CN1222472C - 一种高分散纳米二氧化硅的制备方法 - Google Patents
一种高分散纳米二氧化硅的制备方法 Download PDFInfo
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- CN1222472C CN1222472C CN 02149782 CN02149782A CN1222472C CN 1222472 C CN1222472 C CN 1222472C CN 02149782 CN02149782 CN 02149782 CN 02149782 A CN02149782 A CN 02149782A CN 1222472 C CN1222472 C CN 1222472C
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- gas
- silicon dioxide
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 133
- 235000012239 silicon dioxide Nutrition 0.000 title claims abstract description 47
- 239000006185 dispersion Substances 0.000 title claims abstract description 11
- 239000005543 nano-size silicon particle Substances 0.000 title claims description 12
- 238000002360 preparation method Methods 0.000 title claims description 7
- 239000007789 gas Substances 0.000 claims abstract description 53
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 52
- 238000006243 chemical reaction Methods 0.000 claims abstract description 48
- 238000000034 method Methods 0.000 claims abstract description 41
- 238000000926 separation method Methods 0.000 claims abstract description 35
- 239000000047 product Substances 0.000 claims abstract description 25
- 230000001681 protective effect Effects 0.000 claims abstract description 15
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 12
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 11
- 150000002367 halogens Chemical class 0.000 claims abstract description 11
- 239000000428 dust Substances 0.000 claims abstract description 9
- 239000011261 inert gas Substances 0.000 claims abstract description 7
- 239000007787 solid Substances 0.000 claims abstract description 7
- 230000007062 hydrolysis Effects 0.000 claims abstract description 6
- 238000006460 hydrolysis reaction Methods 0.000 claims abstract description 6
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 5
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims abstract description 4
- 238000001354 calcination Methods 0.000 claims abstract description 4
- 238000006482 condensation reaction Methods 0.000 claims abstract description 4
- 238000002485 combustion reaction Methods 0.000 claims description 20
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 12
- 239000001257 hydrogen Substances 0.000 claims description 12
- 229910052739 hydrogen Inorganic materials 0.000 claims description 12
- 239000001301 oxygen Substances 0.000 claims description 12
- 229910052760 oxygen Inorganic materials 0.000 claims description 12
- 239000003570 air Substances 0.000 claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 10
- 229910000077 silane Inorganic materials 0.000 claims description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 claims description 7
- 238000004220 aggregation Methods 0.000 claims description 4
- 230000002776 aggregation Effects 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 239000002737 fuel gas Substances 0.000 claims description 3
- 238000009461 vacuum packaging Methods 0.000 claims description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 2
- 229910004721 HSiCl3 Inorganic materials 0.000 claims description 2
- 229910003910 SiCl4 Inorganic materials 0.000 claims description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052794 bromium Inorganic materials 0.000 claims description 2
- 229910052801 chlorine Inorganic materials 0.000 claims description 2
- 239000000460 chlorine Substances 0.000 claims description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 claims description 2
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052731 fluorine Inorganic materials 0.000 claims description 2
- 239000011737 fluorine Substances 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 239000011630 iodine Substances 0.000 claims description 2
- 229910052740 iodine Inorganic materials 0.000 claims description 2
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical group Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 claims description 2
- 125000001153 fluoro group Chemical group F* 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 12
- 230000008021 deposition Effects 0.000 abstract description 3
- 229910001882 dioxygen Inorganic materials 0.000 abstract description 2
- 238000009825 accumulation Methods 0.000 abstract 1
- 238000012805 post-processing Methods 0.000 abstract 1
- 239000002245 particle Substances 0.000 description 9
- 229910021485 fumed silica Inorganic materials 0.000 description 6
- 239000005055 methyl trichlorosilane Substances 0.000 description 5
- 238000004806 packaging method and process Methods 0.000 description 5
- 239000011164 primary particle Substances 0.000 description 5
- 239000002912 waste gas Substances 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 230000003014 reinforcing effect Effects 0.000 description 3
- 230000008719 thickening Effects 0.000 description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
- 239000004965 Silica aerogel Substances 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000004964 aerogel Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- -1 silicon halides Chemical class 0.000 description 2
- 239000005049 silicon tetrachloride Substances 0.000 description 2
- 230000009974 thixotropic effect Effects 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 229910000039 hydrogen halide Inorganic materials 0.000 description 1
- 239000012433 hydrogen halide Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000006223 plastic coating Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
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Abstract
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CN 02149782 CN1222472C (zh) | 2002-12-30 | 2002-12-30 | 一种高分散纳米二氧化硅的制备方法 |
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CN 02149782 CN1222472C (zh) | 2002-12-30 | 2002-12-30 | 一种高分散纳米二氧化硅的制备方法 |
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CN1422805A CN1422805A (zh) | 2003-06-11 |
CN1222472C true CN1222472C (zh) | 2005-10-12 |
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Cited By (1)
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EP3900822A4 (en) * | 2019-05-31 | 2022-03-02 | Guangzhou Huifu Research Institute Co., Ltd. | GAS NOZZLE, GAS REACTION DEVICE AND GAS HYDROLYSIS REACTION METHOD |
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CN100369811C (zh) * | 2006-04-29 | 2008-02-20 | 广州吉必时科技实业有限公司 | 一种多晶硅生产过程中的副产物的综合利用方法 |
CN101830469B (zh) * | 2009-12-30 | 2011-12-14 | 邓兵国 | 可调式高压脉冲静电硅微粉提纯机 |
CN102234117B (zh) * | 2010-05-05 | 2015-11-25 | 刘基扬 | 一种含可水解卤原子的物质的水解方法 |
CN102530962B (zh) * | 2010-12-10 | 2015-06-03 | 中国科学院过程工程研究所 | 一种燃烧法合成疏水性纳米二氧化硅颗粒的方法 |
CN102616794B (zh) * | 2012-04-11 | 2013-12-25 | 宣城晶瑞新材料有限公司 | 一种高分散性纳米二氧化硅的制备方法 |
CN103553059B (zh) * | 2013-07-23 | 2016-08-10 | 龚兴荣 | 氟硅酸处理方法及其系统 |
CN103420383B (zh) * | 2013-07-29 | 2015-12-23 | 中国化学赛鼎宁波工程有限公司 | 以磷肥副产物氟硅酸盐为原料制备气相法白炭黑和无水氢氟酸的方法 |
JP6480863B2 (ja) | 2013-08-01 | 2019-03-13 | 日揮触媒化成株式会社 | 解砕シリカ粒子の製造方法 |
CN103466636B (zh) * | 2013-08-27 | 2016-08-17 | 合盛硅业股份有限公司 | 一种利用甲基三氯硅烷生产气相法白炭黑的系统 |
CN104628005B (zh) * | 2013-11-07 | 2017-08-25 | 浙江开化合成材料有限公司 | 一种汽化器、生产白炭黑的设备和方法 |
CN105384177B (zh) * | 2015-11-27 | 2018-04-13 | 江苏联瑞新材料股份有限公司 | 亚微米级球形二氧化硅微粉的制备方法 |
CN105399103B (zh) * | 2015-12-24 | 2017-12-05 | 江西黑猫炭黑股份有限公司 | 一种气相二氧化硅消光粉及其制备方法 |
CN107973546A (zh) * | 2016-10-25 | 2018-05-01 | 中国石油化工股份有限公司 | 一种固井用油井水泥悬浮剂及其制备方法和固井用水泥浆 |
US11498841B2 (en) * | 2017-07-13 | 2022-11-15 | Wacker Chemie Ag | Method for producing highly dispersed silicon dioxide |
CN109231220B (zh) * | 2018-10-18 | 2020-10-02 | 江西星火狮达科技有限公司 | 一种气相二氧化硅的生产工艺 |
CN111484023B (zh) * | 2019-12-23 | 2022-10-11 | 浙江精功新材料技术有限公司 | 一种基于氢气燃烧法产高温水蒸气的卧式脱酸炉 |
CN113401912B (zh) * | 2021-07-06 | 2023-03-07 | 苏州大学 | 一种调控火焰法合成二氧化硅颗粒尺寸的装置和方法 |
CN115744919B (zh) * | 2022-10-19 | 2024-02-09 | 苏州大学 | 一种超高纯二氧化硅颗粒的制备方法 |
CN116081631B (zh) * | 2022-12-30 | 2024-05-31 | 浙江工程设计有限公司 | 一种气相白炭黑脱酸方法 |
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- 2002-12-30 CN CN 02149782 patent/CN1222472C/zh not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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EP3900822A4 (en) * | 2019-05-31 | 2022-03-02 | Guangzhou Huifu Research Institute Co., Ltd. | GAS NOZZLE, GAS REACTION DEVICE AND GAS HYDROLYSIS REACTION METHOD |
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Owner name: KAIHUA XINJIXIN MATERIALS CO., LTD. Free format text: FORMER OWNER: JIBISHI SCI. + TECH. INDUSTRIAL CO., LTD., GUANGZHOU Effective date: 20070112 |
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Assignee: ZHEJIANG KAIHUA SYNTHETIC MATERIAL CO.,LTD. Assignor: Kaihua Xinji New Material Co.,Ltd. Contract fulfillment period: 2008.9.23 to 2012.12.30 Contract record no.: 2008330000877 Denomination of invention: High-dispersion nano silicon dioxide preparation method Granted publication date: 20051012 License type: Exclusive license Record date: 20081008 |
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