CN115870265A - Cleaning device and method for silicon wafer box - Google Patents
Cleaning device and method for silicon wafer box Download PDFInfo
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- CN115870265A CN115870265A CN202211603487.3A CN202211603487A CN115870265A CN 115870265 A CN115870265 A CN 115870265A CN 202211603487 A CN202211603487 A CN 202211603487A CN 115870265 A CN115870265 A CN 115870265A
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract
The invention discloses a cleaning device and a method for a silicon wafer box, and the cleaning device comprises a shell, an electric annular slide rail, a rotary lifting mechanism, a fixing frame, a cleaning chamber and a liquid storage chamber, wherein the middle part of the front side of the shell is provided with an operation window, the bottom of the operation window is provided with an operation platform, the electric annular slide rail is fixedly arranged at the top in the shell, a plurality of slide blocks are uniformly arranged on the electric annular slide rail, the rotary lifting mechanism is fixedly arranged at the bottom end of the slide block, the fixing frame is detachably and fixedly arranged at the bottom end of the rotary lifting mechanism, the cleaning chamber comprises a first cleaning chamber, a second cleaning chamber and a drying chamber which are sequentially arranged along the sliding direction of the slide blocks, the side wall of the first cleaning chamber is uniformly provided with a plurality of nozzle assemblies, the inside of the second cleaning chamber is provided with an ultrasonic cleaner, and the side wall of the drying chamber is provided with a drying assembly; the cleaning device can achieve the purpose of continuous cleaning, and can ensure the cleanliness and dryness of the wafer box.
Description
Technical Field
The invention relates to the technical field of silicon wafer production equipment, in particular to a cleaning device and a cleaning method for a silicon wafer box.
Background
In the production process of a semiconductor silicon single crystal material, a silicon wafer needs to be placed in a silicon wafer box for storage, when the silicon wafer box is used, due to the fact that the friction between the silicon wafer and the silicon wafer box can leave stains in the silicon wafer box, the stains mainly comprise particle impurities and metal ions, the stains can directly influence the quality of the silicon wafer, the silicon wafer box needs to be cleaned in time, and the cleanliness and the dryness of the silicon wafer box are guaranteed.
The existing cleaning equipment adopts pure water to spray, particle impurities and metal ions on the inner surface of the wafer box are removed, and then hot drying is carried out, so that the surface cleanliness and the dryness of the wafer box are ensured. Like publication number CN217411649U discloses a portable major diameter silicon chip spool box cleaning equipment, the on-line screen storage device comprises a base, the top of base is provided with the washing case, the inside fixed mounting of base has the motor, the output of motor runs through the washing case and installs the center pin, the outside fixed surface of center pin installs the spool box frame, the washing case inside of spool box frame top is encircleed and is provided with the mouth that sprays, the washing case inner wall that sprays the mouth top is encircleed and is provided with the stoving pipe, a side surface of washing case is provided with the heating pipe, the below of heating pipe is provided with the temperature controller, a side surface of washing case runs through and is provided with the overflow pipe. Through the airtight space that sets up for do not contact with the external world in the silicon chip spool box cleaning process, spray through 3 pure water simultaneously, and dry in turn through 12 rotatory high temperature cooperations low temperatures, improved the whole cleanliness of spool box greatly.
However, after a batch of silicon wafer boxes are cleaned, the portable large-diameter silicon wafer box cleaning equipment needs to be stopped to replace the next batch of silicon wafer boxes to be cleaned, cannot be continuously cleaned, is not suitable for large-batch cleaning, and is frequently started and shut down to shorten the service life of the cleaning equipment.
Disclosure of Invention
The invention aims to provide a cleaning device and a cleaning method for a silicon wafer box, which can carry out continuous cleaning without shutdown and can ensure the cleanliness and the dryness of the wafer box so as to solve the problems in the background art.
The purpose of the invention can be realized by the following technical scheme:
a cleaning device for a silicon wafer box comprises a shell, wherein an operation window is arranged in the middle of the front side of the shell, and an operation table is arranged at the bottom of the operation window; further comprising:
the electric annular sliding rail is fixedly arranged at the top in the shell, a plurality of sliding blocks are uniformly arranged on the electric annular sliding rail, and the sliding blocks can synchronously slide on the electric annular sliding rail;
the rotary lifting mechanism is fixedly arranged at the bottom end of the sliding block;
the fixing frame is detachably and fixedly arranged at the bottom end of the rotary lifting mechanism and is used for fixing the box body and the box cover of the film box;
the cleaning device comprises a cleaning chamber and a drying chamber, wherein the cleaning chamber comprises a first cleaning chamber, a second cleaning chamber and the drying chamber which are sequentially arranged along the sliding direction of a sliding block, a plurality of nozzle assemblies are uniformly arranged on the side wall of the first cleaning chamber, an ultrasonic cleaning machine is arranged in the second cleaning chamber, and a drying assembly is arranged on the side wall of the drying chamber;
the liquid storage chamber, the liquid storage chamber top sets up the hydraulic pump, and the hydraulic pump is used for carrying the interior washing liquid of liquid storage chamber to in nozzle assembly and the ultrasonic cleaner respectively.
As a further scheme of the invention: the rotary lifting mechanism comprises:
the servo motor is fixedly arranged at the bottom end of the sliding block;
electric telescopic handle, fixed connection in servo motor's output, electric telescopic handle's output and mount detachable fixed connection.
As a further scheme of the invention: the mount includes:
the center of the top of the T-shaped base is provided with a connecting hole, the output end of the electric telescopic rod is inserted into the connecting hole, and the T-shaped base is symmetrically provided with two inclined plates;
and the two limiting parts are respectively arranged between the two inclined plates.
As a further scheme of the invention: the stopper includes:
the bottom of the circular ring is uniformly provided with a plurality of connecting columns, and the connecting columns fixedly connect the circular ring to the inclined plate;
the two limiting rods are symmetrically arranged on the circular ring, and one end of each limiting rod is hinged to the circular ring;
the clamping piece is arranged on the circular ring and used for fixing the other end of the limiting rod on the circular ring;
the sucking disc, it is a plurality of the sucking disc evenly sets up on the hang plate, and the sucking disc is located the circular ring.
As a further scheme of the invention: the nozzle assembly includes:
the upper nozzle is obliquely arranged on the upper section of the side wall of the first cleaning chamber downwards, and the inclination angle is 30-45 degrees;
the lower nozzle is arranged on the lower section of the side wall of the first cleaning chamber in an upward inclined mode, and the inclined angle is 30-45 degrees.
As a further scheme of the invention: the drying assembly comprises:
the fans are uniformly arranged on the side wall of the drying chamber;
and the heating element is arranged between the upper wall and the lower wall of the drying chamber in a spanning manner and is positioned in front of the fan.
As a further scheme of the invention: the heating member includes:
the two steel wire meshes are arranged between the upper wall and the lower wall of the drying chamber in a front-back layered manner;
and the heating wires are arranged between the two steel wire meshes.
As a further scheme of the invention: the cleaning chamber further comprises an air drying chamber, the air drying chamber is arranged on one side of the drying chamber along the sliding direction of the sliding block, and a plurality of fans are arranged on the inner side wall of the air drying chamber.
And a method for cleaning a silicon wafer cassette, characterized by comprising the steps of:
s1, fixing a plurality of box bodies to be cleaned and a box cover on a plurality of fixing frames exposed in an operation window in a separated manner;
s2, starting a hydraulic pump, and respectively conveying the cleaning liquid in the liquid storage chamber to the nozzle assembly and the ultrasonic cleaning machine;
s3, starting the electric annular sliding rail, moving the fixing frame provided with the wafer box to the upper side of the first cleaning chamber by the sliding block, stopping the electric annular sliding rail, starting the rotary lifting mechanism, moving the fixing frame provided with the wafer box to the first cleaning chamber by the rotary lifting mechanism, and performing spray cleaning on the box body and the box cover by the nozzle assembly;
s4, repeating the process of S3 after the spray cleaning is finished, and sequentially finishing the ultrasonic cleaning, drying and air drying procedures;
s5, in the processes of spraying, cleaning, ultrasonic cleaning, drying and air drying, the electric annular slide rail stops, the cleaned box body and the cleaned box cover are taken down from the fixing frame in the gap, and a new box body and a new box cover to be cleaned are replaced, so that continuous cleaning is achieved.
The invention has at least the following beneficial effects:
(1) The cleaning device is characterized in that an electric annular slide rail, a rotary lifting mechanism, a fixing frame and a cleaning chamber are arranged, a plurality of slide blocks capable of sliding synchronously are uniformly arranged on the electric annular slide rail, the slide blocks drive the fixing frame to move on the electric annular slide rail through the rotary lifting mechanism, the fixing frame is used for fixedly mounting a box body to be cleaned and a box cover, the spraying cleaning, the ultrasonic cleaning, the drying and the air drying of a box body are sequentially completed along with the movement of the fixing frame for one circle on the electric annular slide rail, and the cleanliness and the dryness of the box body are guaranteed;
(2) After accomplishing round cleaning procedure, in the box body and the lid that the washing was accomplished got back to the operating window, spraying washing, ultrasonic cleaning, stoving and air-dry in-process electronic annular slide rail stopped to remove, the workman personnel can take off the box body and the lid that the washing was accomplished from the mount at this interval to change new box body and the lid of treating the washing, thereby reach the abluent mesh of continuity.
Drawings
The invention is further described below with reference to the accompanying drawings.
FIG. 1 is a schematic front view of the overall structure of the present invention;
FIG. 2 is a schematic cross-sectional view of the overall structure of the present invention;
FIG. 3 is a schematic top view of the overall structure of the present invention;
FIG. 4 is a schematic top view of the electric endless track structure of the present invention;
FIG. 5 is a schematic view of the structure of the fixing frame of the present invention;
FIG. 6 is a schematic view of a first cleaning chamber according to the present invention;
FIG. 7 is a schematic view of a drying chamber according to the present invention;
FIG. 8 is a schematic view of the air-drying chamber of the present invention;
FIG. 9 is a schematic view of the engaging member of the present invention.
In the figure: 1. a housing; 2. operating a window; 3. an operation table; 4. an electric annular slide rail; 5. a slider; 6. a rotary lifting mechanism; 7. a fixed mount; 8. a first cleaning chamber; 9. a second cleaning chamber; 10. a drying chamber; 11. a nozzle assembly; 12. an ultrasonic cleaning machine; 13. a drying assembly; 14. a liquid storage chamber; 15. a hydraulic pump; 16. a servo motor; 17. an electric telescopic rod; 18. a T-shaped base; 19. connecting holes; 20. an inclined plate; 21. a stopper; 22. a circular ring; 23. connecting columns; 24. a limiting rod; 25. a suction cup; 26. an upper nozzle; 27. a lower nozzle; 28. a fan; 29. steel wire mesh; 30. heating wires; 31. an air drying chamber; 32. an integrated control panel; 33. a hemispherical fixture block; 34. a spring.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1-9, the present invention provides a cleaning device for silicon wafer cassettes, which comprises a housing 1, an electric ring-shaped slide rail 4, a rotary lifting mechanism 6, a fixing frame 7, a cleaning chamber and a liquid storage chamber 14.
The middle part of the front side of the shell 1 is provided with an operation window 2, the bottom of the operation window 2 is provided with an operation table 3, the operation table 3 is used for placing a silicon wafer box to be cleaned and recovering the cleaned silicon wafer box, the operation window 2 is used for fixedly installing the box body and the cover body to be cleaned on a fixed frame 7 and taking the cleaned box body and the cleaned cover body off the fixed frame 7 from the fixed frame 7; the electric annular slide rail 4 is fixedly arranged at the inner top of the shell 1, the electric annular slide rail 4 can be fixedly connected with the top wall of the shell 1 through a plurality of mounting posts uniformly arranged at the top of the electric annular slide rail 4, a plurality of slide blocks 5 are uniformly arranged on the electric annular slide rail 4, the plurality of slide blocks 5 can synchronously slide on the electric annular slide rail 4, preferably, as shown in fig. 3, the electric annular slide rail 4 is a quasi-rectangular slide rail, four slide blocks 5 are uniformly arranged on two long edges of the quasi-rectangular slide rail respectively, and two slide blocks 5 are arranged on two short edges of the quasi-rectangular slide rail respectively; as shown in fig. 1, four rotary lifting mechanisms 6 and fixed frames 7 on one long side are always positioned in the operation window 2; the rotary lifting mechanism 6 is fixedly arranged at the bottom end of the sliding block 5, and the sliding block 5 is used for driving the rotary lifting mechanism 6 to move on the electric annular sliding rail 4; the fixed frame 7 is detachably and fixedly arranged at the bottom end of the rotary lifting mechanism 6, and the fixed frame 7 is used for fixing the box body and the box cover; the rotary lifting mechanism 6 is not only used for driving the fixed frame 7 to move synchronously, but also used for driving the fixed frame 7 to rotate, lift and move; the cleaning chamber comprises a first cleaning chamber 8, a second cleaning chamber 9 and a drying chamber 10 which are sequentially arranged along the sliding direction of the sliding block 5, a plurality of nozzle assemblies 11 are uniformly arranged on the side wall of the first cleaning chamber 8, the nozzle assemblies 11 are used for spraying and cleaning the box body and the box cover on the fixing frame 7, particle impurities and metal ions attached to the box body and the box cover are preliminarily cleaned, an ultrasonic cleaning machine 12 is arranged in the second cleaning chamber 9, the ultrasonic cleaning machine 12 is used for carrying out ultrasonic cleaning on the box body and the box cover on the fixing frame 7, particle impurities and metal ions which are difficult to clean in the preliminary cleaning are further cleaned, a drying assembly 13 is arranged on the side wall of the drying chamber 10, and the drying assembly 13 is used for drying the box body and the box cover on the fixing frame 7; the top of the liquid storage chamber 14 is provided with a hydraulic pump 15, and the hydraulic pump 15 is used for conveying the cleaning liquid in the liquid storage chamber 14 to the nozzle assembly 11 and the ultrasonic cleaning machine 12 respectively.
In this embodiment, the rotary lifting mechanism 6 specifically includes a servo motor 16 and an electric telescopic rod 17, and the servo motor 16 is fixedly mounted at the bottom end of the sliding block 5; the electric telescopic rod 17 is fixedly connected with the output end of the servo motor 16, and the output end of the electric telescopic rod 17 is detachably and fixedly connected with the fixed frame 7; the servo motor 16 drives the electric telescopic rod 17 to rotate, and the electric telescopic rod 17 drives the fixing frame 7 to move up and down, so that the fixing frame 7 can rotate, lift and move.
In this embodiment, the fixing frame 7 includes a T-shaped base 18 and two limiting members 21, a connecting hole 19 is formed in the center of the top of the T-shaped base 18, the output end of the electric telescopic rod 17 is inserted into the connecting hole 19, so that the T-shaped base 18 and the electric telescopic rod 17 are fixedly connected, and two inclined plates 20 are symmetrically arranged on the T-shaped base 18; the two limiting parts 21 are respectively arranged between the two inclined plates 20, wherein the limiting part 21 of one inclined plate 20 is used for fixing a box body of the silicon wafer box, and the other inclined plate 20 is used for fixing a box cover of the silicon wafer box.
Preferably, the limiting member 21 specifically includes a circular ring 22, two limiting rods 24, a clamping member and a suction cup 25, the bottom of the circular ring 22 is uniformly provided with a plurality of connecting columns 23, the connecting columns 23 fixedly connect the circular ring 22 to the inclined plate 20, and the box body or the box cover is placed in the circular ring 22; the two limiting rods 24 are symmetrically arranged on the circular ring 22, one end of each limiting rod 24 is hinged to the circular ring 22, the clamping piece is arranged on the circular ring 22 and used for fixing the other end of each limiting rod 24 to the circular ring 22, the limiting rods 24 limit the box body or the box cover in the circular ring 22, the plurality of suckers 25 are uniformly arranged on the inclined plate 20, the suckers 25 are located in the circular ring 22, and the suckers 25 are used for being adsorbed to the bottom surface of the box body or the box cover, so that the box body or the box cover does not collide with the circular ring 22 in the rotating and lifting process; preferably, the clamping member includes a spring 34 and a hemispherical latch 33, the spring 34 is disposed in blind holes formed in two sides of a slot on the circular ring 22, the hemispherical latch 33 is fixedly disposed at a movable end of the spring 34, the hemispherical surface of the hemispherical latch 33 is located in the slot on the circular ring 22 in a natural state of the spring 34, the end of the limiting rod 24 is adapted to the slot on the circular ring 22, two sides of the end of the limiting rod 24 are respectively provided with a groove matched with the hemispherical surface of the hemispherical latch 33, in use, the hemispherical surface of the hemispherical latch 33 is latched in the groove, so that the limiting rod 24 is clamped and fixed on the circular ring 22.
In this embodiment, the nozzle assembly 11 specifically includes an upper nozzle 26 and a lower nozzle 27, the upper nozzle 26 is disposed at the upper section of the sidewall of the first cleaning chamber 8 in a downward inclination manner, and the inclination angle is 30 ° to 45 °; the lower nozzle 27 is arranged on the lower section of the side wall of the first cleaning chamber 8 in an upward inclined way, and the inclined angle is 30-45 degrees. The upper nozzle 26 and the lower nozzle 27 spray and clean the box body and the box cover which rotate and lift from a plurality of angles from top to bottom, and primarily clean off particle impurities and metal ions attached in the box body and the box cover.
In this embodiment, the drying assembly 13 specifically includes a fan 28 and a heating element, and the fans 28 are uniformly disposed on the sidewall of the drying chamber 10; the heating elements are arranged between the upper wall and the lower wall of the drying chamber 10 in a spanning mode and are positioned in front of the fan 28, preferably, the heating elements specifically comprise steel wire meshes 29 and heating wires 30, and the two steel wire meshes 29 are arranged between the upper wall and the lower wall of the drying chamber 10 in a spanning mode in a front-back layered mode; the heating wire 30 is arranged between the two wire meshes 29. The plurality of fans 28 rotate simultaneously to blow hot air generated by the heating wires 30 into the drying chamber 10, and the cleaned box body and box cover are quickly dried.
In this embodiment, furthermore, still be provided with air-dry chamber 31 in the wash chamber, air-dry chamber 31 sets up in drying chamber 10 one side along the slider 5 slip direction, sets up a plurality of fans 28 on the air-dry chamber 31 inside wall, and a plurality of fans 28 cool down the box body after drying and the lid air-dry.
It should be noted that an integrated control panel 32 is further disposed on the front side of the housing 1, each electrical component in the present invention is electrically connected to the integrated control panel 32, and the start/stop time of each electrical component and the time for spray cleaning, ultrasonic cleaning, drying and air drying are set and adjusted by the integrated control panel 32, so that each electrical component is cooperatively matched with each other, thereby achieving the purpose of continuous cleaning.
The specific method for cleaning the silicon wafer cassette by using the cleaning device in the above embodiment is as follows:
step one, fixing four box bodies to be cleaned and a box cover on four fixing frames 7 exposed in an operation window 2 separately;
step two, starting the hydraulic pump 15, and respectively conveying the cleaning liquid in the liquid storage chamber 14 to the nozzle assembly 11 and the ultrasonic cleaning machine 12;
step three, starting the electric annular slide rail 4, moving the two fixing frames 7 provided with the film boxes to the upper part of a first cleaning chamber 8 by the slide block 5 according to preset parameters, automatically stopping the electric annular slide rail 4, automatically starting the two rotary lifting mechanisms 6, moving the fixing frames 7 provided with the film boxes to the first cleaning chamber 8 by the rotary lifting mechanisms 6, rotating the fixing frames 7 in the first cleaning chamber 8 to perform lifting motion, and starting the nozzle assembly 11 to perform spray cleaning on the box body and the box cover;
after the spray cleaning is finished, repeating the process of S3, and sequentially finishing the ultrasonic cleaning, drying and air drying procedures, wherein after all the procedures are finished, the box body and the box cover just move on the electric annular slide rail 4 for a circle and return to the operation window 2, and preferably, the time of the spray cleaning, the ultrasonic cleaning, the drying and the air drying procedures is set to 60S;
and step five, stopping the electric annular slide rail 4 in the processes of spray cleaning, ultrasonic cleaning, drying and air drying, taking the cleaned box body and box cover down from the fixed frame 7 in the gap, and replacing the new box body and box cover to be cleaned, thereby achieving continuous cleaning.
The above detailed description of the preferred embodiments of the present invention should not be taken as limiting the scope of the invention. All equivalent changes and modifications made within the scope of the present invention shall fall within the scope of the present invention.
Claims (9)
1. A cleaning device for a silicon wafer box comprises a shell (1), wherein an operation window (2) is formed in the middle of the front side of the shell (1), and an operation table (3) is arranged at the bottom of the operation window (2); it is characterized by also comprising:
the electric annular sliding rail (4) is fixedly arranged at the top in the shell (1), a plurality of sliding blocks (5) are uniformly arranged on the electric annular sliding rail (4), and the sliding blocks (5) can synchronously slide on the electric annular sliding rail (4);
the rotary lifting mechanism (6) is fixedly arranged at the bottom end of the sliding block (5);
the fixing frame (7) is detachably and fixedly arranged at the bottom end of the rotary lifting mechanism (6), and the fixing frame (7) is used for fixing the wafer box body and the box cover;
the cleaning device comprises a cleaning chamber, a drying chamber and a cleaning device, wherein the cleaning chamber comprises a first cleaning chamber (8), a second cleaning chamber (9) and the drying chamber (10) which are sequentially arranged along the sliding direction of a sliding block (5), a plurality of nozzle assemblies (11) are uniformly arranged on the side wall of the first cleaning chamber (8), an ultrasonic cleaning machine (12) is arranged in the second cleaning chamber (9), and a drying assembly (13) is arranged on the side wall of the drying chamber (10);
liquid storage chamber (14), liquid storage chamber (14) top sets up hydraulic pump (15), and hydraulic pump (15) are used for carrying the washing liquid in liquid storage chamber (14) respectively to in nozzle assembly (11) and ultrasonic cleaner (12).
2. A cleaning apparatus of a silicon wafer cassette as set forth in claim 1, wherein said rotary elevating mechanism (6) comprises:
the servo motor (16) is fixedly arranged at the bottom end of the sliding block (5);
electric telescopic handle (17), fixed connection is in the output of servo motor (16), the output and the mount (7) detachable fixed connection of electric telescopic handle (17).
3. A cleaning apparatus of silicon wafer cassettes as claimed in claim 2, wherein said holder (7) comprises:
the electric telescopic rod comprises a T-shaped base (18), wherein a connecting hole (19) is formed in the center of the top of the T-shaped base (18), the output end of the electric telescopic rod (17) is inserted into the connecting hole (19), and two inclined plates (20) are symmetrically arranged on the T-shaped base (18);
two limiting pieces (21) are respectively arranged between the two inclined plates (20).
4. A cleaning device of a silicon wafer cassette according to claim 3, wherein the stopper (21) comprises:
the bottom of the circular ring (22) is uniformly provided with a plurality of connecting columns (23), and the connecting columns (23) fixedly connect the circular ring (22) to the inclined plate (20);
the two limiting rods (24) are symmetrically arranged on the circular ring (22), and one end of each limiting rod (24) is hinged to the circular ring (22);
the clamping piece is arranged on the circular ring (22) and used for fixing the other end of the limiting rod (24) on the circular ring (22);
and the suckers (25) are uniformly arranged on the inclined plate (20), and the suckers (25) are positioned in the circular ring (22).
5. The cleaning apparatus of a silicon wafer cassette as set forth in claim 1, wherein the nozzle assembly (11) comprises:
the upper nozzle (26) is obliquely arranged on the upper section of the side wall of the first cleaning chamber (8) downwards, and the inclination angle is 30-45 degrees;
the lower nozzle (27) is arranged on the lower section of the side wall of the first cleaning chamber (8) in an upward inclined mode, and the inclined angle is 30-45 degrees.
6. A cleaning apparatus of silicon wafer cassettes as claimed in claim 1, wherein said drying assembly (13) comprises:
the fans (28), a plurality of the fans (28) are uniformly arranged on the side wall of the drying chamber (10);
and the heating element is arranged between the upper wall and the lower wall of the drying chamber (10) in a spanning way, and is positioned in front of the fan (28).
7. The cleaning device of a silicon wafer cassette as set forth in claim 6, wherein the heating member comprises:
the two steel wire meshes (29) are arranged between the upper wall and the lower wall of the drying chamber (10) in a spanning mode at intervals in the front-back direction;
the heating wire (30) is arranged between the two steel wire meshes (29).
8. The cleaning apparatus for silicon wafer cassettes according to any one of claims 1 to 7, wherein said cleaning chamber further comprises an air drying chamber (31), said air drying chamber (31) being provided at one side of the drying chamber (10) in the sliding direction of the slider (5), said air drying chamber (31) being provided at an inner side wall thereof with a plurality of fans (28).
9. A cleaning method of a silicon wafer cassette characterized by being carried out by the cleaning device of a silicon wafer cassette claimed in claim 8, comprising the steps of:
s1, fixing a plurality of box bodies to be cleaned and a box cover on a plurality of fixing frames (7) exposed in an operation window (2) separately;
s2, starting a hydraulic pump (15) and respectively conveying the cleaning liquid in the liquid storage chamber (14) to the nozzle assembly (11) and the ultrasonic cleaning machine (12);
s3, starting the electric annular sliding rail (4), moving the fixing frame (7) provided with the wafer box to the position above the first cleaning chamber (8) by the sliding block (5), stopping the electric annular sliding rail (4), starting the rotary lifting mechanism (6), moving the fixing frame (7) provided with the wafer box to the first cleaning chamber (8) by the rotary lifting mechanism (6), and performing spray cleaning on the box body and the box cover by the nozzle assembly (11);
s4, repeating the process of S3 after the spray cleaning is finished, and sequentially finishing the ultrasonic cleaning, drying and air drying procedures;
s5, in the processes of spraying, cleaning, ultrasonic cleaning, drying and air drying, the electric annular sliding rail (4) stops, the box body and the box cover which are cleaned in the gap are taken down from the fixing frame (7), and the new box body and the new box cover to be cleaned are replaced, so that continuous cleaning is achieved.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211603487.3A CN115870265B (en) | 2022-12-14 | 2022-12-14 | Cleaning device and method for silicon wafer box |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211603487.3A CN115870265B (en) | 2022-12-14 | 2022-12-14 | Cleaning device and method for silicon wafer box |
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| CN115870265A true CN115870265A (en) | 2023-03-31 |
| CN115870265B CN115870265B (en) | 2023-07-14 |
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| CN106733853A (en) * | 2017-01-05 | 2017-05-31 | 丽水市飞天人机械设计有限公司 | A kind of part intelligence cleaning and sterilization drains equipment |
| CN106955864A (en) * | 2017-04-28 | 2017-07-18 | 杭州泰扶新能源有限公司 | Monocrystalline silicon piece cleaning device |
| CN215466778U (en) * | 2020-10-09 | 2022-01-11 | 浙江康鹏半导体有限公司 | Cleaning device for gallium arsenide wafer box |
| CN214398150U (en) * | 2020-12-18 | 2021-10-15 | 陕西佳迪技术工业有限公司 | Support convenient for placing different electrical components |
| CN214066217U (en) * | 2020-12-30 | 2021-08-27 | 浙江荣鑫智能仪表股份有限公司 | Lower box cover of diaphragm gas meter |
| CN112934841A (en) * | 2021-02-08 | 2021-06-11 | 江苏亚电科技有限公司 | A wash drying machine for wafer case |
| CN114602921A (en) * | 2022-03-29 | 2022-06-10 | 中环领先半导体材料有限公司 | Special frame of portable film box cleaning machine film box |
| CN114749406A (en) * | 2022-04-01 | 2022-07-15 | 中环领先半导体材料有限公司 | Portable major diameter silicon chip spool box cleaning equipment |
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