JPWO2024062680A1 - - Google Patents
Info
- Publication number
- JPWO2024062680A1 JPWO2024062680A1 JP2024501238A JP2024501238A JPWO2024062680A1 JP WO2024062680 A1 JPWO2024062680 A1 JP WO2024062680A1 JP 2024501238 A JP2024501238 A JP 2024501238A JP 2024501238 A JP2024501238 A JP 2024501238A JP WO2024062680 A1 JPWO2024062680 A1 JP WO2024062680A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3092—Recovery of material; Waste processing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022150200 | 2022-09-21 | ||
| PCT/JP2023/018636 WO2024062680A1 (ja) | 2022-09-21 | 2023-05-18 | 再生現像液を製造する方法、及びその方法に好適な感光性樹脂組成物 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024062680A1 true JPWO2024062680A1 (https=) | 2024-03-28 |
Family
ID=90454222
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024501238A Pending JPWO2024062680A1 (https=) | 2022-09-21 | 2023-05-18 |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP4592754A1 (https=) |
| JP (1) | JPWO2024062680A1 (https=) |
| CN (1) | CN119895335A (https=) |
| WO (1) | WO2024062680A1 (https=) |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61128243A (ja) | 1984-11-28 | 1986-06-16 | Asahi Chem Ind Co Ltd | 感光性樹脂組成物 |
| JPH01300246A (ja) | 1988-05-28 | 1989-12-04 | Nippon Paint Co Ltd | フレキソ印刷用感光性樹脂組成物 |
| JP3240769B2 (ja) | 1992-10-02 | 2001-12-25 | ジェイエスアール株式会社 | 感光性樹脂組成物 |
| JP3138553B2 (ja) | 1992-10-30 | 2001-02-26 | 日本ペイント株式会社 | フレキソ製版工程における現像液循環方法及びその方法を実施するための装置 |
| JPH07134411A (ja) | 1993-11-10 | 1995-05-23 | Japan Synthetic Rubber Co Ltd | 感光性樹脂組成物 |
| CA2430101C (en) | 2000-11-28 | 2009-05-26 | Asahi Kasei Kabushiki Kaisha | Improved photosensitive resin for flexographic printing developable with an aqueous developer solution |
| JP2004066118A (ja) * | 2002-08-07 | 2004-03-04 | Asahi Kasei Chemicals Corp | 感光性樹脂版現像廃液の処理方法 |
| JP5334996B2 (ja) * | 2008-12-18 | 2013-11-06 | 旭化成イーマテリアルズ株式会社 | アブレーション層、感光性樹脂構成体、当該感光性樹脂構成体を用いた凸版印刷版の製造方法 |
| JP5688917B2 (ja) | 2010-04-23 | 2015-03-25 | 旭化成イーマテリアルズ株式会社 | 現像装置、現像液の処理方法、印刷版の製造装置、及びろ過装置 |
| JP2018054969A (ja) | 2016-09-30 | 2018-04-05 | 住友理工株式会社 | 印刷版の現像方法および現像装置 |
| EP3605232B1 (en) * | 2017-03-31 | 2021-05-05 | FUJIFILM Corporation | Treatment method and treatment device |
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2023
- 2023-05-18 JP JP2024501238A patent/JPWO2024062680A1/ja active Pending
- 2023-05-18 CN CN202380067369.1A patent/CN119895335A/zh active Pending
- 2023-05-18 WO PCT/JP2023/018636 patent/WO2024062680A1/ja not_active Ceased
- 2023-05-18 EP EP23867811.4A patent/EP4592754A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| EP4592754A1 (en) | 2025-07-30 |
| CN119895335A (zh) | 2025-04-25 |
| WO2024062680A1 (ja) | 2024-03-28 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20240110 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20250523 |
|
| AA64 | Notification of invalidation of claim of internal priority (with term) |
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| A621 | Written request for application examination |
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