CN1202638A - 光敏性记录材料的制备方法 - Google Patents
光敏性记录材料的制备方法 Download PDFInfo
- Publication number
- CN1202638A CN1202638A CN98106936A CN98106936A CN1202638A CN 1202638 A CN1202638 A CN 1202638A CN 98106936 A CN98106936 A CN 98106936A CN 98106936 A CN98106936 A CN 98106936A CN 1202638 A CN1202638 A CN 1202638A
- Authority
- CN
- China
- Prior art keywords
- layer
- preparation
- corona treatment
- photosensitive layer
- protective cover
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 66
- 238000004519 manufacturing process Methods 0.000 title abstract description 3
- 238000003851 corona treatment Methods 0.000 claims abstract description 54
- 230000001681 protective effect Effects 0.000 claims abstract description 51
- 238000002360 preparation method Methods 0.000 claims description 30
- 239000000758 substrate Substances 0.000 claims description 22
- 238000003475 lamination Methods 0.000 claims description 20
- 206010034972 Photosensitivity reaction Diseases 0.000 claims description 10
- 230000036211 photosensitivity Effects 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 9
- 229920002799 BoPET Polymers 0.000 claims description 6
- 239000005041 Mylar™ Substances 0.000 claims description 6
- 239000004952 Polyamide Substances 0.000 claims description 6
- 229920002647 polyamide Polymers 0.000 claims description 6
- 239000011230 binding agent Substances 0.000 claims description 4
- 239000002904 solvent Substances 0.000 claims description 4
- 230000004913 activation Effects 0.000 claims description 3
- 239000003505 polymerization initiator Substances 0.000 claims description 2
- 230000002441 reversible effect Effects 0.000 claims description 2
- 239000007787 solid Substances 0.000 claims description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 2
- 229920002554 vinyl polymer Polymers 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 238000010526 radical polymerization reaction Methods 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 6
- 239000002131 composite material Substances 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 150
- 239000011248 coating agent Substances 0.000 description 16
- 238000000576 coating method Methods 0.000 description 16
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 238000012360 testing method Methods 0.000 description 9
- 238000011010 flushing procedure Methods 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 238000003490 calendering Methods 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- 230000032798 delamination Effects 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000007767 bonding agent Substances 0.000 description 4
- 239000000155 melt Substances 0.000 description 4
- -1 polyethylene terephthalate Polymers 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 230000004927 fusion Effects 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- VOBUAPTXJKMNCT-UHFFFAOYSA-N 1-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound CCCCCC(OC(=O)C=C)OC(=O)C=C VOBUAPTXJKMNCT-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- VSKJLJHPAFKHBX-UHFFFAOYSA-N 2-methylbuta-1,3-diene;styrene Chemical compound CC(=C)C=C.C=CC1=CC=CC=C1.C=CC1=CC=CC=C1 VSKJLJHPAFKHBX-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 229920002633 Kraton (polymer) Polymers 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 239000002671 adjuvant Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000012174 chinese wax Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 125000005469 ethylenyl group Chemical group 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 230000010412 perfusion Effects 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000013047 polymeric layer Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 230000010076 replication Effects 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920000428 triblock copolymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/138—Corona discharge process
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19711696A DE19711696C1 (de) | 1997-03-20 | 1997-03-20 | Verfahren zum Herstellen eines photopolymerisierbaren Aufzeichungsmaterials |
| DE19711696.5 | 1997-03-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1202638A true CN1202638A (zh) | 1998-12-23 |
Family
ID=7824055
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN98106936A Pending CN1202638A (zh) | 1997-03-20 | 1998-03-20 | 光敏性记录材料的制备方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6326128B1 (enExample) |
| EP (1) | EP0866373B1 (enExample) |
| JP (1) | JP4179658B2 (enExample) |
| CN (1) | CN1202638A (enExample) |
| BR (1) | BR9801872A (enExample) |
| DE (2) | DE19711696C1 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0924568B1 (en) * | 1997-11-27 | 2002-10-09 | Agfa-Gevaert | Radiation-sensitive material containing a multilayer support material |
| US6327047B1 (en) * | 1999-01-22 | 2001-12-04 | Electronics For Imaging, Inc. | Automatic scanner calibration |
| US6268109B1 (en) * | 1999-10-12 | 2001-07-31 | E. I. Du Pont De Nemours And Company | Composite photosensitive element |
| IL133355A (en) * | 1999-12-07 | 2003-10-31 | Creo Il Ltd | Method and plate for digitally-imaged offset printing |
| DE10100514A1 (de) * | 2001-01-08 | 2002-07-11 | Basf Drucksysteme Gmbh | Verfahren zur Herstellung von thermisch vernetzten, lasergravierbaren Flexodruckelementen |
| US7063264B2 (en) | 2001-12-24 | 2006-06-20 | Digimarc Corporation | Covert variable information on identification documents and methods of making same |
| EP1319491B1 (de) * | 2001-12-14 | 2006-01-18 | Bayer MaterialScience AG | Verfahren zur Herstellung eines transparenten Flachfilms aus aliphatischem thermoplastischem Polyurethan |
| US7793846B2 (en) | 2001-12-24 | 2010-09-14 | L-1 Secure Credentialing, Inc. | Systems, compositions, and methods for full color laser engraving of ID documents |
| US7728048B2 (en) * | 2002-12-20 | 2010-06-01 | L-1 Secure Credentialing, Inc. | Increasing thermal conductivity of host polymer used with laser engraving methods and compositions |
| US7207494B2 (en) | 2001-12-24 | 2007-04-24 | Digimarc Corporation | Laser etched security features for identification documents and methods of making same |
| US7694887B2 (en) | 2001-12-24 | 2010-04-13 | L-1 Secure Credentialing, Inc. | Optically variable personalized indicia for identification documents |
| AU2002353174A1 (en) | 2001-12-24 | 2003-07-15 | Digimarc Id Systems, Llc | Laser engraving methods and compositions |
| AU2003221894A1 (en) | 2002-04-09 | 2003-10-27 | Digimarc Id Systems, Llc | Image processing techniques for printing identification cards and documents |
| US7824029B2 (en) | 2002-05-10 | 2010-11-02 | L-1 Secure Credentialing, Inc. | Identification card printer-assembler for over the counter card issuing |
| AU2003298731A1 (en) | 2002-11-26 | 2004-06-18 | Digimarc Id Systems | Systems and methods for managing and detecting fraud in image databases used with identification documents |
| DE10258668A1 (de) * | 2002-12-13 | 2004-06-24 | Basf Ag | Verfahren zur Herstellung von Flexodruckformen mittels Lasergravur unter Verwendung von fotopolymeren Flexodruckelementen und fotopolymerisierbares Flexodruckelementen |
| US7763179B2 (en) | 2003-03-21 | 2010-07-27 | Digimarc Corporation | Color laser engraving and digital watermarking |
| DE602004030434D1 (de) | 2003-04-16 | 2011-01-20 | L 1 Secure Credentialing Inc | Dreidimensionale datenspeicherung |
| US7682775B2 (en) * | 2004-03-05 | 2010-03-23 | E. I. Du Pont De Nemours And Company | Process for preparing a flexographic printing plate |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4072527A (en) | 1972-09-27 | 1978-02-07 | E. I. Du Pont De Nemours And Company | Oxygen barrier layers for photopolymerizable elements |
| JPS5535278B2 (enExample) * | 1974-03-18 | 1980-09-12 | ||
| US4162919A (en) | 1974-11-29 | 1979-07-31 | Basf Aktiengesellschaft | Laminates for the manufacture of flexographic printing plates using block copolymers |
| US4427759A (en) | 1982-01-21 | 1984-01-24 | E. I. Du Pont De Nemours And Company | Process for preparing an overcoated photopolymer printing plate |
| US4460675A (en) * | 1982-01-21 | 1984-07-17 | E. I. Du Pont De Nemours And Company | Process for preparing an overcoated photopolymer printing plate |
| NL8501128A (nl) * | 1985-04-18 | 1986-11-17 | Stamicarbon | Werkwijze voor het bereiden van polyolefinevoorwerpen met grote hechtkracht voor polymere matrices, alsmede voor het bereiden van versterkte matrixmaterialen. |
| EP0225676B1 (en) * | 1985-12-09 | 1994-07-06 | Nippon Paint Co., Ltd. | Photosensitive resin base printing material |
| AU589722B2 (en) | 1986-01-28 | 1989-10-19 | Minnesota Mining And Manufacturing Company | Imageable material and process |
| DE3825782A1 (de) | 1987-07-30 | 1989-02-09 | Hercules Inc | Verfahren zur herstellung eines trockenfilm-photoresists |
| JP2747837B2 (ja) * | 1989-03-10 | 1998-05-06 | 富士写真フイルム株式会社 | 支持体の帯電方法 |
| JPH03161753A (ja) | 1989-11-20 | 1991-07-11 | Fuji Photo Film Co Ltd | 湿し水不要感光性平版印刷版 |
| US5175072A (en) * | 1990-07-26 | 1992-12-29 | Minnesota Mining And Manufacturing Company | Flexographic printing plate process |
| DE4202282A1 (de) * | 1991-01-29 | 1992-08-20 | Fuji Photo Film Co Ltd | Lichtempfindliches uebertragungsmaterial und bilderzeugungsverfahren |
| JPH05142777A (ja) | 1991-11-21 | 1993-06-11 | Hitachi Chem Co Ltd | 感光性積層体及びその製造方法 |
| DE4203608A1 (de) * | 1992-02-07 | 1993-08-12 | Basf Lacke & Farben | Verfahren zur photochemischen oder mechanischen herstellung flexibler druckformen |
| US5292617A (en) * | 1992-03-31 | 1994-03-08 | E. I. Du Pont De Nemours And Company | Photosensitive element having support with adjustable adhesion |
| DE4300856A1 (de) * | 1993-01-15 | 1994-07-21 | Basf Lacke & Farben | Lichtempfindliches Aufzeichnungselement und Verfahren zur Herstellung einer Reliefdruckplatte |
| US5679485A (en) * | 1993-03-31 | 1997-10-21 | Nippon Zeon Co., Ltd. | Photosensitive composition, photosensitive rubber plate and process for producing same, and flexographic plate and process for producing same |
| US5425980A (en) * | 1994-02-22 | 1995-06-20 | Eastman Kodak Company | Use of glow discharge treatment to promote adhesion of aqueous coats to substrate |
| DE4415607A1 (de) * | 1994-05-04 | 1995-11-09 | Hoechst Ag | Lichtempfindliches Material und Verfahren zur Herstellung von Flachdruckplatten |
| US5698363A (en) | 1995-07-10 | 1997-12-16 | Konica Corporation | Image forming method |
| US5888697A (en) * | 1996-07-03 | 1999-03-30 | E. I. Du Pont De Nemours And Company | Flexographic printing element having a powder layer |
| US6074807A (en) * | 1998-10-15 | 2000-06-13 | Eastman Kodak Company | Imaging element containing an electrically-conductive layer containing acicular metal-containing particles and a transparent magnetic recording layer |
-
1997
- 1997-03-20 DE DE19711696A patent/DE19711696C1/de not_active Expired - Fee Related
-
1998
- 1998-03-17 US US09/042,573 patent/US6326128B1/en not_active Expired - Fee Related
- 1998-03-18 DE DE59804280T patent/DE59804280D1/de not_active Expired - Fee Related
- 1998-03-18 EP EP98104902A patent/EP0866373B1/de not_active Expired - Lifetime
- 1998-03-20 CN CN98106936A patent/CN1202638A/zh active Pending
- 1998-03-20 JP JP07265998A patent/JP4179658B2/ja not_active Expired - Fee Related
- 1998-03-20 BR BR9801872-8A patent/BR9801872A/pt not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| EP0866373A1 (de) | 1998-09-23 |
| BR9801872A (pt) | 2001-03-20 |
| DE59804280D1 (de) | 2002-07-11 |
| US6326128B1 (en) | 2001-12-04 |
| DE19711696C1 (de) | 1998-11-12 |
| JPH1124242A (ja) | 1999-01-29 |
| JP4179658B2 (ja) | 2008-11-12 |
| EP0866373B1 (de) | 2002-06-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C01 | Deemed withdrawal of patent application (patent law 1993) | ||
| WD01 | Invention patent application deemed withdrawn after publication |