KR20260006632A - 화합물의 제조 방법, 화합물 - Google Patents

화합물의 제조 방법, 화합물

Info

Publication number
KR20260006632A
KR20260006632A KR1020257040252A KR20257040252A KR20260006632A KR 20260006632 A KR20260006632 A KR 20260006632A KR 1020257040252 A KR1020257040252 A KR 1020257040252A KR 20257040252 A KR20257040252 A KR 20257040252A KR 20260006632 A KR20260006632 A KR 20260006632A
Authority
KR
South Korea
Prior art keywords
compound
group
formula
mmol
ring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257040252A
Other languages
English (en)
Korean (ko)
Inventor
메구미 오쿠보
다카시 마치다
게이스케 고다마
히로시 이나다
Original Assignee
후지필름 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 후지필름 가부시키가이샤 filed Critical 후지필름 가부시키가이샤
Publication of KR20260006632A publication Critical patent/KR20260006632A/ko
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/06—Preparatory processes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0834—Compounds having one or more O-Si linkage
    • C07F7/0838—Compounds with one or more Si-O-Si sequences
    • C07F7/0872—Preparation and treatment thereof
    • C07F7/089—Treatments not covered by a preceding group
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0834—Compounds having one or more O-Si linkage
    • C07F7/0838—Compounds with one or more Si-O-Si sequences
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0834—Compounds having one or more O-Si linkage
    • C07F7/0838—Compounds with one or more Si-O-Si sequences
    • C07F7/0872—Preparation and treatment thereof
    • C07F7/0874—Reactions involving a bond of the Si-O-Si linkage
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/12—Organo silicon halides
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/38—Polysiloxanes modified by chemical after-treatment
    • C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
    • C08G77/385—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing halogens

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Chemical & Material Sciences (AREA)
KR1020257040252A 2023-07-11 2024-07-10 화합물의 제조 방법, 화합물 Pending KR20260006632A (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JPJP-P-2023-113782 2023-07-11
JP2023113782 2023-07-11
JPJP-P-2023-169671 2023-09-29
JP2023169671 2023-09-29
JPJP-P-2023-219204 2023-12-26
JP2023219204 2023-12-26
PCT/JP2024/024962 WO2025013897A1 (ja) 2023-07-11 2024-07-10 化合物の製造方法、化合物

Publications (1)

Publication Number Publication Date
KR20260006632A true KR20260006632A (ko) 2026-01-13

Family

ID=94215892

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020257040252A Pending KR20260006632A (ko) 2023-07-11 2024-07-10 화합물의 제조 방법, 화합물

Country Status (5)

Country Link
US (1) US20260092147A1 (https=)
JP (1) JPWO2025013897A1 (https=)
KR (1) KR20260006632A (https=)
CN (1) CN121263424A (https=)
WO (1) WO2025013897A1 (https=)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013047204A (ja) 2011-07-27 2013-03-07 Fujifilm Corp 化合物、ヘイズ低下剤、液晶組成物、高分子材料およびフィルム

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07233177A (ja) * 1994-02-22 1995-09-05 Sagami Chem Res Center ピロリドン環を有するケイ素化合物、ポリオルガノシロキサンおよび経皮吸収促進剤
JPH09143186A (ja) * 1995-11-28 1997-06-03 Sagami Chem Res Center 四級アンモニウム基を有するジシロキサン化合物および殺菌殺藻剤
JPH1192490A (ja) * 1997-07-25 1999-04-06 Sagami Chem Res Center 糖残基を有するオルガノシロキサン化合物および経皮吸収促進剤
WO2010149505A2 (en) * 2009-06-24 2010-12-29 Basf Se Charged particles
JP6102283B2 (ja) * 2013-01-29 2017-03-29 住友化学株式会社 高分子化合物、及び該高分子化合物を含む絶縁層材料
KR102126680B1 (ko) * 2016-05-23 2020-06-25 주식회사 엘지화학 신규 액정 화합물 및 이의 용도

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013047204A (ja) 2011-07-27 2013-03-07 Fujifilm Corp 化合物、ヘイズ低下剤、液晶組成物、高分子材料およびフィルム

Also Published As

Publication number Publication date
WO2025013897A1 (ja) 2025-01-16
CN121263424A (zh) 2026-01-02
US20260092147A1 (en) 2026-04-02
JPWO2025013897A1 (https=) 2025-01-16

Similar Documents

Publication Publication Date Title
CN105263913B (zh) 硫代1,2,4‑三唑衍生物及其制备方法
JP6950869B2 (ja) １つの炭化水素基を有するイソシアヌル酸誘導体の製造方法
JP6819892B2 (ja) モノグリシジルイソシアヌレート化合物及びその製造方法
KR20260006632A (ko) 화합물의 제조 방법, 화합물
CN112480048A (zh) 化合物、液晶介质、液晶显示元件、液晶显示器
JP5209426B2 (ja) １，２，４−オキサジアゾール誘導体の製造方法
JP2013151443A (ja) イソシアヌレート化合物
JP2019094314A (ja) トリアジン−２，４−ジオン誘導体及びその製造方法
CN110551123A (zh) 一种5-(叔丁氧羰基)-2-甲基-4,5,6,7-四氢-2h-吡唑并[4,3-c]吡啶-7-羧酸的制备方法
JP4471361B2 (ja) 新規なフロロアルキル基含有アセチレンアルコールおよびその製造方法
JPS6148830B2 (https=)
EP0267066B1 (fr) Nouveaux organomagnésiens sous forme solide, leur procédé de préparation et leur utilisation
AU2017239848A1 (en) Novel compound and synthesis method therefor
CN108264492B (zh) 一种氧二氮杂环化合物的制备工艺及应用
CN118702908B (zh) 含硫聚乙二醇衍生物及其制备方法和在醇羟基选择性氧化中的应用
US2708200A (en) Pentaerythrite dihalohydrin monosulfurous acid esters
CN108101771A (zh) β-d2烷基酸类化合物的制备方法
JP7007999B2 (ja) ジエステル化合物およびその製造方法
SU390118A1 (ru) Способ получения олигомерных перекисей
JP3012933B1 (ja) ジチアナフタレノファン化合物とその製造方法
JPH0480902B2 (https=)
WO2025192727A1 (ja) 硫黄含有ビニルエーテルの製造方法
KR101463933B1 (ko) 5-치환된 또는 2,5-치환된 3-푸르알데히드 유도체의 제조방법
KR102157528B1 (ko) 2-아미노니코틴산 벤질에스테르 유도체의 제조 방법
JP2016145202A (ja) 新規なエポキシ化合物

Legal Events

Date Code Title Description
D11 Substantive examination requested

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D11-EXM-PA0201 (AS PROVIDED BY THE NATIONAL OFFICE)

P11 Amendment of application requested

Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P11-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13 Application amended

Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P13-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

Q12 Application published

Free format text: ST27 STATUS EVENT CODE: A-1-1-Q10-Q12-NAP-PG1501 (AS PROVIDED BY THE NATIONAL OFFICE)