CN1291468C - 用于制造互连结构的方法和装置 - Google Patents
用于制造互连结构的方法和装置 Download PDFInfo
- Publication number
- CN1291468C CN1291468C CNB018083455A CN01808345A CN1291468C CN 1291468 C CN1291468 C CN 1291468C CN B018083455 A CNB018083455 A CN B018083455A CN 01808345 A CN01808345 A CN 01808345A CN 1291468 C CN1291468 C CN 1291468C
- Authority
- CN
- China
- Prior art keywords
- bottom pad
- layer
- passivation layer
- post
- base material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/019—Manufacture or treatment of bond pads
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/012—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/012—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps
- H10W72/01231—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps using blanket deposition
- H10W72/01233—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps using blanket deposition in liquid form, e.g. spin coating, spray coating or immersion coating
- H10W72/01235—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps using blanket deposition in liquid form, e.g. spin coating, spray coating or immersion coating by plating, e.g. electroless plating or electroplating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/012—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps
- H10W72/01231—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps using blanket deposition
- H10W72/01238—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps using blanket deposition in gaseous form, e.g. by CVD or PVD
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/012—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps
- H10W72/01251—Changing the shapes of bumps
- H10W72/01255—Changing the shapes of bumps by using masks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/073—Connecting or disconnecting of die-attach connectors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
- H10W72/221—Structures or relative sizes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
- H10W72/221—Structures or relative sizes
- H10W72/224—Bumps having multiple side-by-side cores
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
- H10W72/241—Dispositions, e.g. layouts
- H10W72/242—Dispositions, e.g. layouts relative to the surface, e.g. recessed, protruding
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
- H10W72/251—Materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
- H10W72/251—Materials
- H10W72/252—Materials comprising solid metals or solid metalloids, e.g. PbSn, Ag or Cu
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
- H10W72/29—Bond pads specially adapted therefor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/921—Structures or relative sizes of bond pads
- H10W72/923—Bond pads having multiple stacked layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/931—Shapes of bond pads
- H10W72/934—Cross-sectional shape, i.e. in side view
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/941—Dispositions of bond pads
- H10W72/9415—Dispositions of bond pads relative to the surface, e.g. recessed, protruding
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/951—Materials of bond pads
- H10W72/952—Materials of bond pads comprising metals or metalloids, e.g. PbSn, Ag or Cu
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
- H10W74/131—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed
- H10W74/137—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed the encapsulations being directly on the semiconductor body
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
- H10W74/15—Encapsulations, e.g. protective coatings characterised by their shape or disposition on active surfaces of flip-chip devices, e.g. underfills
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Wire Bonding (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/551,312 | 2000-04-18 | ||
| US09/551,312 US6429531B1 (en) | 2000-04-18 | 2000-04-18 | Method and apparatus for manufacturing an interconnect structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1473359A CN1473359A (zh) | 2004-02-04 |
| CN1291468C true CN1291468C (zh) | 2006-12-20 |
Family
ID=24200750
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB018083455A Expired - Lifetime CN1291468C (zh) | 2000-04-18 | 2001-04-06 | 用于制造互连结构的方法和装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6429531B1 (https=) |
| JP (1) | JP5064632B2 (https=) |
| KR (1) | KR100818902B1 (https=) |
| CN (1) | CN1291468C (https=) |
| AU (1) | AU2001251415A1 (https=) |
| TW (1) | TW490775B (https=) |
| WO (1) | WO2001080303A2 (https=) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6642136B1 (en) * | 2001-09-17 | 2003-11-04 | Megic Corporation | Method of making a low fabrication cost, high performance, high reliability chip scale package |
| US8021976B2 (en) | 2002-10-15 | 2011-09-20 | Megica Corporation | Method of wire bonding over active area of a semiconductor circuit |
| US6815324B2 (en) * | 2001-02-15 | 2004-11-09 | Megic Corporation | Reliable metal bumps on top of I/O pads after removal of test probe marks |
| US6818545B2 (en) * | 2001-03-05 | 2004-11-16 | Megic Corporation | Low fabrication cost, fine pitch and high reliability solder bump |
| US8158508B2 (en) * | 2001-03-05 | 2012-04-17 | Megica Corporation | Structure and manufacturing method of a chip scale package |
| TWI313507B (en) | 2002-10-25 | 2009-08-11 | Megica Corporatio | Method for assembling chips |
| US7099293B2 (en) | 2002-05-01 | 2006-08-29 | Stmicroelectronics, Inc. | Buffer-less de-skewing for symbol combination in a CDMA demodulator |
| TWI245402B (en) | 2002-01-07 | 2005-12-11 | Megic Corp | Rod soldering structure and manufacturing process thereof |
| US6614117B1 (en) * | 2002-06-04 | 2003-09-02 | Skyworks Solutions, Inc. | Method for metallization of a semiconductor substrate and related structure |
| KR100476301B1 (ko) * | 2002-07-27 | 2005-03-15 | 한국과학기술원 | 전기도금법에 의한 반도체 소자의 플립칩 접속용 ubm의형성방법 |
| US6878633B2 (en) * | 2002-12-23 | 2005-04-12 | Freescale Semiconductor, Inc. | Flip-chip structure and method for high quality inductors and transformers |
| JP2004247530A (ja) * | 2003-02-14 | 2004-09-02 | Renesas Technology Corp | 半導体装置及びその製造方法 |
| US7470997B2 (en) * | 2003-07-23 | 2008-12-30 | Megica Corporation | Wirebond pad for semiconductor chip or wafer |
| US7394161B2 (en) * | 2003-12-08 | 2008-07-01 | Megica Corporation | Chip structure with pads having bumps or wirebonded wires formed thereover or used to be tested thereto |
| US8067837B2 (en) * | 2004-09-20 | 2011-11-29 | Megica Corporation | Metallization structure over passivation layer for IC chip |
| US8294279B2 (en) | 2005-01-25 | 2012-10-23 | Megica Corporation | Chip package with dam bar restricting flow of underfill |
| JP4219951B2 (ja) * | 2006-10-25 | 2009-02-04 | 新光電気工業株式会社 | はんだボール搭載方法及びはんだボール搭載基板の製造方法 |
| JP4682964B2 (ja) * | 2006-10-30 | 2011-05-11 | 株式会社デンソー | 半導体装置およびその製造方法 |
| US20120248599A1 (en) * | 2011-03-28 | 2012-10-04 | Ring Matthew A | Reliable solder bump coupling within a chip scale package |
| US9324667B2 (en) | 2012-01-13 | 2016-04-26 | Freescale Semiconductor, Inc. | Semiconductor devices with compliant interconnects |
| KR102315276B1 (ko) | 2014-10-06 | 2021-10-20 | 삼성전자 주식회사 | 집적회로 소자 및 그 제조 방법 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5071518A (en) | 1989-10-24 | 1991-12-10 | Microelectronics And Computer Technology Corporation | Method of making an electrical multilayer interconnect |
| JP3141364B2 (ja) * | 1992-05-06 | 2001-03-05 | 住友電気工業株式会社 | 半導体チップ |
| KR960011855B1 (ko) * | 1992-10-08 | 1996-09-03 | 삼성전자 주식회사 | 반도체장치의 범프 형성방법 |
| US5466635A (en) | 1994-06-02 | 1995-11-14 | Lsi Logic Corporation | Process for making an interconnect bump for flip-chip integrated circuit including integral standoff and hourglass shaped solder coating |
| US5447264A (en) * | 1994-07-01 | 1995-09-05 | Mcnc | Recessed via apparatus for testing, burn-in, and/or programming of integrated circuit chips, and for placing solder bumps thereon |
| JPH0837190A (ja) * | 1994-07-22 | 1996-02-06 | Nec Corp | 半導体装置 |
| JP2701751B2 (ja) * | 1994-08-30 | 1998-01-21 | 日本電気株式会社 | 半導体装置の製造方法 |
| EP0751566A3 (en) * | 1995-06-30 | 1997-02-26 | Ibm | Metal thin film barrier for electrical connections |
| DE19616373A1 (de) | 1996-04-24 | 1997-08-14 | Fraunhofer Ges Forschung | Herstellung galvanisch abgeformter Kontakthöcker |
| JPH1092924A (ja) * | 1996-09-18 | 1998-04-10 | Toshiba Corp | 半導体装置及びその製造方法 |
| JPH10209154A (ja) * | 1997-01-21 | 1998-08-07 | Oki Electric Ind Co Ltd | 半導体装置 |
| US6441487B2 (en) * | 1997-10-20 | 2002-08-27 | Flip Chip Technologies, L.L.C. | Chip scale package using large ductile solder balls |
| US6251528B1 (en) * | 1998-01-09 | 2001-06-26 | International Business Machines Corporation | Method to plate C4 to copper stud |
| US5977632A (en) * | 1998-02-02 | 1999-11-02 | Motorola, Inc. | Flip chip bump structure and method of making |
| US6075290A (en) | 1998-02-26 | 2000-06-13 | National Semiconductor Corporation | Surface mount die: wafer level chip-scale package and process for making the same |
| US5943597A (en) * | 1998-06-15 | 1999-08-24 | Motorola, Inc. | Bumped semiconductor device having a trench for stress relief |
| JP2000091369A (ja) | 1998-09-11 | 2000-03-31 | Sony Corp | 半導体装置及びその製造方法 |
| US6218732B1 (en) | 1998-09-15 | 2001-04-17 | Texas Instruments Incorporated | Copper bond pad process |
| JP3577419B2 (ja) * | 1998-12-17 | 2004-10-13 | 新光電気工業株式会社 | 半導体装置およびその製造方法 |
| US6180505B1 (en) | 1999-01-07 | 2001-01-30 | International Business Machines Corporation | Process for forming a copper-containing film |
| JP2000228006A (ja) * | 1999-02-05 | 2000-08-15 | Alps Electric Co Ltd | ボンディングパットおよびバンプを用いた接合体、および磁気ヘッド装置 |
-
2000
- 2000-04-18 US US09/551,312 patent/US6429531B1/en not_active Expired - Lifetime
-
2001
- 2001-04-06 KR KR1020027013890A patent/KR100818902B1/ko not_active Expired - Lifetime
- 2001-04-06 CN CNB018083455A patent/CN1291468C/zh not_active Expired - Lifetime
- 2001-04-06 JP JP2001577599A patent/JP5064632B2/ja not_active Expired - Lifetime
- 2001-04-06 AU AU2001251415A patent/AU2001251415A1/en not_active Abandoned
- 2001-04-06 WO PCT/US2001/011319 patent/WO2001080303A2/en not_active Ceased
- 2001-04-17 TW TW090109167A patent/TW490775B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| TW490775B (en) | 2002-06-11 |
| US6429531B1 (en) | 2002-08-06 |
| WO2001080303A3 (en) | 2002-02-21 |
| CN1473359A (zh) | 2004-02-04 |
| AU2001251415A1 (en) | 2001-10-30 |
| KR100818902B1 (ko) | 2008-04-04 |
| KR20020091210A (ko) | 2002-12-05 |
| JP5064632B2 (ja) | 2012-10-31 |
| WO2001080303A2 (en) | 2001-10-25 |
| JP2004501504A (ja) | 2004-01-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20180918 Address after: texas Patentee after: Fisical Semiconductor Inc. Address before: Illinois Patentee before: Motorola Inc. |
|
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20181016 Address after: American Texas Patentee after: NXP America Co Ltd Address before: texas Patentee before: Fisical Semiconductor Inc. |
|
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20061220 |