CN117652017A - 用于炉加热器的闸门 - Google Patents
用于炉加热器的闸门 Download PDFInfo
- Publication number
- CN117652017A CN117652017A CN202380011076.1A CN202380011076A CN117652017A CN 117652017 A CN117652017 A CN 117652017A CN 202380011076 A CN202380011076 A CN 202380011076A CN 117652017 A CN117652017 A CN 117652017A
- Authority
- CN
- China
- Prior art keywords
- shutter
- ball spline
- heater
- base frame
- lifting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000498 cooling water Substances 0.000 claims abstract description 23
- 230000003028 elevating effect Effects 0.000 claims description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 238000001816 cooling Methods 0.000 claims description 8
- 239000004065 semiconductor Substances 0.000 abstract description 8
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 238000000034 method Methods 0.000 description 16
- 230000008569 process Effects 0.000 description 16
- 235000012431 wafers Nutrition 0.000 description 14
- 230000004888 barrier function Effects 0.000 description 13
- 230000008878 coupling Effects 0.000 description 10
- 238000010168 coupling process Methods 0.000 description 10
- 238000005859 coupling reaction Methods 0.000 description 10
- 230000000694 effects Effects 0.000 description 9
- 230000000903 blocking effect Effects 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 238000009413 insulation Methods 0.000 description 4
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 4
- 230000003139 buffering effect Effects 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 3
- 238000003466 welding Methods 0.000 description 3
- 238000000137 annealing Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2022-0082550 | 2022-07-05 | ||
| KR1020220082550A KR102447175B1 (ko) | 2022-07-05 | 2022-07-05 | 퍼니스 히터용 셔터 |
| PCT/KR2023/008809 WO2024010262A1 (ko) | 2022-07-05 | 2023-06-26 | 퍼니스 히터용 셔터 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117652017A true CN117652017A (zh) | 2024-03-05 |
Family
ID=83452473
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202380011076.1A Pending CN117652017A (zh) | 2022-07-05 | 2023-06-26 | 用于炉加热器的闸门 |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR102447175B1 (ko) |
| CN (1) | CN117652017A (ko) |
| WO (1) | WO2024010262A1 (ko) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102447175B1 (ko) * | 2022-07-05 | 2022-09-26 | 주식회사제이에스솔루션 | 퍼니스 히터용 셔터 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0631140U (ja) * | 1992-09-29 | 1994-04-22 | 神鋼電機株式会社 | 表面処理装置 |
| JP4574926B2 (ja) * | 1999-09-13 | 2010-11-04 | 東京エレクトロン株式会社 | 真空処理装置 |
| KR20030004939A (ko) | 2001-07-07 | 2003-01-15 | 삼성전자 주식회사 | 퍼니스의 로그셔터 |
| KR20050068303A (ko) | 2003-12-30 | 2005-07-05 | 동부아남반도체 주식회사 | 수직형 퍼니스의 자동 셔터장치 |
| JP2006093201A (ja) * | 2004-09-21 | 2006-04-06 | Hitachi Kokusai Electric Inc | 半導体製造装置 |
| KR20210078678A (ko) * | 2019-12-19 | 2021-06-29 | 주식회사 원익아이피에스 | 기판처리장치 |
| KR102447175B1 (ko) * | 2022-07-05 | 2022-09-26 | 주식회사제이에스솔루션 | 퍼니스 히터용 셔터 |
-
2022
- 2022-07-05 KR KR1020220082550A patent/KR102447175B1/ko active IP Right Grant
-
2023
- 2023-06-26 CN CN202380011076.1A patent/CN117652017A/zh active Pending
- 2023-06-26 WO PCT/KR2023/008809 patent/WO2024010262A1/ko unknown
Also Published As
| Publication number | Publication date |
|---|---|
| KR102447175B1 (ko) | 2022-09-26 |
| WO2024010262A1 (ko) | 2024-01-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |