CN1161655C - 构造的着色有机材料、按图形掩蔽的方法和制备图形黑色基质的方法 - Google Patents

构造的着色有机材料、按图形掩蔽的方法和制备图形黑色基质的方法 Download PDF

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Publication number
CN1161655C
CN1161655C CNB988040328A CN98804032A CN1161655C CN 1161655 C CN1161655 C CN 1161655C CN B988040328 A CNB988040328 A CN B988040328A CN 98804032 A CN98804032 A CN 98804032A CN 1161655 C CN1161655 C CN 1161655C
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CN
China
Prior art keywords
alkyl
material according
pigments
hydrogen
pigment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB988040328A
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English (en)
Chinese (zh)
Other versions
CN1252135A (zh
Inventor
U�����
U·谢德利
E·廷格莱
-
V·哈尔-古勒
G·德基策尔
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BASF Schweiz AG
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Ciba Spezialitaetenchemie Holding AG
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Publication of CN1252135A publication Critical patent/CN1252135A/zh
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Publication of CN1161655C publication Critical patent/CN1161655C/zh
Anticipated expiration legal-status Critical
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C7/00—Multicolour photographic processes or agents therefor; Regeneration of such processing agents; Photosensitive materials for multicolour processes
    • G03C7/04—Additive processes using colour screens; Materials therefor; Preparing or processing such materials
    • G03C7/06—Manufacture of colour screens
    • G03C7/10—Manufacture of colour screens with regular areas of colour, e.g. bands, lines, dots
    • G03C7/12—Manufacture of colour screens with regular areas of colour, e.g. bands, lines, dots by photo-exposure
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B29/00—Monoazo dyes prepared by diazotising and coupling
    • C09B29/32—Monoazo dyes prepared by diazotising and coupling from coupling components containing a reactive methylene group
    • C09B29/33—Aceto- or benzoylacetylarylides
    • C09B29/335—Aceto- or benzoylacetylarylides free of acid groups
    • C09B29/338—Heterocyclic arylides, e.g. acetoacetylaminobenzimidazolone
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B33/00—Disazo and polyazo dyes of the types A->K<-B, A->B->K<-C, or the like, prepared by diazotising and coupling
    • C09B33/02—Disazo dyes
    • C09B33/153—Disazo dyes in which the coupling component is a bis-(aceto-acetyl amide) or a bis-(benzoyl-acetylamide)
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B35/00—Disazo and polyazo dyes of the type A<-D->B prepared by diazotising and coupling
    • C09B35/02—Disazo dyes
    • C09B35/021—Disazo dyes characterised by two coupling components of the same type
    • C09B35/035—Disazo dyes characterised by two coupling components of the same type in which the coupling component containing an activated methylene group
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0033—Blends of pigments; Mixtured crystals; Solid solutions
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0071—Process features in the making of dyestuff preparations; Dehydrating agents; Dispersing agents; Dustfree compositions
    • C09B67/0077—Preparations with possibly reduced vat, sulfur or indigo dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Manufacturing & Machinery (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Optical Filters (AREA)
  • Indole Compounds (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
CNB988040328A 1997-04-09 1998-03-26 构造的着色有机材料、按图形掩蔽的方法和制备图形黑色基质的方法 Expired - Fee Related CN1161655C (zh)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
CH823/1997 1997-04-09
CH82297 1997-04-09
CH822/1997 1997-04-09
CH82397 1997-04-09
CH1573/1997 1997-06-30
CH157397 1997-06-30
CH289697 1997-12-16
CH2896/1997 1997-12-16

Publications (2)

Publication Number Publication Date
CN1252135A CN1252135A (zh) 2000-05-03
CN1161655C true CN1161655C (zh) 2004-08-11

Family

ID=27428013

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB988040328A Expired - Fee Related CN1161655C (zh) 1997-04-09 1998-03-26 构造的着色有机材料、按图形掩蔽的方法和制备图形黑色基质的方法

Country Status (8)

Country Link
US (2) US6010567A (https=)
EP (1) EP0974075B1 (https=)
JP (1) JP2002512647A (https=)
KR (1) KR20010006127A (https=)
CN (1) CN1161655C (https=)
AU (1) AU7211498A (https=)
DE (1) DE69807203T2 (https=)
WO (1) WO1998045757A1 (https=)

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DE69418826T2 (de) * 1993-11-22 1999-10-21 Ciba Specialty Chemicals Holding Inc., Basel Zusammensetzungen zur Herstellung strukturierter Farbbilder und deren Anwendung
US6026207A (en) * 1997-05-21 2000-02-15 Alcatel Black appearing color coating for optical fiber and method using same
WO2000017275A1 (de) 1998-09-21 2000-03-30 Ciba Specialty Chemicals Holding Inc. Substituierte phthalocyanine
US6423839B1 (en) * 1999-04-16 2002-07-23 Ciba Specialty Chemicals Corporation Mixed color pigment precursors and their use
ES2370485T3 (es) 1999-07-09 2011-12-16 Basf Se C.i. pigmento red 254 con propiedades colorantes mejoradas.
KR100455652B1 (ko) 1999-09-06 2004-11-06 삼성전자주식회사 포지티브형 포토레지스트 막의 제조방법
CA2474606A1 (en) * 2002-03-25 2003-10-02 Fridolin Baebler Black pigment compositions
DE10303913A1 (de) * 2003-01-31 2004-08-12 Quiss Gmbh Identifizierungsvorrichtung
KR20060028434A (ko) * 2003-06-27 2006-03-29 시바 스페셜티 케미칼스 홀딩 인크. 저장 밀도가 높은 광학 기록 재료
US7077898B2 (en) * 2003-07-17 2006-07-18 Ciba Specialty Chemicals Corporation Black pigment compositions
CN100379205C (zh) * 2003-08-11 2008-04-02 华为技术有限公司 交换机加速arp表项老化的方法
JP4621528B2 (ja) * 2005-03-31 2011-01-26 富士フイルム株式会社 可溶性顔料前駆体および有機顔料の製造方法
CN101568601A (zh) * 2006-12-14 2009-10-28 西巴控股有限公司 新的棒状形式的c.i.颜料紫37
GB0722779D0 (en) * 2007-11-20 2008-01-02 Sterix Ltd Compound
JP2010083982A (ja) 2008-09-30 2010-04-15 Fujifilm Corp 有機顔料微粒子の製造方法、それにより得られる有機顔料微粒子、その分散液、及びその組成物
KR101935644B1 (ko) 2008-10-31 2019-01-04 바스프 에스이 유기 전계 효과 트랜지스터에 사용하기 위한 디케토피롤로피롤 중합체
CN102449030B (zh) 2009-05-27 2014-06-25 巴斯夫欧洲公司 用于有机半导体器件中的二酮基吡咯并吡咯聚合物
JP2013533895A (ja) 2010-05-19 2013-08-29 ビーエーエスエフ ソシエタス・ヨーロピア 有機半導体デバイスにおいて使用するためのジケトピロロピロール系ポリマー
WO2012017005A2 (en) 2010-08-05 2012-02-09 Basf Se Polymers based on benzodiones
EP2723750B1 (en) 2011-06-22 2022-08-10 CLAP Co., Ltd. Diketopyrrolopyrrole oligomers for use in organic semiconductor devices
US8544990B2 (en) 2011-07-29 2013-10-01 Videojet Technologies Inc. Pigmented ink jet ink composition
JP6296980B2 (ja) 2011-09-02 2018-03-20 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ ジケトピロロピロールオリゴマー、及びジケトピロロピロールオリゴマーを含む組成物
CN103906786B (zh) 2011-10-04 2017-06-09 巴斯夫欧洲公司 基于苯并二酮的聚合物
KR20150082473A (ko) 2012-11-07 2015-07-15 바스프 에스이 나프토디온 기재 중합체
JP6162984B2 (ja) * 2013-03-14 2017-07-12 山本化成株式会社 感熱発色性組成物及び該組成物を用いてなる感熱記録材料
CN103451998B (zh) * 2013-09-18 2015-12-09 潍坊恒联特种纸有限公司 一种彩色无尘纸表面施胶染色工艺
PT3772529T (pt) * 2019-08-05 2023-07-18 Sanko Tekstil Isletmeleri San Ve Tic As Corantes sensíveis ao ph para materiais têxteis, um processo para a sua preparação e utilizações dos mesmos

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Also Published As

Publication number Publication date
AU7211498A (en) 1998-10-30
DE69807203D1 (de) 2002-09-19
US6165681A (en) 2000-12-26
CN1252135A (zh) 2000-05-03
EP0974075A1 (en) 2000-01-26
US6010567A (en) 2000-01-04
KR20010006127A (ko) 2001-01-26
JP2002512647A (ja) 2002-04-23
WO1998045757A1 (en) 1998-10-15
DE69807203T2 (de) 2003-05-28
EP0974075B1 (en) 2002-08-14

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