CN1193116C - 黑色钌电镀液 - Google Patents
黑色钌电镀液 Download PDFInfo
- Publication number
- CN1193116C CN1193116C CNB008015945A CN00801594A CN1193116C CN 1193116 C CN1193116 C CN 1193116C CN B008015945 A CNB008015945 A CN B008015945A CN 00801594 A CN00801594 A CN 00801594A CN 1193116 C CN1193116 C CN 1193116C
- Authority
- CN
- China
- Prior art keywords
- black
- ruthenium
- soluton
- sulfocompound
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
5安时/升 | 10安时/升 | 15安时/升 | 20安时/升 | 25安时/升 | 30安时/升 | |
实施例1 | 黑色膜 | 黑色膜 | 黑色膜 | 黑色膜 | 黑色膜 | 黑色膜 |
实施例2 | 黑色膜 | 黑色膜补充硫酸羟基胺5克/升 | 黑色膜补充硫酸羟基胺5克/升 | 黑色膜补充硫酸羟基胺5克/升 | 黑色膜补充硫酸羟基胺5克/升 | 黑色膜补充硫酸羟基胺5克/升 |
比较例 | 浅的黑色膜 | 添加尿素1.5克/升稍带黑色的银色膜 | 添加尿素1.5克/升稍带黑色的银色膜 | 添加尿素1.5克/升稍带黑色的银色膜 | 添加尿素3克/升无光泽的灰茶色膜电镀液混浊 | 添加尿素3克/升无光泽的灰茶色膜电镀液混浊 |
Claims (2)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP219684/1999 | 1999-08-03 | ||
JP21968499A JP3302949B2 (ja) | 1999-08-03 | 1999-08-03 | 黒色ルテニウムめっき液 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1319148A CN1319148A (zh) | 2001-10-24 |
CN1193116C true CN1193116C (zh) | 2005-03-16 |
Family
ID=16739360
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB008015945A Expired - Fee Related CN1193116C (zh) | 1999-08-03 | 2000-05-26 | 黑色钌电镀液 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP3302949B2 (zh) |
KR (1) | KR100392694B1 (zh) |
CN (1) | CN1193116C (zh) |
WO (1) | WO2001011113A1 (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101575694B (zh) * | 2009-03-13 | 2011-04-20 | 宜兴市科兴合金材料有限公司 | 一种超大直径钼圆片表面渗钌工艺 |
CN104040033A (zh) * | 2011-06-17 | 2014-09-10 | 优美科电镀技术有限公司 | 电解液及其用于沉积黑钌镀层的用途及以此方式获得的镀层 |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6773573B2 (en) * | 2001-10-02 | 2004-08-10 | Shipley Company, L.L.C. | Plating bath and method for depositing a metal layer on a substrate |
US6911068B2 (en) * | 2001-10-02 | 2005-06-28 | Shipley Company, L.L.C. | Plating bath and method for depositing a metal layer on a substrate |
US6736954B2 (en) * | 2001-10-02 | 2004-05-18 | Shipley Company, L.L.C. | Plating bath and method for depositing a metal layer on a substrate |
EP1308541A1 (en) * | 2001-10-04 | 2003-05-07 | Shipley Company LLC | Plating bath and method for depositing a metal layer on a substrate |
US6699385B2 (en) | 2001-10-17 | 2004-03-02 | Chevron U.S.A. Inc. | Process for converting waxy feeds into low haze heavy base oil |
DE502007002036D1 (de) * | 2007-03-28 | 2009-12-31 | Umicore Galvanotechnik Gmbh | Elektolyt und Verfahren zur Abscheidung von dekoraium |
CN101684565B (zh) * | 2009-08-10 | 2012-03-21 | 成都宏明双新科技股份有限公司 | 一种镀黑钌的工艺 |
CN104342731A (zh) * | 2013-07-23 | 2015-02-11 | 深圳中宇昭日科技有限公司 | 一种半导体钼材电镀钌方法 |
CN106148896B (zh) * | 2016-07-29 | 2019-10-15 | 泉州市宕存工业设计有限公司 | 一种钼基片镀厚钌的方法 |
US10329683B2 (en) | 2016-11-03 | 2019-06-25 | Lam Research Corporation | Process for optimizing cobalt electrofill using sacrificial oxidants |
CN107021464B (zh) * | 2017-06-07 | 2019-10-15 | 王晓波 | 一种[μ-氮-双(四氯一水合钌)]酸钾的合成方法以及电子元器件表面镀钌的方法 |
CN109234757B (zh) * | 2018-10-18 | 2020-07-28 | 任杰 | 一种均匀稳定的钌铱双金属掺杂钛电极的制备方法 |
KR102313739B1 (ko) * | 2019-08-23 | 2021-10-18 | 정광미 | 루테늄을 포함하는 합금 도금액 조성물 및 이를 이용한 루테늄 도금 방법 |
CN110965088A (zh) * | 2019-08-27 | 2020-04-07 | 周大福珠宝金行(深圳)有限公司 | 一种黄金的复古工艺以及复古黄金 |
JP2023056187A (ja) | 2021-10-07 | 2023-04-19 | Eeja株式会社 | PtRu合金めっき液及びPtRu合金膜のめっき方法 |
CN115261937A (zh) * | 2022-03-22 | 2022-11-01 | 东莞市弘裕表面处理技术有限公司 | 钌镀液及其制备方法、镀钌方法、钌镀层及含有其的器件 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06146055A (ja) * | 1992-11-06 | 1994-05-27 | Japan Energy Corp | ルテニウムめっき液 |
JPH06146056A (ja) * | 1992-11-06 | 1994-05-27 | Japan Energy Corp | ルテニウムめっき液 |
JPH06146054A (ja) * | 1992-11-06 | 1994-05-27 | Japan Energy Corp | ルテニウムめっき液 |
JPH1150295A (ja) * | 1997-07-28 | 1999-02-23 | Daiwa Kasei Kenkyusho:Kk | めっき浴 |
DE19741990C1 (de) * | 1997-09-24 | 1999-04-29 | Degussa | Elektrolyt zur galvanischen Abscheidung von spannungsarmen, rißfesten Rutheniumschichten, Verfahren zur Herstellung und Verwendung |
-
1999
- 1999-08-03 JP JP21968499A patent/JP3302949B2/ja not_active Expired - Lifetime
-
2000
- 2000-05-26 CN CNB008015945A patent/CN1193116C/zh not_active Expired - Fee Related
- 2000-05-26 WO PCT/JP2000/003395 patent/WO2001011113A1/ja active Application Filing
- 2000-05-26 KR KR10-2001-7004063A patent/KR100392694B1/ko not_active IP Right Cessation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101575694B (zh) * | 2009-03-13 | 2011-04-20 | 宜兴市科兴合金材料有限公司 | 一种超大直径钼圆片表面渗钌工艺 |
CN104040033A (zh) * | 2011-06-17 | 2014-09-10 | 优美科电镀技术有限公司 | 电解液及其用于沉积黑钌镀层的用途及以此方式获得的镀层 |
CN104040033B (zh) * | 2011-06-17 | 2017-12-19 | 优美科电镀技术有限公司 | 电解液及其用于沉积黑钌镀层的用途及以此方式获得的镀层 |
Also Published As
Publication number | Publication date |
---|---|
CN1319148A (zh) | 2001-10-24 |
KR100392694B1 (ko) | 2003-07-28 |
JP2001049485A (ja) | 2001-02-20 |
WO2001011113A1 (fr) | 2001-02-15 |
KR20010073198A (ko) | 2001-07-31 |
JP3302949B2 (ja) | 2002-07-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: NIPPON MINING AND METALS CO., LTD. Free format text: FORMER NAME OR ADDRESS: NIKKO MATERIALS CO. LTD |
|
CP03 | Change of name, title or address |
Address after: Tokyo, Japan, Japan Patentee after: Nippon Mining & Metals Co., Ltd. Address before: Tokyo, Japan, Japan Patentee before: Nikko Materials Company, Limited |
|
C56 | Change in the name or address of the patentee |
Owner name: JX NIPPON MINING + METALS CORP. Free format text: FORMER NAME: NIPPON MINING + METALS CO., LTD. |
|
CP01 | Change in the name or title of a patent holder |
Address after: Tokyo, Japan, Japan Patentee after: JX Nippon Mining & Metals Corporation Address before: Tokyo, Japan, Japan Patentee before: Nippon Mining & Metals Co., Ltd. |
|
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20050316 Termination date: 20160526 |
|
CF01 | Termination of patent right due to non-payment of annual fee |