CN115870265B - Cleaning device and method for silicon wafer box - Google Patents
Cleaning device and method for silicon wafer box Download PDFInfo
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- CN115870265B CN115870265B CN202211603487.3A CN202211603487A CN115870265B CN 115870265 B CN115870265 B CN 115870265B CN 202211603487 A CN202211603487 A CN 202211603487A CN 115870265 B CN115870265 B CN 115870265B
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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Abstract
The invention discloses a cleaning device and a method for a silicon wafer box, wherein the cleaning device comprises a shell, an electric annular sliding rail, a rotary lifting mechanism, a fixing frame, a cleaning chamber and a liquid storage chamber, wherein an operation window is formed in the middle of the front side of the shell, an operation table is arranged at the bottom of the operation window, the electric annular sliding rail is fixedly arranged at the top in the shell, a plurality of sliding blocks are uniformly arranged on the electric annular sliding rail, the rotary lifting mechanism is fixedly arranged at the bottom end of the sliding blocks, the fixing frame is detachably and fixedly arranged at the bottom end of the rotary lifting mechanism, the cleaning chamber comprises a first cleaning chamber, a second cleaning chamber and a drying chamber which are sequentially arranged along the sliding direction of the sliding blocks, a plurality of nozzle assemblies are uniformly arranged on the side wall of the first cleaning chamber, an ultrasonic cleaner is arranged in the second cleaning chamber, and a drying assembly is arranged on the side wall of the drying chamber; the cleaning device can achieve the purpose of continuous cleaning, and can ensure the cleanliness and dryness of the wafer box.
Description
Technical Field
The invention relates to the technical field of silicon wafer production equipment, in particular to a cleaning device and a cleaning method for a silicon wafer box.
Background
In the production process of semiconductor silicon single crystal materials, silicon wafers need to be placed in a silicon wafer box for storage, when the silicon wafer box is used, dirt is left in the silicon wafer box due to friction between the silicon wafers and the silicon wafer box, the dirt mainly comprises particle impurities and metal ions, the quality of the silicon wafers can be directly affected by the dirt, and therefore the silicon wafer box needs to be cleaned in time, and the cleanliness and dryness of the silicon wafer box are guaranteed.
The existing cleaning equipment adopts pure water to spray, removes particle impurities and metal ions on the inner surface of the wafer box, and then carries out hot drying so as to ensure the cleanliness and dryness of the surface of the wafer box. The utility model discloses a portable major diameter silicon chip box cleaning equipment, the on-line screen storage device comprises a base, the top of base is provided with washs the case, the inside fixed mounting of base has the motor, the output of motor runs through washs the case and installs the center pin, the outside fixed surface of center pin installs the box frame, the inside washing case inside of box frame top is encircleed and is provided with the mouth that sprays, the washing case inner wall of spraying mouthful top is encircleed and is provided with the drying tube, one side surface of washs the case is provided with the heating pipe, the below of heating pipe is provided with the temperature controller, one side surface of washs the case runs through and is provided with the overflow pipe. Through the airtight space that sets up for the silicon chip box cleaning process in not contact with the external world, through 3 pure water sprays simultaneously, and through 12 rotatory high temperature cooperation low temperature stoving in turn, improved the whole cleanliness of box greatly.
However, this portable major diameter silicon chip box cleaning equipment need shut down and change next batch of silicon chip box that waits to wash after accomplishing in one batch washs, can not carry out the continuity and wash, is unsuitable for the washing in a large number of batches, and frequent switch-on and switch-off shortens cleaning equipment's life.
Disclosure of Invention
The invention aims to provide a cleaning device and a cleaning method for a silicon wafer box, which can continuously clean the silicon wafer box without stopping the machine, and can ensure the cleanliness and dryness of the silicon wafer box so as to solve the problems in the background technology.
The aim of the invention can be achieved by the following technical scheme:
the cleaning device of the silicon wafer box comprises a shell, wherein an operation window is formed in the middle of the front side of the shell, and an operation table is arranged at the bottom of the operation window; further comprises:
the electric annular slide rail is fixedly arranged at the inner top of the shell, a plurality of slide blocks are uniformly arranged on the electric annular slide rail, and the slide blocks can synchronously slide on the electric annular slide rail;
the rotary lifting mechanism is fixedly arranged at the bottom end of the sliding block;
the fixing frame is detachably and fixedly arranged at the bottom end of the rotary lifting mechanism and is used for fixing the box body and the box cover;
the cleaning chamber comprises a first cleaning chamber, a second cleaning chamber and a drying chamber which are sequentially arranged along the sliding direction of the sliding block, wherein a plurality of nozzle assemblies are uniformly arranged on the side wall of the first cleaning chamber, an ultrasonic cleaner is arranged in the second cleaning chamber, and a drying assembly is arranged on the side wall of the drying chamber;
the liquid storage chamber, the liquid storage chamber top sets up the hydraulic pump, and the hydraulic pump is used for carrying the interior washing liquid of liquid storage to nozzle assembly and ultrasonic cleaner respectively in.
As a further scheme of the invention: the rotary lifting mechanism includes:
the servo motor is fixedly arranged at the bottom end of the sliding block;
the electric telescopic rod is fixedly connected to the output end of the servo motor, and the output end of the electric telescopic rod is fixedly connected with the fixing frame in a detachable mode.
As a further scheme of the invention: the fixing frame comprises:
the electric telescopic rod comprises a T-shaped base, wherein a connecting hole is formed in the center of the top of the T-shaped base, the output end of the electric telescopic rod is inserted into the connecting hole, and two inclined plates are symmetrically arranged on the T-shaped base;
the two limiting parts are respectively arranged between the two inclined plates.
As a further scheme of the invention: the limiting piece includes:
the bottom of the circular ring is uniformly provided with a plurality of connecting columns, and the connecting columns fixedly connect the circular ring to the inclined plate;
the two limiting rods are symmetrically arranged on the circular ring, and one end of each limiting rod is hinged on the circular ring;
the clamping piece is arranged on the circular ring and is used for fixing the other end of the limiting rod on the circular ring;
the sucking discs are uniformly arranged on the inclined plate and are positioned in the circular ring.
As a further scheme of the invention: the nozzle assembly includes:
the upper nozzle is arranged at the upper section of the side wall of the first cleaning chamber in a downward inclined manner, and the inclination angle is 30-45 degrees;
the lower nozzle is arranged at the lower section of the side wall of the first cleaning chamber in an upward inclined way, and the inclination angle is 30-45 degrees.
As a further scheme of the invention: the drying assembly includes:
the fans are uniformly arranged on the side wall of the drying chamber;
the heating piece is arranged between the upper wall and the lower wall of the drying chamber in a crossing mode and is positioned in front of the fan.
As a further scheme of the invention: the heating element includes:
the steel wire meshes are arranged between the upper wall and the lower wall of the drying chamber in a front-back layered manner;
the heating wire is arranged between the two steel wire meshes.
As a further scheme of the invention: the cleaning chamber further comprises an air drying chamber, the air drying chamber is arranged on one side of the drying chamber along the sliding direction of the sliding block, and a plurality of fans are arranged on the inner side wall of the air drying chamber.
And a cleaning method of a silicon wafer cassette, characterized by comprising the steps of:
s1, a plurality of box bodies to be cleaned and box covers are fixed on a plurality of fixing frames exposed in an operation window in a separated mode;
s2, starting a hydraulic pump, and respectively conveying cleaning liquid in a liquid storage chamber into the nozzle assembly and the ultrasonic cleaner;
s3, starting an electric annular sliding rail, moving a fixing frame provided with a wafer box to the upper part of a first cleaning chamber by a sliding block, stopping the electric annular sliding rail, starting a rotary lifting mechanism, moving the fixing frame provided with the wafer box to the first cleaning chamber by the rotary lifting mechanism, and spraying and cleaning a box body and a box cover by a nozzle assembly;
s4, repeating the process of S3 after the spray cleaning is finished, and sequentially completing ultrasonic cleaning, drying and air drying procedures;
s5, in the processes of spray cleaning, ultrasonic cleaning, drying and air drying, the electric annular slide rail is stopped, the cleaned box body and box cover are taken off from the fixing frame in the gap, and new box body and box cover to be cleaned are replaced, so that continuous cleaning is achieved.
The invention has at least the following beneficial effects:
(1) Through setting up electronic annular slide rail, rotatory elevating system, mount and cleaning chamber, evenly set up a plurality of slider that can slide in step on the electronic annular slide rail, the slider passes through rotatory elevating system and drives the mount and move on electronic annular slide rail, and the mount is used for fixed mounting to wait to wash box body and lid, along with the mount moves round on electronic annular slide rail and accomplishes spray cleaning, ultrasonic cleaning, stoving and the air-drying procedure to the box in proper order, guarantee the cleanliness factor and the dryness factor of box;
(2) After a circle of cleaning procedure is completed, the cleaned box body and box cover return to the operation window, and the electric annular slide rail stops moving in the processes of spray cleaning, ultrasonic cleaning, drying and air drying, so that workers can take down the cleaned box body and box cover from the fixing frame and replace the new box body and box cover to be cleaned, thereby achieving the purpose of continuous cleaning.
Drawings
The invention is further described below with reference to the accompanying drawings.
FIG. 1 is a schematic front view of the overall structure of the present invention;
FIG. 2 is a schematic cross-sectional view of the overall structure of the present invention;
FIG. 3 is a schematic top view of the overall structure of the present invention;
FIG. 4 is a schematic top view of the electric annular slide rail structure of the present invention;
FIG. 5 is a schematic view of the structure of the fixing frame of the present invention;
FIG. 6 is a schematic view of a first cleaning chamber structure according to the present invention;
FIG. 7 is a schematic view of a drying chamber according to the present invention;
FIG. 8 is a schematic view of the structure of the air drying chamber of the present invention;
fig. 9 is a schematic view of the structure of the engaging member of the present invention.
In the figure: 1. a housing; 2. an operation window; 3. an operation table; 4. an electric annular slide rail; 5. a slide block; 6. a rotary lifting mechanism; 7. a fixing frame; 8. a first cleaning chamber; 9. a second cleaning chamber; 10. a drying chamber; 11. a nozzle assembly; 12. an ultrasonic cleaner; 13. a drying assembly; 14. a liquid storage chamber; 15. a hydraulic pump; 16. a servo motor; 17. an electric telescopic rod; 18. a T-shaped base; 19. a connection hole; 20. an inclined plate; 21. a limiting piece; 22. a circular ring; 23. a connecting column; 24. a limit rod; 25. a suction cup; 26. an upper nozzle; 27. a lower nozzle; 28. a fan; 29. a steel wire mesh; 30. a heating wire; 31. an air drying chamber; 32. an integrated control panel; 33. a hemispherical clamping block; 34. and (3) a spring.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Referring to fig. 1-9, the present invention provides a cleaning device for a silicon wafer cassette, which includes a housing 1, an electric annular slide rail 4, a rotary lifting mechanism 6, a fixing frame 7, a cleaning chamber and a liquid storage chamber 14.
The middle part of the front side of the shell 1 is provided with an operation window 2, the bottom of the operation window 2 is provided with an operation table 3, the operation table 3 is used for placing a silicon wafer box to be cleaned and recovering the cleaned silicon wafer box, the operation window 2 is used for fixedly mounting the box body to be cleaned and the cover body on a fixed frame 7 and removing the cleaned box body and the cover body from the fixed frame 7; the electric annular sliding rail 4 is fixedly arranged at the inner top of the shell 1, the electric annular sliding rail 4 is fixedly connected with the top wall of the shell 1 through a plurality of mounting posts uniformly arranged at the top of the electric annular sliding rail 4, a plurality of sliding blocks 5 are uniformly arranged on the electric annular sliding rail 4, the sliding blocks 5 can synchronously slide on the electric annular sliding rail 4, preferably, as shown in fig. 3, the electric annular sliding rail 4 is a rectangular-like sliding rail, four sliding blocks 5 are uniformly arranged on two long sides of the rectangular-like sliding rail respectively, and two sliding blocks 5 are arranged on two short sides respectively; as shown in fig. 1, four rotary lifting mechanisms 6 and a fixing frame 7 which are arranged on a long side are positioned in the operation window 2 all the time; the rotary lifting mechanism 6 is fixedly arranged at the bottom end of the sliding block 5, and the sliding block 5 is used for driving the rotary lifting mechanism 6 to move on the electric annular sliding rail 4; the fixing frame 7 is detachably and fixedly arranged at the bottom end of the rotary lifting mechanism 6, and the fixing frame 7 is used for fixing the box body and the box cover; the rotary lifting mechanism 6 is used for driving the fixing frame 7 to synchronously move and driving the fixing frame 7 to rotationally lift; the cleaning chamber comprises a first cleaning chamber 8, a second cleaning chamber 9 and a drying chamber 10 which are sequentially arranged along the sliding direction of the sliding block 5, wherein a plurality of nozzle assemblies 11 are uniformly arranged on the side wall of the first cleaning chamber 8, the nozzle assemblies 11 are used for spraying and cleaning the box body and the box cover on the fixing frame 7, the ultrasonic cleaner 12 is arranged in the second cleaning chamber 9 and is used for carrying out ultrasonic cleaning on the box body and the box cover on the fixing frame 7, the particle impurities and the metal ions which are difficult to clean in the preliminary cleaning are further cleaned, the drying assembly 13 is arranged on the side wall of the drying chamber 10, and the drying assembly 13 is used for drying the box body and the box cover on the fixing frame 7; the top of the liquid storage chamber 14 is provided with a hydraulic pump 15, and the hydraulic pump 15 is used for conveying the cleaning liquid in the liquid storage chamber 14 into the nozzle assembly 11 and the ultrasonic cleaner 12 respectively.
In the embodiment, the rotary lifting mechanism 6 specifically comprises a servo motor 16 and an electric telescopic rod 17, and the servo motor 16 is fixedly arranged at the bottom end of the sliding block 5; the electric telescopic rod 17 is fixedly connected to the output end of the servo motor 16, and the output end of the electric telescopic rod 17 is detachably and fixedly connected with the fixing frame 7; the servo motor 16 drives the electric telescopic rod 17 to rotate, and the electric telescopic rod 17 drives the fixing frame 7 to move up and down, so that the fixing frame 7 can rotate, lift and move.
In this embodiment, the fixing frame 7 includes a T-shaped base 18 and two limiting members 21, a connecting hole 19 is formed in the center of the top of the T-shaped base 18, the output end of the electric telescopic rod 17 is inserted into the connecting hole 19, so that the T-shaped base 18 is fixedly connected with the electric telescopic rod 17, and two inclined plates 20 are symmetrically arranged on the T-shaped base 18; the two limiting pieces 21 are respectively arranged between the two inclined plates 20, wherein the limiting piece 21 of one inclined plate 20 is used for fixing the box body of the silicon wafer box, and the other inclined plate 20 is used for fixing the box cover of the silicon wafer box.
Preferably, the limiting piece 21 specifically comprises a circular ring 22, two limiting rods 24, a clamping piece and a sucking disc 25, wherein a plurality of connecting columns 23 are uniformly arranged at the bottom of the circular ring 22, the circular ring 22 is fixedly connected to the inclined plate 20 by the connecting columns 23, and a box body or a box cover is arranged in the circular ring 22; two limiting rods 24 are symmetrically arranged on the circular ring 22, one end of each limiting rod 24 is hinged on the circular ring 22, a clamping piece is arranged on the circular ring 22 and used for fixing the other end of each limiting rod 24 on the circular ring 22, each limiting rod 24 limits a box body or a box cover in the circular ring 22, a plurality of suckers 25 are uniformly arranged on the inclined plate 20, the suckers 25 are positioned in the circular ring 22 and are used for being adsorbed on the bottom surface of the box body or the box cover, so that the box body or the box cover does not collide with the circular ring 22 in the rotating lifting process; preferably, the clamping piece is a spring 34 and a hemispherical clamping block 33, the spring 34 is arranged in a blind hole formed in two sides of a clamping groove formed in the circular ring 22, the hemispherical clamping block 33 is fixedly arranged at the movable end of the spring 34, under the natural state of the spring 34, the hemispherical surface of the hemispherical clamping block 33 is positioned in the clamping groove formed in the circular ring 22, the end part of the limiting rod 24 is matched with the clamping groove formed in the circular ring 22, two sides of the end part of the limiting rod 24 are respectively provided with a groove matched with the hemispherical surface of the hemispherical clamping block 33, and when the clamping rod is used, the hemispherical surface of the hemispherical clamping block 33 is clamped in the grooves, so that the limiting rod 24 is clamped and fixed on the circular ring 22.
In this embodiment, the nozzle assembly 11 specifically includes an upper nozzle 26 and a lower nozzle 27, where the upper nozzle 26 is disposed at an upper section of the sidewall of the first cleaning chamber 8 in a downward inclination angle of 30 ° -45 °; the lower nozzle 27 is arranged at the lower section of the side wall of the first cleaning chamber 8 in an upward inclined manner by an angle of 30-45 degrees. The upper nozzle 26 and the lower nozzle 27 spray-clean the rotary-lifting box body and the box cover from a plurality of angles up and down, and primarily clean out the particle impurities and metal ions adhered in the box body and the box cover.
In this embodiment, the drying assembly 13 specifically includes a fan 28 and a heating element, and a plurality of fans 28 are uniformly disposed on the side wall of the drying chamber 10; the heating element is arranged between the upper wall and the lower wall of the drying chamber 10 in a crossing way, and the heating element is positioned in front of the fan 28, preferably, the heating element specifically comprises a steel wire mesh 29 and a heating wire 30, and the two steel wire meshes 29 are arranged between the upper wall and the lower wall of the drying chamber 10 in a crossing way in a front-back layering way; the heating wires 30 are arranged between two steel wires 29. The fans 28 are rotated simultaneously to blow hot air generated from the heating wires 30 into the drying chamber 10, and rapidly dry the cleaned box body and the box cover.
In this embodiment, further, still be provided with in the cleaning chamber and air-dry room 31, air-dry room 31 sets up in drying chamber 10 one side along slider 5 slip direction, sets up a plurality of fans 28 on the air-dry room 31 inside wall, and a plurality of fans 28 cool down and air-dry the box body and the lid after the stoving.
It should be noted that, the front side of the housing 1 is further provided with an integrated control panel 32, and each electrical element in the invention is electrically connected with the integrated control panel 32, and the integrated control panel 32 is used for setting and adjusting the start-stop time of each electrical element and the time of spraying cleaning, ultrasonic cleaning, drying and air drying, so that each electrical element cooperates with each other to achieve the purpose of continuous cleaning.
The specific method for cleaning the silicon wafer cassette using the cleaning device in the above embodiment is as follows:
step one, the four box bodies to be cleaned and the box cover are fixed on four fixing frames 7 exposed in an operation window 2 in a separated mode;
step two, starting the hydraulic pump 15 to respectively convey the cleaning liquid in the liquid storage chamber 14 into the nozzle assembly 11 and the ultrasonic cleaner 12;
starting the electric annular slide rail 4, moving two fixing frames 7 with the boxes above the first cleaning chamber 8 by the slide block 5 according to the pre-adjusted parameters, stopping the electric annular slide rail 4 by itself, starting the two rotary lifting mechanisms 6 by itself, moving the fixing frames 7 with the boxes to the first cleaning chamber 8 by the rotary lifting mechanisms 6, and enabling the fixing frames 7 to rotate in the first cleaning chamber 8 to move up and down, and starting the spray cleaning on the box body and the box cover by the nozzle assembly 11;
step four, after the spray cleaning is finished, repeating the process of S3, sequentially finishing ultrasonic cleaning, drying and air drying procedures, and after all procedures are finished, moving the box body and the box cover on the electric annular sliding rail 4 for one circle and returning to the operation window 2, wherein the preferable procedure time of the spray cleaning, ultrasonic cleaning, drying and air drying is set to be 60S;
step five, the electric annular slide rail 4 is stopped in the processes of spray cleaning, ultrasonic cleaning, drying and air drying, the cleaned box body and box cover are taken off from the fixing frame 7 in the gap, and new box body and box cover to be cleaned are replaced, so that continuous cleaning is achieved.
The foregoing detailed description of the preferred embodiments of the invention should not be taken as limiting the scope of the invention. All equivalent changes and modifications within the scope of the present invention are intended to be covered by the present invention.
Claims (6)
1. The cleaning device of the silicon wafer box comprises a shell (1), wherein an operation window (2) is formed in the middle of the front side of the shell (1), and an operation table (3) is arranged at the bottom of the operation window (2); characterized by further comprising:
the electric annular sliding rail (4) is fixedly arranged at the inner top of the shell (1), a plurality of sliding blocks (5) are uniformly arranged on the electric annular sliding rail (4), and the sliding blocks (5) can synchronously slide on the electric annular sliding rail (4);
the rotary lifting mechanism (6) is fixedly arranged at the bottom end of the sliding block (5);
the fixing frame (7) is detachably and fixedly arranged at the bottom end of the rotary lifting mechanism (6), and the fixing frame (7) is used for fixing the box body and the box cover;
the cleaning chamber comprises a first cleaning chamber (8), a second cleaning chamber (9) and a drying chamber (10) which are sequentially arranged along the sliding direction of the sliding block (5), wherein a plurality of nozzle assemblies (11) are uniformly arranged on the side wall of the first cleaning chamber (8), an ultrasonic cleaner (12) is arranged in the second cleaning chamber (9), and a drying assembly (13) is arranged on the side wall of the drying chamber (10);
the cleaning device comprises a liquid storage chamber (14), wherein a hydraulic pump (15) is arranged at the top of the liquid storage chamber (14), and the hydraulic pump (15) is used for respectively conveying cleaning liquid in the liquid storage chamber (14) into a nozzle assembly (11) and an ultrasonic cleaner (12);
the fixing frame (7) comprises:
the electric telescopic device comprises a T-shaped base (18), wherein a connecting hole (19) is formed in the center of the top of the T-shaped base (18), the output end of an electric telescopic rod (17) is inserted into the connecting hole (19), and two inclined plates (20) are symmetrically arranged on the T-shaped base (18);
two limiting pieces (21) which are respectively arranged between the two inclined plates (20);
the stopper (21) includes:
the circular ring (22), a plurality of connecting columns (23) are uniformly arranged at the bottom of the circular ring (22), and the connecting columns (23) fixedly connect the circular ring (22) to the inclined plate (20);
the two limiting rods (24) are symmetrically arranged on the circular ring (22), and one end of each limiting rod (24) is hinged on the circular ring (22);
the clamping piece is arranged on the circular ring (22) and is used for fixing the other end of the limiting rod (24) on the circular ring (22);
the suckers (25) are uniformly arranged on the inclined plate (20), and the suckers (25) are positioned in the circular ring (22);
the cleaning chamber further comprises an air drying chamber (31), the air drying chamber (31) is arranged on one side of the drying chamber (10) along the sliding direction of the sliding block (5), and a plurality of fans (28) are arranged on the inner side wall of the air drying chamber (31).
2. A cleaning apparatus of a silicon wafer cassette according to claim 1, wherein the rotation lifting mechanism (6) comprises:
the servo motor (16) is fixedly arranged at the bottom end of the sliding block (5);
the electric telescopic rod (17) is fixedly connected to the output end of the servo motor (16), and the output end of the electric telescopic rod (17) is detachably and fixedly connected with the fixing frame (7).
3. A cleaning apparatus of a silicon wafer cassette according to claim 1, wherein the nozzle assembly (11) comprises:
the upper nozzle (26) is arranged at the upper section of the side wall of the first cleaning chamber (8) in a downward inclined way, and the inclination angle is 30-45 degrees;
the lower nozzle (27) is arranged at the lower section of the side wall of the first cleaning chamber (8) in an upward inclined way, and the inclination angle is 30-45 degrees.
4. A cleaning apparatus of a silicon wafer cassette according to claim 1, wherein the drying assembly (13) comprises:
a plurality of fans (28), wherein the fans (28) are uniformly arranged on the side wall of the drying chamber (10);
and the heating piece is arranged between the upper wall and the lower wall of the drying chamber (10) in a straddling way and is positioned in front of the fan (28).
5. The cleaning apparatus of a silicon wafer cassette as defined in claim 4, wherein the heating member comprises:
the steel wire meshes (29) are arranged between the upper wall and the lower wall of the drying chamber (10) in a crossing way at intervals in front of and behind the two steel wire meshes (29);
and the heating wires (30), wherein the heating wires (30) are arranged between the two steel wire meshes (29).
6. A method for cleaning a silicon wafer cassette, characterized by using a cleaning apparatus for a silicon wafer cassette according to claim 5, comprising the steps of:
s1, a plurality of box bodies and box covers to be cleaned are fixed on a plurality of fixing frames (7) exposed in an operation window (2) in a separated mode;
s2, starting a hydraulic pump (15) and conveying cleaning liquid in a liquid storage chamber (14) into a nozzle assembly (11) and an ultrasonic cleaner (12) respectively;
s3, starting an electric annular sliding rail (4), enabling a sliding block (5) to move a fixing frame (7) provided with a box to the position above a first cleaning chamber (8), stopping the electric annular sliding rail (4), starting a rotary lifting mechanism (6), enabling the rotary lifting mechanism (6) to move the fixing frame (7) provided with the box to the first cleaning chamber (8), and enabling a nozzle assembly (11) to spray and clean the box body and the box cover;
s4, repeating the process of S3 after the spray cleaning is finished, and sequentially completing ultrasonic cleaning, drying and air drying procedures;
s5, in the processes of spray cleaning, ultrasonic cleaning, drying and air drying, the electric annular slide rail (4) is stopped, the cleaned box body and box cover are taken down from the fixing frame (7) in the gap, and new box body and box cover to be cleaned are replaced, so that continuous cleaning is achieved.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211603487.3A CN115870265B (en) | 2022-12-14 | 2022-12-14 | Cleaning device and method for silicon wafer box |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211603487.3A CN115870265B (en) | 2022-12-14 | 2022-12-14 | Cleaning device and method for silicon wafer box |
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| Publication Number | Publication Date |
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| CN115870265A CN115870265A (en) | 2023-03-31 |
| CN115870265B true CN115870265B (en) | 2023-07-14 |
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| CN202211603487.3A Active CN115870265B (en) | 2022-12-14 | 2022-12-14 | Cleaning device and method for silicon wafer box |
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Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10261606A (en) * | 1997-03-19 | 1998-09-29 | Fujitsu Ltd | Equipment and method for washing substrate cassette |
| CN202290684U (en) * | 2011-10-17 | 2012-07-04 | 中芯国际集成电路制造(上海)有限公司 | Automatic cleaning device for wafer box |
| DE102015226657A1 (en) * | 2015-12-23 | 2017-06-29 | Sms Group Gmbh | Rotorentzunderung |
| CN106733853A (en) * | 2017-01-05 | 2017-05-31 | 丽水市飞天人机械设计有限公司 | A kind of part intelligence cleaning and sterilization drains equipment |
| CN106955864A (en) * | 2017-04-28 | 2017-07-18 | 杭州泰扶新能源有限公司 | Monocrystalline silicon piece cleaning device |
| CN215466778U (en) * | 2020-10-09 | 2022-01-11 | 浙江康鹏半导体有限公司 | Cleaning device for gallium arsenide wafer box |
| CN214398150U (en) * | 2020-12-18 | 2021-10-15 | 陕西佳迪技术工业有限公司 | Support convenient for placing different electrical components |
| CN214066217U (en) * | 2020-12-30 | 2021-08-27 | 浙江荣鑫智能仪表股份有限公司 | Lower box cover of diaphragm gas meter |
| CN112934841B (en) * | 2021-02-08 | 2022-03-11 | 江苏亚电科技有限公司 | A wash drying machine for wafer case |
| CN114602921A (en) * | 2022-03-29 | 2022-06-10 | 中环领先半导体材料有限公司 | Special frame of portable film box cleaning machine film box |
| CN114749406A (en) * | 2022-04-01 | 2022-07-15 | 中环领先半导体材料有限公司 | Portable major diameter silicon chip spool box cleaning equipment |
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- 2022-12-14 CN CN202211603487.3A patent/CN115870265B/en active Active
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