CN1742233A - 能正性成像的厚膜组合物 - Google Patents

能正性成像的厚膜组合物 Download PDF

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Publication number
CN1742233A
CN1742233A CNA2003801092354A CN200380109235A CN1742233A CN 1742233 A CN1742233 A CN 1742233A CN A2003801092354 A CNA2003801092354 A CN A2003801092354A CN 200380109235 A CN200380109235 A CN 200380109235A CN 1742233 A CN1742233 A CN 1742233A
Authority
CN
China
Prior art keywords
composition
film
acrylate
patterned structure
methacrylate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2003801092354A
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English (en)
Chinese (zh)
Inventor
D·H·罗奇
Y·H·金
L·-T·A·程
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of CN1742233A publication Critical patent/CN1742233A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Electrodes For Cathode-Ray Tubes (AREA)
  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)
CNA2003801092354A 2002-12-06 2003-12-05 能正性成像的厚膜组合物 Pending CN1742233A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US43139202P 2002-12-06 2002-12-06
US60/431,392 2002-12-06

Publications (1)

Publication Number Publication Date
CN1742233A true CN1742233A (zh) 2006-03-01

Family

ID=32507722

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2003801092354A Pending CN1742233A (zh) 2002-12-06 2003-12-05 能正性成像的厚膜组合物

Country Status (7)

Country Link
US (2) US20040170925A1 (OSRAM)
EP (1) EP1567917A2 (OSRAM)
JP (1) JP2006510046A (OSRAM)
KR (1) KR20050084150A (OSRAM)
CN (1) CN1742233A (OSRAM)
AU (1) AU2003293441A1 (OSRAM)
WO (1) WO2004053593A2 (OSRAM)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101125944B (zh) * 2006-04-26 2011-05-18 三星Sdi株式会社 组合物及由其形成的电子发射源和电子发射装置
CN101086617B (zh) * 2006-06-09 2012-07-04 太阳控股株式会社 光固化性组合物以及使用其得到的烧成物图案
CN104541202A (zh) * 2012-08-31 2015-04-22 富士胶片株式会社 感光性树脂组合物、硬化物及其制造方法、树脂图案的制造方法、硬化膜、液晶显示装置、有机el显示装置、以及触摸屏显示装置

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KR20060090520A (ko) * 2005-02-07 2006-08-11 삼성전자주식회사 감광성 수지 및 상기 감광성 수지로 이루어진 패턴을포함하는 박막 표시판 및 그 제조 방법
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US7524606B2 (en) 2005-04-11 2009-04-28 Az Electronic Materials Usa Corp. Nanocomposite photoresist composition for imaging thick films
JP4861767B2 (ja) 2005-07-26 2012-01-25 富士フイルム株式会社 ポジ型レジスト組成物およびそれを用いたパターン形成方法
WO2008065827A1 (fr) * 2006-11-28 2008-06-05 Tokyo Ohka Kogyo Co., Ltd. Composition de résine photosensible de type positif chimiquement amplifié pour film épais, film sec chimiquement amplifié pour film épais, et procédé de fabrication d'un motif de résine photosensible sur film épais
KR101034346B1 (ko) * 2006-12-22 2011-05-16 주식회사 엘지화학 탄소 나노 튜브를 통한 내열성 개선의 감광성 수지 조성물
US8310069B2 (en) * 2007-10-05 2012-11-13 Texas Instruements Incorporated Semiconductor package having marking layer
CN101861282A (zh) * 2007-11-15 2010-10-13 纳幕尔杜邦公司 碳纳米管的保护
US20110012035A1 (en) * 2009-07-15 2011-01-20 Texas Instruments Incorporated Method for Precision Symbolization Using Digital Micromirror Device Technology
US20140267107A1 (en) 2013-03-15 2014-09-18 Sinovia Technologies Photoactive Transparent Conductive Films
US20130189524A1 (en) * 2012-01-19 2013-07-25 Brewer Science Inc. Viscous fugitive polymer-based carbon nanotube coatings
TW201421154A (zh) * 2012-10-26 2014-06-01 Fujifilm Corp 感光性樹脂組成物、硬化物及其製造方法、樹脂圖案製造方法、硬化膜、有機ｅｌ顯示裝置、液晶顯示裝置以及觸控面板顯示裝置
JP6564196B2 (ja) * 2014-03-20 2019-08-21 東京応化工業株式会社 厚膜用化学増幅型ポジ型感光性樹脂組成物
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101125944B (zh) * 2006-04-26 2011-05-18 三星Sdi株式会社 组合物及由其形成的电子发射源和电子发射装置
CN101086617B (zh) * 2006-06-09 2012-07-04 太阳控股株式会社 光固化性组合物以及使用其得到的烧成物图案
CN104541202A (zh) * 2012-08-31 2015-04-22 富士胶片株式会社 感光性树脂组合物、硬化物及其制造方法、树脂图案的制造方法、硬化膜、液晶显示装置、有机el显示装置、以及触摸屏显示装置
CN104541202B (zh) * 2012-08-31 2019-03-01 富士胶片株式会社 树脂组合物、硬化膜、物及其与图案的制法、及显示装置

Also Published As

Publication number Publication date
US20040170925A1 (en) 2004-09-02
WO2004053593A2 (en) 2004-06-24
WO2004053593A3 (en) 2004-10-28
EP1567917A2 (en) 2005-08-31
KR20050084150A (ko) 2005-08-26
AU2003293441A8 (en) 2004-06-30
JP2006510046A (ja) 2006-03-23
US20080166666A1 (en) 2008-07-10
AU2003293441A1 (en) 2004-06-30

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