CN114830034B - 转印膜、层叠体的制造方法 - Google Patents

转印膜、层叠体的制造方法 Download PDF

Info

Publication number
CN114830034B
CN114830034B CN202080087102.5A CN202080087102A CN114830034B CN 114830034 B CN114830034 B CN 114830034B CN 202080087102 A CN202080087102 A CN 202080087102A CN 114830034 B CN114830034 B CN 114830034B
Authority
CN
China
Prior art keywords
photopolymerization initiator
photosensitive composition
composition layer
transfer film
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202080087102.5A
Other languages
English (en)
Chinese (zh)
Other versions
CN114830034A (zh
Inventor
丰冈健太郎
有年阳平
霜山达也
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of CN114830034A publication Critical patent/CN114830034A/zh
Application granted granted Critical
Publication of CN114830034B publication Critical patent/CN114830034B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0416—Control or interface arrangements specially adapted for digitisers
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0416—Control or interface arrangements specially adapted for digitisers
    • G06F3/04164—Connections between sensors and controllers, e.g. routing lines between electrodes and connection pads

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Human Computer Interaction (AREA)
  • Inorganic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN202080087102.5A 2019-12-27 2020-11-30 转印膜、层叠体的制造方法 Active CN114830034B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019238559 2019-12-27
JP2019-238559 2019-12-27
PCT/JP2020/044439 WO2021131502A1 (ja) 2019-12-27 2020-11-30 転写フィルム、積層体の製造方法

Publications (2)

Publication Number Publication Date
CN114830034A CN114830034A (zh) 2022-07-29
CN114830034B true CN114830034B (zh) 2025-05-30

Family

ID=76574313

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202080087102.5A Active CN114830034B (zh) 2019-12-27 2020-11-30 转印膜、层叠体的制造方法

Country Status (6)

Country Link
US (1) US20220299872A1 (https=)
JP (1) JP7360476B2 (https=)
KR (1) KR20220100643A (https=)
CN (1) CN114830034B (https=)
TW (1) TW202125108A (https=)
WO (1) WO2021131502A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230296820A1 (en) * 2020-11-26 2023-09-21 Fujifilm Corporation Polarizing plate and image display device

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1877449A (zh) * 2005-06-10 2006-12-13 东进世美肯株式会社 负型感光性树脂组合物
JP2009025482A (ja) * 2007-07-18 2009-02-05 Kaneka Corp 感光性ドライフィルムレジスト及びその利用
CN103885288A (zh) * 2012-12-20 2014-06-25 彩虹科技系统有限公司 用于光成像的可固化涂料
CN104714365A (zh) * 2014-07-01 2015-06-17 广东丹邦科技有限公司 一种感光组合物和光致抗蚀剂
JP2017191204A (ja) * 2016-04-13 2017-10-19 互応化学工業株式会社 感光性樹脂組成物、ドライフィルム、及びプリント配線板
CN107436536A (zh) * 2016-05-26 2017-12-05 太阳油墨制造株式会社 感光性树脂组合物、干膜及印刷电路板的制造方法
CN109791450A (zh) * 2016-09-29 2019-05-21 富士胶片株式会社 触摸面板的制造方法
TW201942142A (zh) * 2018-03-29 2019-11-01 日商富士軟片股份有限公司 感光性轉印材料、電極保護膜、積層體、靜電電容型輸入裝置及觸控面板的製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6724299B2 (ja) 2015-06-18 2020-07-15 日立化成株式会社 感光性樹脂組成物及び感光性エレメント
JP2017215569A (ja) 2016-05-26 2017-12-07 太陽インキ製造株式会社 感光性樹脂組成物、ドライフィルム、およびプリント配線板の製造方法
JP2019175226A (ja) 2018-03-29 2019-10-10 日立化成株式会社 タッチセンサの保護膜形成用感光性フィルム、タッチセンサの保護膜形成用感光性屈折率調整フィルム、タッチセンサの保護膜の形成方法及びタッチパネル

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1877449A (zh) * 2005-06-10 2006-12-13 东进世美肯株式会社 负型感光性树脂组合物
JP2009025482A (ja) * 2007-07-18 2009-02-05 Kaneka Corp 感光性ドライフィルムレジスト及びその利用
CN103885288A (zh) * 2012-12-20 2014-06-25 彩虹科技系统有限公司 用于光成像的可固化涂料
CN104714365A (zh) * 2014-07-01 2015-06-17 广东丹邦科技有限公司 一种感光组合物和光致抗蚀剂
JP2017191204A (ja) * 2016-04-13 2017-10-19 互応化学工業株式会社 感光性樹脂組成物、ドライフィルム、及びプリント配線板
CN107436536A (zh) * 2016-05-26 2017-12-05 太阳油墨制造株式会社 感光性树脂组合物、干膜及印刷电路板的制造方法
CN109791450A (zh) * 2016-09-29 2019-05-21 富士胶片株式会社 触摸面板的制造方法
TW201942142A (zh) * 2018-03-29 2019-11-01 日商富士軟片股份有限公司 感光性轉印材料、電極保護膜、積層體、靜電電容型輸入裝置及觸控面板的製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230296820A1 (en) * 2020-11-26 2023-09-21 Fujifilm Corporation Polarizing plate and image display device

Also Published As

Publication number Publication date
CN114830034A (zh) 2022-07-29
TW202125108A (zh) 2021-07-01
WO2021131502A1 (ja) 2021-07-01
KR20220100643A (ko) 2022-07-15
JP7360476B2 (ja) 2023-10-12
JPWO2021131502A1 (https=) 2021-07-01
US20220299872A1 (en) 2022-09-22

Similar Documents

Publication Publication Date Title
JP7213981B2 (ja) 転写フィルム、積層体の製造方法およびタッチパネルの製造方法
CN114830034B (zh) 转印膜、层叠体的制造方法
CN115298614B (zh) 感光性材料、转印膜、电路布线的制造方法、触摸面板的制造方法、图案形成方法
CN115136073A (zh) 转印薄膜、层叠体的制造方法
JP7696778B2 (ja) タッチパネルセンサー、及び、タッチパネルセンサーの製造方法
CN115668057B (zh) 转印膜、层叠体的制造方法及封端异氰酸酯化合物
JP7514305B2 (ja) 転写フィルム、積層体の製造方法
JP7538224B2 (ja) 転写フィルム及び積層体の製造方法
JP7635244B2 (ja) 転写フィルム、積層体の製造方法、回路配線の製造方法
JP7285331B2 (ja) 組成物、組成物の製造方法、硬化膜、転写フィルムおよびタッチパネルの製造方法
US20220107562A1 (en) Photosensitive resin composition, transfer film, cured film, laminate, and method for manufacturing touch panel
JP7812843B2 (ja) 積層体及び積層体の製造方法
CN114846402A (zh) 感光性转印材料及其制造方法、带图案的金属导电性材料的制造方法、膜、触控面板、劣化抑制方法、以及层叠体
CN115917430A (zh) 转印膜、层叠体的制造方法
CN114902164A (zh) 层叠体的制造方法、层叠体、触摸传感器
JP2025103326A (ja) 転写フィルム、積層体の製造方法
CN117897660A (zh) 感光性组合物、转印膜、图案形成方法、电路布线的制造方法、触摸面板的制造方法
JP2024075592A (ja) 転写フィルム、積層体の製造方法、タッチセンサー、プリント配線基板の製造方法
TW202209077A (zh) 轉印薄膜、積層體的製造方法
CN118235091A (zh) 转印膜、具有导体图案的层叠体及具有导体图案的层叠体的制造方法、转印膜的制造方法
WO2022039027A1 (ja) 感光性組成物、転写フィルム

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant