CN116137896A - 层叠体的制造方法、防反射部件、led显示器的前端部件、转印膜 - Google Patents

层叠体的制造方法、防反射部件、led显示器的前端部件、转印膜 Download PDF

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Publication number
CN116137896A
CN116137896A CN202180063289.XA CN202180063289A CN116137896A CN 116137896 A CN116137896 A CN 116137896A CN 202180063289 A CN202180063289 A CN 202180063289A CN 116137896 A CN116137896 A CN 116137896A
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CN
China
Prior art keywords
laminate
photosensitive layer
layer
group
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202180063289.XA
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English (en)
Chinese (zh)
Inventor
中村秀之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of CN116137896A publication Critical patent/CN116137896A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Theoretical Computer Science (AREA)
  • Materials For Photolithography (AREA)
  • Laminated Bodies (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
CN202180063289.XA 2020-09-18 2021-08-18 层叠体的制造方法、防反射部件、led显示器的前端部件、转印膜 Pending CN116137896A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020-157642 2020-09-18
JP2020157642A JP2022051261A (ja) 2020-09-18 2020-09-18 積層体の製造方法、反射防止部材、ｌｅｄディスプレイのフロント部材、転写フィルム
PCT/JP2021/030106 WO2022059405A1 (fr) 2020-09-18 2021-08-18 Procédé de fabrication de corps stratifié, élément antireflet, élément avant d'affichage à del et film de transfert

Publications (1)

Publication Number Publication Date
CN116137896A true CN116137896A (zh) 2023-05-19

Family

ID=80775860

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202180063289.XA Pending CN116137896A (zh) 2020-09-18 2021-08-18 层叠体的制造方法、防反射部件、led显示器的前端部件、转印膜

Country Status (4)

Country Link
JP (1) JP2022051261A (fr)
CN (1) CN116137896A (fr)
TW (1) TW202223553A (fr)
WO (1) WO2022059405A1 (fr)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001042119A (ja) * 1999-08-02 2001-02-16 Fuji Photo Film Co Ltd カラーフィルター用転写シート及びカラーフィルターの製造方法
KR100612994B1 (ko) * 2000-05-12 2006-08-14 삼성전자주식회사 액정 표시 장치 및 그에 사용되는 기판
JP6100500B2 (ja) * 2012-10-26 2017-03-22 富士フイルム株式会社 感光性転写材料、パターン形成方法およびエッチング方法
WO2018180477A1 (fr) * 2017-03-31 2018-10-04 富士フイルム株式会社 Film coloré, son procédé de fabrication, et élément d'imagerie à semi-conducteurs
JP7094372B2 (ja) * 2018-08-23 2022-07-01 富士フイルム株式会社 転写フィルム、積層体、及びパターン形成方法
WO2020066376A1 (fr) * 2018-09-28 2020-04-02 富士フイルム株式会社 Élément avant d'affichage led et son procédé de fabrication

Also Published As

Publication number Publication date
TW202223553A (zh) 2022-06-16
WO2022059405A1 (fr) 2022-03-24
JP2022051261A (ja) 2022-03-31

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