CN1301903C - 火焰水解法制备的二氧化硅、其制备方法及用途 - Google Patents
火焰水解法制备的二氧化硅、其制备方法及用途 Download PDFInfo
- Publication number
- CN1301903C CN1301903C CNB2004100492750A CN200410049275A CN1301903C CN 1301903 C CN1301903 C CN 1301903C CN B2004100492750 A CNB2004100492750 A CN B2004100492750A CN 200410049275 A CN200410049275 A CN 200410049275A CN 1301903 C CN1301903 C CN 1301903C
- Authority
- CN
- China
- Prior art keywords
- silicon
- powder
- sio
- value
- preparation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 47
- 238000000034 method Methods 0.000 title claims description 17
- 230000007062 hydrolysis Effects 0.000 title claims description 16
- 238000006460 hydrolysis reaction Methods 0.000 title claims description 16
- 229910021485 fumed silica Inorganic materials 0.000 title abstract 3
- 239000000843 powder Substances 0.000 claims abstract description 34
- 239000007789 gas Substances 0.000 claims abstract description 29
- 230000008719 thickening Effects 0.000 claims abstract description 20
- 239000000203 mixture Substances 0.000 claims abstract description 19
- 239000001301 oxygen Substances 0.000 claims abstract description 17
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 17
- 238000002485 combustion reaction Methods 0.000 claims abstract description 11
- 239000011541 reaction mixture Substances 0.000 claims abstract description 4
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 31
- 229960001866 silicon dioxide Drugs 0.000 claims description 22
- 235000012239 silicon dioxide Nutrition 0.000 claims description 22
- 239000000377 silicon dioxide Substances 0.000 claims description 22
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 16
- 239000001257 hydrogen Substances 0.000 claims description 14
- 229910052739 hydrogen Inorganic materials 0.000 claims description 14
- 238000002360 preparation method Methods 0.000 claims description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 10
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims description 7
- 239000006185 dispersion Substances 0.000 claims description 7
- 239000005049 silicon tetrachloride Substances 0.000 claims description 7
- 239000000945 filler Substances 0.000 claims description 3
- 150000003377 silicon compounds Chemical class 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 238000001816 cooling Methods 0.000 claims description 2
- 229920001971 elastomer Polymers 0.000 claims description 2
- 239000003973 paint Substances 0.000 claims description 2
- 239000004033 plastic Substances 0.000 claims description 2
- 229920003023 plastic Polymers 0.000 claims description 2
- 229920002379 silicone rubber Polymers 0.000 claims description 2
- 150000001282 organosilanes Chemical class 0.000 claims 1
- 238000002156 mixing Methods 0.000 abstract description 2
- 239000000567 combustion gas Substances 0.000 abstract 1
- 239000002243 precursor Substances 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 19
- 239000004215 Carbon black (E152) Substances 0.000 description 8
- 239000003570 air Substances 0.000 description 8
- 229930195733 hydrocarbon Natural products 0.000 description 7
- 150000002430 hydrocarbons Chemical class 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 5
- -1 silicon halide Chemical class 0.000 description 5
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 230000013011 mating Effects 0.000 description 3
- 150000001367 organochlorosilanes Chemical class 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229920006337 unsaturated polyester resin Polymers 0.000 description 3
- AFABGHUZZDYHJO-UHFFFAOYSA-N 2-Methylpentane Chemical compound CCCC(C)C AFABGHUZZDYHJO-UHFFFAOYSA-N 0.000 description 2
- PFEOZHBOMNWTJB-UHFFFAOYSA-N 3-methylpentane Chemical compound CCC(C)CC PFEOZHBOMNWTJB-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910003902 SiCl 4 Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- RYPKRALMXUUNKS-HYXAFXHYSA-N (z)-hex-2-ene Chemical compound CCC\C=C/C RYPKRALMXUUNKS-HYXAFXHYSA-N 0.000 description 1
- RYPKRALMXUUNKS-UHFFFAOYSA-N 2-Hexene Natural products CCCC=CC RYPKRALMXUUNKS-UHFFFAOYSA-N 0.000 description 1
- RYPKRALMXUUNKS-HWKANZROSA-N 2E-hexene Chemical compound CCC\C=C\C RYPKRALMXUUNKS-HWKANZROSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 235000009508 confectionery Nutrition 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- 150000002896 organic halogen compounds Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
- B01J21/08—Silica
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0238—Impregnation, coating or precipitation via the gaseous phase-sublimation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/66—Additives characterised by particle size
- C09D7/69—Particle size larger than 1000 nm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/60—Catalysts, in general, characterised by their form or physical properties characterised by their surface properties or porosity
- B01J35/61—Surface area
- B01J35/613—10-100 m2/g
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/60—Catalysts, in general, characterised by their form or physical properties characterised by their surface properties or porosity
- B01J35/61—Surface area
- B01J35/615—100-500 m2/g
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/60—Catalysts, in general, characterised by their form or physical properties characterised by their surface properties or porosity
- B01J35/61—Surface area
- B01J35/617—500-1000 m2/g
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/22—Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Nanotechnology (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Chemical & Material Sciences (AREA)
- Silicon Compounds (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Glass Compositions (AREA)
Abstract
Description
实施例 | 加入的水 | SiCl4 | 氢气 | 空气 | γ | λ | β | BET | 增稠 | 粒度值 |
g/h | kg/h | m3/h | m3/h | m2/g | mPas | μm | ||||
A1* | 0 | 4.00 | 2.10 | 7.00 | 1.99 | 1.79 | 1.98 | 218 | 2640 | 46.4 |
A2 | 90 | 4.00 | 2.10 | 6.85 | 1.99 | 1.73 | 2.19 | 255 | 4075 | 25.0 |
A3 | 150 | 4.00 | 2.10 | 6.75 | 1.99 | 1.69 | 2.33 | 281 | 4240 | 26.2 |
A4 | 223 | 4.00 | 2.10 | 6.65 | 1.99 | 1.65 | 2.51 | 317 | 4435 | 30.0 |
A5 | 380 | 4.00 | 2.10 | 6.30 | 1.99 | 1.51 | 2.88 | 385 | 4430 | 35.0 |
A6 | 500 | 4.00 | 2.10 | 6.15 | 1.99 | 1.45 | 3.16 | 386 | 4260 | 38.9 |
A7* | 800 | 4.00 | 2.10 | 5.70 | 1.99 | 1.28 | 3.87 | 418 | 2550 | 48.5 |
A8* | 955 | 4.00 | 2.10 | 5.30 | 1.99 | 1.11 | 4.23 | 411 | 2430 | 56.7 |
B1* | 600 | 5.18 | 1.95 | 5.40 | 1.43 | 1.16 | 1.95 | 308 | 2780 | 44.2 |
B2* | 700 | 5.18 | 1.95 | 5.40 | 1.43 | 1.16 | 2.13 | 322 | 2823 | 41.3 |
B3 | 800 | 5.18 | 1.95 | 5.40 | 1.43 | 1.16 | 2.31 | 336 | 3289 | 26.0 |
B4 | 900 | 5.18 | 1.95 | 5.40 | 1.43 | 1.16 | 2.49 | 351 | 3370 | 25.0 |
B5 | 1000 | 5.18 | 1.95 | 5.40 | 1.43 | 1.16 | 2.68 | 364 | 3355 | 32.0 |
B6 | 1100 | 5.18 | 1.95 | 5.40 | 1.43 | 1.16 | 2.86 | 376 | 3300 | 38.0 |
B7* | 1200 | 5.18 | 1.95 | 5.40 | 1.43 | 1.16 | 3.54 | 378 | 2760 | 46.7 |
C1 | 250 | 4.00a) | 1.95 | 6.70 | 1.97 | 1.26 | 2.48 | 310 | 3300 | 32.0 |
C2 | 800 | 5.18b) | 0.55 | 12.50 | 1.96 | 1.05 | 2.70 | 282 | 3050 | 37.0 |
Claims (6)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10326049A DE10326049A1 (de) | 2003-06-10 | 2003-06-10 | Flammenhydrolytisch hergestelltes Siliciumdioxid, Verfahren zu seiner Herstellung und Verwendung |
DE10326049.8 | 2003-06-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1572725A CN1572725A (zh) | 2005-02-02 |
CN1301903C true CN1301903C (zh) | 2007-02-28 |
Family
ID=33185729
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2004100492750A Expired - Lifetime CN1301903C (zh) | 2003-06-10 | 2004-06-09 | 火焰水解法制备的二氧化硅、其制备方法及用途 |
Country Status (8)
Country | Link |
---|---|
US (1) | US20040253164A1 (zh) |
EP (1) | EP1486461B1 (zh) |
JP (1) | JP4248450B2 (zh) |
KR (1) | KR100644313B1 (zh) |
CN (1) | CN1301903C (zh) |
AT (1) | ATE369315T1 (zh) |
DE (2) | DE10326049A1 (zh) |
ES (1) | ES2290585T3 (zh) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10239144A1 (de) * | 2002-08-27 | 2004-03-18 | Degussa Ag | Dispersion |
DE10258858A1 (de) | 2002-12-17 | 2004-08-05 | Degussa Ag | Pyrogen hergestelltes Siliciumdioxid |
DE10258857A1 (de) | 2002-12-17 | 2004-07-08 | Degussa Ag | Pyrogen hergestelltes Siliciumdioxid und Dispersion hiervon |
DE10312970A1 (de) * | 2003-03-24 | 2004-10-14 | Degussa Ag | Pyrogenes Siliciumdioxidpulver und Dispersion hiervon |
DE102005001408A1 (de) * | 2005-01-12 | 2006-07-20 | Degussa Ag | Pyrogen hergestelltes Siliciumdioxidpulver |
DE102005001409A1 (de) * | 2005-01-12 | 2006-07-20 | Degussa Ag | Pyrogen hergestelltes Siliciumdioxidpulver und dieses Pulver enthaltene Silikondichtmasse |
DE102005001414A1 (de) * | 2005-01-12 | 2006-07-20 | Degussa Ag | Pyrogen hergestelltes Siliciumdioxidpulver |
DE102005001410A1 (de) | 2005-01-12 | 2006-07-20 | Degussa Ag | Pyrogen hergestelltes Siliciumdioxidpulver und Dispersion hiervon |
WO2006084390A1 (en) * | 2005-02-11 | 2006-08-17 | Eth Zurich | Antimicrobial and antifungal powders made by flame spray pyrolysis |
CN100369803C (zh) * | 2005-05-31 | 2008-02-20 | 昆明理工大学 | 一种制备气相法纳米氧化物的方法和装置 |
ATE509891T1 (de) * | 2005-12-20 | 2011-06-15 | Evonik Degussa Gmbh | Pyrogen hergestelltes siliciumdioxid |
DE102007025685A1 (de) * | 2007-06-01 | 2008-12-04 | Evonik Degussa Gmbh | RTV-Zweikomponenten-Silikonkautschuk |
EP2070992A1 (de) * | 2007-12-11 | 2009-06-17 | Evonik Degussa GmbH | Lacksysteme |
DE102008000499A1 (de) * | 2008-03-04 | 2009-09-10 | Evonik Degussa Gmbh | Kieselsäure sowie Epoxidharze |
DE102011004744A1 (de) * | 2011-02-25 | 2012-08-30 | Wacker Chemie Ag | Vorrichtung und Verfahren zur Bestimmung einer Gaskonzentration in einem strömenden Gasgemisch |
CN102115081B (zh) * | 2011-03-10 | 2013-09-25 | 上海竟茨环保科技有限公司 | 用于生产气相法二氧化硅的燃烧炉 |
CN102115082B (zh) * | 2011-03-10 | 2013-05-01 | 上海竟茨环保科技有限公司 | 气相法二氧化硅生产装置 |
WO2015003873A1 (de) * | 2013-07-11 | 2015-01-15 | Evonik Industries Ag | Verfahren zur herstellung von kieselsäure mit variabler verdickung |
EP3390290B1 (de) | 2015-12-18 | 2023-03-15 | Heraeus Quarzglas GmbH & Co. KG | Herstellung eines opaken quarzglaskörpers |
EP3390293B1 (de) | 2015-12-18 | 2023-04-19 | Heraeus Quarzglas GmbH & Co. KG | Erhöhen des siliziumgehalts bei der herstellung von quarzglas |
EP3390303B1 (de) | 2015-12-18 | 2024-02-07 | Heraeus Quarzglas GmbH & Co. KG | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
JP7044454B2 (ja) | 2015-12-18 | 2022-03-30 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 石英ガラス調製時の中間体としての炭素ドープ二酸化ケイ素造粒体の調製 |
CN108698894A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在多腔式烘箱中制备石英玻璃体 |
EP3390305B1 (de) | 2015-12-18 | 2023-11-15 | Heraeus Quarzglas GmbH & Co. KG | Herstellung von quarzglaskörpern aus siliziumdioxidgranulat |
WO2017103125A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas |
EP3390302B1 (de) | 2015-12-18 | 2023-09-20 | Heraeus Quarzglas GmbH & Co. KG | Herstellung eines quarzglaskörpers in einem schmelztiegel aus refraktärmetall |
EP3390308B1 (de) | 2015-12-18 | 2024-08-28 | Heraeus Quarzglas GmbH & Co. KG | Glasfasern aus quarzglas mit geringem oh-, cl- und al-gehalt |
JP6881777B2 (ja) | 2015-12-18 | 2021-06-02 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 合成石英ガラス粒の調製 |
EP4455089A1 (en) | 2023-04-25 | 2024-10-30 | Evonik Operations GmbH | Process for producing at least one pyrogenic compound and burner suitable for use in said process |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0855368A1 (de) * | 1997-01-23 | 1998-07-29 | Degussa Aktiengesellschaft | Pyrogene Oxide und Verfahren zu ihrer Herstellung |
CN1221393A (zh) * | 1996-06-06 | 1999-06-30 | 罗狄亚化学公司 | 用于牙膏组合物的二氧化硅 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2904199A1 (de) * | 1979-02-05 | 1980-08-07 | Degussa | Verfahren zur gelenkten herstellung von kieselsaeure mittels flammenhydrolyse |
DE3016010C2 (de) * | 1980-04-25 | 1985-01-10 | Degussa Ag, 6000 Frankfurt | Verfahren zur pyrogenen Herstellung von Kieselsäure |
DE3028364C2 (de) * | 1980-07-26 | 1983-07-21 | Degussa Ag, 6000 Frankfurt | Verfahren und Vorrichtung zur pyrogenen Herstellung von Siliciumdioxid |
US6322765B1 (en) * | 1996-02-15 | 2001-11-27 | Wacker-Chemie Gmbh | Process for preparing silicon dioxide |
DE19650500A1 (de) * | 1996-12-05 | 1998-06-10 | Degussa | Dotierte, pyrogen hergestellte Oxide |
US6331055B1 (en) * | 1999-08-30 | 2001-12-18 | Hewlett-Packard Company | Inkjet printhead with top plate bubble management |
-
2003
- 2003-06-10 DE DE10326049A patent/DE10326049A1/de not_active Withdrawn
-
2004
- 2004-05-21 EP EP04012014A patent/EP1486461B1/de not_active Expired - Lifetime
- 2004-05-21 DE DE502004004552T patent/DE502004004552D1/de not_active Expired - Lifetime
- 2004-05-21 AT AT04012014T patent/ATE369315T1/de active
- 2004-05-21 ES ES04012014T patent/ES2290585T3/es not_active Expired - Lifetime
- 2004-06-08 JP JP2004170191A patent/JP4248450B2/ja not_active Expired - Lifetime
- 2004-06-09 US US10/863,348 patent/US20040253164A1/en not_active Abandoned
- 2004-06-09 CN CNB2004100492750A patent/CN1301903C/zh not_active Expired - Lifetime
- 2004-06-09 KR KR1020040042066A patent/KR100644313B1/ko active IP Right Grant
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1221393A (zh) * | 1996-06-06 | 1999-06-30 | 罗狄亚化学公司 | 用于牙膏组合物的二氧化硅 |
EP0855368A1 (de) * | 1997-01-23 | 1998-07-29 | Degussa Aktiengesellschaft | Pyrogene Oxide und Verfahren zu ihrer Herstellung |
Also Published As
Publication number | Publication date |
---|---|
ES2290585T3 (es) | 2008-02-16 |
KR100644313B1 (ko) | 2006-11-10 |
CN1572725A (zh) | 2005-02-02 |
JP2005001990A (ja) | 2005-01-06 |
EP1486461B1 (de) | 2007-08-08 |
ATE369315T1 (de) | 2007-08-15 |
DE502004004552D1 (de) | 2007-09-20 |
JP4248450B2 (ja) | 2009-04-02 |
DE10326049A1 (de) | 2004-12-30 |
EP1486461A1 (de) | 2004-12-15 |
US20040253164A1 (en) | 2004-12-16 |
KR20040111003A (ko) | 2004-12-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN1301903C (zh) | 火焰水解法制备的二氧化硅、其制备方法及用途 | |
KR101148291B1 (ko) | 발열 제조된 이산화규소 분말 | |
JP4440158B2 (ja) | 熱分解法により製造される二酸化ケイ素粉末 | |
KR100649048B1 (ko) | 발열 제조된 이산화규소 분말 및 이 분말을 함유하는실리콘 실링 화합물 | |
US20110244387A1 (en) | Low-surface area fumed silicon dioxide powder | |
JPH107929A (ja) | カーボンブラック、その製造方法及び該カーボンブラックを含有するタイヤ用ゴムコンパウンド | |
US11242259B2 (en) | Method for producing silicic acid with variable thickening | |
JPS6335567B2 (zh) | ||
US5372795A (en) | Process for hydrophobicizing of pyrogenic silica | |
CN102245291A (zh) | 小型生产装置中生产热解硅酸 | |
JP2002173318A (ja) | 微細シリカの製造方法及びこれによって得られる微細シリカ | |
JP2023025185A (ja) | 高分散二酸化ケイ素を製造する方法 | |
JPH11241040A (ja) | 塗料結合剤系および顔料としてカーボンブラックを含有する塗料および印刷インキ | |
KR101544299B1 (ko) | 긴 기공 길이를 갖는 이산화규소 분말 | |
CN1238252C (zh) | 一种有机硅甲基单体生产过程中的副产物的综合利用法 | |
CN110139830B (zh) | 生产气相二氧化硅的方法 | |
TW202332656A (zh) | 複合氧化物粒子材料及其製造方法、填料、含填料漿料組成物,以及含填料樹脂組成物 | |
TH55727B (th) | ผงซิลิคอน ไดออกไซด์ที่ถูกผลิตขึ้นแบบไพโรจีนิคอล |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: EVONIK DEGUSSA CO., LTD. Free format text: FORMER NAME: DECOUCHY STOCK COMPANY |
|
CP03 | Change of name, title or address |
Address after: essen Patentee after: Evonik Degussa GmbH Address before: Dusseldorf, Federal Republic of Germany Patentee before: Degussa AG |
|
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: Essen, Germany Patentee after: Evonik Operations Ltd. Address before: Essen, Germany Patentee before: EVONIK DEGUSSA GmbH |
|
CX01 | Expiry of patent term | ||
CX01 | Expiry of patent term |
Granted publication date: 20070228 |