CN112934841B - A wash drying machine for wafer case - Google Patents
A wash drying machine for wafer case Download PDFInfo
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- CN112934841B CN112934841B CN202110171665.9A CN202110171665A CN112934841B CN 112934841 B CN112934841 B CN 112934841B CN 202110171665 A CN202110171665 A CN 202110171665A CN 112934841 B CN112934841 B CN 112934841B
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- drying
- box
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- 238000001035 drying Methods 0.000 title claims abstract description 51
- 238000004140 cleaning Methods 0.000 claims abstract description 103
- 230000007246 mechanism Effects 0.000 claims abstract description 102
- 238000003860 storage Methods 0.000 claims abstract description 41
- 239000013078 crystal Substances 0.000 claims abstract description 13
- 230000005540 biological transmission Effects 0.000 claims description 30
- 238000005406 washing Methods 0.000 claims description 17
- 238000007789 sealing Methods 0.000 claims description 16
- 230000013011 mating Effects 0.000 claims description 13
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 7
- 239000007921 spray Substances 0.000 claims description 6
- 238000007493 shaping process Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 5
- 235000012431 wafers Nutrition 0.000 description 37
- 238000010586 diagram Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 4
- 230000002337 anti-port Effects 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
- B08B3/123—Cleaning travelling work, e.g. webs, articles on a conveyor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/20—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
- B08B9/28—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking
- B08B9/34—Arrangements of conduits or nozzles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/20—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
- B08B9/36—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by using brushes
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/001—Drying-air generating units, e.g. movable, independent of drying enclosure
Abstract
The invention discloses a cleaning and drying integrated machine for a wafer storage box, which comprises a supporting mechanism, a conveying mechanism, a cleaning mechanism and a drying mechanism, wherein the conveying mechanism is installed at the upper end of the supporting mechanism, the cleaning mechanism is arranged at the lower side of the conveying mechanism, the drying mechanism is arranged at the rear side of the cleaning mechanism, a cleaning mechanism is hung on the conveying mechanism, and a clamping mechanism is arranged at the inner side of the cleaning mechanism. According to the invention, the cleaning mechanism is matched with the cleaning mechanism and the drying mechanism, so that the cleaning efficiency is improved in a flow line mode, the drying effect is ensured, and the cleaning mechanism is matched with the limiting frame, the limiting slide rail, the first matching rack and the second matching rack, so that the cleaning brush and the round crystal storage box can rotate reversely, the cleaning effect is improved, the round crystal storage box is not damaged, and the working efficiency is improved.
Description
Technical Field
The invention relates to the field of cleaning of wafer storage boxes, in particular to a cleaning and drying integrated machine for a wafer storage box.
Background
Currently, cassettes are often used to transfer wafers between processes in semiconductor manufacturing. The existing wafer box comprises a box body with an opening on one side and a door cover, wherein the door cover is matched with the opening of the box body and used for sealing the box body, and a plurality of grooves used for placing wafers are formed in the inner wall of the box body.
After a certain amount of wafers are transferred by the wafer cassette, a large amount of particulate matter is easily accumulated during the contact between the wafers and the wafer cassette due to repeated placement and removal of the wafers. Therefore, the wafer cassette needs to be cleaned periodically. At present, the common cleaning method is as follows: the wafer box is opened first, then the wafer boxes are placed into a cleaning cavity of a large cleaning device, and then the wafer boxes are washed in the cleaning cavity. However, the method has the problem that the wafer box is not dried after being washed, and cannot be directly used for wafer transmission, and the method can be used for wafer transmission only after the wafer box is completely dried.
Disclosure of Invention
The invention aims to solve the problems and provide a cleaning and drying all-in-one machine for a wafer storage box.
The invention realizes the purpose through the following technical scheme:
a cleaning and drying integrated machine for a wafer storage box comprises a supporting mechanism, a conveying mechanism, a cleaning mechanism and a drying mechanism, wherein the conveying mechanism is mounted at the upper end of the supporting mechanism, the cleaning mechanism is arranged on the lower side of the conveying mechanism, the drying mechanism is arranged on the rear side of the cleaning mechanism, a cleaning mechanism is hoisted on the conveying mechanism, and a clamping mechanism is arranged on the inner side of the cleaning mechanism;
the supporting mechanism comprises an upright post, a supporting frame and a sliding rail, the supporting frame is mounted at the upper end of the upright post, and the sliding rail is connected to the outer side of the supporting frame;
the conveying mechanism comprises a motor mounting frame, a motor and a transmission chain group, the motor mounting frame is mounted at the upper end of the slide rail, the motor is mounted at the upper end of the motor mounting frame, the transmission chain group is mounted at the power output end of the motor, and a matching groove is formed between the transmission chain group and the slide rail;
the cleaning mechanism comprises a cleaning box, an ultrasonic cleaning machine, a circulating pump and a transmission pipe, the ultrasonic cleaning machine is arranged at the bottom end inside the cleaning box, the circulating pump is arranged at the rear side of the cleaning box, the transmission pipe is connected to the circulating pump, a high-pressure sprayer is arranged on the transmission pipe, a limiting frame is arranged on the inner side surface of the cleaning box, a limiting slide rail is arranged on the lower side of the limiting frame, the inner side surface of the cleaning box of the limiting slide rail is of a Z-shaped structure, a first matching rack is arranged on the side opposite to the lower end of the limiting slide rail, a second matching rack is arranged on the lower side of the limiting slide rail, and a draining frame is arranged between the cleaning box and the drying mechanism;
the drying mechanism comprises a sealing box, an exhaust fan, a hot air blower and a drying nozzle, wherein the exhaust fan is installed at the upper end of the sealing box, the hot air blower is arranged at the lower end of the sealing box, and the hot air blower is connected to the drying nozzle in the sealing box through a pipeline;
washing mechanism includes movable block, connecting rod, removal frame, first cooperation gear, install the movable block lower extreme the connecting rod, the connecting rod lower extreme is connected with the removal frame, the removal frame inboard is provided with clamping mechanism, the clamping mechanism lower extreme is connected with first cooperation gear, spacing dish is connected to first cooperation gear below, spacing dish downside is provided with the cleaning brush, spacing dish with be provided with the brilliant case of circle between the cleaning brush, second cooperation gear is connected to cleaning brush power end, first cooperation gear front side with first cooperation rack cooperation, first cooperation gear rear side quilt spacing slide rail is spacing, second cooperation gear rear end with second cooperation rack cooperation.
Preferably: clamping mechanism includes first traveller, first reset spring, spout, the first traveller outside is provided with first reset spring, first reset spring lower extreme is connected first cooperation gear, first cooperation gear with the shaping has between the first traveller the spout.
So set up, when spacing slide rail step by step becomes low, first cooperation gear is oppressed the step-down and is in downward slip on the first traveller drives spacing dish simultaneously and pushes the brilliant case of circle in the cleaning brush upper end.
Preferably: clamping mechanism includes second traveller, connecting block, second reset spring, spout, the outside sliding connection of second traveller has first cooperation gear, the second traveller with be provided with between the first cooperation gear the spout, first cooperation gear medial surface is provided with the connecting block, the connecting block passes through second reset spring connects the second traveller, be provided with on the second traveller and be used for the gliding groove of connecting block.
So set up, when spacing slide rail step by step becomes low, first cooperation gear is oppressed the step-down and is in downward slip on the second traveller drives spacing dish simultaneously and pushes the brilliant case of circle in the cleaning brush upper end.
Preferably: the support frame is connected with the upright posts in a welding mode, the sliding rail is connected with the support frame through bolts, the inside of the sliding rail is hollow, and grooves used for limiting the moving blocks are formed in the bottoms of the sliding rail.
So set up, the slide rail plays the transmission effect.
Preferably: the motor mounting frame is connected with the motor through bolts, the motor is connected with the transmission chain set through bolts, clamping blocks are arranged on the transmission chain set, and the clamping blocks are matched with the chains on the moving blocks.
So set up, drive chain group plays the drive wash the mechanism removal effect of brushing.
Preferably: the included angle scope between high pressure nozzle and the horizontal plane is 20 degrees to 70 degrees, spacing slide rail height face with first cooperation gear initial position is the same, spacing slide rail low side with first cooperation rack height is the same.
So set up, the high pressure nozzle washs the wafer case outside and inside.
Preferably: the limiting disc key is connected with the first matching gear, and the limiting disc is made of rubber.
So set up, spacing dish is used for compressing tightly the brilliant case of circle, thereby make the brilliant case of circle can with the cleaning brush cooperation antiport.
Preferably: the second cooperation gear passes through the bearing frame and connects the removal frame, the cleaning brush key-type connection the second cooperation gear.
So set up, the removal frame plays installation and fixed action.
Preferably: the cleaning brush is made of a soft brush.
So set up, the cleaning brush is right the side washs in the brilliant case of circle, guarantees simultaneously that the medial surface can not take place the damage.
Preferably: the first matching gear is connected with the first sliding column in a sliding mode, and the first return spring is connected with the moving frame and the first matching gear through screws.
So set up, first cooperation gear is used for driving spacing dish descends and rotates.
Compared with the prior art, the invention has the following beneficial effects:
1. the washing mechanism is matched with the washing mechanism and the drying mechanism, so that the washing efficiency is improved in a flow line mode, and the drying effect is ensured;
2. utilize washing mechanism cooperation spacing, spacing slide rail, first cooperation rack, second cooperation rack to make washing brush and brilliant case of circle can the antiport, thereby improve the cleaning performance, and can not take place the damage to brilliant case of circle, improve work efficiency.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
FIG. 1 is a schematic structural diagram of a cleaning and drying machine for wafer storage cassettes according to the present invention;
FIG. 2 is a schematic diagram of an internal structure of a cleaning box of the integrated cleaning and drying machine for wafer storage boxes according to the present invention;
FIG. 3 is a schematic diagram of the internal structure of a sealing box of the integrated cleaning and drying machine for wafer storage boxes according to the present invention;
FIG. 4 is a schematic structural diagram of a washing mechanism of the integrated washing and drying machine for wafer storage boxes according to the present invention;
FIG. 5 is a schematic structural diagram of a cleaning brush of the integrated cleaning and drying machine for wafer storage boxes according to the present invention;
FIG. 6 is a schematic structural diagram of a first state of a first mating gear of the integrated cleaning and drying machine for wafer storage cassettes according to the present invention;
FIG. 7 is a schematic structural diagram of a second state of a first mating gear of the integrated cleaning and drying machine for wafer storage boxes according to the present invention;
FIG. 8 is a schematic structural view of a first slide column of the integrated cleaning and drying machine for wafer storage boxes according to the present invention;
fig. 9 is a schematic structural view of a second slide column of the integrated cleaning and drying machine for wafer storage boxes according to the present invention.
The reference numerals are explained below:
1. a support mechanism; 2. a transport mechanism; 3. a cleaning mechanism; 4. a drying mechanism; 5. a washing mechanism; 6. a clamping mechanism; 7. a wafer storage box; 11. a column; 12. a support frame; 13. a slide rail; 21. a motor mounting bracket; 22. an electric motor; 23. a drive chain set; 31. a cleaning tank; 32. an ultrasonic cleaning machine; 33. a circulation pump; 34. a conveying pipe; 35. a high pressure spray head; 36. a limiting frame; 37. a limiting slide rail; 38. a first mating rack; 39. a second mating rack; 310. a draining rack; 41. a sealing box; 42. an exhaust fan; 43. a hot air blower; 44. drying the nozzle; 51. a moving block; 52. a connecting rod; 53. a movable frame; 54. a first mating gear; 55. a limiting disc; 56. a second mating gear; 57. cleaning brushes; 61. a first traveler; 62. a first return spring; 63. a chute; 611. a second strut; 612. connecting blocks; 613. a second return spring.
Detailed Description
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on those shown in the drawings, and are used only for convenience in describing the present invention and for simplicity in description, and do not indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and thus, are not to be construed as limiting the present invention. Furthermore, the terms "first", "second", etc. are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first," "second," etc. may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless otherwise specified.
In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art through specific situations.
The invention will be further described with reference to the accompanying drawings in which:
example 1
As shown in fig. 1-8, a cleaning and drying integrated machine for a wafer storage box comprises a supporting mechanism 1, a conveying mechanism 2, a cleaning mechanism 3 and a drying mechanism 4, wherein the conveying mechanism 2 is installed at the upper end of the supporting mechanism 1, the cleaning mechanism 3 is arranged at the lower side of the conveying mechanism 2, the drying mechanism 4 is arranged at the rear side of the cleaning mechanism 3, a cleaning mechanism 5 is hung on the conveying mechanism 2, and a clamping mechanism 6 is arranged at the inner side of the cleaning mechanism 5;
the supporting mechanism 1 comprises an upright post 11, a supporting frame 12 and a sliding rail 13, wherein the supporting frame 12 is installed at the upper end of the upright post 11, and the sliding rail 13 is connected to the outer side of the supporting frame 12;
the conveying mechanism 2 comprises a motor mounting frame 21, a motor 22 and a transmission chain group 23, the motor mounting frame 21 is mounted at the upper end of the slide rail 13, the motor 22 is mounted at the upper end of the motor mounting frame 21, the power output end of the motor 22 is provided with the transmission chain group 23, and a matching groove is formed between the transmission chain group 23 and the slide rail 13;
the cleaning mechanism 3 comprises a cleaning box 31, an ultrasonic cleaning machine 32, a circulating pump 33 and a transmission pipe 34, the ultrasonic cleaning machine 32 is arranged at the bottom end inside the cleaning box 31, the circulating pump 33 is arranged at the rear side of the cleaning box 31, the transmission pipe 34 is connected onto the circulating pump 33, a high-pressure nozzle 35 is arranged on the transmission pipe 34, a limiting frame 36 is arranged on the inner side surface of the cleaning box 31, a limiting slide rail 37 is arranged on the lower side of the limiting frame 36, the inner side surface of the cleaning box 31 of the limiting slide rail 37 is of a Z-shaped structure, a first matching rack 38 is arranged on the opposite side of the lower end of the limiting slide rail 37, a second matching rack 39 is arranged on the lower side of the limiting slide rail 37, and a draining rack 310 is arranged between the cleaning box 31 and the drying mechanism 4;
the drying mechanism 4 comprises a sealing box 41, an exhaust fan 42, a hot air blower 43 and a drying nozzle 44, wherein the exhaust fan 42 is installed at the upper end of the sealing box 41, the hot air blower 43 is arranged at the lower end of the sealing box 41, and the hot air blower 43 is connected to the drying nozzle 44 in the sealing box 41 through a pipeline;
the washing mechanism 5 comprises a moving block 51, a connecting rod 52, a moving frame 53 and a first matching gear 54, the connecting rod 52 is mounted at the lower end of the moving block 51, the moving frame 53 is connected to the lower end of the connecting rod 52, a clamping mechanism 6 is arranged on the inner side of the moving frame 53, the first matching gear 54 is connected to the lower end of the clamping mechanism 6, a limiting disc 55 is connected to the lower side of the first matching gear 54, a washing brush 57 is arranged on the lower side of the limiting disc 55, a round crystal storage box 7 is arranged between the limiting disc 55 and the washing brush 57, the power end of the washing brush 57 is connected with a second matching gear 56, the front side of the first matching gear 54 is matched with the first matching rack 38, the rear side of the first matching gear 54 is limited by a limiting slide rail 37, and the rear end of the second matching gear 56 is matched with the second matching rack 39.
Preferably: the clamping mechanism 6 comprises a first sliding column 61, a first return spring 62 and a sliding chute 63, wherein the first return spring 62 is arranged on the outer side of the first sliding column 61, the lower end of the first return spring 62 is connected with a first matching gear 54, the sliding chute 63 is formed between the first matching gear 54 and the first sliding column 61, when the limiting sliding rail 37 gradually becomes lower, the first matching gear 54 is pressed to become lower to slide downwards on the first sliding column 61, and meanwhile, the limiting disc 55 is driven to press the round crystal storage box 7 on the upper end of the cleaning brush 57; the support frame 12 is connected with the upright post 11 through welding, the slide rail 13 is connected with the support frame 12 through bolts, the slide rail 13 is hollow inside, a groove for limiting the moving block 51 is formed in the bottom of the slide rail 13, and the slide rail 13 plays a role in transmission; the motor mounting frame 21 is connected with the motor 22 through bolts, the motor 22 is connected with the transmission chain group 23 through bolts, a clamping block is arranged on the transmission chain group 23 and matched with a chain on the moving block 51, and the transmission chain group 23 plays a role in driving the washing mechanism 5 to move; the included angle range between the high-pressure spray head 35 and the horizontal plane is 20 degrees to 70 degrees, the high surface of the limiting slide rail 37 is the same as the initial position of the first matching gear 54, the low surface of the limiting slide rail 37 is the same as the height of the first matching rack 38, and the high-pressure spray head 35 cleans the exterior and the interior of the round crystal storage box 7; the limiting disc 55 is in key connection with the first matching gear 54, the limiting disc 55 is made of rubber, and the limiting disc 55 is used for tightly pressing the round crystal storage box 7, so that the round crystal storage box 7 can be matched with the cleaning brush 57 to rotate reversely; the second matching gear 56 is connected with the moving frame 53 through a bearing seat, the cleaning brush 57 is in key connection with the second matching gear 56, and the moving frame 53 plays a role in installation and fixation; the cleaning brush 57 is made of a soft brush, and the cleaning brush 57 cleans the inner side surface of the wafer storage box 7 and simultaneously ensures that the inner side surface is not damaged; the first mating gear 54 is slidably connected to the first sliding column 61, the first return spring 62 is connected to the moving frame 53 and the first mating gear 54 through screws, and the first mating gear 54 is used for driving the limiting disc 55 to descend and rotate.
Example 2
As shown in fig. 9, the present embodiment is different from embodiment 1 in that:
the clamping mechanism 6 includes a second sliding column 611, a connecting block 612, a second return spring 613, and a sliding slot 63, the first engaging gear 54 is slidably connected to the outside of the second sliding column 611, the sliding slot 63 is provided between the second sliding column 611 and the first engaging gear 54, the connecting block 612 is provided on the inner side of the first engaging gear 54, the connecting block 612 is connected to the second sliding column 611 through the second return spring 613, a slot for the connecting block 612 to slide is provided on the second sliding column 611, when the limiting sliding rail 37 gradually becomes lower, the first engaging gear 54 is pressed to become lower and slide downward on the second sliding column 611, and at the same time, the limiting disc 55 is driven to press the round crystal storage box 7 on the upper end of the cleaning brush 57.
The working principle is as follows: before the feeding end of the cleaning box 31, the wafer storage box 7 is placed on the outer side of the cleaning brush 57, then the transmission chain group 23 drives the chain at the upper end of the moving block 51 to start conveying, after the moving frame 53 enters the cleaning box 31, the limiting frame 36 limits the front end and the rear end of the moving frame 53, at this time, the first matching gear 54 contacts the high-level surface of the limiting slide rail 37, the limiting slide rail 37 gradually becomes lower, the first matching gear 54 is gradually pressed down, when the limiting slide rail 37 reaches the lowest surface, the first matching gear 54 drives the limiting disc 55 to press down, the limiting disc 55 tightly presses the wafer storage box 7 on the upper end surface of the cleaning brush 57, at this time, the first matching gear 54 contacts the first matching rack 38, the second matching gear 56 contacts the second matching rack 39, the first matching gear 54 and the second matching gear 56 rotate reversely, while the wafer storage box 7 and the cleaning brush 57 also rotate reversely, and simultaneously the three high-pressure spray heads 35 spray water, the inner surface and the outer surface of the round crystal storage box 7 are cleaned, after the cleaning, the first matching gear 54 is separated from the limiting slide rail 37, the first matching gear 54 drives the limiting disc 55 to reset, the round crystal storage box enters the draining rack 310 for draining, and then the round crystal storage box 7 can be taken down after the round crystal storage box enters the sealing box 41 for drying.
The foregoing illustrates and describes the principles, general features, and advantages of the present invention. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, which are described in the specification and illustrated only to illustrate the principle of the present invention, but that various changes and modifications may be made therein without departing from the spirit and scope of the present invention, which fall within the scope of the invention as claimed.
Claims (8)
1. The utility model provides a wash drying machine for wafer storage box which characterized in that: the washing machine comprises a supporting mechanism (1), a conveying mechanism (2), a cleaning mechanism (3) and a drying mechanism (4), wherein the conveying mechanism (2) is installed at the upper end of the supporting mechanism (1), the cleaning mechanism (3) is arranged at the lower side of the conveying mechanism (2), the drying mechanism (4) is arranged at the rear side of the cleaning mechanism (3), a washing mechanism (5) is hoisted on the conveying mechanism (2), and a clamping mechanism (6) is arranged at the inner side of the washing mechanism (5);
the supporting mechanism (1) comprises an upright post (11), a supporting frame (12) and a sliding rail (13), the supporting frame (12) is installed at the upper end of the upright post (11), and the sliding rail (13) is connected to the outer side of the supporting frame (12);
the conveying mechanism (2) comprises a motor mounting frame (21), an electric motor (22) and a transmission chain group (23), the motor mounting frame (21) is mounted at the upper end of the sliding rail (13), the electric motor (22) is mounted at the upper end of the motor mounting frame (21), the transmission chain group (23) is mounted at the power output end of the electric motor (22), and a matching groove is formed between the transmission chain group (23) and the sliding rail (13);
the cleaning mechanism (3) comprises a cleaning box (31), an ultrasonic cleaning machine (32), a circulating pump (33) and a transmission pipe (34), the bottom end in the cleaning box (31) is provided with the ultrasonic cleaning machine (32), the back side of the cleaning box (31) is provided with the circulating pump (33), the circulating pump (33) is connected with the transmission pipe (34), a high-pressure spray head (35) is arranged on the transmission pipe (34), a limiting frame (36) is arranged on the inner side surface of the cleaning box (31), a limiting slide rail (37) is arranged on the lower side of the limiting frame (36), the inner side surface of the limiting slide rail (37) in the cleaning box (31) is of a Z-shaped structure, and the opposite side of the lower end of the limit slide rail (37) is provided with a first matching rack (38), a second matching rack (39) is arranged on the lower side of the limiting slide rail (37), and a draining rack (310) is arranged between the cleaning box (31) and the drying mechanism (4);
the drying mechanism (4) comprises a sealing box (41), an exhaust fan (42), a hot air blower (43) and a drying nozzle (44), wherein the exhaust fan (42) is installed at the upper end of the sealing box (41), the hot air blower (43) is arranged at the lower end of the sealing box (41), and the hot air blower (43) is connected to the drying nozzle (44) in the sealing box (41) through a pipeline;
the cleaning mechanism (5) comprises a moving block (51), a connecting rod (52), a moving frame (53) and a first matching gear (54), the connecting rod (52) is installed at the lower end of the moving block (51), the moving frame (53) is connected to the lower end of the connecting rod (52), the clamping mechanism (6) is arranged on the inner side of the moving frame (53), the first matching gear (54) is connected to the lower end of the clamping mechanism (6), a limiting disc (55) is connected to the lower portion of the first matching gear (54), a cleaning brush (57) is arranged on the lower side of the limiting disc (55), a round crystal storage box (7) is arranged between the limiting disc (55) and the cleaning brush (57), the power end of the cleaning brush (57) is connected with a second matching gear (56), the front side of the first matching gear (54) is matched with the first matching rack (38), the rear side of the first matching gear (54) is limited by the limiting slide rail (37), the rear end of the second matching gear (56) is matched with the second matching rack (39);
the cleaning brush (57) is made of a soft brush.
2. The integrated cleaning and drying machine for wafer storage boxes according to claim 1, wherein: clamping mechanism (6) include first traveller (61), first reset spring (62), spout (63), first traveller (61) outside is provided with first reset spring (62), first reset spring (62) lower extreme is connected first cooperation gear (54), first cooperation gear (54) with the shaping has between first traveller (61) spout (63).
3. The integrated cleaning and drying machine for wafer storage boxes according to claim 1, wherein: the clamping mechanism (6) comprises a second sliding column (611), a connecting block (612), a second return spring (613) and a sliding groove (63), the first matching gear (54) is connected to the outer portion of the second sliding column (611) in a sliding mode, the sliding groove (63) is formed between the second sliding column (611) and the first matching gear (54), the connecting block (612) is arranged on the inner side face of the first matching gear (54), the connecting block (612) is connected with the second sliding column (611) through the second return spring (613), and a groove used for the connecting block (612) to slide is formed in the second sliding column (611).
4. The integrated cleaning and drying machine for wafer storage boxes according to claim 1, wherein: the motor mounting frame (21) is connected with the motor (22) through bolts, the motor (22) is connected with the transmission chain group (23) through bolts, a clamping block is arranged on the transmission chain group (23), and the clamping block is matched with a chain on the moving block (51).
5. The integrated cleaning and drying machine for wafer storage boxes according to claim 1, wherein: the included angle scope between high pressure nozzle (35) and the horizontal plane is 20 degrees to 70 degrees, spacing slide rail (37) high face with first cooperation gear (54) initial position is the same, spacing slide rail (37) low face with first cooperation rack (38) height is the same.
6. The integrated cleaning and drying machine for wafer storage boxes according to claim 1, wherein: spacing dish (55) key-type connection first cooperation gear (54), spacing dish (55) material is rubber.
7. The integrated cleaning and drying machine for wafer storage boxes according to claim 1, wherein: the second mating gear (56) is connected with the moving frame (53) through a bearing seat, and the cleaning brush (57) is in key connection with the second mating gear (56).
8. The integrated cleaning and drying machine for wafer storage boxes according to claim 2, wherein: the first mating gear (54) is slidably connected with the first sliding column (61), and the first return spring (62) is connected with the moving frame (53) and the first mating gear (54) through screws.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110171665.9A CN112934841B (en) | 2021-02-08 | 2021-02-08 | A wash drying machine for wafer case |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110171665.9A CN112934841B (en) | 2021-02-08 | 2021-02-08 | A wash drying machine for wafer case |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN112934841A CN112934841A (en) | 2021-06-11 |
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| CN202290684U (en) * | 2011-10-17 | 2012-07-04 | 中芯国际集成电路制造(上海)有限公司 | Automatic cleaning device for wafer box |
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