CN1276132C - 带材处理装置 - Google Patents

带材处理装置 Download PDF

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Publication number
CN1276132C
CN1276132C CNB031220754A CN03122075A CN1276132C CN 1276132 C CN1276132 C CN 1276132C CN B031220754 A CNB031220754 A CN B031220754A CN 03122075 A CN03122075 A CN 03122075A CN 1276132 C CN1276132 C CN 1276132C
Authority
CN
China
Prior art keywords
electrode
liquid
mentioned
rectification part
band
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB031220754A
Other languages
English (en)
Chinese (zh)
Other versions
CN1515704A (zh
Inventor
藤井正
杉冈英一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Kohan Co Ltd
Original Assignee
Toyo Kohan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP06134970A external-priority patent/JP3073653B2/ja
Priority claimed from JP15660394A external-priority patent/JP2942146B2/ja
Priority claimed from JP07053325A external-priority patent/JP3073662B2/ja
Application filed by Toyo Kohan Co Ltd filed Critical Toyo Kohan Co Ltd
Publication of CN1515704A publication Critical patent/CN1515704A/zh
Application granted granted Critical
Publication of CN1276132C publication Critical patent/CN1276132C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
CNB031220754A 1994-05-24 1995-05-22 带材处理装置 Expired - Fee Related CN1276132C (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP06134970A JP3073653B2 (ja) 1994-05-24 1994-05-24 ストリップ処理装置
JP134970/1994 1994-05-24
JP156603/1994 1994-06-14
JP15660394A JP2942146B2 (ja) 1994-06-14 1994-06-14 メッキ装置及びクリーニング装置
JP07053325A JP3073662B2 (ja) 1995-02-17 1995-02-17 めっき装置及びクリーニング装置
JP53325/1995 1995-02-17

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN95193196A Division CN1122121C (zh) 1994-05-24 1995-05-22 带材处理装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN 200610005089 Division CN1824843A (zh) 1994-05-24 1995-05-22 带材处理装置

Publications (2)

Publication Number Publication Date
CN1515704A CN1515704A (zh) 2004-07-28
CN1276132C true CN1276132C (zh) 2006-09-20

Family

ID=27294911

Family Applications (2)

Application Number Title Priority Date Filing Date
CN95193196A Expired - Fee Related CN1122121C (zh) 1994-05-24 1995-05-22 带材处理装置
CNB031220754A Expired - Fee Related CN1276132C (zh) 1994-05-24 1995-05-22 带材处理装置

Family Applications Before (1)

Application Number Title Priority Date Filing Date
CN95193196A Expired - Fee Related CN1122121C (zh) 1994-05-24 1995-05-22 带材处理装置

Country Status (8)

Country Link
EP (3) EP1029951B1 (enrdf_load_stackoverflow)
KR (1) KR100297274B1 (enrdf_load_stackoverflow)
CN (2) CN1122121C (enrdf_load_stackoverflow)
AU (1) AU697938B2 (enrdf_load_stackoverflow)
CA (1) CA2191225C (enrdf_load_stackoverflow)
DE (3) DE69528458T2 (enrdf_load_stackoverflow)
ES (2) ES2214810T3 (enrdf_load_stackoverflow)
WO (1) WO1995032322A1 (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW592859B (en) * 2001-09-11 2004-06-21 Ebara Corp Electrolytic processing apparatus and method
DE102009060937A1 (de) * 2009-12-22 2011-06-30 Siemens Aktiengesellschaft, 80333 Verfahren zum elektrochemischen Beschichten
CN104419974B (zh) * 2013-08-19 2017-06-16 柳广德 供成捆不锈钢线可连续进行电浆抛光及降低表面粗糙度的装置方法
CN105316739B (zh) * 2014-06-11 2017-10-20 上海梅山钢铁股份有限公司 一种模拟带钢不同线速度的连续电镀试验装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4518664Y1 (enrdf_load_stackoverflow) * 1966-12-14 1970-07-29
US4652346A (en) * 1984-12-31 1987-03-24 Olin Corporation Apparatus and process for the continuous plating of wide delicate metal foil
JPS61217596A (ja) * 1985-03-25 1986-09-27 Sumitomo Metal Ind Ltd 鋼帯の均一電気メツキ方法及びその装置
JPS62211399A (ja) * 1986-03-11 1987-09-17 Nippon Kokan Kk <Nkk> 合金電気鍍金用電解槽
JPS63303100A (ja) * 1987-06-03 1988-12-09 Mitsubishi Heavy Ind Ltd 帯鋼連続処理設備
JPH01306596A (ja) * 1988-06-06 1989-12-11 Eagle Ind Co Ltd 鍍金装置

Also Published As

Publication number Publication date
EP0765953A1 (en) 1997-04-02
DE69532421T2 (de) 2004-11-11
EP1029950A3 (en) 2000-12-06
ES2210968T3 (es) 2004-07-01
ES2214810T3 (es) 2004-09-16
WO1995032322A1 (fr) 1995-11-30
EP1029951A3 (en) 2000-12-06
EP1029951A2 (en) 2000-08-23
CA2191225C (en) 2003-11-04
AU2455795A (en) 1995-12-18
AU697938B2 (en) 1998-10-22
CN1122121C (zh) 2003-09-24
DE69528458D1 (de) 2002-11-07
EP0765953A4 (enrdf_load_stackoverflow) 1997-04-23
KR970702940A (ko) 1997-06-10
CN1515704A (zh) 2004-07-28
EP1029950A2 (en) 2000-08-23
DE69532422D1 (de) 2004-02-12
DE69528458T2 (de) 2003-06-05
CN1148873A (zh) 1997-04-30
CA2191225A1 (en) 1995-11-30
EP1029951B1 (en) 2004-01-07
EP0765953B1 (en) 2002-10-02
DE69532421D1 (de) 2004-02-12
KR100297274B1 (ko) 2001-08-07
EP1029950B1 (en) 2004-01-07
DE69532422T2 (de) 2004-12-02

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GR01 Patent grant
C19 Lapse of patent right due to non-payment of the annual fee
CF01 Termination of patent right due to non-payment of annual fee