CN1678695A - 二氧化硅 - Google Patents
二氧化硅 Download PDFInfo
- Publication number
- CN1678695A CN1678695A CNA038202786A CN03820278A CN1678695A CN 1678695 A CN1678695 A CN 1678695A CN A038202786 A CNA038202786 A CN A038202786A CN 03820278 A CN03820278 A CN 03820278A CN 1678695 A CN1678695 A CN 1678695A
- Authority
- CN
- China
- Prior art keywords
- dioxide
- silicon
- structurally
- modified
- lacquer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3081—Treatment with organo-silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K7/00—Use of ingredients characterised by shape
- C08K7/22—Expanded, porous or hollow particles
- C08K7/24—Expanded, porous or hollow particles inorganic
- C08K7/26—Silicon- containing compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
- C09D7/62—Additives non-macromolecular inorganic modified by treatment with other compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/10—Solid density
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/11—Powder tap density
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/19—Oil-absorption capacity, e.g. DBP values
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/04—Ingredients treated with organic substances
- C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Inorganic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Composite Materials (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Silicon Compounds (AREA)
- Paints Or Removers (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
AEROSIL90 | AEROSIL130 | AEROSIL150 | AEROSIL200 | AEROSIL300 | AEROSIL380 | AEROSILOX 50 | AEROSILTT 600 | |
关于水的性质 | 亲水 | |||||||
外观 | 松散的白色粉末 | |||||||
比表面积1),m2/g | 90±15 | 130±25 | 150±15 | 200±25 | 300±30 | 380±30 | 50±15 | 200±50 |
原始粒子的平均尺寸,nm | 20 | 16 | 14 | 12 | 7 | 7 | 40 | 40 |
填充密度2)标准材料,g/l压缩材料,g/l(添加剂″V″) | ca.80- | ca.50ca.120 | ca.50ca.120 | ca.50ca.120 | ca.50ca.120 | ca.50ca.120 | ca.130- | ca.60- |
出厂时的干燥损失3)(1000℃加热2小时),% | <1.0 | <1.5 | <0.59) | <1.5 | <1.5 | <1.5 | <1.5 | <2.5 |
灼烧减量4)7)(1000℃下2小时),% | <1 | <1 | <1 | <1 | <2 | <2.5 | <1 | <2.5 |
pH值5)(4%水分散体中) | 3.6-4.5 | 3.6-4.3 | 3.6-4.3 | 3.6-4.3 | 3.6-4.3 | 3.6-4.3 | 3.8-4.8 | 3.6-4.5 |
SiO2 8),% | >99.8 | >99.8 | >99.8 | >99.8 | >99.8 | >99.8 | >99.8 | >99.8 |
Al2O3 8),% | <0.05 | <0.05 | <0.05 | <0.05 | <0.05 | <0.05 | <0.08 | <0.05 |
Fe2O3 8),% | <0.003 | <0.003 | <0.003 | <0.003 | <0.003 | <0.003 | <0.01 | <0.003 |
TiO2 8),% | <0.03 | <0.03 | <0.03 | <0.03 | <0.03 | <0.03 | <0.03 | <0.03 |
HCl8)9),% | <0.025 | <0.025 | <0.025 | <0.025 | <0.025 | <0.025 | <0.025 | <0.025 |
筛渣量6),%(Mocker,45μm) | <0.05 | <0.05 | <0.05 | <0.05 | <0.05 | <0.05 | <0.2 | <0.05 |
离析物 | A90 | A130 | A150 | A200 | A300 | A380 | OX50 | TT600 |
原始粒子的平均尺寸[nm] | 20 | 16 | 14 | 12 | 7 | 7 | 40 | 40 |
比表面积[m2/g] | 40-90 | 60-130 | 75-150 | 100-200 | 150-300 | 200-380 | 20-50 | 100-250 |
填充密度[g/l] | 40-140 | 40-140 | 40-140 | 40-140 | 40-140 | 40-140 | 40-140 | 40-140 |
干燥损失[%] | <2 | <2 | <2 | <2 | <2 | <2 | <2 | <2 |
灼烧减量[%] | 0.1-10 | 0.1-10 | 0.1-10 | 0.5-15 | 0.5-20 | 0.5-25 | 0.1-10 | 0.1-20 |
C含量[%] | 0.1-10 | 0.1-10 | 0.1-10 | 0.5-15 | 0.5-20 | 0.1-25 | 0.1-10 | 0.5-20 |
pH值 | 3.5-5.5 | 3.5-5.5 | 3.5-5.5 | 3.5-5.5 | 3.5-5.5 | 3.5-5.5 | 3.5-5.5 | 3.5-5.5 |
实施例 | Aerosil | 硅烷 | 硅烷量(g/100gAerosil) | 水量(g/100gAerosil) | 乙醇量(g/100gAerosil) | 回火时间(h) | 回火温度(℃) |
1 | A300 | 硅烷I | 1 | 0 | 9 | 2 | 120 |
2 | A200 | 硅烷I | 2.5 | 0 | 0 | 2 | 140 |
3 | A200 | 硅烷I | 20 | 5 | 0 | 2 | 140 |
4 | A200 | 硅烷I | 10 | 2.5 | 0 | 2 | 140 |
5 | A200 | 硅烷I | 5 | 1.25 | 0 | 2 | 140 |
6 | A200 | 硅烷I | 2.5 | 1.25 | 0 | 2 | 140 |
实施例 | pH值 | 填充密度(g/l) | C含量(%) | 表面积(m2/g) | 干燥损失(%) | 灼烧减量(%) |
1 | 4.3 | 50 | 1.3 | 253 | 0.4 | 1.8 |
2 | 4.4 | 49 | 1.7 | 176 | 0.3 | 2.5 |
3 | 4.6 | 68 | 10.1 | 116 | 0.6 | 12.7 |
4 | 4.5 | 72 | 5.7 | 144 | 0.6 | 7.1 |
5 | 4.7 | 52 | 2.6 | 167 | 0.6 | 3.4 |
6 | 4.5 | 51 | 1.9 | 171 | 0.7 | 2.5 |
名称 | 表面结合基团 | 结构改性 | 结构改性后的后研磨 | 后研磨后的回火 |
比较二氧化硅1 | 十六烷基甲硅烷基 | 否 | - | - |
比较二氧化硅2 | 辛基甲硅烷基 | 否 | - | - |
二氧化硅1 | 十六烷基甲硅烷基 | 是 | 否 | 否 |
二氧化硅2 | 辛基甲硅烷基 | 是 | 是 | 否 |
二氧化硅3 | 十六烷基甲硅烷基 | 是 | 是 | 是 |
二氧化硅4 | 辛基甲硅烷基 | 是 | 否 | 是 |
二氧化硅5 | 辛基甲硅烷基 | 是 | 是 | 否 |
二氧化硅6 | 十六烷基甲硅烷基 | 是 | 是 | 否 |
二氧化硅7 | 十六烷基甲硅烷基 | 是 | 是 | 否 |
二氧化硅8 | 十六烷基甲硅烷基 | 是 | 否 | 否 |
二氧化硅9 | 辛基甲硅烷基 | 是 | 是 | 否 |
二氧化硅10 | 辛基甲硅烷基 | 是 | 否 | 否 |
二氧化硅11 | 辛基甲硅烷基 | 是 | 是 | 否 |
二氧化硅12 | 辛基甲硅烷基 | 是 | 否 | 否 |
名称 | 填充密度[g/l] | 干燥损失[%] | 灼烧减量[%] | pH值 | C含量[%] | DBP吸附[%] | BET比表面积[m2/g] |
比较二氧化硅1 | 57 | 0.5 | 1.8 | 4.6 | 1.2 | 302 | 195 |
比较二氧化硅2 | 51 | 0.6 | 6.8 | 5.3 | 5.4 | 263 | 175 |
二氧化硅1 | 137 | 0.7 | 1.9 | 4.9 | 1.3 | 217 | 193 |
二氧化硅2 | 112 | 0.7 | 7.0 | 5.8 | 5.5 | 145 | 175 |
二氧化硅3 | 118 | 0.7 | 2.3 | 5.1 | 1.3 | 228 | 176 |
二氧化硅4 | 163 | 0.9 | 6.7 | 5.3 | 5.4 | 134 | 176 |
二氧化硅5 | 114 | 0.5 | 7.1 | 6.0 | 5.4 | 142 | 175 |
二氧化硅6 | 113 | 1.3 | 2.2 | 5.1 | 1.4 | 221 | 193 |
二氧化硅7 | 123 | 0.7 | 2.6 | 6.0 | 1.4 | 208 | 197 |
二氧化硅8 | 146 | 1.1 | 2.3 | 5.8 | 1.4 | 182 | 195 |
二氧化硅9 | 240 | 0.8 | 6.7 | 4.8 | 5.3 | 87 | 169 |
二氧化硅10 | 322 | 0.3 | 6.9 | 6.0 | 5.3 | 不能测出 | 172 |
二氧化硅11 | 204 | 0.7 | 6.4 | 5.7 | 5.4 | 101 | 173 |
二氧化硅12 | 276 | 0.3 | 6.6 | 6.6 | 5.3 | 不能测出 | 168 |
研磨基料 | 重量份 |
丙烯酸树酯,50%,在二甲苯/乙苯3∶1中乙酸丁酯,98%二甲苯二氧化硅 | 53.36.76.75.0 |
71.7 | |
漆组成 | |
丙烯酸树酯,50%,在二甲苯/乙苯3∶1中二甲苯醋酸乙氧丙酯丁基乙二醇乙酸酯乙酸丁酯,98%脂族聚异氰酸酯,约75%,在1-甲氧基丙基-2-乙酸酯/二甲苯1∶1中 | 1.112.21.51.5-17.0 |
105.0 |
比较二氧化硅1 | 二氧化硅7 | 二氧化硅8 | 无二氧化硅参照 | 比较二氧化硅2 | 二氧化硅9 | 二氧化硅11 | 无二氧化硅参照 | ||
粒度计值[μm] | <10 | <10 | <10 | <10 | <10 | <10 | <10 | / | |
粘度(研磨基料)[mPas]6Rpm60Rpm | 409407 | 210210 | 220212 | // | 56701260 | 935409 | 832407 | // | |
粘度(漆+固化剂)[mPas]6rpm60rpm | 120113 | 8082 | 8082 | 6061 | 446194 | 195146 | 175144 | 5564 | |
流动性 | 差,细裂纹 | 好 | 好 | 好 | 桔皮皱纹效应 | 好 | 好 | 好 | |
耐擦伤性 | |||||||||
擦伤前20°反射计值 | 81 | 89.5 | 89.1 | 91.3 | 38 | 85.5 | 85.3 | 91.7 | |
擦伤前的纹理 | 101 | 9 | 12 | 2 | 423 | 18 | 19 | 2 | |
黑度值My | 272 | 286 | 286 | 291 | 260 | 283 | 282 | 294 | |
用Sikron F 500划40下后剩余的光泽[%] | 83.4 | 88.5 | 90.7 | 51.8 | / | 80.4 | 84.3 | 56.1 |
研磨基料 | 重量份 |
丙烯酸共聚物,用合成的脂肪酸改性,70%乙酸正丁基酯溶液乙酸丁酯,98%醋酸乙氧丙酯芳烃油溶剂100二甲苯Baysilon OL 17,10%二甲苯溶液(硅油)二氧化硅 | 61.07.31.72.02.00.75.0 |
79.7 | |
漆组成(固化剂) | |
脂肪族聚异氰酸酯,90%乙酸正丁酯溶液乙酸丁酯,98%芳烃油溶剂100 | 22.32.01.0 |
105.0 |
比较二氧化硅1 | 二氧化硅7 | 二氧化硅8 | 无二氧化硅参照 | |
堆积密度[g/l] | 50 | 146 | 123 | / |
粒度计值[μm] | <10 | <10 | <10 | / |
粘度(研磨基料)[mPas]6rpm60rpm | 767717 | 376359 | 376361 | 205205 |
粘度(漆+固化剂)[mPas]6rpm60rpm | 459399 | 279272 | 281274 | 120120 |
流动性 | 差(细“裂纹”) | 好 | 好 | 好 |
耐擦伤性 | ||||
擦伤前20°反射计值 | 82.3 | 86.5 | 86.3 | 88.2 |
擦伤前的纹理 | 3 | 4 | 4 | 2 |
黑度值My | 275 | 283 | 282 | 292 |
用SikronF 500划40下后剩余的光泽[%] | 63.2 | 78.2 | 75.4 | 30.2 |
研磨基料 | 重量份 |
丙烯酸共聚物,用合成的脂肪酸改性,60%溶液乙酸丁酯,98%二甲苯二氧化硅 | 43.417.83.95.0 |
70.7 | |
漆组成 | |
二甲苯醋酸乙氧丙酯丁基乙二醇乙酸酯脂肪族聚异氰酸酯,约75%,在1-甲氧基丙基-2-乙酸酯/二甲苯1∶1中 | 11.33.41.618.6 |
105.0 |
比较二氧化硅1 | 二氧化硅7 | 二氧化硅8 | 无二氧化硅参照 | 比较二氧化硅2 | 二氧化硅9 | 二氧化硅11 | 无二氧化硅参照 | ||
粒度计值[μm] | <10 | <10 | <10 | / | <10 | <10 | <10 | / | |
粘度(研磨基料)[mPas]6Rpm60Rpm | 409407 | 210210 | 220212 | // | 56701260 | 935409 | 832407 | // | |
粘度(漆+固化剂)[mPas]6rpm60rpm | 120113 | 8082 | 8082 | 6061 | 446194 | 195146 | 175144 | 5564 | |
流动性 | 差,细裂纹 | 好 | 好 | 好 | 桔皮皱纹效应 | 好 | 好 | 好 | |
耐擦伤性 | |||||||||
擦伤前20°反射计值 | 81 | 89.5 | 89.1 | 91.3 | 38 | 85.5 | 85.3 | 91.7 | |
擦伤前的纹理 | 101 | 9 | 12 | 2 | 423 | 18 | 19 | 2 | |
用Sikron F 500划40下后剩余的光泽[%] | 83.4 | 88.5 | 90.7 | 51.8 | / | 80.4 | 84.3 | 56.1 |
现有技术1) | 依照本发明的二氧化硅2) | |
研磨基料 | ||
Desmophen A 2009/1 | 190.2 | |
乙酸甲氧丙酯∶芳烃油溶剂100 1∶1 | 36.8 | |
二氧化硅 | 23.0 | |
250.0 | ||
漆组成 | ||
Desmophen A YEP4-55A,包含AEROSIL R 972 | 96.0 | - |
研磨基料 | - | 48.9 |
Desmophen 2009/1 | - | 24.9 |
OL 17,10%MPA溶液 | - | - |
Modaflow 1%MPA溶液 | - | - |
MPA∶芳烃油溶剂100,1∶1 | 11.6 | 33.8 |
丁基乙二醇乙酸酯 | 10.5 | 10.5 |
Byketol OK | 7.5 | 7.5 |
Byk 141 | 0.8 | 0.8 |
固化剂的添加 | ||
Desmodur N 3390 | 23.6 | 23.6 |
∑ | 150.0 | 150.0 |
现有技术 | 二氧化硅7 | 参照 | |
粒度计值[μm] | <10 | <10 | / |
粘度(研磨基料)[mPas]6rpm60rpm | 5848 | 3043 | 3040 |
表面 | 桔皮皱纹 | 好 | 好 |
擦伤前20°反射计值 | 88.0 | 86.5 | 98.5 |
用Millicarb划100下后剩余光泽[%] | 88.6 | 96.3 | 59.6 |
Claims (6)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10239424A DE10239424A1 (de) | 2002-08-28 | 2002-08-28 | Kieselsäuren |
DE10239424.5 | 2002-08-28 | ||
PCT/EP2003/008329 WO2004020531A1 (en) | 2002-08-28 | 2003-07-29 | Silicas |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1678695A true CN1678695A (zh) | 2005-10-05 |
CN100445336C CN100445336C (zh) | 2008-12-24 |
Family
ID=31502032
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB038202786A Expired - Lifetime CN100445336C (zh) | 2002-08-28 | 2003-07-29 | 二氧化硅 |
Country Status (10)
Country | Link |
---|---|
US (1) | US7563317B2 (zh) |
EP (1) | EP1530613B1 (zh) |
JP (1) | JP4440101B2 (zh) |
KR (2) | KR100858235B1 (zh) |
CN (1) | CN100445336C (zh) |
AU (1) | AU2003255310A1 (zh) |
BR (1) | BRPI0313967B1 (zh) |
CA (1) | CA2496914C (zh) |
DE (1) | DE10239424A1 (zh) |
WO (1) | WO2004020531A1 (zh) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101730725A (zh) * | 2007-05-22 | 2010-06-09 | 赢创德固赛有限责任公司 | 硅烷化的研磨热解法二氧化硅 |
CN101346439B (zh) * | 2005-12-23 | 2012-08-29 | 赢创德固赛有限责任公司 | 热解法硅烷化二氧化硅 |
CN101796145B (zh) * | 2007-07-06 | 2013-04-17 | 卡伯特公司 | 经表面处理的金属氧化物颗粒 |
CN101688069B (zh) * | 2007-07-06 | 2014-02-12 | 卡伯特公司 | 经疏水处理的金属氧化物 |
CN101679774B (zh) * | 2007-05-22 | 2014-12-10 | 赢创德固赛有限责任公司 | 研磨的硅烷化气相法二氧化硅 |
CN105228970A (zh) * | 2013-03-26 | 2016-01-06 | 喜利得股份公司 | 用于胺固化剂的添加剂组合物、其用途以及含有其的胺固化剂组合物 |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10239423A1 (de) * | 2002-08-28 | 2004-03-11 | Degussa Ag | Kieselsäure |
DE10239425A1 (de) * | 2002-08-28 | 2004-03-11 | Degussa Ag | Lackformulierungen |
US7892643B2 (en) * | 2004-09-30 | 2011-02-22 | Cabot Corporation | Metal and oxides thereof and methods to make same |
ATE406405T1 (de) * | 2005-06-25 | 2008-09-15 | Evonik Degussa Gmbh | Thermoplastische matrix enthaltend silanisierte pyrogene kieselsäure |
EP1924655B1 (en) | 2005-08-25 | 2011-05-25 | E.I. Du Pont De Nemours And Company | Process for the production of a scratch resistant vehicle coating |
JP5541864B2 (ja) | 2005-08-25 | 2014-07-09 | コーティングス フォーリン アイピー カンパニー, エルエルシー | 変性ナノ粒子 |
EP1801073B1 (de) * | 2005-12-20 | 2011-05-18 | Evonik Degussa GmbH | Pyrogen hergestelltes Siliciumdioxid |
US8455165B2 (en) | 2006-09-15 | 2013-06-04 | Cabot Corporation | Cyclic-treated metal oxide |
US8202502B2 (en) * | 2006-09-15 | 2012-06-19 | Cabot Corporation | Method of preparing hydrophobic silica |
DE102007024096A1 (de) | 2007-05-22 | 2008-11-27 | Evonik Degussa Gmbh | Klebstoffe |
DE102007024099A1 (de) | 2007-05-22 | 2008-11-27 | Evonik Degussa Gmbh | Klebstoffe |
DE102007024095A1 (de) * | 2007-05-22 | 2008-11-27 | Evonik Degussa Gmbh | Hydrophobe pyrogen hergestellte Kieselsäure und Silikonkautschukmassen, enthaltend die pyrogene Kieselsäure |
DE102007024097A1 (de) | 2007-05-22 | 2008-11-27 | Evonik Degussa Gmbh | Kieselsäuren |
DE102007025435A1 (de) * | 2007-05-31 | 2008-12-04 | Evonik Degussa Gmbh | Kleb- und Dichtstoffsysteme |
DE102007035951A1 (de) * | 2007-07-30 | 2009-02-05 | Evonik Degussa Gmbh | Oberflächenmodifizierte, pyrogen hergestellte Kieselsäuren |
DE102007035955A1 (de) * | 2007-07-30 | 2009-02-05 | Evonik Degussa Gmbh | Oberflächenmodifizierte, pyrogen hergestellte Kieselsäuren |
DE102007035952A1 (de) * | 2007-07-30 | 2009-04-09 | Evonik Degussa Gmbh | Oberflächenmodifizierte, pyrogen hergestellte Kieselsäuren |
DE102007035956A1 (de) * | 2007-07-30 | 2009-02-05 | Evonik Degussa Gmbh | Oberflächenmodifizierte, pyrogen hergestellte Kieselsäuren |
EP2070992A1 (de) * | 2007-12-11 | 2009-06-17 | Evonik Degussa GmbH | Lacksysteme |
DE102008000499A1 (de) | 2008-03-04 | 2009-09-10 | Evonik Degussa Gmbh | Kieselsäure sowie Epoxidharze |
US9963595B2 (en) | 2011-05-18 | 2018-05-08 | Axalta Coating Systems Ip Co., Llc | Coating composition and method for producing powder coating |
JP5748573B2 (ja) * | 2011-06-15 | 2015-07-15 | キヤノン株式会社 | 熱可塑性複合材料、その製造方法および成形品 |
DE102012211121A1 (de) | 2012-06-28 | 2014-01-02 | Evonik Industries Ag | Granuläre, funktionalisierte Kieselsäure, Verfahren zu deren Herstellung und deren Verwendung |
DE102015204896A1 (de) * | 2015-03-18 | 2016-09-22 | Evonik Degussa Gmbh | Lacksystem enthaltend ein bewuchshemmendes Metalloxid und eine pyrogene Kieselsäure |
JP7560997B2 (ja) | 2020-10-27 | 2024-10-03 | キヤノン株式会社 | トナー及び画像形成方法 |
JP7562370B2 (ja) | 2020-10-27 | 2024-10-07 | キヤノン株式会社 | トナー |
CN116285475A (zh) * | 2023-02-13 | 2023-06-23 | 青岛中邦新材料科技有限公司 | 一种疏水二氧化硅及其制备方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0166009A1 (en) * | 1984-06-22 | 1986-01-02 | Dentsply Gmbh | Photopolymerizable dental composition for preparing crowns and bridges |
JPS6343976A (ja) * | 1986-08-12 | 1988-02-25 | Asahi Chem Ind Co Ltd | 仕上塗材組成物 |
US6193795B1 (en) * | 1993-08-02 | 2001-02-27 | Degussa Corporation | Low structure pyrogenic hydrophilic and hydrophobic metallic oxides, production and use |
DE4402370A1 (de) * | 1994-01-27 | 1995-08-03 | Degussa | Silanisierte Kieselsäuren |
ES2154748T3 (es) * | 1995-02-04 | 2001-04-16 | Degussa | Granulados a base de dioxido de silicio preparado por via pirogena, procedimiento para su preparacion y su empleo. |
US5827363A (en) * | 1995-12-19 | 1998-10-27 | Degussa Corporation | Structure precipitated silicates and silicas, production and use in ink jet printing |
US5959005A (en) | 1996-04-26 | 1999-09-28 | Degussa-Huls Aktiengesellschaft | Silanized silica |
DE19616781A1 (de) * | 1996-04-26 | 1997-11-06 | Degussa | Silanisierte Kieselsäure |
DE19811790A1 (de) * | 1998-03-18 | 1999-09-23 | Bayer Ag | Nanopartikel enthaltende transparente Lackbindemittel mit verbesserter Verkratzungsbeständigkeit, ein Verfahren zur Herstellung sowie deren Verwendung |
PT1173523E (pt) * | 2000-02-29 | 2006-05-31 | Feron Aluminium | Processo para a preparacao de um material estratificado e material estratificado assim obtido |
EP1199336B1 (de) * | 2000-10-21 | 2014-01-15 | Evonik Degussa GmbH | Funktionalisierte, strukturmodifizierte Kieselsäuren |
US20030108580A1 (en) * | 2001-10-30 | 2003-06-12 | Steffen Hasenzahl | Use of granulates based on pyrogenically - produced silicon dioxide in cosmetic compositions |
DE10239425A1 (de) * | 2002-08-28 | 2004-03-11 | Degussa Ag | Lackformulierungen |
DE10239423A1 (de) * | 2002-08-28 | 2004-03-11 | Degussa Ag | Kieselsäure |
DE10250712A1 (de) * | 2002-10-31 | 2004-05-19 | Degussa Ag | Pulverförmige Stoffe |
DE102004005221A1 (de) * | 2004-02-03 | 2005-08-18 | Degussa Ag | Verfahren zur Herstellung von Siliconpolymer-Mischungen |
-
2002
- 2002-08-28 DE DE10239424A patent/DE10239424A1/de not_active Ceased
-
2003
- 2003-07-29 US US10/524,366 patent/US7563317B2/en not_active Expired - Lifetime
- 2003-07-29 BR BRPI0313967A patent/BRPI0313967B1/pt active IP Right Grant
- 2003-07-29 WO PCT/EP2003/008329 patent/WO2004020531A1/en active Application Filing
- 2003-07-29 KR KR1020077008395A patent/KR100858235B1/ko active IP Right Grant
- 2003-07-29 EP EP03790825.8A patent/EP1530613B1/en not_active Expired - Lifetime
- 2003-07-29 CN CNB038202786A patent/CN100445336C/zh not_active Expired - Lifetime
- 2003-07-29 JP JP2004531825A patent/JP4440101B2/ja not_active Expired - Lifetime
- 2003-07-29 KR KR1020057003231A patent/KR100741305B1/ko active IP Right Grant
- 2003-07-29 AU AU2003255310A patent/AU2003255310A1/en not_active Abandoned
- 2003-07-29 CA CA2496914A patent/CA2496914C/en not_active Expired - Lifetime
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101346439B (zh) * | 2005-12-23 | 2012-08-29 | 赢创德固赛有限责任公司 | 热解法硅烷化二氧化硅 |
CN101730725A (zh) * | 2007-05-22 | 2010-06-09 | 赢创德固赛有限责任公司 | 硅烷化的研磨热解法二氧化硅 |
CN101730725B (zh) * | 2007-05-22 | 2013-12-04 | 赢创德固赛有限责任公司 | 硅烷化的研磨热解法二氧化硅 |
CN101679774B (zh) * | 2007-05-22 | 2014-12-10 | 赢创德固赛有限责任公司 | 研磨的硅烷化气相法二氧化硅 |
CN101796145B (zh) * | 2007-07-06 | 2013-04-17 | 卡伯特公司 | 经表面处理的金属氧化物颗粒 |
CN101688069B (zh) * | 2007-07-06 | 2014-02-12 | 卡伯特公司 | 经疏水处理的金属氧化物 |
CN105228970A (zh) * | 2013-03-26 | 2016-01-06 | 喜利得股份公司 | 用于胺固化剂的添加剂组合物、其用途以及含有其的胺固化剂组合物 |
Also Published As
Publication number | Publication date |
---|---|
JP4440101B2 (ja) | 2010-03-24 |
BRPI0313967B1 (pt) | 2017-03-07 |
JP2005536611A (ja) | 2005-12-02 |
CA2496914A1 (en) | 2004-03-11 |
KR20070044077A (ko) | 2007-04-26 |
EP1530613B1 (en) | 2013-09-04 |
KR100858235B1 (ko) | 2008-09-12 |
WO2004020531A1 (en) | 2004-03-11 |
DE10239424A1 (de) | 2004-03-11 |
CA2496914C (en) | 2011-02-08 |
US20050241531A1 (en) | 2005-11-03 |
EP1530613A1 (en) | 2005-05-18 |
KR20050059100A (ko) | 2005-06-17 |
KR100741305B1 (ko) | 2007-07-23 |
BR0313967A (pt) | 2005-07-19 |
CN100445336C (zh) | 2008-12-24 |
US7563317B2 (en) | 2009-07-21 |
AU2003255310A1 (en) | 2004-03-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN1678695A (zh) | 二氧化硅 | |
CN1678696A (zh) | 二氧化硅 | |
EP1199335B1 (de) | Funktionalisierte Kieselsäuren | |
CN1910225A (zh) | 包含纳米级氧化锌的分散体和涂布制品 | |
CN1180034C (zh) | 一种纳米二氧化钛浆组合物及其制备方法 | |
JP4240872B2 (ja) | 構造変性された官能化ケイ酸 | |
CN1709986A (zh) | 具有改进流变性能的涂料配制料 | |
CN100343343C (zh) | 用聚乙烯蜡乳液包衣的沉淀二氧化硅及其制备方法 | |
CN1207350C (zh) | 纳米水性分散体组合物及其制备方法和用途 | |
US8349399B2 (en) | Powder particles that are uniformly coated with functional groups, method for their production and use thereof | |
CN1242001C (zh) | 纳米氧化铝浆组合物及其制备方法 | |
CN1930224A (zh) | 硅橡胶 | |
CN1264906C (zh) | 用聚酰胺改性的二氧化硅,其制备方法以及应用 | |
CN1678698A (zh) | 漆制剂 | |
CN1587325A (zh) | 一种高稳定、高透明性的金红石型纳米二氧化钛浆及其分散制备方法 | |
CN1206287C (zh) | 一种纳米氧化锆浆组合物及其制备方法 | |
CN1648186A (zh) | 一种具有随角异色效果金属面漆及其制备方法 | |
CN115627104A (zh) | 一种高遮盖力双组份水性白漆及其制备方法 | |
CN1629235A (zh) | 一种车辆漆的配方 | |
CN101068889A (zh) | 表面改性的氧化铟锡 | |
TH105942A (th) | ฟูมด์ซิลิกาที่ถูกไซเลไนซ์ และที่ถูกบด |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: EVONIK DEGUSSA CO., LTD. Free format text: FORMER NAME: DECOUCHY STOCK COMPANY |
|
CP03 | Change of name, title or address |
Address after: essen Patentee after: Evonik Degussa GmbH Address before: Dusseldorf, Germany Patentee before: Degussa AG |
|
CP01 | Change in the name or title of a patent holder |
Address after: Essen, Germany Patentee after: Evonik Operations Ltd. Address before: Essen, Germany Patentee before: EVONIK DEGUSSA GmbH |
|
CP01 | Change in the name or title of a patent holder | ||
CX01 | Expiry of patent term |
Granted publication date: 20081224 |
|
CX01 | Expiry of patent term |