CN1738845A - 具有微孔的聚氨酯泡沫的制备方法和由此获得的抛光垫 - Google Patents
具有微孔的聚氨酯泡沫的制备方法和由此获得的抛光垫 Download PDFInfo
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- CN1738845A CN1738845A CNA2003801089224A CN200380108922A CN1738845A CN 1738845 A CN1738845 A CN 1738845A CN A2003801089224 A CNA2003801089224 A CN A2003801089224A CN 200380108922 A CN200380108922 A CN 200380108922A CN 1738845 A CN1738845 A CN 1738845A
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
- C08G18/10—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
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- C08G18/12—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step using two or more compounds having active hydrogen in the first polymerisation step
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/82—Post-polymerisation treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/04—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof using blowing gases generated by a previously added blowing agent
- C08J9/12—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof using blowing gases generated by a previously added blowing agent by a physical blowing agent
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/30—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by mixing gases into liquid compositions or plastisols, e.g. frothing with air
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2101/00—Manufacture of cellular products
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
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- C08J2375/04—Polyurethanes
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- Chemical & Material Sciences (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Polyurethanes Or Polyureas (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
氨基甲酸乙酯预聚物(重量份) | 中空球(重量份) | 表面活性剂(重量份) | 活性氢化合物(重量份) | 质量流量计控制水平;<非反应性注入量>;(升/分钟) | 混合溶液的排放(kg/min) | 搅拌速率(rpm) | |
对比例1 | L-325100 | Expancel2.3 | - | MOCA25 | - | - | - |
对比例2 | L-325100 | - | DC-190,1.0 | MBCA 26.2 | - | - | 3,500 |
实施方式1 | L-325100 | - | DC-193,1.0 | MBCA24 | 20%;(1升/分钟) | 3 | 5,000 |
实施方式2 | L-325100 | - | DC-193,2.0DC-190,1.0 | MBCA24 | 20%;(1升/分钟) | 3 | 3,500 |
实施方式3 | L-325100 | - | DC-193,3.0 | MBCA24 | 25%;(1.25升/分钟) | 3 | 5,000 |
实施方式4 | L-325100 | - | DC-193,3.0 | MBCA24 | 30%;(1.5升/分钟) | 3 | 5,000 |
实施方式5 | L-325100 | - | DC-193,3.0 | MBCA24 | 40%;(2升/分钟) | 5 | 5,000 |
实施方式6 | L-325100 | - | DC-193,3.0 | MBCA24 | 40%;(2升/分钟) | 5 | 5,000 |
实施方式7 | L-325100 | - | DC-193,3.0 | MBCA24 | 50%;(2.5升/分钟) | 7 | 5,000 |
实施方式8 | L-325100 | - | DC-193,2.0DC-190,1.0 | MBCA24 | 40%;(2升/分钟) | 5 | 5,000 |
实施方式9 | L-325100 | - | DC-193,2.5DC-190,0.5 | MBCA24 | 0%;(2升/分钟) | 5 | 5,000 |
实施方式10 | L-325100 | 80GCA0.5 | DC-193,3.0 | MBCA24 | 40%;(2升/分钟) | 5 | 5,000 |
对比例1 | 对比例2 | 实施方式1 | 实施方式2 | 实施方式3 | 实施方式4 | |
抛光速率 | 3,000±200 | 2,800±200 | 2,900±200 | 3,000±200 | 3,400±200 | 3,200±200 |
平整度 | 5±1 | 3±1 | 5±1 | 4±1 | 3±1 | 3±1 |
硬度(肖氏D) | 57 | 58 | 68 | 68 | 60 | 57 |
气泡形状,细度 | ○ | ○ | ○ | ○ | ◎ | ◎ |
实施方式5 | 实施方式6 | 实施方式7 | 实施方式8 | 实施方式9 | 实施方式10 | |
抛光速率 | 3,400±100 | 3,500±100 | 3,200±200 | 3,400±200 | 3,300±100 | 3,400±200 |
平整度 | 3±1 | 3±1 | 4±1 | 3±1 | 3±1 | 3±1 |
硬度(肖氏D) | 62 | 63 | 61 | 62 | 61 | 62 |
气泡形状,细度 | ◎ | ◎ | ○ | ◎ | ◎ | ◎ |
Claims (25)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020020071715 | 2002-11-18 | ||
KR20020071715 | 2002-11-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1738845A true CN1738845A (zh) | 2006-02-22 |
CN1318469C CN1318469C (zh) | 2007-05-30 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CNB2003801089224A Expired - Lifetime CN1318469C (zh) | 2002-11-18 | 2003-11-18 | 具有微孔的聚氨酯泡沫的制备方法和由此获得的抛光垫 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20060022368A1 (zh) |
JP (1) | JP4313761B2 (zh) |
KR (1) | KR100464570B1 (zh) |
CN (1) | CN1318469C (zh) |
AU (1) | AU2003280879A1 (zh) |
WO (1) | WO2004046216A1 (zh) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100540224C (zh) * | 2006-05-25 | 2009-09-16 | 罗门哈斯电子材料Cmp控股股份有限公司 | 化学机械抛光垫 |
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-
2003
- 2003-11-18 JP JP2004553258A patent/JP4313761B2/ja not_active Expired - Lifetime
- 2003-11-18 WO PCT/KR2003/002472 patent/WO2004046216A1/en active Application Filing
- 2003-11-18 CN CNB2003801089224A patent/CN1318469C/zh not_active Expired - Lifetime
- 2003-11-18 AU AU2003280879A patent/AU2003280879A1/en not_active Abandoned
- 2003-11-18 KR KR10-2004-7007320A patent/KR100464570B1/ko active IP Right Grant
- 2003-11-18 US US10/528,159 patent/US20060022368A1/en not_active Abandoned
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CN100540224C (zh) * | 2006-05-25 | 2009-09-16 | 罗门哈斯电子材料Cmp控股股份有限公司 | 化学机械抛光垫 |
CN100540225C (zh) * | 2006-05-25 | 2009-09-16 | 罗门哈斯电子材料Cmp控股股份有限公司 | 化学机械抛光垫 |
TWI418443B (zh) * | 2006-05-25 | 2013-12-11 | 羅門哈斯電子材料Cmp控股公司 | 化學機械研磨墊 |
CN102639299A (zh) * | 2009-11-12 | 2012-08-15 | 3M创新有限公司 | 旋转抛光垫 |
CN102672628A (zh) * | 2012-06-08 | 2012-09-19 | 常熟晶玻光学科技有限公司 | 一种聚氨酯抛光垫的生产工艺 |
CN105382680A (zh) * | 2014-08-22 | 2016-03-09 | 陶氏环球技术有限责任公司 | 聚氨酯抛光垫 |
CN105382680B (zh) * | 2014-08-22 | 2020-02-28 | 陶氏环球技术有限责任公司 | 聚氨酯抛光垫 |
CN107695904A (zh) * | 2015-06-26 | 2018-02-16 | 陶氏环球技术有限责任公司 | 制备用于化学机械抛光垫的抛光层的方法 |
CN107033319A (zh) * | 2016-12-21 | 2017-08-11 | 重庆德盈汽车零部件有限公司 | 一种开孔聚氨酯泡沫及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
KR100464570B1 (ko) | 2005-01-03 |
KR20040066811A (ko) | 2004-07-27 |
AU2003280879A1 (en) | 2004-06-15 |
CN1318469C (zh) | 2007-05-30 |
JP4313761B2 (ja) | 2009-08-12 |
US20060022368A1 (en) | 2006-02-02 |
WO2004046216A1 (en) | 2004-06-03 |
JP2006502300A (ja) | 2006-01-19 |
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