CN1334569A - 介电陶瓷组合物 - Google Patents
介电陶瓷组合物 Download PDFInfo
- Publication number
- CN1334569A CN1334569A CN01124410A CN01124410A CN1334569A CN 1334569 A CN1334569 A CN 1334569A CN 01124410 A CN01124410 A CN 01124410A CN 01124410 A CN01124410 A CN 01124410A CN 1334569 A CN1334569 A CN 1334569A
- Authority
- CN
- China
- Prior art keywords
- ceramic
- weight
- dielectric ceramic
- dielectric
- tio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000919 ceramic Substances 0.000 title claims abstract description 301
- 239000000203 mixture Substances 0.000 title claims abstract description 84
- 239000011521 glass Substances 0.000 claims abstract description 60
- 238000005245 sintering Methods 0.000 claims abstract description 45
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 5
- 239000000463 material Substances 0.000 claims description 58
- 239000004615 ingredient Substances 0.000 claims description 50
- 239000003990 capacitor Substances 0.000 claims description 32
- 239000004020 conductor Substances 0.000 claims description 21
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 13
- 239000000470 constituent Substances 0.000 claims description 12
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 9
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- 229910004283 SiO 4 Inorganic materials 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 abstract description 9
- 239000002184 metal Substances 0.000 abstract description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052681 coesite Inorganic materials 0.000 abstract description 3
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 3
- 239000000377 silicon dioxide Substances 0.000 abstract description 3
- 229910052682 stishovite Inorganic materials 0.000 abstract description 3
- 229910052905 tridymite Inorganic materials 0.000 abstract description 3
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 26
- 239000010949 copper Substances 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 229910052709 silver Inorganic materials 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 6
- 238000010304 firing Methods 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 239000004332 silver Substances 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 238000000354 decomposition reaction Methods 0.000 description 5
- 239000010953 base metal Substances 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 229910010293 ceramic material Inorganic materials 0.000 description 3
- 239000003989 dielectric material Substances 0.000 description 3
- 238000009766 low-temperature sintering Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 229910052775 Thulium Inorganic materials 0.000 description 2
- BYFGZMCJNACEKR-UHFFFAOYSA-N aluminium(i) oxide Chemical compound [Al]O[Al] BYFGZMCJNACEKR-UHFFFAOYSA-N 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 239000005331 crown glasses (windows) Substances 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- VIKNJXKGJWUCNN-XGXHKTLJSA-N norethisterone Chemical compound O=C1CC[C@@H]2[C@H]3CC[C@](C)([C@](CC4)(O)C#C)[C@@H]4[C@@H]3CCC2=C1 VIKNJXKGJWUCNN-XGXHKTLJSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000010944 silver (metal) Substances 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- 229910052765 Lutetium Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910002785 ReO3 Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 239000003985 ceramic capacitor Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 238000009774 resonance method Methods 0.000 description 1
- YSZJKUDBYALHQE-UHFFFAOYSA-N rhenium trioxide Chemical compound O=[Re](=O)=O YSZJKUDBYALHQE-UHFFFAOYSA-N 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000001238 wet grinding Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/46—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates
- C04B35/462—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
- C03C3/066—Glass compositions containing silica with less than 40% silica by weight containing boron containing zinc
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/46—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates
- C04B35/462—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates
- C04B35/465—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on alkaline earth metal titanates
- C04B35/468—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on alkaline earth metal titanates based on barium titanates
- C04B35/4682—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on alkaline earth metal titanates based on barium titanates based on BaTiO3 perovskite phase
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
- H01B3/12—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances ceramics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/08—Inorganic dielectrics
- H01G4/12—Ceramic dielectrics
- H01G4/1209—Ceramic dielectrics characterised by the ceramic dielectric material
- H01G4/1218—Ceramic dielectrics characterised by the ceramic dielectric material based on titanium oxides or titanates
- H01G4/1227—Ceramic dielectrics characterised by the ceramic dielectric material based on titanium oxides or titanates based on alkaline earth titanates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0213—Electrical arrangements not otherwise provided for
- H05K1/0237—High frequency adaptations
- H05K1/024—Dielectric details, e.g. changing the dielectric material around a transmission line
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3205—Alkaline earth oxides or oxide forming salts thereof, e.g. beryllium oxide
- C04B2235/3215—Barium oxides or oxide-forming salts thereof
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3217—Aluminum oxide or oxide forming salts thereof, e.g. bauxite, alpha-alumina
- C04B2235/3222—Aluminates other than alumino-silicates, e.g. spinel (MgAl2O4)
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3224—Rare earth oxide or oxide forming salts thereof, e.g. scandium oxide
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
- C04B2235/3232—Titanium oxides or titanates, e.g. rutile or anatase
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
- C04B2235/3232—Titanium oxides or titanates, e.g. rutile or anatase
- C04B2235/3234—Titanates, not containing zirconia
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
- C04B2235/3232—Titanium oxides or titanates, e.g. rutile or anatase
- C04B2235/3234—Titanates, not containing zirconia
- C04B2235/3236—Alkaline earth titanates
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3281—Copper oxides, cuprates or oxide-forming salts thereof, e.g. CuO or Cu2O
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/34—Non-metal oxides, non-metal mixed oxides, or salts thereof that form the non-metal oxides upon heating, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3409—Boron oxide, borates, boric acids, or oxide forming salts thereof, e.g. borax
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/34—Non-metal oxides, non-metal mixed oxides, or salts thereof that form the non-metal oxides upon heating, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3427—Silicates other than clay, e.g. water glass
- C04B2235/3436—Alkaline earth metal silicates, e.g. barium silicate
- C04B2235/3445—Magnesium silicates, e.g. forsterite
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/36—Glass starting materials for making ceramics, e.g. silica glass
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/60—Aspects relating to the preparation, properties or mechanical treatment of green bodies or pre-forms
- C04B2235/602—Making the green bodies or pre-forms by moulding
- C04B2235/6025—Tape casting, e.g. with a doctor blade
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
- C04B2235/656—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes characterised by specific heating conditions during heat treatment
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/80—Phases present in the sintered or melt-cast ceramic products other than the main phase
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0556—Disposition
- H01L2224/05568—Disposition the whole external layer protruding from the surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05573—Single external layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/1517—Multilayer substrate
- H01L2924/15172—Fan-out arrangement of the internal vias
- H01L2924/15174—Fan-out arrangement of the internal vias in different layers of the multilayer substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/1615—Shape
- H01L2924/16152—Cap comprising a cavity for hosting the device, e.g. U-shaped cap
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/191—Disposition
- H01L2924/19101—Disposition of discrete passive components
- H01L2924/19105—Disposition of discrete passive components in a side-by-side arrangement on a common die mounting substrate
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Organic Chemistry (AREA)
- Structural Engineering (AREA)
- Power Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Ceramic Capacitors (AREA)
- Coils Or Transformers For Communication (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Inorganic Insulating Materials (AREA)
Abstract
一种介电陶瓷压块,它可在1000℃或更低温度下由介电陶瓷组合物和导电性优良的金属如银烧结而成,具有高相对介电常数、高Q值和低介电性能温度系数。所述组合物包括BaO-TiO2-ReO3/2基由式xBaO-yTiO2-zReO3/2表示的陶瓷组分和玻璃组分,8≤x≤18、52.5≤y≤65、20≤z≤40,x、y和z为摩尔百分数,x+y+z=100,Re为稀土元素,所述玻璃组分包括10-25重量%SiO2、10-40重量%B2O3、25-55重量%MgO、0-20重量%ZnO、0-15重量%Al2O3、0.5-10重量%Li2O和0-10重量%RO,R是至少一种选自Ba、Sr和Ca的元素。
Description
技术领域
本发明涉及一种介电陶瓷组合物,它适用于高频带(例如微波或毫波带)并且可用于形成微波谐振器、滤波器和叠层电容器。本发明还涉及介电陶瓷压块、由所述介电陶瓷压块形成的多层陶瓷基材、陶瓷电子元件和叠层陶瓷电子元件。
背景技术
以前,为了使电子元件(如微波谐振器和滤波器)小型化,提出了一种由高相对介电常数的介电陶瓷材料形成的结构取代空腔谐振器。当用ε表示介电材料的相对介电常数时,通过将电磁波在介电材料中的波长缩短至其在自由空间中的波长的(1/ε)1/2,尝试利用上述高相对介电常数的介电陶瓷材料对微波谐振器和滤波器进行小型化。
但是,可实际用作介电谐振器具有温度系数的介电陶瓷的相对介电常数ε最高为100或更小,结果难以满足进一步小型化的要求。
因此,为了在介电陶瓷的相对介电常数的限制下进一步进行小型化,提出了使用具有已知微波电路的LC谐振器的方法。也就是说,将实践中用于形成叠层电容器和多层基材的叠层法用于形成LC电路,可进一步使微波电子元件小型化,并可改进其可靠性。
但是,为了获得在微波带具有高Q值的LC谐振器,嵌入叠层电容器或者多层线路基材中的内电极必须具有高的导电性。换句话说,作为可与介电材料或多层线路基材一起同时烧制的内电极,必须使用高导电性金属,如金(Au)、银(Ag)或铜(Cu)。
因此,介电陶瓷压块必须具有高的相对介电常数、高的Q值和小的温度系数,除了这些要求以外,介电陶瓷压块还必须是这样一种材料,即它可与由低熔点金属组成的内电极一起烧结而成。但是,至今未找到能满足上述各项要求的材料。
例如,由于金属(如Ag、Au或Cu)的熔点约为960-1063℃,而常规的介电陶瓷组合物具有1350℃或更高的烧制温度,因此这种组合物难以与上述具有优良导电性的金属一起烧结。
发明内容
因此,本发明的一个目的是提供一种介电陶瓷组合物,它烧结后具有高的相对介电常数、高的Q值、小的温度系数,除了这些性能以外,它可在相对低的温度下进行烧结。
本发明另一个目的是提供一种介电陶瓷组合物烧结而成的介电陶瓷压块、由该介电陶瓷压块形成的具有优良高频性能的多层陶瓷基材、陶瓷电子元件和叠层陶瓷电子元件。
因此,本发明的一个方面涉及一种介电陶瓷组合物,它包括基于BaO-TiO2-ReO3/2的由式xBaO-yTiO2-zReO3/2表示的陶瓷组分和玻璃组分,在式xBaO-yTiO2-zReO3/2中,8≤x≤18、52.5≤y≤65、20≤z≤40,其中x、y和z用摩尔百分数表示,x+y+z=100,Re代表稀土元素,并且所述玻璃组分包括10-25重量%SiO2、10-40重量%B2O3、25-55重量%MgO、0-20重量%ZnO、0-15重量%Al2O3、0.5-10重量%Li2O和0-10重量%RO,其中R是至少一种选自Ba、Sr和Ca的元素。
在上述介电陶瓷组合物中,所述玻璃组分较好是无铅玻璃。另外,BaO-TiO2-ReO3/2基介电陶瓷较好是无铋介电陶瓷。
除了由BaO-TiO2-ReO3/2基介电陶瓷和玻璃组分组成的主要组分以外,上述介电陶瓷压块还可包括CuO次要组分。
除了由BaO-TiO2-ReO3/2基介电陶瓷和玻璃组分组成的主要组分以外,上述介电陶瓷组合物还可包括TiO2次要组分。
在上述介电陶瓷组合物中,玻璃组分的含量较好为15-35重量%,而BaO-TiO2-ReO3/2基陶瓷组分的含量为65-85重量%。
本发明另一方面涉及一种介电陶瓷组合物,它包括基于BaO-TiO2-ReO3/2的由式xBaO-yTiO2-zReO3/2表示的陶瓷组分、玻璃组分、CuO和TiO2,在式xBaO-yTiO2-zReO3/2中,8≤x≤18、52.5≤y≤65、20≤z≤40,其中x、y和z用摩尔百分数表示,x+y+z=100,Re代表稀土元素,并且所述玻璃组分包括10-25重量%SiO2、10-40重量%B2O3、25-55重量%MgO、0-20重量%ZnO、0-15重量%Al2O3、0.5-10重量%Li2O和0-10重量%RO,其中R是至少一种选自Ba、Sr和Ca的元素,并且基于BaO-TiO2-ReO3/2的陶瓷组分、玻璃组分、TiO2和CuO的含量分别为65-85重量%、15-35重量%、0.1-10重量%和3重量%或更少。
在上述介电陶瓷组合物中,所述玻璃组分较好是无铅玻璃。另外,BaO-TiO2-ReO3/2基介电陶瓷较好是无铋介电陶瓷。
具体实施方法
下面将详细描述本发明。
在本发明中由于使用基于BaO-TiO2-ReO3/2的由式xBaO-yTiO2-zReO3/2表示的陶瓷组分和上述特殊的玻璃组分作为主要组分,因此如下面实施例将证明的那样,可在不超过1100℃,较好为1000℃或更低的低温下进行烧结,从而能与具有优良导电性能的金属(如金、银或铜)一起进行烧结。
另外,可通过烧结该介电陶瓷组合物制得介电陶瓷压块,它具有低的温度系数并在高的频带(具体地说,在微波带和毫波带)具有高的相对介电常数。
此外,当由玻璃组合物组成的玻璃组分结晶时,或者当基于BaO-TiO2-ReO3/2的陶瓷组分和玻璃组分通过相互反应形成晶相时,会析出具有高Q值的晶相,如Mg2B2O5、Mg3B2O6、BaTi4O9、Ba2Ti9O20、Mg2TiO4、Mg2SiO4、Zn2TiO4、Zn2Ti3O8或ZnAl2O4,从而可获得具有高Q值的介电陶瓷压块。
用于基于BaO-TiO2-ReO3/2的陶瓷组分的稀土金属元素Re无特别的限制,例如可任选地单独使用Sc、Y、La、Ce、Pr、Nd、Pm、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb和Lu或者组合使用之。
下面将描述将由式xBaO-yTiO2-zReO3/2表示的组分用于本发明介电陶瓷压块的原因。
图1是基于BaO-TiO2-ReO3/2的陶瓷组分的三元组成图。在该三元组成图中,实线P围成的区域相当于xBaO-yTiO2-zReO3/2表示的组成。
对于图1中A区的组成,也就是说对于x为18或更大的区域中的组成,难以通过烧结形成基于BaO-TiO2-ReO3/2的陶瓷组分,即使在1400℃的烧结温度下也仅可得到多孔陶瓷。在y超过65并且z小于20的B区中,其温度性能差。也就是说,当形成其中包括电容器的多层线路基材时,其具有过大负值的电容量温度系数(TCC)。在x小于8的C区中,制得的陶瓷压块的相对介电常数下降过多,其烧结性能也不稳定。另外,在z超过40并且y小于52.5的D区,电容量的温度系数的正值过大,相对介电常数也减小。
在本发明中,特定的基于BaO-TiO2-ReO3/2的陶瓷组分和特定的玻璃组分构成如上所述的主要组分。
所述玻璃组分包括10-25重量%SiO2、10-40重量%B2O3、25-55重量%MgO、0-20重量%ZnO、0-15重量%Al2O3、0.5-10重量%Li2O和0-10重量%RO,其中R是至少一种选自Ba、Sr和Ca的元素。此时,ZnO和Al2O3是添加的组分,它可包含在玻璃组分中或者不包含在玻璃组分中。
上述B2O3用于降低玻璃粘度,有助于烧结陶瓷组分和玻璃组分。另外,B2O3构成具有高Q值的晶体如Mg2B2O5或Mg3B2O6。但是,当B2O3的含量超过40重量%时,抗湿性下降,当其含量低于10重量%时,难以在低于1100℃进行烧结。
上述SiO2形成具有高Q值的晶体,如Mg2SiO4。但是,当SiO2的含量超过25重量%时,由于玻璃的软化温度显著增加,因此陶瓷组分和玻璃组分的烧结性能下降,当其含量小于10重量%时,则抗湿性下降。
MgO有助于基于BaO-TiO2-ReO3/2的陶瓷组分和玻璃组分之间的反应,并用于降低玻璃组分的软化温度。另外,MgO构成高Q值的晶体,如Mg2B2O5、Mg3B2O6、Mg2TiO4或Mg2SiO4。当MgO的含量小于25重量%时,烧结性能下降,因此难以在低于1100℃进行烧结。另外,当MgO的含量超过55重量%时,抗湿性有一定程度下降,另外,它难以进行玻璃化。
Li2O用于降低玻璃的软化温度。当Li2O的含量超过10重量%时,抗湿性显著下降,当其含量小于0.5重量%时,软化温度明显上升,从而难以进行烧结。
ZnO用于增加Q值;但是当其含量超过20重量%时,烧结性能下降。另外,Al2O3用于改进抗湿性;但是当其含量超过10重量%时,烧结性能下降。ZnO形成具有高Q值的晶体,如Zn2TiO4、Zn2Ti3O8或ZnAl2O4。
BaO、CaO和SrO用于改进烧结性能;但是当其含量超过10重量%时,Q值下降。具体地说,BaO形成具有高Q值的晶体,如BaTi4O9或Ba2Ti9O20。
除了上述主要组分以外,本发明介电陶瓷组合物最好还包括CuO作为次要组分。CuO次要组分作为烧结助剂。但是,当CuO的含量超过3重量%时,Q值下降,因此在某些情况下电容的温度系数的正值过大。
另外,除了上述主要组分以外,本发明介电陶瓷组合物还可包括TiO2次要组分,该TiO2次要组分有助于玻璃的结晶。但是,当TiO2含量超过介电陶瓷压块的10重量%时,在某些情况下烧结性能会下降。
另外,在本发明介电陶瓷压块中,当玻璃组分的含量小于介电陶瓷压块总量的15重量%时,在某些情况下难以进行烧结,当其含量超过35重量%时,在某些情况下抗湿性下降,或者相对介电常数下降。因此,对于65-85重量%的基于BaO-TiO2-ReO3/2的陶瓷组分,玻璃组分的含量较好为15-35重量%。
另外,如上所述,本发明介电陶瓷组合物较好含有65-85重量%的基于BaO-TiO2-ReO3/2的陶瓷组分,15-35重量%的玻璃组分、0.1-10重量%TiO2和3重量%或更少的CuO。
本发明另一方面提供一种多层陶瓷基材,它包括本发明介电陶瓷压块的第一介电陶瓷层以及在该第一介电陶瓷层上的电极。在该多层陶瓷基材中,由于第一介电陶瓷层包括本发明介电陶瓷压块,并且在介电陶瓷层上形成有电极,因此可在低温(如1100℃或更低)下烧制该多层陶瓷基材,结果可得到具有高介电常数、高Q值和低介电性能温度系数的多层陶瓷基材。
上述多层陶瓷基材在所述第一介电陶瓷层的至少一个表面上还可包括第二介电陶瓷层,其中所述第二介电陶瓷层的介电常数低于第一介电陶瓷层的介电常数。
可将上述多层陶瓷基材的电极相互对置,它们之间隔有至少部分第一介电陶瓷层,形成电容器。
在上述多层陶瓷基材中,所述电极可包括多个内电极以形成电容器,并可包括相互电接触的多个线圈导体以形成电感器。
本发明另一方面提供一种陶瓷电子元件,它包括上述多层陶瓷基材和至少一个安装在上述多层陶瓷基材上并与电极一起构成电路的电子器件。
较好的是,上述陶瓷电子元件还包括固定在多层陶瓷基材上的一个罩子使之围罩所述电子器件。更好的是,所述陶瓷电子元件包括一个导电罩作为所述罩子。
另外,上述陶瓷电子元件还包括多个仅形成于上述多层陶瓷基材底表面上的外电极和多个与上述外电极电接触并且与上述电极或电子器件电接触的通孔导体。
此外,本发明再一方面提供一种叠层陶瓷电子元件,它包括含本发明介电陶瓷压块的烧结陶瓷体、置于所述烧结陶瓷体中的多个电极、以及在该烧结陶瓷体外表面上各自与所述多个电极中的一个电接触的多个外电极。
在上述叠层陶瓷电子元件中,所述多个电极包括相互叠合的内电极,它们之间隔有至少部分烧结陶瓷体,从而形成叠层电容器单元。
此外,在上述叠层陶瓷电子元件中,除了形成叠层电容器单元的内电极以外,所述多个电极还可包括相互电接触的线圈导体,从而形成叠层电感器单元。
附图简述
图1是用于形成本发明介电陶瓷压块的BaO-TiO2-ReO3/2基陶瓷组分的三元组成图;
图2是作为陶瓷电子元件使用本发明第一个实例的多层陶瓷基材的多层陶瓷组件剖面图;
图3是图2多层陶瓷组件的分解透视图;
图4是说明陶瓷坯料片和形成于其上的电极图形的分解透视图,它用于形成本发明第二个实例的叠层陶瓷电子元件;
图5是本发明第二个实例的叠层陶瓷电子元件的分解透视图;
图6是图5叠层陶瓷元件的线路图。
较好实例的详细描述
下面先描述本发明介电陶瓷压块的具体实施例,接着描述有关多层陶瓷基材的结构、陶瓷电子元件和叠层陶瓷电子元件的实例,从而更全面地了解本发明。
制备陶瓷组分
首先称重BaCO3、TiO2、Nd2O3、Pr2O3和Sm2O3,并将其混合在一起,使得BaO、TiO2和ReO3/2的摩尔比达到下表1的主要组分栏所示的摩尔比,将如此形成的混合原料在1150℃煅烧1小时。接着,粉碎煅烧产物,形成表1所示的陶瓷组分S1-S10。使用陶瓷组分S1-S10形成下面所示的介电陶瓷组合物。
表1
陶瓷组分序号 | 主要组分(摩尔%) | ||
BaO | TiO2 | ReO3/2 | |
S1 | 13 | 58 | Nd:10,Sm:19 |
S2 | 25 | 55 | Nd:20 |
S3 | 5 | 75 | Nd:20 |
S4 | 2 | 65 | Nd:33 |
S5 | 10 | 50 | Nd:40 |
S6 | 18 | 62 | Nd:20 |
S7 | 8 | 65 | Nd:27 |
S8 | 8 | 52.5 | Nd:39.5 |
S9 | 13 | 58 | Sm:29 |
S10 | 13 | 58 | Pr:6,Sm:23 |
制备玻璃组分
称重B2O3、SiO2、ZnO、MgO、Li2O、Al2O3、BaO、CaO和SrO并将其充分混合,形成下表2所示的组成比,将该混合物在1100-1400℃熔融,接着注入水中骤冷之,并湿粉碎,形成玻璃组分G1-G24。
表2
玻璃序号 | MgO(重量%) | ZnO(重量%) | Al2O3(重量%) | B2O3(重量%) | SiO2(重量%) | Li2O(重量%) | BaO(重量%) | SrO(重量%) | CaO(重量%) |
G1 | 40 | 7 | 1.5 | 28.5 | 15.5 | 7.5 | |||
G2 | 15 | 25 | 1.5 | 40.0 | 20.0 | 7.5 | |||
G3 | 25 | 20 | 1.5 | 35.0 | 18.0 | 0.5 | |||
G4 | 57 | 5 | 1.5 | 10.0 | 18.0 | 8.5 | |||
G5 | 65 | 5 | 1.5 | 8.0 | 17.0 | 3.5 | |||
G6 | 42 | 0 | 1.5 | 30.5 | 18.5 | 7.5 | |||
G7 | 40 | 8.5 | 0 | 28.5 | 15.5 | 7.5 | |||
G8 | 38 | 7 | 15 | 22 | 10.5 | 7.5 | |||
G9 | 37 | 7 | 20 | 18 | 13.5 | 5.5 | |||
G10 | 28 | 7 | 1.5 | 50 | 5 | 8.5 | |||
G11 | 42 | 7 | 1.5 | 30 | 10 | 9.5 | |||
G12 | 30 | 7 | 1.5 | 20 | 35 | 6.5 | |||
G13 | 42 | 9 | 1.5 | 30.5 | 17 | 0 | |||
G14 | 43 | 5 | 1.5 | 26.5 | 14 | 10 | |||
G15 | 37 | 5 | 1.5 | 24.5 | 13 | 20 | |||
G16 | 39 | 7 | 1.5 | 28.5 | 15.5 | 7.5 | 1 | ||
G17 | 30 | 7 | 1.5 | 28.5 | 15.5 | 7.5 | 10 | ||
G18 | 25 | 7 | 1.5 | 28.5 | 15.5 | 7.5 | 15 | ||
G19 | 39 | 7 | 1.5 | 28.5 | 15.5 | 7.5 | 1 | ||
G20 | 30 | 7 | 1.5 | 28.5 | 15.5 | 7.5 | 10 | ||
G21 | 25 | 7 | 1.5 | 28.5 | 15.5 | 7.5 | 15 | ||
G22 | 39 | 7 | 1.5 | 28.5 | 15.5 | 7.5 | 1 | ||
G23 | 30 | 7 | 1.5 | 28.5 | 15.5 | 7.5 | 10 | ||
G24 | 25 | 7 | 1.5 | 28.5 | 15.5 | 7.5 | 15 |
制备介电陶瓷压块
将如此形成的陶瓷组分S1-S10和玻璃组分G1-G24混合成组成比如表3或表4所示的混合物,形成介电陶瓷组合物,根据表3或表4所示的比例向混合物中加入粉末CuO和粉末TiO2作为次要组分,接着充分混合。随后向如此形成的各个混合物中加入粘合剂、增塑剂和溶剂,接着捏合得到糊浆。
用刮刀法将如此形成的各糊浆制成50微米厚的陶瓷坯料片。将该陶瓷坯料片切成长30mm、宽10mm的矩形。将多块如此形成的矩形陶瓷坯料片相互叠合,加压粘合在一起形成0.5mm厚的叠合物。随后,将该叠合物在800-1100℃烧制1小时,得到平板状介电陶瓷压块试样1-43。
对于上面得到的介电陶瓷压块,测量其相对介电常数(ε)、Q值、电容的温度系数(TCC,ppm/℃)。在所述测量中,相对介电常数(ε)和Q值是用短路介电谐振法在谐振频率(1MHz)测得的。结果列于表3和表4。
表3
试样 | 陶瓷组分 | 玻璃组分 | CuO含量(重量%) | TiO2含量(重量%) | 烧结温度(℃) | 相对介电常数(ε) | Qf/GHz | 电容温度系数(TCC)(ppm/℃) | 注 | ||
No. | 含量(重量%) | No. | 含量(重量%) | ||||||||
1 | S1 | 73 | G1 | 22 | 1 | 4 | 900 | 31 | 12000 | +8 | |
2 | S2 | 73 | G1 | 22 | 1 | 4 | 900 | 37 | 3000 | -100 | 大负值的TCC |
3 | S3 | 73 | G1 | 22 | 1 | 4 | 900 | 21 | 4000 | -160 | 低ε |
4 | S4 | 73 | G1 | 22 | 1 | 4 | 900 | 16 | 3000 | +20 | 低ε |
5 | S5 | 73 | G1 | 22 | 1 | 4 | 900 | 14 | 4000 | +90 | 低ε |
6 | S6 | 73 | G1 | 22 | 1 | 4 | 900 | 33 | 8500 | -60 | |
7 | S7 | 73 | G1 | 22 | 1 | 4 | 900 | 33 | 6000 | -60 | |
8 | S8 | 73 | G1 | 22 | 1 | 4 | 900 | 25 | 5500 | +10 | |
9 | S9 | 73 | G1 | 22 | 1 | 4 | 900 | 30 | 12000 | +18 | |
10 | S10 | 73 | G1 | 22 | 1 | 4 | 900 | 31 | 11000 | +4 | |
11 | S1 | 73 | G2 | 22 | 1 | 4 | 850 | 30 | 2500 | +12 | 抗湿性差 |
12 | S1 | 73 | G3 | 22 | 1 | 4 | 900 | 29 | 5000 | +20 | |
13 | S1 | 73 | G4 | 22 | 1 | 4 | 900 | 31 | 6500 | +15 | |
14 | S1 | 73 | G5 | 22 | 1 | 4 | - | - | - | - | 未玻璃化 |
15 | S1 | 73 | G6 | 22 | 1 | 4 | 900 | 30 | 9000 | +10 | |
16 | S1 | 73 | G7 | 22 | 1 | 4 | 900 | 31 | 9500 | +5 | |
17 | S1 | 73 | G8 | 22 | 1 | 4 | 900 | 28 | 7500 | +20 | |
18 | S1 | 73 | G9 | 22 | 1 | 4 | 1050 | 28 | 5500 | +20 | 烧结温度稍高 |
19 | S1 | 73 | G10 | 22 | 1 | 4 | 850 | 32 | 2000 | +25 | 低Q |
20 | S1 | 73 | G11 | 22 | 1 | 4 | 900 | 30 | 6000 | +15 | |
21 | S1 | 73 | G12 | 22 | 1 | 4 | 1100 | 28 | 4000 | +20 | 烧结温度高 |
22 | S1 | 73 | G13 | 22 | 1 | 4 | 1050 | 29 | 6000 | +25 | 烧结温度稍高 |
表4
试样 | 陶瓷组分 | 玻璃组分 | CuO含量(重量%) | TiO2含量(重量%) | 烧结温度(℃) | 相对介电常数(ε) | Qf/GHz | 电容温度系数(TCC)(ppm/℃) | 注 | ||
No. | 含量(重量%) | No. | 含量(重量%) | ||||||||
23 | S1 | 73 | G14 | 22 | 1 | 4 | 850 | 30 | 5000 | +30 | |
24 | S1 | 73 | G15 | 22 | 1 | 4 | 800 | 29 | 3000 | +25 | 抗湿性差 |
25 | S1 | 55 | G1 | 40 | 1 | 4 | 850 | 18 | 4000 | +70 | ε稍低 |
26 | S1 | 65 | G1 | 30 | 1 | 4 | 880 | 24 | 6000 | +40 | |
27 | S1 | 85 | G1 | 15 | 0 | 0 | 1000 | 38 | 5500 | -10 | |
28 | S1 | 90 | G1 | 8 | 1 | 1 | 1100 | 43 | 6000 | -20 | 高烧结温度 |
29 | S1 | 60 | G1 | 35 | 1 | 4 | 850 | 21 | 4500 | -30 | |
30 | S1 | 71 | G1 | 22 | 3 | 4 | 850 | 33 | 5000 | +40 | |
31 | S1 | 70 | G1 | 22 | 5 | 3 | 800 | 35 | 2000 | +50 | 低Q值 |
32 | S1 | 76.9 | G1 | 22 | 1 | 0.1 | 900 | 32 | 9000 | 0 | |
33 | S1 | 67 | G1 | 22 | 1 | 10 | 1000 | 35 | 11000 | -10 | |
34 | S1 | 62 | G1 | 22 | 1 | 15 | 1100 | 37 | 9000 | -30 | 高烧结温度 |
35 | S1 | 73 | G16 | 22 | 1 | 4 | 900 | 32 | 6000 | +10 | |
36 | S1 | 73 | G17 | 22 | 1 | 4 | 900 | 33 | 3000 | +14 | |
37 | S1 | 73 | G18 | 22 | 1 | 4 | 900 | 34 | 1500 | +18 | Q值低 |
38 | S1 | 73 | G19 | 22 | 1 | 4 | 900 | 32 | 8000 | +10 | |
39 | S1 | 73 | G20 | 22 | 1 | 4 | 900 | 33 | 3500 | +12 | |
40 | S1 | 73 | G21 | 22 | 1 | 4 | 900 | 34 | 1800 | +15 | Q值低 |
41 | S1 | 73 | G22 | 22 | 1 | 4 | 900 | 31 | 11000 | +10 | |
42 | S1 | 73 | G23 | 22 | 1 | 4 | 900 | 32 | 4000 | +11 | |
43 | S1 | 73 | G24 | 22 | 1 | 4 | 900 | 33 | 2000 | +13 | Q值低 |
由表3可见,在使用含25摩尔%BaO的S2的介电陶瓷压块试样2中,温度系数具有大负值,例如为-100ppm/℃。
在使用含5摩尔%BaO和75摩尔%TiO2的陶瓷组分S3的情况下,由试样3的结果可见,相对介电常数ε较小,为21。
同样,在使用含2摩尔%BaO的陶瓷组分S4的试样4和含50摩尔%TiO2的陶瓷组分S5的试样5的情况下,相对介电常数ε较低,分别为例如16和14。
在使用含15重量%MgO、20重量%ZnO和40重量%B2O3的玻璃组分G2的试样11中,抗湿性难以令人满意。对于抗湿性,将介电陶瓷压块在85℃、85%相对湿度下放置1100小时,其电阻率小于1010Ω.cm则视为次品。
使用含65重量%MgO和10重量%B2O3的玻璃组分G5的试样14不能进行玻璃化。
使用含20重量%Al2O3的玻璃组分G9的试样18具有稍高的为1050℃的烧结温度。
使用含35重量%SiO2的玻璃组分G12的试样21具有1100℃高的烧结温度。
使用含50重量%B2O3和5重量%SiO2的玻璃组分G10的试样19具有为2000的低Q值。
使用不含Li2O的玻璃组分G13的试样22具有1050℃稍高的烧结温度。
使用含20重量%Li2O的玻璃组分G15的试样24具有低的抗湿性。
含有40重量%玻璃组分和55重量%陶瓷组分的试样25具有为18的低的相对介电常数。
含有8重量%玻璃组分和90重量%陶瓷组分的试样28具有1100℃高的烧结温度。
含有5重量%CuO次要组分的试样31具有为2000的低Q值。
含有22重量%玻璃组分G1、15重量%TiO2和62重量%陶瓷组分的试样34具有1100℃高的烧结温度。
由于试样37、40和43分别使用玻璃组分18、21和24并含有15重量%RO,因此具有2000或更低的Q值。
相反,已知其它试样的介电陶瓷压块具有不超过1100℃,较好为1000℃或更低的烧结温度,因此通过在低温下进行烧制可得到上述介电陶瓷压块。另外,还已知上述介电陶瓷压块具有24或更高的高相对介电常数、3000或更高的高Q值以及在±40范围内的温度系数。
如上所述,当使用本发明介电陶瓷压块时,由于它可由低温烧制而成,因此可与低电阻贱金属(如银或铜)一起烧结,另外,使用叠层陶瓷电子元件的制备方法可制得小型高频谐振器。
下面描述与多层陶瓷基材、陶瓷电子元件和叠层陶瓷电子元件的结构有关的实例。
第一个实例
图2是含有本发明第一个实例的多层陶瓷基材作为陶瓷电子元件的多层陶瓷组件剖面图,图3是图2多层陶瓷组件的分解透视图。
多层陶瓷组件1是由多层陶瓷基材2制成的。
多层陶瓷基材2是由中间隔有介电陶瓷层4的绝缘陶瓷层3a和3b组成的,其中介电陶瓷层4具有相对高的介电常数,由本发明介电陶瓷压块制成。
用于形成绝缘陶瓷层3a和3b的陶瓷材料无特别的限制,只要其介电常数低于介电陶瓷层4的介电常数即可,它可使用例如氧化铝、石英等材料。
在介电陶瓷层4中形成有许多内电极5,这些内电极相互间相隔有至少部分介电陶瓷层4,因此形成叠层陶瓷电容器单元C1和C2。
在绝缘陶瓷层3a和3b以及介电陶瓷层4中,形成有多个通孔电极6和6a以及内导线。
另外,在多层陶瓷基材2的顶面上安装有电子器件9-11。作为电子器件9-11,可使用任选的电子器件,如半导体器件或片型叠层电容器。电子器件9-11、电容器单元C1和C2通过通孔电极6和内导线相互电接触,从而在本实例的多层陶瓷组件1中形成电路。
另外,在多层陶瓷基材2的顶面上固定有导电罩8,该导电罩8与由多层陶瓷基材2的顶面穿透至底面的通孔电极6a电接触。在多层陶瓷基材2的底面,形成有外电极7和7,所述外电极7和7与通孔电极6和6a电接触。即使图中未显示其它外电极,但是如外电极7和7那样,它们仅形成在多层陶瓷基材2的底面上。另外,其它外电极与电子器件9-11和电容器单元C1和C2通过上述内导线电接触。
如上所述,由于与外界电接触的电极7和7仅形成在多层陶瓷基材2的底面上,因此多层陶瓷组件1可容易地通过其底面安装在印刷线路板等之上。
另外,在本实例中,由于罩子8是由导电材料制成的并且通过通孔电极6a和6a与外电极7和7电接触,因此导电罩8可对电子器件9-11形成电磁屏蔽。但是,罩子8不必非要由导电材料制成。
在本实例的多层陶瓷组件1中,由于如上所述由本发明介电陶瓷压块制成的叠层电容器单元C1和C2形成于多层陶瓷基材2之中,因此可使用低电阻贱金属(如银或铜)形成内电极5、用于形成外导线的电极以及通孔电极6和6a,从而多层陶瓷组件1可通过两者共同烧结而成。由于可使用可整体烧结型多层陶瓷基材2制备电容器单元C1和C2,因此可实现小型化。此外,由于介电陶瓷层4是由本发明介电陶瓷压块制成的,因此相对介电常数高、Q值也高,从而可形成较好用于高频带的多层陶瓷组件1。
可使用已知的用于陶瓷叠层物的整体烧制技术容易地形成多层陶瓷基材2。也就是说,首先制得主要由本发明介电陶瓷压块组成的陶瓷坯料片,用印刷法在陶瓷坯料片上形成用于构成内电极5、外导线和通孔电极6和6a的电极图案,并将带有电极图案的陶瓷坯料片相互层叠。另外,在用于在上述层叠物的顶面和底面上形成绝缘陶瓷层3a和3b的陶瓷坯料片上,形成电极图案以便形成外导线和通孔电极6和6a。将任意数量的带电极图案的陶瓷坯料片相互叠合在一起,随后沿厚度方向压制之。通过烧制如此形成的层叠物,可容易地制得多层陶瓷基材2。
在各个叠层电容器单元C1和C2中,由于高介电常数的介电陶瓷层被放置在沿厚度方向相邻的内电极5和5之间以获得电容量,因此可在相对小的面积中获得大的电容量,从而也可实现小型化。
第二个实例
图4-6是用于说明本发明涉及结构的第二个实例的叠层陶瓷电子元件的分解透视图、外部透视图和线路图。
图5所示的叠层陶瓷电子元件20是一个LC滤波器。在烧结陶瓷体21中,如下面将描述的那样形成构成电感L和电容C的电路。烧结陶瓷体21是由本发明介电陶瓷压块制成的。另外,在烧结陶瓷体21的外表面上,形成外电极23a、23b、24a和24b,在外电极23a、23b、24a和24b之间形成如图6所示的LC谐振电路。
下面将参照图4描述烧结陶瓷体21的制造方法,从而进一步理解烧结陶瓷体21的内部结构。
首先将有机载体加入原料中以形成本发明介电陶瓷组合物,形成陶瓷糊浆。用任意的片成型法使该陶瓷糊浆成型。如此形成的陶瓷坯料片干燥后,将其冲压成具有预定尺寸的矩形陶瓷坯料片21a-21m。
随后如果需要,在陶瓷坯料片21a-21m中形成用于形成通孔电极28的通孔。另外,通过网印导电糊浆,形成线圈导体26a和26b、用于构成电容器的内电极27a-27c以及线圈导体26c和26d。并将导电糊浆填入用于形成通孔电极28的通孔中形成通孔电极28。
接着,沿附图所示的方向将陶瓷坯料片21a-21m相互叠合在一起,并沿厚度方向压制之,得到烧结的陶瓷体21。
在如此形成的烧结陶瓷体21上,用薄膜形成法(如涂覆/烘烤、沉积、电镀或阴极溅射)形成如图5所示的外电极23a-24b。结果,得到叠层陶瓷电子元件20。
由图4可见,图6所示的电感器单元L1是由线圈导体26a和26b形成的,电感器单元L2是由线圈导体26c和26d形成的,电容器C是由内电极27a-27c形成的。
在本发明叠层陶瓷电子元件20中,如上所述形成LC滤波器;但是由于烧结陶瓷体21是由本发明介电陶瓷组合物制成的,因此第一个实例中的多层陶瓷基材2那样,在低温下烧制可得到叠层陶瓷电子元件20,因此介电陶瓷组合物可与用作圈导体26a-26c和电容器内电极27a-27c的低熔点金属(如Cu、Ag或Au)一起烧结。另外,可形成较好用于高频带的LC滤波器,它具有高的相对介电常数、在高频带的高Q值和低的谐振频率温度系数τf。
在上述涉及结构的第一个实例和第二个实例中,通过实例说明了多层陶瓷组件1和构成LC滤波器的叠层陶瓷电子元件20。但是本发明陶瓷电子元件和叠层陶瓷电子元件不限于上述结构。也就是说,本发明可用于各种多层陶瓷基材,例如用于多片组件的多层陶瓷基材和用于混合集成电路的多层陶瓷基材;具有上面安装电子器件的多层陶瓷基材的各种陶瓷电子元件以及各种片型叠层电子元件,如片型叠层电容器和片型叠层介电天线。
由于本发明介电陶瓷组合物包括由式xBaO-yTiO2-zReO3/2表示的陶瓷组分和上述特定的玻璃组分,因此可在低温(如不超过1100℃,较好为1000℃或更低)进行烧制,从而可与具有优良导电性的金属(如Au、Ag或Cu)一起烧结。因此,例如,多层陶瓷基材或叠层陶瓷电子元件可使用上述金属作为内电极材料,结果可使多层陶瓷基材或叠层陶瓷电子元件小型化。
另外,由于本发明介电陶瓷压块具有24或更大的高相对介电常数、在1MHz为3000或更高的高Q值、以及低的谐振频率温度系数,因此该介电陶瓷压块较好用于形成高频带使用的电容器或LC谐振电路。
当除了陶瓷组分和玻璃组分组成的主要组分以外还含有CuO次要组分时,由于CuO作为烧结助剂,因此可改进低温烧结性能,另外,还可提高Q值和相对介电常数。
此外,当含有TiO2作为次要组分时,该组分有助于玻璃的玻璃化,从而可改进低温烧结性能,另外,还可进一步提高相对介电常数和Q值。
当如上所述由15-35重量%玻璃组分和65-85重量%陶瓷组分形成主要组分时,可可靠地获得低温烧结性能、高相对介电常数、高Q值和低温度系数。
具体地说,当在由15-35重量%玻璃组分和65-85重量%陶瓷组分形成主要组分中含有3重量%或更低的CuO以及1-10重量%TiO2时,在不超过1100℃,尤其在1000℃或更低温度下烧结而成的本发明介电陶瓷压块具有非常高的相对介电常数和Q值,以及低的温度系数。
由于本发明多层陶瓷基材具有这样的结构,即由包括本发明介电陶瓷压块的第一介电陶瓷层组成的陶瓷基材中具有多个电极,因此通过低温烧制可获得该多层陶瓷基材,并且可使用低电阻贱金属(如银或铜)作为电极材料。另外,介电陶瓷层具有高的相对介电常数、高的Q值和低的谐振频率温度系数,因此可得到适合高频带使用的多层陶瓷基材。
在多层陶瓷基材中,当在第一介电陶瓷层的至少一个表面上形成介电常数低于该第一介电陶瓷层的第二陶瓷层时,通过适当地设计第二陶瓷层的组成和叠层物的结构,可根据需要任意地控制该多层陶瓷基材的强度和环境耐受性。
当将其中间隔有至少部分第一介电陶瓷层的多个电极层叠成叠层电容器时,由于本发明介电陶瓷压块具有高的相对介电常数和高的Q值,因此该叠层电容器适用于高频带并能容易地形成高的电容量。另外,由于相对介电常数高,因此可减少构成叠层电容器的多个电极的对置面积,结果可降低电容器部分的尺寸。
当除了构成叠层电容器的内电极以外所述多个电极还包括用于形成叠层电感器的多个线圈导体时,由于本发明介电陶瓷压块具有高的相对介电常数、在高频下具有高的Q值并具有低的谐振频率温度系数,因此可容易地形成较好用于高频带的小型LC谐振电路。
根据本发明多层陶瓷基材上至少安装一个电子器件的本发明陶瓷电子元件,通过使用多层陶瓷基材和电子器件中的电路结构,可形成较好用于高频带的各种小型陶瓷电子元件。
另外,当在多层陶瓷基材上安装外罩使之围绕电子器件时,电子器件受外罩的保护,因此可形成具有优良抗湿性的陶瓷电子元件。
当所述外罩是导电外罩时,可对外罩封闭的电子器件进行电磁屏蔽。
当外电极仅形成在多层陶瓷基材的底面上时,利用多层陶瓷基材的底面可容易地将陶瓷电子元件表面安装在印刷线路板等之上。
在本发明叠层陶瓷电子元件中,由于本发明介电陶瓷压块中形成多个电极,因此通过低温烧制可得到叠层陶瓷电子元件,并可使用低电阻贱金属(如银或铜)作为内电极材料。另外,介电陶瓷压块具有高的相对介电常数、高的Q值和低的谐振频率温度系数,可形成较好用于高频带的叠层电容器。
在本发明叠层陶瓷电子元件中,当多个电极包括构成叠层电容器的内电极时,由于本发明介电陶瓷压块具有高的相对介电常数和高的Q值,因此该叠层陶瓷电子元件适用于高频带并可容易地形成大的电容量。另外,由于相对介电常数高,因此可降低构成叠层电容器的内电极的对置面积,从而可降低电容器部分的尺寸。
在本发明叠层陶瓷电子元件中,当多个电极包括用于构成叠层电容器的内电极和构成叠层电感器的线圈导体时,由于本发明介电陶瓷压块具有高的相对介电常数、在高频具有高的Q值和低的谐振频率温度系数,因此可容易地形成较好用于高频带的小型LC谐振电路。
Claims (15)
1.一种介电陶瓷组合物,它包括:
基于BaO-TiO2-ReO3/2的由式xBaO-yTiO2-zReO3/2表示的陶瓷组分和玻璃组分;
在式xBaO-yTiO2-zReO3/2中,8≤x≤18、52.5≤y≤65、20≤z≤40,其中x、y和z用摩尔百分数表示,x+y+z=100,Re代表稀土元素,并且
所述玻璃组分包括10-25重量%SiO2、10-40重量%B2O3、25-55重量%MgO、0-20重量%ZnO、0-15重量%Al2O3、0.5-10重量%Li2O和0-10重量%RO,其中R是至少一种选自Ba、Sr和Ca的元素。
2.如权利要求1所述的介电陶瓷组合物,它还包括CuO次要组分。
3.如权利要求1所述的介电陶瓷组合物,它还包括TiO2次要组分。
4.如权利要求1所述的介电陶瓷组合物,其特征在于对于65-85重量%BaO-TiO2-ReO3/2基陶瓷组分的含量,玻璃组分的含量为15-35重量%。
5.一种介电陶瓷组合物,它包括:
基于BaO-TiO2-ReO3/2的由式xBaO-yTiO2-zReO3/2表示的陶瓷组分、玻璃组分、CuO和TiO2;
在式xBaO-yTiO2-zReO3/2中,8≤x≤18、52.5≤y≤65、20≤z≤40,其中x、y和z用摩尔百分数表示,x+y+z=100,Re代表稀土元素,
所述玻璃组分包括10-25重量%SiO2、10-40重量%B2O3、25-55重量%MgO、0-20重量%ZnO、0-15重量%Al2O3、0.5-10重量%Li2O和0-10重量%RO,其中R是至少一种选自Ba、Sr和Ca的元素,并且
基于BaO-TiO2-ReO3/2的陶瓷组分、玻璃组分、TiO2和CuO的含量分别为65-85重量%、15-35重量%、0.1-10重量%和3重量%或更少。
6.由权利要求1或5所述的介电陶瓷组合物烧结而成的介电陶瓷压块。
7.如权利要求6所述的介电陶瓷压块,其特征在于所述介电陶瓷组合物是在不超过1100℃的温度下烧结的。
8.如权利要求6所述的介电陶瓷压块,其特征在于在该陶瓷压块中析出晶相,该晶相是至少一种选自Mg2B2O5、Mg3B2O6、BaTi4O9、Ba2Ti9O20、Mg2TiO4、Mg2SiO4、Zn2TiO4、Zn2Ti3O8和ZnAl2O4的晶相。
9.一种多层陶瓷基材,它包括:
第一介电陶瓷层,该层包括权利要求6所述的介电陶瓷压块;和
在所述第一介电陶瓷层上的电极。
10.如权利要求9所述的多层陶瓷基材,在所述第一介电陶瓷层的至少一个表面上它还包括第二介电陶瓷层;
其中所述第二介电陶瓷层的介电常数低于第一介电陶瓷层的介电常数。
11.如权利要求10所述的多层陶瓷基材,其特征在于所述电极是相对放置的,它们之间隔有至少部分第一介电陶瓷层,从而形成电容器。
12.一种陶瓷电子元件,它包括:
如权利要求9所述的多层陶瓷基材;和
至少一个安装在该多层陶瓷基材上与电极一起构成电路的电子器件。
13.一种叠层陶瓷电子元件,它包括:
烧结陶瓷体,它包括如权利要求6所述的介电陶瓷压块;
置于所述烧结陶瓷体中的多个电极;和
多个外电极,其位于烧结陶瓷体的外表面上,各自与所述多个电极中的一个电接触。
14.如权利要求13所述的叠层陶瓷电子元件,其特征在于所述多个电极包括相互叠合在一起的内电极,它们之间至少隔有一部分烧结陶瓷体,从而形成电容器单元。
15.如权利要求14所述的叠层陶瓷电子元件,其特征在于所述多个电极还包括线圈导体以形成叠层电感器单元。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000220866 | 2000-07-21 | ||
JP220866/2000 | 2000-07-21 | ||
JP166653/2001 | 2001-06-01 | ||
JP2001166653A JP3680765B2 (ja) | 2000-07-21 | 2001-06-01 | 誘電体磁器組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1334569A true CN1334569A (zh) | 2002-02-06 |
CN1208783C CN1208783C (zh) | 2005-06-29 |
Family
ID=26596439
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB011244100A Expired - Lifetime CN1208783C (zh) | 2000-07-21 | 2001-07-19 | 介电陶瓷组合物 |
Country Status (4)
Country | Link |
---|---|
US (1) | US6458734B1 (zh) |
JP (1) | JP3680765B2 (zh) |
CN (1) | CN1208783C (zh) |
GB (1) | GB2366563B (zh) |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100415678C (zh) * | 2006-03-27 | 2008-09-03 | 浙江大学 | 一种低介电常数微波介质陶瓷 |
CN1914134B (zh) * | 2004-10-26 | 2010-05-05 | 株式会社村田制作所 | 陶瓷材料组合物、陶瓷衬底和不可逆电路元件 |
CN101492294B (zh) * | 2009-02-17 | 2011-11-16 | 同济大学 | 介电可调微波陶瓷介质材料及其制备方法 |
CN101346310B (zh) * | 2005-12-27 | 2012-01-25 | 株式会社村田制作所 | 镁橄榄石粉末的制造方法、镁橄榄石粉末、镁橄榄石烧结体、绝缘体陶瓷组合物以及层叠陶瓷电子器件 |
CN102682953A (zh) * | 2012-05-28 | 2012-09-19 | 深圳顺络电子股份有限公司 | 一种共模滤波器 |
CN102887702A (zh) * | 2012-10-09 | 2013-01-23 | 天津大学 | 低温烧结锂锌钛系微波介质陶瓷及其制备方法 |
CN108290794A (zh) * | 2016-01-13 | 2018-07-17 | 株式会社村田制作所 | 玻璃陶瓷烧结体、玻璃陶瓷组合物、层叠陶瓷电容器及层叠陶瓷电容器的制造方法 |
CN108484160A (zh) * | 2018-06-25 | 2018-09-04 | 苏州博恩希普新材料科技有限公司 | 一种九钛酸钡基微波介质陶瓷材料及制备方法 |
CN108863347A (zh) * | 2018-08-02 | 2018-11-23 | 广东国华新材料科技股份有限公司 | 一种微波介质陶瓷及其制备方法 |
CN112592160A (zh) * | 2020-12-23 | 2021-04-02 | 嘉兴佳利电子有限公司 | 一种复相低温共烧陶瓷材料及其制备方法 |
CN113045314A (zh) * | 2019-12-27 | 2021-06-29 | 奇力新电子股份有限公司 | 具薄型化适用高频组件的陶瓷粉末 |
CN113429200A (zh) * | 2021-07-20 | 2021-09-24 | 山东国瓷功能材料股份有限公司 | 一种中介低损耗低温共烧陶瓷材料及其制备方法 |
CN113563061A (zh) * | 2021-09-26 | 2021-10-29 | 广东康荣高科新材料股份有限公司 | 一种用于单腔滤波器的低介电常数介质材料及其制备方法 |
Families Citing this family (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001348270A (ja) * | 2000-05-31 | 2001-12-18 | Philips Japan Ltd | 誘電体磁器組成物 |
US6774077B2 (en) * | 2001-01-24 | 2004-08-10 | Paratek Microwave, Inc. | Electronically tunable, low-loss ceramic materials including a tunable dielectric phase and multiple metal oxide phases |
DE60126242T2 (de) * | 2000-08-08 | 2007-08-30 | Philips Intellectual Property & Standards Gmbh | Dielektrische zusammensetzung, herstellungsverfahren von einem keramikbauteil, und elektronisches bauteil |
KR100466072B1 (ko) * | 2002-05-24 | 2005-01-13 | 삼성전기주식회사 | 적층 세라믹 콘덴서용 유전체 조성물 및 이를 이용한 적층세라믹 콘덴서 |
DE10234364B4 (de) * | 2002-07-27 | 2007-12-27 | Robert Bosch Gmbh | Glas-Keramik-Verbundwerkstoff, dessen Verwendung als keramische Folie, Schichtverbund oder Mikrohybrid und Verfahren zu dessen Herstellung |
JP3093578U (ja) * | 2002-10-22 | 2003-05-16 | アルプス電気株式会社 | 多層回路基板 |
KR100522134B1 (ko) * | 2003-04-02 | 2005-10-18 | 한국과학기술연구원 | 저온소성용 고유전율 유전체 조성물 |
WO2004094338A1 (ja) * | 2003-04-21 | 2004-11-04 | Asahi Glass Company, Limited | 誘電体形成用無鉛ガラス、誘電体形成用ガラスセラミックス組成物、誘電体および積層誘電体製造方法 |
JP4907850B2 (ja) * | 2003-06-11 | 2012-04-04 | 日本特殊陶業株式会社 | 低温焼成誘電体磁器組成物及びその製造方法 |
JP4552411B2 (ja) * | 2003-09-30 | 2010-09-29 | 株式会社村田製作所 | 誘電体セラミック組成物、誘電体セラミックおよび積層セラミック電子部品 |
US7417001B2 (en) | 2004-03-01 | 2008-08-26 | Murata Manufacturing Co., Ltd | Glass ceramic composition, glass-ceramic sintered body, and monolithic ceramic electronic component |
US7439202B2 (en) | 2004-03-01 | 2008-10-21 | Murata Manufacturing Co., Ltd. | Glass ceramic composition, glass-ceramic sintered body, and monolithic ceramic electronic component |
CN1826299B (zh) * | 2004-03-01 | 2010-06-16 | 株式会社村田制作所 | 绝缘体陶瓷组合物、绝缘性陶瓷烧结体及层叠型陶瓷电子部件 |
US7368408B2 (en) | 2004-03-01 | 2008-05-06 | Murata Manufacturing Co., Ltd. | Glass-ceramic composition, glass-ceramic sintered body, and monolithic ceramic electronic component |
JP4244865B2 (ja) * | 2004-06-03 | 2009-03-25 | セイコーエプソン株式会社 | 圧電発振器および電子機器 |
KR100859264B1 (ko) * | 2004-12-24 | 2008-09-18 | 가부시키가이샤 무라타 세이사쿠쇼 | 유전체 세라믹 및 적층 세라믹 커패시터 |
US7241712B2 (en) * | 2005-02-28 | 2007-07-10 | National Taiwan University Technology | Low-temperature sintered barium titanate microwave dielectric ceramic material |
JP3940424B2 (ja) * | 2005-03-18 | 2007-07-04 | Tdk株式会社 | 誘電体磁器組成物及びその製造方法 |
JP4838068B2 (ja) * | 2005-09-01 | 2011-12-14 | 日本特殊陶業株式会社 | 配線基板 |
US7517823B2 (en) * | 2005-09-29 | 2009-04-14 | Tdk Corporation | Dielectric porcelain composition and method for production thereof |
JP4299827B2 (ja) * | 2005-12-05 | 2009-07-22 | Tdk株式会社 | 誘電体磁器組成物、電子部品および積層セラミックコンデンサ |
WO2007086184A1 (ja) | 2006-01-30 | 2007-08-02 | Murata Manufacturing Co., Ltd. | 多層セラミック基板の内蔵コンデンサの容量値調整方法、ならびに多層セラミック基板およびその製造方法 |
TWI342573B (en) * | 2006-03-10 | 2011-05-21 | Composition of dielectric material | |
CN100455539C (zh) * | 2006-08-02 | 2009-01-28 | 南京工业大学 | 一种微波介质陶瓷及其制备方法 |
EP2214181B1 (en) | 2007-12-26 | 2016-04-13 | Murata Manufacturing Co. Ltd. | Laminated electronic component and electronic component module provided with the same |
DE112009000012B4 (de) | 2008-03-13 | 2014-11-13 | Murata Manufacturing Co., Ltd. | Glaskeramikzusammensetzung, Glaskeramik-Sinterkörper und keramisches Mehrschicht-Elektronikbauteil |
DE102008001402A1 (de) * | 2008-04-28 | 2009-10-29 | Ceramtec Ag | Formkörper mit poröser Oberfläche und Verfahren zu seiner Herstellung |
JP5315544B2 (ja) * | 2009-03-25 | 2013-10-16 | Tdk株式会社 | 誘電体磁器組成物およびこれを用いた電子部品 |
JP5332807B2 (ja) * | 2009-03-30 | 2013-11-06 | Tdk株式会社 | 誘電体磁器組成物 |
EP2513012B1 (en) | 2009-12-16 | 2016-10-12 | Skyworks Solutions, Inc. | Dielectric ceramic materials and associated methods |
JP5120406B2 (ja) * | 2010-03-31 | 2013-01-16 | Tdk株式会社 | セラミック電子部品及びセラミック電子部品の製造方法 |
US8420560B2 (en) | 2010-03-31 | 2013-04-16 | Tdk Corporation | Dielectric ceramic, method for producing dielectric ceramic, and method for producing powder for producing dielectric ceramic |
WO2012053316A1 (ja) | 2010-10-20 | 2012-04-26 | 太陽誘電株式会社 | 積層セラミックコンデンサ |
DE102011119804B4 (de) | 2011-11-24 | 2019-02-07 | Schott Ag | Dielektrikum für den Hochfrequenzbereich und seine Verwendung |
DE102011119798A1 (de) | 2011-11-24 | 2013-05-29 | Schott Ag | Glaskeramik als Dielektrikum im Hochfrequenzbereich |
JP5983265B2 (ja) | 2011-12-12 | 2016-08-31 | Tdk株式会社 | 誘電体磁器組成物 |
CN103360056A (zh) * | 2012-03-31 | 2013-10-23 | 深圳光启创新技术有限公司 | 一种介质陶瓷 |
DE102012110362B4 (de) * | 2012-10-30 | 2015-10-15 | Borgwarner Ludwigsburg Gmbh | Koronazündeinrichtung und Verfahren zum Herstellen eines Zündkopfes für eine Koronazündeinrichtung |
JP6063729B2 (ja) * | 2012-12-21 | 2017-01-18 | Fdk株式会社 | 誘電体磁器組成物の製造方法、積層チップ部品の製造方法 |
KR101532137B1 (ko) * | 2013-07-23 | 2015-06-26 | 삼성전기주식회사 | 저온 소성용 유전체 조성물, 이를 포함하는 적층 세라믹 전자 부품 및 적층 세라믹 전자 부품의 제조 방법 |
CN103420670B (zh) * | 2013-08-09 | 2015-02-18 | 电子科技大学 | 一种低温烧结微波陶瓷材料及其制备方法 |
US10315959B2 (en) | 2016-09-29 | 2019-06-11 | Skyworks Solutions, Inc. | Temperature compensated dielectric material |
JP6976053B2 (ja) * | 2016-12-14 | 2021-12-01 | Tdk株式会社 | 積層電子部品 |
US11740399B2 (en) * | 2018-02-06 | 2023-08-29 | Raytheon Company | Low cost dispersive optical elements |
CN114874005B (zh) * | 2022-06-10 | 2023-01-13 | 安徽理工大学 | 温度稳定型钛酸镁基微波介质复合陶瓷及其制备方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5646081A (en) * | 1995-04-12 | 1997-07-08 | Murata Manufacturing Co., Ltd. | Non-reduced dielectric ceramic compositions |
JPH11228222A (ja) * | 1997-12-11 | 1999-08-24 | Murata Mfg Co Ltd | 誘電体磁器組成物及びそれを用いたセラミック電子部品 |
JPH11310455A (ja) * | 1998-02-27 | 1999-11-09 | Murata Mfg Co Ltd | 誘電体磁器組成物およびそれを用いたセラミック電子部品 |
JP4108836B2 (ja) * | 1998-07-15 | 2008-06-25 | Tdk株式会社 | 誘電体磁器組成物 |
-
2001
- 2001-06-01 JP JP2001166653A patent/JP3680765B2/ja not_active Expired - Lifetime
- 2001-07-10 GB GB0116838A patent/GB2366563B/en not_active Expired - Lifetime
- 2001-07-19 CN CNB011244100A patent/CN1208783C/zh not_active Expired - Lifetime
- 2001-07-20 US US09/910,352 patent/US6458734B1/en not_active Expired - Lifetime
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1914134B (zh) * | 2004-10-26 | 2010-05-05 | 株式会社村田制作所 | 陶瓷材料组合物、陶瓷衬底和不可逆电路元件 |
US8455381B2 (en) | 2004-10-26 | 2013-06-04 | Murata Manufacturing Co., Ltd. | Ceramic material composition, ceramic substrate, and nonreciprocal circuit device |
CN101346310B (zh) * | 2005-12-27 | 2012-01-25 | 株式会社村田制作所 | 镁橄榄石粉末的制造方法、镁橄榄石粉末、镁橄榄石烧结体、绝缘体陶瓷组合物以及层叠陶瓷电子器件 |
CN100415678C (zh) * | 2006-03-27 | 2008-09-03 | 浙江大学 | 一种低介电常数微波介质陶瓷 |
CN101492294B (zh) * | 2009-02-17 | 2011-11-16 | 同济大学 | 介电可调微波陶瓷介质材料及其制备方法 |
CN102682953A (zh) * | 2012-05-28 | 2012-09-19 | 深圳顺络电子股份有限公司 | 一种共模滤波器 |
CN102887702A (zh) * | 2012-10-09 | 2013-01-23 | 天津大学 | 低温烧结锂锌钛系微波介质陶瓷及其制备方法 |
CN108290794B (zh) * | 2016-01-13 | 2023-01-20 | 株式会社村田制作所 | 玻璃陶瓷烧结体、玻璃陶瓷组合物、层叠陶瓷电容器及层叠陶瓷电容器的制造方法 |
CN108290794A (zh) * | 2016-01-13 | 2018-07-17 | 株式会社村田制作所 | 玻璃陶瓷烧结体、玻璃陶瓷组合物、层叠陶瓷电容器及层叠陶瓷电容器的制造方法 |
CN108484160A (zh) * | 2018-06-25 | 2018-09-04 | 苏州博恩希普新材料科技有限公司 | 一种九钛酸钡基微波介质陶瓷材料及制备方法 |
CN108863347A (zh) * | 2018-08-02 | 2018-11-23 | 广东国华新材料科技股份有限公司 | 一种微波介质陶瓷及其制备方法 |
CN113045314A (zh) * | 2019-12-27 | 2021-06-29 | 奇力新电子股份有限公司 | 具薄型化适用高频组件的陶瓷粉末 |
CN112592160A (zh) * | 2020-12-23 | 2021-04-02 | 嘉兴佳利电子有限公司 | 一种复相低温共烧陶瓷材料及其制备方法 |
CN112592160B (zh) * | 2020-12-23 | 2022-05-24 | 嘉兴佳利电子有限公司 | 一种复相低温共烧陶瓷材料及其制备方法 |
CN113429200A (zh) * | 2021-07-20 | 2021-09-24 | 山东国瓷功能材料股份有限公司 | 一种中介低损耗低温共烧陶瓷材料及其制备方法 |
CN113563061A (zh) * | 2021-09-26 | 2021-10-29 | 广东康荣高科新材料股份有限公司 | 一种用于单腔滤波器的低介电常数介质材料及其制备方法 |
CN113563061B (zh) * | 2021-09-26 | 2021-12-21 | 广东康荣高科新材料股份有限公司 | 一种用于单腔滤波器的低介电常数介质材料及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
GB2366563A (en) | 2002-03-13 |
CN1208783C (zh) | 2005-06-29 |
GB2366563B (en) | 2002-07-24 |
US6458734B1 (en) | 2002-10-01 |
JP3680765B2 (ja) | 2005-08-10 |
JP2002097072A (ja) | 2002-04-02 |
GB0116838D0 (en) | 2001-08-29 |
US20020037804A1 (en) | 2002-03-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN1208783C (zh) | 介电陶瓷组合物 | |
CN1197822C (zh) | 绝缘陶瓷压块 | |
CN1241870C (zh) | 非磁性陶瓷和多层陶瓷部件 | |
CN1215502C (zh) | 合成多层陶瓷电子部件及其制造方法 | |
CN1132800C (zh) | 介电陶瓷组合物 | |
JP4371141B2 (ja) | 絶縁体セラミック組成物、絶縁性セラミック焼結体および積層型セラミック電子部品 | |
CN1145596C (zh) | 非还原性介电陶瓷和使用该陶瓷的单块陶瓷电容器 | |
CN1090371C (zh) | 绝缘陶瓷组合物及使用该组合物的叠层陶瓷电容器 | |
US7544629B2 (en) | Non-lead glass for forming dielectric, glass ceramic composition for forming dielectric, dielectric, and process for producing laminated dielectric | |
CN1209771C (zh) | 绝缘体陶瓷组合物 | |
CN1280234C (zh) | 介电陶瓷、其生产方法和多层陶瓷电容器 | |
CN1188367C (zh) | 绝缘陶瓷压块、陶瓷多层基板和陶瓷电子器件 | |
KR100814674B1 (ko) | 유전체 자기 조성물 및 그 제조방법 | |
CN1457527A (zh) | 介电滤波器、天线收发转换装置和使用滤波器的通讯装置 | |
CN1319571A (zh) | 绝缘陶瓷、多层陶瓷基片和层叠的陶瓷电子部件 | |
JPWO2012157299A1 (ja) | ガラスセラミック組成物 | |
CN1212996C (zh) | 玻璃陶瓷组合物、玻璃陶瓷烧结体以及陶瓷多层基板 | |
US8168555B2 (en) | Ceramic substrate, process for producing the same, and dielectric-porcelain composition | |
CN1189421C (zh) | 高频介电陶瓷构件,介电谐振器,介电滤波器,介电双工器,和通讯装置 | |
US8652982B2 (en) | Ceramic sintered body and method for producing ceramic sintered body | |
JP3903781B2 (ja) | 複合積層セラミック電子部品及びその製造方法 | |
CN1374272A (zh) | 低温烧结瓷器及电子部件 | |
CN1202532C (zh) | 介电陶瓷组合物、介电陶瓷压块及含有它们的电子元件 | |
CN1302070A (zh) | 电子器件和介电陶瓷组合物以及其制备方法、 | |
JP4419487B2 (ja) | 酸化物磁器組成物、セラミック多層基板およびセラミック電子部品 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C06 | Publication | ||
PB01 | Publication | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CX01 | Expiry of patent term |
Granted publication date: 20050629 |
|
CX01 | Expiry of patent term |