CN1587040A - 一种有机硅甲基单体生产过程中的副产物的综合利用法 - Google Patents
一种有机硅甲基单体生产过程中的副产物的综合利用法 Download PDFInfo
- Publication number
- CN1587040A CN1587040A CN 200410051507 CN200410051507A CN1587040A CN 1587040 A CN1587040 A CN 1587040A CN 200410051507 CN200410051507 CN 200410051507 CN 200410051507 A CN200410051507 A CN 200410051507A CN 1587040 A CN1587040 A CN 1587040A
- Authority
- CN
- China
- Prior art keywords
- product
- depickling
- gas
- comprehensive use
- zle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000006227 byproduct Substances 0.000 title claims abstract description 27
- 238000000034 method Methods 0.000 title claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 239000000178 monomer Substances 0.000 title claims description 17
- 239000010703 silicon Substances 0.000 title description 2
- 229910052710 silicon Inorganic materials 0.000 title description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 54
- 239000007789 gas Substances 0.000 claims abstract description 35
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 26
- 238000006243 chemical reaction Methods 0.000 claims abstract description 19
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 19
- 239000001257 hydrogen Substances 0.000 claims abstract description 14
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 14
- 239000000203 mixture Substances 0.000 claims abstract description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 7
- 238000000926 separation method Methods 0.000 claims abstract description 6
- 239000007787 solid Substances 0.000 claims abstract description 5
- 238000002156 mixing Methods 0.000 claims abstract description 3
- 238000009835 boiling Methods 0.000 claims description 24
- 229960001866 silicon dioxide Drugs 0.000 claims description 16
- 239000000126 substance Substances 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 14
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 10
- 238000005516 engineering process Methods 0.000 claims description 7
- 150000002431 hydrogen Chemical class 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 5
- 239000005543 nano-size silicon particle Substances 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- 238000003837 high-temperature calcination Methods 0.000 claims description 4
- 238000009834 vaporization Methods 0.000 claims description 4
- 230000008016 vaporization Effects 0.000 claims description 4
- 229910001868 water Inorganic materials 0.000 claims description 4
- 229910008045 Si-Si Inorganic materials 0.000 claims description 3
- 229910003902 SiCl 4 Inorganic materials 0.000 claims description 3
- 229910002808 Si–O–Si Inorganic materials 0.000 claims description 3
- 229910006411 Si—Si Inorganic materials 0.000 claims description 3
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 claims description 3
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 238000006068 polycondensation reaction Methods 0.000 claims description 2
- 239000000047 product Substances 0.000 abstract description 13
- 229920001971 elastomer Polymers 0.000 abstract description 2
- 230000007062 hydrolysis Effects 0.000 abstract description 2
- 238000006460 hydrolysis reaction Methods 0.000 abstract description 2
- 239000003973 paint Substances 0.000 abstract description 2
- 239000002245 particle Substances 0.000 abstract description 2
- 239000004033 plastic Substances 0.000 abstract description 2
- 229920003023 plastic Polymers 0.000 abstract description 2
- 239000005060 rubber Substances 0.000 abstract description 2
- 229910052681 coesite Inorganic materials 0.000 abstract 3
- 229910052906 cristobalite Inorganic materials 0.000 abstract 3
- 229910052682 stishovite Inorganic materials 0.000 abstract 3
- 229910052905 tridymite Inorganic materials 0.000 abstract 3
- 238000005345 coagulation Methods 0.000 abstract 1
- 230000015271 coagulation Effects 0.000 abstract 1
- 238000012643 polycondensation polymerization Methods 0.000 abstract 1
- 230000003014 reinforcing effect Effects 0.000 abstract 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 12
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 6
- 239000005049 silicon tetrachloride Substances 0.000 description 6
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical compound C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 description 5
- 229920001296 polysiloxane Polymers 0.000 description 3
- 229920002545 silicone oil Polymers 0.000 description 3
- 229920002050 silicone resin Polymers 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- 229910002012 Aerosil® Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000009776 industrial production Methods 0.000 description 2
- 239000005055 methyl trichlorosilane Substances 0.000 description 2
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 2
- 150000001282 organosilanes Chemical class 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000005496 tempering Methods 0.000 description 2
- 230000003245 working effect Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- XLVKXZZJSTWDJY-UHFFFAOYSA-N [SiH4].[Si] Chemical compound [SiH4].[Si] XLVKXZZJSTWDJY-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000007233 catalytic pyrolysis Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000013530 defoamer Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000029087 digestion Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 150000005826 halohydrocarbons Chemical class 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 150000001367 organochlorosilanes Chemical class 0.000 description 1
- 229920001558 organosilicon polymer Polymers 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- 238000004078 waterproofing Methods 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
Abstract
Description
组分名称 | 分子式 | 沸点(101.3kPa)/℃ | ||
主产物 | 二甲基二氯硅烷 | (CH3)2SiCl2 | 70.2 | |
副产物 | 低沸物 | 甲基三氯硅烷 | CH3SiCl3 | 66.1 |
三甲基氯硅烷 | (CH3)3SiCl | 57.3 | ||
甲基二氯硅烷 | CH3SiHCl2 | 40.4 | ||
二甲基氯硅烷 | (CH3)2SiHCl | 35.4 | ||
四甲基硅烷 | (CH3)4Si | 26.2 | ||
四氯化硅 | SiCl4 | 57.6 | ||
三氯硅烷 | HSiCl3 | 31.8 | ||
高沸物 | 二硅烷等 | ≡Si-Si≡≡Si-O-Si≡≡Si-CH2-Si≡ | >70.2℃ |
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 200410051507 CN1238252C (zh) | 2004-09-17 | 2004-09-17 | 一种有机硅甲基单体生产过程中的副产物的综合利用法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 200410051507 CN1238252C (zh) | 2004-09-17 | 2004-09-17 | 一种有机硅甲基单体生产过程中的副产物的综合利用法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1587040A true CN1587040A (zh) | 2005-03-02 |
CN1238252C CN1238252C (zh) | 2006-01-25 |
Family
ID=34602462
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 200410051507 Active CN1238252C (zh) | 2004-09-17 | 2004-09-17 | 一种有机硅甲基单体生产过程中的副产物的综合利用法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN1238252C (zh) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100369811C (zh) * | 2006-04-29 | 2008-02-20 | 广州吉必时科技实业有限公司 | 一种多晶硅生产过程中的副产物的综合利用方法 |
CN101378991B (zh) * | 2006-03-03 | 2012-11-28 | 瓦克化学有限公司 | 在综合氯硅烷厂中回收利用高沸点化合物的方法 |
CN107603230A (zh) * | 2017-08-25 | 2018-01-19 | 山东东岳有机硅材料有限公司 | 利用有机硅低沸水解物制备的硅橡胶及其制备方法 |
CN109880119A (zh) * | 2019-01-31 | 2019-06-14 | 山东东岳有机硅材料股份有限公司 | 消除有机硅粗单体水解物不分层和黏附设备现象的方法 |
CN113663464A (zh) * | 2021-09-01 | 2021-11-19 | 山东东岳有机硅材料股份有限公司 | 氯甲烷工业化生产用HCl的除杂工艺及除杂装置 |
CN114015049A (zh) * | 2021-10-29 | 2022-02-08 | 山东东岳有机硅材料股份有限公司 | 由有机硅副产物合成压敏胶用mq硅树脂的制备方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102513031B (zh) * | 2011-11-30 | 2014-04-16 | 广州吉必盛科技实业有限公司 | 一种脱酸工艺及其设备 |
-
2004
- 2004-09-17 CN CN 200410051507 patent/CN1238252C/zh active Active
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101378991B (zh) * | 2006-03-03 | 2012-11-28 | 瓦克化学有限公司 | 在综合氯硅烷厂中回收利用高沸点化合物的方法 |
CN100369811C (zh) * | 2006-04-29 | 2008-02-20 | 广州吉必时科技实业有限公司 | 一种多晶硅生产过程中的副产物的综合利用方法 |
CN107603230A (zh) * | 2017-08-25 | 2018-01-19 | 山东东岳有机硅材料有限公司 | 利用有机硅低沸水解物制备的硅橡胶及其制备方法 |
CN109880119A (zh) * | 2019-01-31 | 2019-06-14 | 山东东岳有机硅材料股份有限公司 | 消除有机硅粗单体水解物不分层和黏附设备现象的方法 |
CN109880119B (zh) * | 2019-01-31 | 2021-08-10 | 山东东岳有机硅材料股份有限公司 | 消除有机硅粗单体水解物不分层和黏附设备现象的方法 |
CN113663464A (zh) * | 2021-09-01 | 2021-11-19 | 山东东岳有机硅材料股份有限公司 | 氯甲烷工业化生产用HCl的除杂工艺及除杂装置 |
CN114015049A (zh) * | 2021-10-29 | 2022-02-08 | 山东东岳有机硅材料股份有限公司 | 由有机硅副产物合成压敏胶用mq硅树脂的制备方法 |
CN114015049B (zh) * | 2021-10-29 | 2023-10-24 | 山东东岳有机硅材料股份有限公司 | 由有机硅副产物合成压敏胶用mq硅树脂的制备方法 |
Also Published As
Publication number | Publication date |
---|---|
CN1238252C (zh) | 2006-01-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN100369811C (zh) | 一种多晶硅生产过程中的副产物的综合利用方法 | |
Rochow | An introduction chemistry of the Silicones | |
KR850000153B1 (ko) | 실리콘 카바이드 전 · 중합체의 제조방법 | |
CN1301903C (zh) | 火焰水解法制备的二氧化硅、其制备方法及用途 | |
CN109593465A (zh) | 一种室温固化耐高温的有机硅橡胶材料及其制备方法和应用 | |
CN101378991B (zh) | 在综合氯硅烷厂中回收利用高沸点化合物的方法 | |
CN1222472C (zh) | 一种高分散纳米二氧化硅的制备方法 | |
GB2093470A (en) | Silazane polymers from (r13si)2h and organochlorosilanes | |
CN1282603C (zh) | 一种高效节能的气相法白炭黑合成工艺 | |
CN1238252C (zh) | 一种有机硅甲基单体生产过程中的副产物的综合利用法 | |
CN105694049B (zh) | 聚硼硅氮烷及其制备方法 | |
CN101824046A (zh) | 一种利用歧化反应生成二甲基二氯硅烷的方法 | |
CN1687246A (zh) | 一种通过连续表面处理制备疏水型纳米二氧化硅的方法 | |
CN1195691C (zh) | 通过分解有机硅烷生产二氧化硅的方法 | |
CN102786056A (zh) | 多晶硅还原生产装置及方法 | |
CN102245291A (zh) | 小型生产装置中生产热解硅酸 | |
CN1033909C (zh) | 疏水的焦化二氧化硅的生产方法 | |
CN101899156B (zh) | 一种多链梯形聚烷基硅倍半氧烷的制备方法 | |
CN117534696A (zh) | 一种直接由稻壳与稻草混合灰分制备正硅酸四乙酯的方法 | |
CN1546373A (zh) | 一种尺寸可控的纳米二氧化硅的制备方法 | |
CN109574674B (zh) | 一种聚硅铝碳氮陶瓷微球及其制备方法和应用 | |
CN109231220B (zh) | 一种气相二氧化硅的生产工艺 | |
CN88103481A (zh) | 含硅-氮和硅-硅键的共聚物和热解该共聚物得到的聚碳硅氮烷及该聚碳硅氮烷制备一碳氮化硅的应用 | |
JP2005522508A (ja) | マイクロ波エネルギー励起下でのハロシランの製造方法 | |
CN107652317B (zh) | 一种由硅橡胶系列物质裂解反应制取ɑ,ω‐二氯封端硅氧烷的方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: GUANGZHOU SCIENCE AND TECHNOLOGY JI SHENG INDUSTRI Free format text: FORMER NAME OR ADDRESS: JIBISHI SCI. + TECH. INDUSTRIAL CO., LTD., GUANGZHOU |
|
CP03 | Change of name, title or address |
Address after: 510450 Tong Shan section of Guangzhou first grade highway, Guangdong, Guangzhou Patentee after: Guangzhou GBS High-Tech & Industry Co., Ltd. Address before: 510510 No. 623 Sha Tai Road, Guangdong, Guangzhou Patentee before: Guangzhou Jibishi Sci-Tech Industry Co., Ltd. |
|
ASS | Succession or assignment of patent right |
Owner name: LIANYUNGANG GBS SILICON MATERIAL CO., LTD. Free format text: FORMER OWNER: JIBISHENG TECH IND CO., LTD., GUANGZHOU Effective date: 20110406 |
|
C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 510450 TANGBEI ROAD SECTION, GUANGHUA FIRST-CLASS HIGHWAY, GUANGZHOU CITY, GUANGDONG PROVINCE TO: 222000 BANQIAO INDUSTRIAL PARK, LIANYUN DEVELOPMENT AREA, LIANYUNGANG CITY, JIANGSU PROVINCE |
|
TR01 | Transfer of patent right |
Effective date of registration: 20110406 Address after: Banqiao Industrial Park 222000 Jiangsu Province, Lianyungang City Lianyun Development Zone Patentee after: Lianyungang Jibi Shenggui Materials Co.,Ltd. Address before: 510450 Tong Shan section of Guangzhou first grade highway, Guangdong, Guangzhou Patentee before: Guangzhou GBS High-Tech & Industry Co., Ltd. |
|
TR01 | Transfer of patent right |
Effective date of registration: 20191125 Address after: Nanxiang three road, Science City high tech Industrial Development Zone, Guangzhou city of Guangdong Province, No. 15 510663 Patentee after: Guangzhou GBS High-Tech & Industry Co., Ltd. Address before: Banqiao Industrial Park 222000 Jiangsu Province, Lianyungang City Lianyun Development Zone Patentee before: Lianyungang Jibi Shenggui Materials Co.,Ltd. |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20200407 Address after: 443007 66-2, Lanting Avenue, Lanting District, Yichang City, Hubei Province Patentee after: YICHANG HUIFU SILICON MATERIAL Co.,Ltd. Address before: Nanxiang three road, Science City high tech Industrial Development Zone, Guangzhou city of Guangdong Province, No. 15 510663 Patentee before: GUANGZHOU GBS HIGH-TECH & INDUSTRY Co.,Ltd. |
|
TR01 | Transfer of patent right | ||
CP03 | Change of name, title or address |
Address after: 66-2 No. 443007 Hubei city of Yichang province located in Xiaoting District Road Patentee after: Hubei HuiFu nano materials Co., Ltd Address before: 443007 66-2, Lanting Avenue, Lanting District, Yichang City, Hubei Province Patentee before: YICHANG HUIFU SILICON MATERIAL Co.,Ltd. |
|
CP03 | Change of name, title or address |