on time skin with the outermost layer that figure (pad) all designs at central layer, need not to add and dash), example: 6 laminates of 1+4+1 in this way, the layer at L2/L5 is all designed with figure (pad) in its location; 8 laminates of 2+4+2 in this way, then the layer at L3/L6 is all designed with figure (pad) in its location.
(2), oxide side alligatoring mode
Only adopt the brown processing mode, add in the hope of laser drill and can more clearly grasp anchor point man-hour, the brown condition is normal.
(3), pressing prepreg and Copper Foil
1. pressing obtains processing quality preferably with first-selected RCC of prepreg and LDP during in the hope of laser drill;
2. table copper is selected 0.3 ounce copper foil for use, and purpose is in order to reduce the thinning flow process, to reduce the thick variation of copper.
(4), high-pressure washing flow process
It is residual to reduce copper foil surface glue, reduces the brown surface and reveals the copper phenomenon.
(5), table copper roughening treatment
Adopt brown to carry out copper surface coarsening (than melanism, can adjust alligatoring by adjusting transmission speed), production line for Copper Foil being controlled certain thickness (about 7um), adopts 2 browns processing not for the Bond-film line more conveniently.
(6), laser drill processing
1. adopt the mode of substep processing, first energy is stronger, processing Copper Foil and part prepreg (laser drill medium); Several the energy in back a little less than, processing prepreg (processing RCC only need 1-2 to send out); Laser drill is opened copper window condition (board is Mitsubishi's laser drilling machine): first: aperture 5mil, pulsewidth 10us, energy 15mj/ send out; Several of backs: aperture 4mil, pulsewidth 10us, energy 12mj/ send out.
2. utilize the Lapie that contracts (mean value) of laser drill board statistics to offer machine drilling usefulness.
(7), surperficial reprocessing
Open the mode of brush with high-pressure washing and promptly the splashings on surface can be removed totally, so also do not increase flow process.

Claims (8)

1, a kind of direct CO2 method for drilling holes is characterized in that it comprises the following steps:
Earlier in inferior outer epigraph transfer process, design and produce out the anchor point that is used to process micropore in the plate;
Before pressing increases layer, brown oxidation processes is carried out on target pad layer surface;
Increase layer in preceding processing procedure pressing, and mill location hole/drag for after the limit, carry out cleaning surfaces with the high-pressure washing mode and handle;
Before laser drill, show the copper brown earlier, roughening treatment is carried out on the copper surface;
Laser drill is carried out step by step:
Laser drill for the first time: use by X ray and bore target drone gets film perforation is positioned, will be positioned at time Copper Foil and the resin of outer field anchor point top and ablate, expose the anchor point on time skin;
Laser drill for the second time: position micropore in the location processing ejecting plate with the anchor point that exposes after the processing of front.
2, direct CO2 method for drilling holes according to claim 1 is characterized in that said method also comprises: high-pressure washing is carried out on the copper surface after the laser drill wash away, make to remove the brown layer and handle.
3, direct CO2 method for drilling holes according to claim 1 and 2 is characterized in that said method also comprises: during table copper brown before laser drill, according to circumstances did copper surface thinning earlier and handle before alligatoring.
4, direct CO2 method for drilling holes according to claim 3, it is characterized in that said method also comprises: follow-up machine drilling is for referencial use with the Lapie that contracts that the laser drilling machine provides, and makees location hole with earth hole and gets out through hole.
5, direct CO2 method for drilling holes according to claim 4 is characterized in that, several layers that increase of pressing no matter, be used to process micropore in the plate the second time laser drill anchor point all design at the i.e. time skin of the outermost layer of central layer.
6, the direct method for drilling holes of CO2 according to claim 5 is characterized in that, in the said method, Copper Foil is selected 0.3 ounce copper foil for use, and pressing is selected RCC (gum Copper Foil) or LDP (laser cloth) for use with prepreg.
7, the direct method for drilling holes of CO2 according to claim 6 is characterized in that, in the said method, before laser drill, his-and-hers watches copper carries out 2 browns to be handled.
8, the direct method for drilling holes of CO2 according to claim 7 is characterized in that, in the said method, when for the second time laser drill was made in the benchmark processing plate micropore with anchor point, anchor point grasped 2 times.
CN 200510103274 2005-09-20 2005-09-20 Method of drilling a hole through Co2 laser directly Pending CN1761378A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 200510103274 CN1761378A (en) 2005-09-20 2005-09-20 Method of drilling a hole through Co2 laser directly

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 200510103274 CN1761378A (en) 2005-09-20 2005-09-20 Method of drilling a hole through Co2 laser directly

Publications (1)

Publication Number Publication Date
CN1761378A true CN1761378A (en) 2006-04-19

Family

ID=36707274

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 200510103274 Pending CN1761378A (en) 2005-09-20 2005-09-20 Method of drilling a hole through Co2 laser directly

Country Status (1)

Country Link
CN (1) CN1761378A (en)

Cited By (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7665206B2 (en) 2007-04-27 2010-02-23 Samsung Electro-Mechanics Co., Ltd. Printed circuit board and manufacturing method thereof
CN101925268A (en) * 2010-05-07 2010-12-22 竞华电子(深圳)有限公司 Preparation method of sandwich plate
CN101977480A (en) * 2010-10-14 2011-02-16 惠州中京电子科技股份有限公司 Manufacturing process of fine circuits of printed circuit board
CN102026488A (en) * 2010-12-18 2011-04-20 奥士康精密电路(惠州)有限公司 Method for improving through-hole quality of multilayer circuit board
CN102036508A (en) * 2011-01-05 2011-04-27 惠州中京电子科技股份有限公司 Multi-layer HDI circuit board blind hole windowing process
CN101352763B (en) * 2007-07-27 2012-03-07 比亚迪股份有限公司 FPC secondary drilling method
CN102427685A (en) * 2011-11-22 2012-04-25 深圳崇达多层线路板有限公司 Manufacturing process of HDI (High Density Interconnection) board
CN102489885A (en) * 2011-12-20 2012-06-13 深圳市木森科技有限公司 Method and device for boring taper hole by using laser
CN102711382A (en) * 2012-06-14 2012-10-03 广州美维电子有限公司 Printed circuit board (PCB) layer-by-layer para-position laser drilling method
CN102026484B (en) * 2009-09-22 2013-01-02 奈电软性科技电子(珠海)有限公司 Pressing and breakover process and laminating board structure of circuit board
CN103068169A (en) * 2012-12-24 2013-04-24 广州杰赛科技股份有限公司 Method of preparing blind groove printed plate
CN103240531A (en) * 2013-05-10 2013-08-14 中国电子科技集团公司第五十四研究所 Segmentation laser punching method
CN103596368A (en) * 2013-10-14 2014-02-19 大连太平洋电子有限公司 Improved direct laser drilling processing method
CN103813653A (en) * 2012-11-09 2014-05-21 深南电路有限公司 Blind hole machining method
CN104244584A (en) * 2013-06-24 2014-12-24 北大方正集团有限公司 Laser drilling alignment method
CN104889575A (en) * 2015-06-15 2015-09-09 博敏电子股份有限公司 Method for manufacturing through hole for printed circuit board through CO2 laser
CN104923918A (en) * 2015-06-30 2015-09-23 开平太平洋绝缘材料有限公司 Laser edge-cutting device of prepreg
CN105101623A (en) * 2015-08-27 2015-11-25 高德(无锡)电子有限公司 Circuit board with ultra-thin medium layers and fabrication technology of circuit board
CN105376941A (en) * 2015-11-02 2016-03-02 深圳市五株科技股份有限公司 Printed circuit board processing method
CN105530767A (en) * 2016-01-26 2016-04-27 江苏博敏电子有限公司 Streamline production process for HDI board
CN105682850A (en) * 2013-08-29 2016-06-15 康宁股份有限公司 Methods for forming vias in glass substrates
CN106735387A (en) * 2016-12-27 2017-05-31 广东生益科技股份有限公司 Multiple-plate boring method
CN107454760A (en) * 2017-08-24 2017-12-08 高德(无锡)电子有限公司 The radium-shine through-hole approaches of carbon dioxide laser
CN107770964A (en) * 2017-10-18 2018-03-06 开平依利安达电子第三有限公司 A kind of wiring board piercing process
CN107949173A (en) * 2017-11-22 2018-04-20 广州兴森快捷电路科技有限公司 The boring method of wiring board
CN108500485A (en) * 2017-02-27 2018-09-07 无锡深南电路有限公司 A kind of production method of IC support plates laser micropore
CN108551723A (en) * 2018-04-20 2018-09-18 惠州市金百泽电路科技有限公司 The blockette seamless laser processing method of thicker gas electron multiplier circuit board
CN110868804A (en) * 2019-10-11 2020-03-06 衢州顺络电路板有限公司 Method for manufacturing printed circuit board for portable card type equipment
CN111203650A (en) * 2020-01-22 2020-05-29 惠州中京电子科技有限公司 Manufacturing method for laser drilling through hole in novel LED packaging support plate
US10756003B2 (en) 2016-06-29 2020-08-25 Corning Incorporated Inorganic wafer having through-holes attached to semiconductor wafer
CN111654978A (en) * 2020-06-30 2020-09-11 景旺电子科技(珠海)有限公司 Circuit board manufacturing method
US11062986B2 (en) 2017-05-25 2021-07-13 Corning Incorporated Articles having vias with geometry attributes and methods for fabricating the same
US11078112B2 (en) 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US11114309B2 (en) 2016-06-01 2021-09-07 Corning Incorporated Articles and methods of forming vias in substrates
CN113747683A (en) * 2020-05-29 2021-12-03 深南电路股份有限公司 Printed circuit board and manufacturing method thereof
US11554984B2 (en) 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness
US11774233B2 (en) 2016-06-29 2023-10-03 Corning Incorporated Method and system for measuring geometric parameters of through holes
US11972993B2 (en) 2021-05-14 2024-04-30 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same

Cited By (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101296569B (en) * 2007-04-27 2011-09-21 三星电机株式会社 Printed circuit board and manufacturing method thereof
US7665206B2 (en) 2007-04-27 2010-02-23 Samsung Electro-Mechanics Co., Ltd. Printed circuit board and manufacturing method thereof
CN101352763B (en) * 2007-07-27 2012-03-07 比亚迪股份有限公司 FPC secondary drilling method
CN102026484B (en) * 2009-09-22 2013-01-02 奈电软性科技电子(珠海)有限公司 Pressing and breakover process and laminating board structure of circuit board
CN101925268A (en) * 2010-05-07 2010-12-22 竞华电子(深圳)有限公司 Preparation method of sandwich plate
CN101925268B (en) * 2010-05-07 2012-07-04 竞华电子(深圳)有限公司 Preparation method of sandwich plate
CN101977480A (en) * 2010-10-14 2011-02-16 惠州中京电子科技股份有限公司 Manufacturing process of fine circuits of printed circuit board
CN101977480B (en) * 2010-10-14 2013-06-05 惠州中京电子科技股份有限公司 Manufacturing process of fine circuits of printed circuit board
CN102026488A (en) * 2010-12-18 2011-04-20 奥士康精密电路(惠州)有限公司 Method for improving through-hole quality of multilayer circuit board
CN102026488B (en) * 2010-12-18 2013-07-17 奥士康精密电路(惠州)有限公司 Method for improving through-hole quality of multilayer circuit board
CN102036508A (en) * 2011-01-05 2011-04-27 惠州中京电子科技股份有限公司 Multi-layer HDI circuit board blind hole windowing process
CN102427685A (en) * 2011-11-22 2012-04-25 深圳崇达多层线路板有限公司 Manufacturing process of HDI (High Density Interconnection) board
CN102489885A (en) * 2011-12-20 2012-06-13 深圳市木森科技有限公司 Method and device for boring taper hole by using laser
CN102489885B (en) * 2011-12-20 2015-12-09 深圳市木森科技有限公司 A kind of method and apparatus of boring taper hole by using laser
CN102711382B (en) * 2012-06-14 2015-02-25 广州美维电子有限公司 Printed circuit board (PCB) layer-by-layer para-position laser drilling method
CN102711382A (en) * 2012-06-14 2012-10-03 广州美维电子有限公司 Printed circuit board (PCB) layer-by-layer para-position laser drilling method
CN103813653B (en) * 2012-11-09 2017-05-31 深南电路有限公司 A kind of method for processing blind hole
CN103813653A (en) * 2012-11-09 2014-05-21 深南电路有限公司 Blind hole machining method
CN103068169B (en) * 2012-12-24 2015-04-29 广州杰赛科技股份有限公司 Method of preparing blind groove printed plate
CN103068169A (en) * 2012-12-24 2013-04-24 广州杰赛科技股份有限公司 Method of preparing blind groove printed plate
CN103240531A (en) * 2013-05-10 2013-08-14 中国电子科技集团公司第五十四研究所 Segmentation laser punching method
CN104244584A (en) * 2013-06-24 2014-12-24 北大方正集团有限公司 Laser drilling alignment method
CN104244584B (en) * 2013-06-24 2017-05-17 北大方正集团有限公司 Laser drilling alignment method
CN105682850A (en) * 2013-08-29 2016-06-15 康宁股份有限公司 Methods for forming vias in glass substrates
US9656909B2 (en) 2013-08-29 2017-05-23 Corning Incorporated Methods for forming vias in glass substrates
CN103596368A (en) * 2013-10-14 2014-02-19 大连太平洋电子有限公司 Improved direct laser drilling processing method
CN104889575A (en) * 2015-06-15 2015-09-09 博敏电子股份有限公司 Method for manufacturing through hole for printed circuit board through CO2 laser
CN104923918A (en) * 2015-06-30 2015-09-23 开平太平洋绝缘材料有限公司 Laser edge-cutting device of prepreg
CN105101623A (en) * 2015-08-27 2015-11-25 高德(无锡)电子有限公司 Circuit board with ultra-thin medium layers and fabrication technology of circuit board
CN105101623B (en) * 2015-08-27 2018-12-11 高德(无锡)电子有限公司 The circuit board and its manufacture craft of ultra-thin medium layer
CN105376941A (en) * 2015-11-02 2016-03-02 深圳市五株科技股份有限公司 Printed circuit board processing method
CN105376941B (en) * 2015-11-02 2018-08-07 深圳市五株科技股份有限公司 The processing method of printed circuit board
CN105530767A (en) * 2016-01-26 2016-04-27 江苏博敏电子有限公司 Streamline production process for HDI board
US11114309B2 (en) 2016-06-01 2021-09-07 Corning Incorporated Articles and methods of forming vias in substrates
US10756003B2 (en) 2016-06-29 2020-08-25 Corning Incorporated Inorganic wafer having through-holes attached to semiconductor wafer
US11774233B2 (en) 2016-06-29 2023-10-03 Corning Incorporated Method and system for measuring geometric parameters of through holes
CN106735387A (en) * 2016-12-27 2017-05-31 广东生益科技股份有限公司 Multiple-plate boring method
CN108500485A (en) * 2017-02-27 2018-09-07 无锡深南电路有限公司 A kind of production method of IC support plates laser micropore
US11062986B2 (en) 2017-05-25 2021-07-13 Corning Incorporated Articles having vias with geometry attributes and methods for fabricating the same
US11078112B2 (en) 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
CN107454760A (en) * 2017-08-24 2017-12-08 高德(无锡)电子有限公司 The radium-shine through-hole approaches of carbon dioxide laser
CN107770964A (en) * 2017-10-18 2018-03-06 开平依利安达电子第三有限公司 A kind of wiring board piercing process
CN107949173A (en) * 2017-11-22 2018-04-20 广州兴森快捷电路科技有限公司 The boring method of wiring board
US11554984B2 (en) 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness
CN108551723A (en) * 2018-04-20 2018-09-18 惠州市金百泽电路科技有限公司 The blockette seamless laser processing method of thicker gas electron multiplier circuit board
CN108551723B (en) * 2018-04-20 2021-05-07 惠州市金百泽电路科技有限公司 Partitioned seamless laser processing method of circuit board for thick gas electron multiplier
CN110868804A (en) * 2019-10-11 2020-03-06 衢州顺络电路板有限公司 Method for manufacturing printed circuit board for portable card type equipment
CN111203650A (en) * 2020-01-22 2020-05-29 惠州中京电子科技有限公司 Manufacturing method for laser drilling through hole in novel LED packaging support plate
CN113747683A (en) * 2020-05-29 2021-12-03 深南电路股份有限公司 Printed circuit board and manufacturing method thereof
CN113747683B (en) * 2020-05-29 2023-07-07 深南电路股份有限公司 Printed circuit board and manufacturing method thereof
CN111654978A (en) * 2020-06-30 2020-09-11 景旺电子科技(珠海)有限公司 Circuit board manufacturing method
US11972993B2 (en) 2021-05-14 2024-04-30 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same

Similar Documents

Publication Publication Date Title
CN1761378A (en) Method of drilling a hole through Co2 laser directly
JP4126038B2 (en) BGA package substrate and manufacturing method thereof
JP3032753B2 (en) Method of manufacturing multilayer printed circuit board
CN1193652C (en) Method for mfg multilayer printed circuit board and composite foil for use therein
CN104427786A (en) Processing method of printed circuit board
CN1758829A (en) Printed circuit board and method of fabricating same
CN108811334B (en) Processing method of graphical blind slot at bottom of printed circuit board
JPH0936522A (en) Formation of circuit of printed-wiring board
KR20050105849A (en) Method for electrolytic gold-plating printed circuit board
CN111356296A (en) Preparation method of circuit board precision line, circuit board precision line and circuit board
CN112040670A (en) Uncovering method of ultrathin rigid-flex printed circuit board
JPH1027960A (en) Manufacture of multi-layer printed wiring board
JP2011171528A (en) Manufacturing method of multilayer wiring board
CN1565150A (en) Interlayer connection structure and its building method
WO2024021438A1 (en) Method for manufacturing circuit board by means of transferring material through opening made by laser, and software and apparatus
CN110267448A (en) Complex copper thick substrate production method
JP2007013048A (en) Multilayer wiring board manufacturing method
CN107454760A (en) The radium-shine through-hole approaches of carbon dioxide laser
TWI299242B (en)
CN104185363A (en) Composite type ultra-thin non-core substrate and manufacturing method thereof
KR101184856B1 (en) Pcb manufacturing method
JP2015195364A (en) Manufacturing method of laminate structure
JP2005144973A (en) Perforated printing mask
CN112911837B (en) Synchronous processing method for inner layer and outer layer of flexible circuit board
JP2010129997A (en) Printed-circuit board with embedded pattern, and its manufacturing method

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication