CN1728916B - 超高速均匀等离子处理系统 - Google Patents

超高速均匀等离子处理系统 Download PDF

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Publication number
CN1728916B
CN1728916B CN200510083627.9A CN200510083627A CN1728916B CN 1728916 B CN1728916 B CN 1728916B CN 200510083627 A CN200510083627 A CN 200510083627A CN 1728916 B CN1728916 B CN 1728916B
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electrode
treatment region
vacuum
partition member
plasma
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Chinese (zh)
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CN1728916A (zh
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罗伯特·S·康德拉斯霍夫
詹姆斯·P·法西奥
詹姆斯·D·格蒂
詹姆斯·S·泰勒
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Nordson Corp
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Nordson Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32834—Exhausting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H01J37/32633—Baffles

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
CN200510083627.9A 2004-07-13 2005-07-13 超高速均匀等离子处理系统 Expired - Lifetime CN1728916B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/710,457 US7845309B2 (en) 2004-07-13 2004-07-13 Ultra high speed uniform plasma processing system
US10/710,457 2004-07-13

Publications (2)

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CN1728916A CN1728916A (zh) 2006-02-01
CN1728916B true CN1728916B (zh) 2011-06-01

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US (1) US7845309B2 (enExample)
EP (1) EP1617457B1 (enExample)
JP (1) JP5054901B2 (enExample)
CN (1) CN1728916B (enExample)
SG (2) SG119365A1 (enExample)
TW (1) TWI392402B (enExample)

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CN1728916A (zh) 2006-02-01

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