CN119895335A - 制造再生显影液的方法以及适合于该方法的光敏树脂组合物 - Google Patents

制造再生显影液的方法以及适合于该方法的光敏树脂组合物 Download PDF

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Publication number
CN119895335A
CN119895335A CN202380067369.1A CN202380067369A CN119895335A CN 119895335 A CN119895335 A CN 119895335A CN 202380067369 A CN202380067369 A CN 202380067369A CN 119895335 A CN119895335 A CN 119895335A
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CN
China
Prior art keywords
photosensitive resin
water
resin composition
development
developer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202380067369.1A
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English (en)
Chinese (zh)
Inventor
芳本和也
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongyang Fangai Muxi Co ltd
Original Assignee
Dongyang Fangai Muxi Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongyang Fangai Muxi Co ltd filed Critical Dongyang Fangai Muxi Co ltd
Publication of CN119895335A publication Critical patent/CN119895335A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3092—Recovery of material; Waste processing

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CN202380067369.1A 2022-09-21 2023-05-18 制造再生显影液的方法以及适合于该方法的光敏树脂组合物 Pending CN119895335A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022150200 2022-09-21
JP2022-150200 2022-09-21
PCT/JP2023/018636 WO2024062680A1 (ja) 2022-09-21 2023-05-18 再生現像液を製造する方法、及びその方法に好適な感光性樹脂組成物

Publications (1)

Publication Number Publication Date
CN119895335A true CN119895335A (zh) 2025-04-25

Family

ID=90454222

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202380067369.1A Pending CN119895335A (zh) 2022-09-21 2023-05-18 制造再生显影液的方法以及适合于该方法的光敏树脂组合物

Country Status (4)

Country Link
EP (1) EP4592754A1 (https=)
JP (1) JPWO2024062680A1 (https=)
CN (1) CN119895335A (https=)
WO (1) WO2024062680A1 (https=)

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61128243A (ja) 1984-11-28 1986-06-16 Asahi Chem Ind Co Ltd 感光性樹脂組成物
JPH01300246A (ja) 1988-05-28 1989-12-04 Nippon Paint Co Ltd フレキソ印刷用感光性樹脂組成物
JP3240769B2 (ja) 1992-10-02 2001-12-25 ジェイエスアール株式会社 感光性樹脂組成物
JP3138553B2 (ja) 1992-10-30 2001-02-26 日本ペイント株式会社 フレキソ製版工程における現像液循環方法及びその方法を実施するための装置
JPH07134411A (ja) 1993-11-10 1995-05-23 Japan Synthetic Rubber Co Ltd 感光性樹脂組成物
CA2430101C (en) 2000-11-28 2009-05-26 Asahi Kasei Kabushiki Kaisha Improved photosensitive resin for flexographic printing developable with an aqueous developer solution
JP2004066118A (ja) * 2002-08-07 2004-03-04 Asahi Kasei Chemicals Corp 感光性樹脂版現像廃液の処理方法
JP5334996B2 (ja) * 2008-12-18 2013-11-06 旭化成イーマテリアルズ株式会社 アブレーション層、感光性樹脂構成体、当該感光性樹脂構成体を用いた凸版印刷版の製造方法
JP5688917B2 (ja) 2010-04-23 2015-03-25 旭化成イーマテリアルズ株式会社 現像装置、現像液の処理方法、印刷版の製造装置、及びろ過装置
JP2018054969A (ja) 2016-09-30 2018-04-05 住友理工株式会社 印刷版の現像方法および現像装置
EP3605232B1 (en) * 2017-03-31 2021-05-05 FUJIFILM Corporation Treatment method and treatment device

Also Published As

Publication number Publication date
EP4592754A1 (en) 2025-07-30
WO2024062680A1 (ja) 2024-03-28
JPWO2024062680A1 (https=) 2024-03-28

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