CN121263424A - 化合物的制造方法、化合物 - Google Patents

化合物的制造方法、化合物

Info

Publication number
CN121263424A
CN121263424A CN202480037485.3A CN202480037485A CN121263424A CN 121263424 A CN121263424 A CN 121263424A CN 202480037485 A CN202480037485 A CN 202480037485A CN 121263424 A CN121263424 A CN 121263424A
Authority
CN
China
Prior art keywords
compound
formula
group
mmol
integer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202480037485.3A
Other languages
English (en)
Chinese (zh)
Inventor
大洼惠
町田崇
小玉启祐
稻田宽
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of CN121263424A publication Critical patent/CN121263424A/zh
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0834—Compounds having one or more O-Si linkage
    • C07F7/0838—Compounds with one or more Si-O-Si sequences
    • C07F7/0872—Preparation and treatment thereof
    • C07F7/089—Treatments not covered by a preceding group
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/06—Preparatory processes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0834—Compounds having one or more O-Si linkage
    • C07F7/0838—Compounds with one or more Si-O-Si sequences
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0834—Compounds having one or more O-Si linkage
    • C07F7/0838—Compounds with one or more Si-O-Si sequences
    • C07F7/0872—Preparation and treatment thereof
    • C07F7/0874—Reactions involving a bond of the Si-O-Si linkage
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/12—Organo silicon halides
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/38—Polysiloxanes modified by chemical after-treatment
    • C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
    • C08G77/385—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing halogens

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Chemical & Material Sciences (AREA)
CN202480037485.3A 2023-07-11 2024-07-10 化合物的制造方法、化合物 Pending CN121263424A (zh)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2023-113782 2023-07-11
JP2023113782 2023-07-11
JP2023-169671 2023-09-29
JP2023169671 2023-09-29
JP2023-219204 2023-12-26
JP2023219204 2023-12-26
PCT/JP2024/024962 WO2025013897A1 (ja) 2023-07-11 2024-07-10 化合物の製造方法、化合物

Publications (1)

Publication Number Publication Date
CN121263424A true CN121263424A (zh) 2026-01-02

Family

ID=94215892

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202480037485.3A Pending CN121263424A (zh) 2023-07-11 2024-07-10 化合物的制造方法、化合物

Country Status (5)

Country Link
US (1) US20260092147A1 (https=)
JP (1) JPWO2025013897A1 (https=)
KR (1) KR20260006632A (https=)
CN (1) CN121263424A (https=)
WO (1) WO2025013897A1 (https=)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07233177A (ja) * 1994-02-22 1995-09-05 Sagami Chem Res Center ピロリドン環を有するケイ素化合物、ポリオルガノシロキサンおよび経皮吸収促進剤
JPH09143186A (ja) * 1995-11-28 1997-06-03 Sagami Chem Res Center 四級アンモニウム基を有するジシロキサン化合物および殺菌殺藻剤
JPH1192490A (ja) * 1997-07-25 1999-04-06 Sagami Chem Res Center 糖残基を有するオルガノシロキサン化合物および経皮吸収促進剤
WO2010149505A2 (en) * 2009-06-24 2010-12-29 Basf Se Charged particles
JP5774518B2 (ja) 2011-07-27 2015-09-09 富士フイルム株式会社 化合物、ヘイズ低下剤、液晶組成物、高分子材料およびフィルム
JP6102283B2 (ja) * 2013-01-29 2017-03-29 住友化学株式会社 高分子化合物、及び該高分子化合物を含む絶縁層材料
KR102126680B1 (ko) * 2016-05-23 2020-06-25 주식회사 엘지화학 신규 액정 화합물 및 이의 용도

Also Published As

Publication number Publication date
WO2025013897A1 (ja) 2025-01-16
KR20260006632A (ko) 2026-01-13
US20260092147A1 (en) 2026-04-02
JPWO2025013897A1 (https=) 2025-01-16

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