KR20010006127A - 흑색으로 착색되고 구조화된 고분자량 물질 - Google Patents

흑색으로 착색되고 구조화된 고분자량 물질 Download PDF

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Publication number
KR20010006127A
KR20010006127A KR1019997009205A KR19997009205A KR20010006127A KR 20010006127 A KR20010006127 A KR 20010006127A KR 1019997009205 A KR1019997009205 A KR 1019997009205A KR 19997009205 A KR19997009205 A KR 19997009205A KR 20010006127 A KR20010006127 A KR 20010006127A
Authority
KR
South Korea
Prior art keywords
formula
alkyl
hydrogen
pigment
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
KR1019997009205A
Other languages
English (en)
Korean (ko)
Inventor
쉐델리울리치
팅구엘리에릭
할-고울레베로니크
데케이처게라르두스
Original Assignee
에프. 아. 프라저
시바 스페셜티 케미칼스 홀딩 인크.
에른스트 알테르 (에. 알테르)
한스 페터 비틀린 (하. 페. 비틀린)
피. 랍 보프
브이. 스펜글러
페. 아에글러
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 에프. 아. 프라저, 시바 스페셜티 케미칼스 홀딩 인크., 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러 filed Critical 에프. 아. 프라저
Publication of KR20010006127A publication Critical patent/KR20010006127A/ko
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54Absorbers, e.g. of opaque materials
    • G03F1/56Organic absorbers, e.g. of photo-resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C7/00Multicolour photographic processes or agents therefor; Regeneration of such processing agents; Photosensitive materials for multicolour processes
    • G03C7/04Additive processes using colour screens; Materials therefor; Preparing or processing such materials
    • G03C7/06Manufacture of colour screens
    • G03C7/10Manufacture of colour screens with regular areas of colour, e.g. bands, lines, dots
    • G03C7/12Manufacture of colour screens with regular areas of colour, e.g. bands, lines, dots by photo-exposure
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B29/00Monoazo dyes prepared by diazotising and coupling
    • C09B29/32Monoazo dyes prepared by diazotising and coupling from coupling components containing a reactive methylene group
    • C09B29/33Aceto- or benzoylacetylarylides
    • C09B29/335Aceto- or benzoylacetylarylides free of acid groups
    • C09B29/338Heterocyclic arylides, e.g. acetoacetylaminobenzimidazolone
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B33/00Disazo and polyazo dyes of the types A->K<-B, A->B->K<-C, or the like, prepared by diazotising and coupling
    • C09B33/02Disazo dyes
    • C09B33/153Disazo dyes in which the coupling component is a bis-(aceto-acetyl amide) or a bis-(benzoyl-acetylamide)
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B35/00Disazo and polyazo dyes of the type A<-D->B prepared by diazotising and coupling
    • C09B35/02Disazo dyes
    • C09B35/021Disazo dyes characterised by two coupling components of the same type
    • C09B35/035Disazo dyes characterised by two coupling components of the same type in which the coupling component containing an activated methylene group
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0033Blends of pigments; Mixtured crystals; Solid solutions
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0071Process features in the making of dyestuff preparations; Dehydrating agents; Dispersing agents; Dustfree compositions
    • C09B67/0077Preparations with possibly reduced vat, sulfur or indigo dyes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Optical Filters (AREA)
  • Indole Compounds (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
KR1019997009205A 1997-04-09 1998-03-26 흑색으로 착색되고 구조화된 고분자량 물질 Abandoned KR20010006127A (ko)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
CH82397 1997-04-09
CH823/97 1997-04-09
CH822/97 1997-04-09
CH82297 1997-04-09
CH157397 1997-06-30
CH1573/97 1997-06-30
CH2896/97 1997-12-16
CH289697 1997-12-16

Publications (1)

Publication Number Publication Date
KR20010006127A true KR20010006127A (ko) 2001-01-26

Family

ID=27428013

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019997009205A Abandoned KR20010006127A (ko) 1997-04-09 1998-03-26 흑색으로 착색되고 구조화된 고분자량 물질

Country Status (8)

Country Link
US (2) US6010567A (https=)
EP (1) EP0974075B1 (https=)
JP (1) JP2002512647A (https=)
KR (1) KR20010006127A (https=)
CN (1) CN1161655C (https=)
AU (1) AU7211498A (https=)
DE (1) DE69807203T2 (https=)
WO (1) WO1998045757A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100379205C (zh) * 2003-08-11 2008-04-02 华为技术有限公司 交换机加速arp表项老化的方法

Families Citing this family (26)

* Cited by examiner, † Cited by third party
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DE69418826T2 (de) * 1993-11-22 1999-10-21 Ciba Specialty Chemicals Holding Inc., Basel Zusammensetzungen zur Herstellung strukturierter Farbbilder und deren Anwendung
US6026207A (en) * 1997-05-21 2000-02-15 Alcatel Black appearing color coating for optical fiber and method using same
AU5975799A (en) 1998-09-21 2000-04-10 Ciba Specialty Chemicals Holding Inc. Substituted phthalocyanine
US6423839B1 (en) * 1999-04-16 2002-07-23 Ciba Specialty Chemicals Corporation Mixed color pigment precursors and their use
ES2370485T3 (es) * 1999-07-09 2011-12-16 Basf Se C.i. pigmento red 254 con propiedades colorantes mejoradas.
KR100455652B1 (ko) 1999-09-06 2004-11-06 삼성전자주식회사 포지티브형 포토레지스트 막의 제조방법
CA2474606A1 (en) * 2002-03-25 2003-10-02 Fridolin Baebler Black pigment compositions
DE10303913A1 (de) * 2003-01-31 2004-08-12 Quiss Gmbh Identifizierungsvorrichtung
WO2005000972A2 (en) * 2003-06-27 2005-01-06 Ciba Specialty Chemicals Holding Inc. Optical recording materials having high storage density
US7077898B2 (en) * 2003-07-17 2006-07-18 Ciba Specialty Chemicals Corporation Black pigment compositions
JP4621528B2 (ja) * 2005-03-31 2011-01-26 富士フイルム株式会社 可溶性顔料前駆体および有機顔料の製造方法
US20110009536A1 (en) * 2006-12-14 2011-01-13 Ciba Corporation C.i. pigment violet 37 in rod-like form
GB0722779D0 (en) 2007-11-20 2008-01-02 Sterix Ltd Compound
JP2010083982A (ja) 2008-09-30 2010-04-15 Fujifilm Corp 有機顔料微粒子の製造方法、それにより得られる有機顔料微粒子、その分散液、及びその組成物
JP5583133B2 (ja) 2008-10-31 2014-09-03 ビーエーエスエフ ソシエタス・ヨーロピア 有機電界効果トランジスタに使用するためのジケトピロロピロールポリマー
WO2010136353A1 (en) 2009-05-27 2010-12-02 Basf Se Diketopyrrolopyrrole polymers for use in organic semiconductor devices
EP2571919B1 (en) 2010-05-19 2018-07-11 Basf Se Diketopyrrolopyrrole polymers for use in organic semiconductor devices
WO2012017005A2 (en) 2010-08-05 2012-02-09 Basf Se Polymers based on benzodiones
JP6165135B2 (ja) 2011-06-22 2017-07-19 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se 有機半導体素子内で使用するためのジケトピロロピロールオリゴマー
US8544990B2 (en) 2011-07-29 2013-10-01 Videojet Technologies Inc. Pigmented ink jet ink composition
CN104094435B (zh) 2011-09-02 2017-02-22 巴斯夫欧洲公司 二酮基吡咯并吡咯低聚物和包含二酮基吡咯并吡咯低聚物的组合物
KR102030860B1 (ko) 2011-10-04 2019-11-08 바스프 에스이 벤조디온 기재 중합체
US9748487B2 (en) 2012-11-07 2017-08-29 Basf Se Polymers based on naphthodiones
JP6162984B2 (ja) * 2013-03-14 2017-07-12 山本化成株式会社 感熱発色性組成物及び該組成物を用いてなる感熱記録材料
CN103451998B (zh) * 2013-09-18 2015-12-09 潍坊恒联特种纸有限公司 一种彩色无尘纸表面施胶染色工艺
ES2948010T3 (es) * 2019-08-05 2023-08-25 Sanko Tekstil Isletmeleri San Ve Tic As Tintes sensibles al pH para materiales textiles, un proceso para su preparación y usos de los mismos

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US5268245A (en) * 1992-07-09 1993-12-07 Polaroid Corporation Process for forming a filter on a solid state imager
DE59408909D1 (de) * 1993-10-13 1999-12-16 Ciba Sc Holding Ag Neue Fluoreszenzfarbstoffe
DE59409351D1 (de) * 1993-10-13 2000-06-21 Ciba Sc Holding Ag Pyrrolo[3,4-c]pyrrole
DE69418826T2 (de) * 1993-11-22 1999-10-21 Ciba Specialty Chemicals Holding Inc., Basel Zusammensetzungen zur Herstellung strukturierter Farbbilder und deren Anwendung
EP0654711B1 (en) * 1993-11-22 1999-06-02 Ciba SC Holding AG Compositions for making structured color images and application thereof
DE69507874T2 (de) * 1994-12-26 1999-07-29 Kabushiki Kaisha Toshiba, Kawasaki, Kanagawa Bildschirm und Verfahren zur Herstellung desselben
TW472072B (en) * 1995-05-12 2002-01-11 Ciba Sc Holding Ag Process for colouration of high molecular weight organic materials in the mass with soluble phthalocyanine precursors
EP0742255B1 (en) * 1995-05-12 2004-04-14 Ciba SC Holding AG Colouration of high molecular weight organic materials in the mass with soluble phthalocyanine precursors
DE69632168T2 (de) * 1995-05-12 2004-08-12 Ciba Specialty Chemicals Holding Inc. Verfahren zum Färben von hochmolekularen organischen Kunststoffen in der Masse mit löslichen phthalocyaninen Precursoren
EP0761772B1 (de) * 1995-07-28 2000-03-15 Ciba SC Holding AG Lösliche Chromophore mit leicht abspaltbaren löslichmachenden Gruppen
JP4558106B2 (ja) * 1997-01-27 2010-10-06 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 改良された溶解性基を有する可溶性発色団
JP2002514263A (ja) * 1997-06-30 2002-05-14 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 微細顔料分散体を製造する方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100379205C (zh) * 2003-08-11 2008-04-02 华为技术有限公司 交换机加速arp表项老化的方法

Also Published As

Publication number Publication date
DE69807203D1 (de) 2002-09-19
WO1998045757A1 (en) 1998-10-15
CN1252135A (zh) 2000-05-03
EP0974075B1 (en) 2002-08-14
US6010567A (en) 2000-01-04
JP2002512647A (ja) 2002-04-23
EP0974075A1 (en) 2000-01-26
US6165681A (en) 2000-12-26
CN1161655C (zh) 2004-08-11
AU7211498A (en) 1998-10-30
DE69807203T2 (de) 2003-05-28

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