CN112825326A - 显示设备及其制造装置和方法、掩模组件及其制造方法 - Google Patents
显示设备及其制造装置和方法、掩模组件及其制造方法 Download PDFInfo
- Publication number
- CN112825326A CN112825326A CN202011307981.6A CN202011307981A CN112825326A CN 112825326 A CN112825326 A CN 112825326A CN 202011307981 A CN202011307981 A CN 202011307981A CN 112825326 A CN112825326 A CN 112825326A
- Authority
- CN
- China
- Prior art keywords
- region
- pattern
- substrate
- thickness
- holes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 68
- 238000000034 method Methods 0.000 title claims description 96
- 239000000758 substrate Substances 0.000 claims description 213
- 229920002120 photoresistant polymer Polymers 0.000 claims description 91
- 238000005530 etching Methods 0.000 claims description 68
- 239000000463 material Substances 0.000 claims description 57
- 230000008021 deposition Effects 0.000 claims description 48
- 238000005507 spraying Methods 0.000 claims description 17
- 238000002834 transmittance Methods 0.000 claims description 17
- 230000001678 irradiating effect Effects 0.000 claims description 15
- 230000000149 penetrating effect Effects 0.000 claims description 14
- 239000010410 layer Substances 0.000 description 205
- 239000010409 thin film Substances 0.000 description 141
- 238000000151 deposition Methods 0.000 description 39
- 230000008569 process Effects 0.000 description 39
- 239000000243 solution Substances 0.000 description 39
- 239000003990 capacitor Substances 0.000 description 26
- 238000003860 storage Methods 0.000 description 26
- 239000004065 semiconductor Substances 0.000 description 17
- 238000005538 encapsulation Methods 0.000 description 13
- 239000004417 polycarbonate Substances 0.000 description 13
- 239000002346 layers by function Substances 0.000 description 11
- 239000010408 film Substances 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- -1 polyethylene naphthalate Polymers 0.000 description 10
- 239000002952 polymeric resin Substances 0.000 description 10
- 229920003002 synthetic resin Polymers 0.000 description 10
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 9
- 230000002829 reductive effect Effects 0.000 description 9
- 239000004642 Polyimide Substances 0.000 description 8
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 8
- 239000011368 organic material Substances 0.000 description 8
- 229920001721 polyimide Polymers 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 8
- 239000002356 single layer Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 239000011229 interlayer Substances 0.000 description 7
- 239000011787 zinc oxide Substances 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 230000002093 peripheral effect Effects 0.000 description 6
- 230000001681 protective effect Effects 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 5
- 229910010272 inorganic material Inorganic materials 0.000 description 5
- 239000011147 inorganic material Substances 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 238000007789 sealing Methods 0.000 description 5
- 229910021417 amorphous silicon Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- 229910004205 SiNX Inorganic materials 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 229910052681 coesite Inorganic materials 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 229910052593 corundum Inorganic materials 0.000 description 3
- 229910052906 cristobalite Inorganic materials 0.000 description 3
- 229910003460 diamond Inorganic materials 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 3
- 229920000058 polyacrylate Polymers 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 239000011112 polyethylene naphthalate Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 229910052682 stishovite Inorganic materials 0.000 description 3
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- 229910052905 tridymite Inorganic materials 0.000 description 3
- 229910001845 yogo sapphire Inorganic materials 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 229920008347 Cellulose acetate propionate Polymers 0.000 description 2
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 2
- 239000004695 Polyether sulfone Substances 0.000 description 2
- 239000004697 Polyetherimide Substances 0.000 description 2
- 239000004734 Polyphenylene sulfide Substances 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229920002125 Sokalan® Polymers 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000004590 computer program Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- JAONJTDQXUSBGG-UHFFFAOYSA-N dialuminum;dizinc;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Al+3].[Al+3].[Zn+2].[Zn+2] JAONJTDQXUSBGG-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910000449 hafnium oxide Inorganic materials 0.000 description 2
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920003217 poly(methylsilsesquioxane) Polymers 0.000 description 2
- 239000004584 polyacrylic acid Substances 0.000 description 2
- 229920001230 polyarylate Polymers 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920006393 polyether sulfone Polymers 0.000 description 2
- 229920001601 polyetherimide Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 229910001936 tantalum oxide Inorganic materials 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910001374 Invar Inorganic materials 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000008378 aryl ethers Chemical class 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229920000891 common polymer Polymers 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 229910001195 gallium oxide Inorganic materials 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229910003471 inorganic composite material Inorganic materials 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
- H10K59/353—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels characterised by the geometrical arrangement of the RGB subpixels
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/351—Thickness
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
- H10K59/352—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels the areas of the RGB subpixels being different
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Optics & Photonics (AREA)
- Geometry (AREA)
- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2019-0150484 | 2019-11-21 | ||
| KR20190150484 | 2019-11-21 | ||
| KR20200052893 | 2020-04-29 | ||
| KR10-2020-0052893 | 2020-04-29 | ||
| KR10-2020-0102708 | 2020-08-14 | ||
| KR1020200102708A KR20210063209A (ko) | 2019-11-21 | 2020-08-14 | 표시 장치, 마스크 조립체, 마스크 조립체의 제조방법, 표시 장치의 제조장치 및 표시 자장치의 제조방법 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112825326A true CN112825326A (zh) | 2021-05-21 |
Family
ID=73497523
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011307981.6A Pending CN112825326A (zh) | 2019-11-21 | 2020-11-20 | 显示设备及其制造装置和方法、掩模组件及其制造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US11805678B2 (ja) |
| EP (1) | EP3826070A3 (ja) |
| JP (1) | JP2021081727A (ja) |
| CN (1) | CN112825326A (ja) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111430427A (zh) * | 2020-04-08 | 2020-07-17 | 武汉华星光电半导体显示技术有限公司 | 显示面板及其制造方法 |
| KR20210155428A (ko) * | 2020-06-15 | 2021-12-23 | 삼성디스플레이 주식회사 | 마스크 조립체 |
| US20230200172A1 (en) * | 2021-12-20 | 2023-06-22 | Google Llc | Triad sub-pixel arrangements for under display sensors |
| KR20230097288A (ko) * | 2021-12-23 | 2023-07-03 | 삼성디스플레이 주식회사 | 마스크 어셈블리 및 이를 포함한 증착 설비 |
Family Cites Families (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4440523B2 (ja) * | 2002-09-19 | 2010-03-24 | 大日本印刷株式会社 | インクジェット法による有機ｅｌ表示装置及びカラーフィルターの製造方法、製造装置 |
| JP4459521B2 (ja) * | 2002-10-17 | 2010-04-28 | 大日本印刷株式会社 | エレクトロルミネッセンス表示装置 |
| JP2007200735A (ja) * | 2006-01-27 | 2007-08-09 | Canon Inc | 有機化合物の蒸着方法および装置 |
| KR20070120266A (ko) | 2006-06-19 | 2007-12-24 | 삼성전자주식회사 | 표시 기판 및 이를 포함하는 표시 장치 |
| US9093399B2 (en) * | 2009-05-28 | 2015-07-28 | Sharp Kabushiki Kaisha | Organic electroluminescence display device, method for producing same, color filter substrate and method for producing same |
| JP2011034681A (ja) | 2009-07-29 | 2011-02-17 | Hitachi Displays Ltd | 金属加工方法、金属マスク製造方法及び有機ｅｌ表示装置製造方法 |
| KR20210046847A (ko) | 2012-01-12 | 2021-04-28 | 다이니폰 인사츠 가부시키가이샤 | 수지판을 구비한 금속 마스크, 증착 마스크, 증착 마스크 장치의 제조 방법, 및 유기 반도체 소자의 제조 방법 |
| JP5780350B2 (ja) | 2013-11-14 | 2015-09-16 | 大日本印刷株式会社 | 蒸着マスク、フレーム付き蒸着マスク、及び有機半導体素子の製造方法 |
| KR101674499B1 (ko) | 2015-08-10 | 2016-11-10 | 에이피시스템 주식회사 | 복합 가공 방법을 이용한 섀도우 마스크의 제조방법 및 이에 의해 제조된 섀도우 마스크 |
| WO2017026741A1 (ko) | 2015-08-10 | 2017-02-16 | 에이피시스템 주식회사 | 복합 가공 방법을 이용한 섀도우 마스크의 제조방법 및 이에 의해 제조된 섀도우 마스크 |
| KR101900281B1 (ko) | 2016-07-26 | 2018-09-20 | 에이피시스템 주식회사 | 복합 가공 방법을 이용한 섀도우 마스크의 제조방법 및 이에 의해 제조된 섀도우 마스크 |
| KR20170059526A (ko) | 2015-11-20 | 2017-05-31 | 삼성디스플레이 주식회사 | 마스크 프레임 조립체, 마스크 프레임 조립체 제조 방법 및 표시 장치 제조 방법 |
| KR102541449B1 (ko) * | 2015-12-22 | 2023-06-09 | 삼성디스플레이 주식회사 | 박막 증착용 마스크 어셈블리 |
| KR20220104846A (ko) | 2016-10-07 | 2022-07-26 | 다이니폰 인사츠 가부시키가이샤 | 증착 마스크의 제조 방법, 증착 마스크가 배치된 중간 제품 및 증착 마스크 |
| JP6428903B2 (ja) | 2017-01-17 | 2018-11-28 | 大日本印刷株式会社 | 蒸着マスク及び蒸着マスクの製造方法 |
| JP2018147599A (ja) * | 2017-03-01 | 2018-09-20 | 株式会社Ｊｏｌｅｄ | 有機電界発光素子、有機電界発光パネルおよび発光装置 |
| KR20190116379A (ko) | 2017-03-06 | 2019-10-14 | 엘피케이에프 레이저 앤드 일렉트로닉스 악티엔게젤샤프트 | 기술적 마스크를 제조하기 위한 방법 |
| CN107093616B (zh) | 2017-04-27 | 2019-07-12 | 武汉华星光电技术有限公司 | 有源矩阵有机发光二极管面板及制作其的方法 |
| US10790338B2 (en) * | 2017-07-05 | 2020-09-29 | Sakai Display Products Corporation | Organic EL display apparatus and method of manufacturing organic EL display apparatus |
| KR102520710B1 (ko) * | 2017-09-05 | 2023-04-12 | 삼성디스플레이 주식회사 | 표시 장치 및 이의 제조 방법 |
| KR102358039B1 (ko) | 2017-09-07 | 2022-02-04 | 엘지이노텍 주식회사 | Oled 화소 증착을 위한 금속재의 증착용 마스크 |
| WO2019087749A1 (ja) | 2017-11-01 | 2019-05-09 | 大日本印刷株式会社 | 蒸着マスク装置 |
| KR102490895B1 (ko) | 2017-12-14 | 2023-01-25 | 삼성디스플레이 주식회사 | 디스플레이 장치 및 그 제조방법 |
| KR102461138B1 (ko) | 2017-12-29 | 2022-10-28 | 엘지디스플레이 주식회사 | 전계 발광 표시장치 |
| KR102587116B1 (ko) * | 2018-05-31 | 2023-10-10 | 삼성디스플레이 주식회사 | 표시 장치 |
| KR102342737B1 (ko) | 2018-07-10 | 2021-12-28 | 주식회사 오럼머티리얼 | 마스크의 제조 방법 |
| KR102640196B1 (ko) * | 2018-10-12 | 2024-02-22 | 엘지디스플레이 주식회사 | 유기발광 표시장치 |
| CN109207920B (zh) | 2018-11-12 | 2021-02-09 | 京东方科技集团股份有限公司 | 掩模版 |
| CN114823812A (zh) * | 2019-01-15 | 2022-07-29 | 武汉天马微电子有限公司 | 显示面板以及显示装置 |
| CN109801950B (zh) | 2019-01-31 | 2021-02-26 | 厦门天马微电子有限公司 | 显示面板、显示装置及显示面板的制作方法 |
| KR101984112B1 (ko) | 2019-03-18 | 2019-05-31 | (주)세우인코퍼레이션 | 투 스텝 에칭 방식에 의한 갭 마스크 제조방법 |
| CN109962092B (zh) | 2019-03-29 | 2021-09-24 | 上海天马微电子有限公司 | 一种显示面板和显示装置 |
| CN110391254A (zh) | 2019-07-16 | 2019-10-29 | 武汉华星光电半导体显示技术有限公司 | 一种显示面板及其制备方法、显示装置 |
| CN110783485B (zh) * | 2019-09-24 | 2021-06-18 | 昆山国显光电有限公司 | 透光显示面板、显示面板、制作方法、显示装置 |
-
2020
- 2020-10-19 US US17/074,427 patent/US11805678B2/en active Active
- 2020-11-19 JP JP2020192829A patent/JP2021081727A/ja active Pending
- 2020-11-19 EP EP20208519.7A patent/EP3826070A3/en active Pending
- 2020-11-20 CN CN202011307981.6A patent/CN112825326A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JP2021081727A (ja) | 2021-05-27 |
| EP3826070A3 (en) | 2021-10-13 |
| US11805678B2 (en) | 2023-10-31 |
| EP3826070A2 (en) | 2021-05-26 |
| US20210159281A1 (en) | 2021-05-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10840317B2 (en) | Display apparatus and method of manufacturing the same | |
| JP7475998B2 (ja) | 表示装置 | |
| US11785829B2 (en) | Display apparatus and method of manufacturing the same, the method including depositing different electrode portions by moving a mask | |
| EP3826070A2 (en) | Display device, mask assembly, method of manufacturing the mask assembly, apparatus for manufacturing the display device, and method of manufacturing the display device | |
| US11574959B2 (en) | Display apparatus, and apparatus and method of manufacturing the same | |
| US11678535B2 (en) | Display panel having a plurality of connection lines in third area being electrically connected to plurality of pixels of first area | |
| US20210183983A1 (en) | Display device | |
| US11171317B2 (en) | Method of manufacturing display apparatus | |
| CN113066823A (zh) | 显示装置 | |
| US11437449B2 (en) | Display panel and display device including the same | |
| CN113284928A (zh) | 掩模组件和制造显示设备的方法 | |
| KR102618039B1 (ko) | 마스크 조립체, 이를 포함한 표시 장치의 제조장치 및 표시 장치의 제조방법 | |
| KR20210063209A (ko) | 표시 장치, 마스크 조립체, 마스크 조립체의 제조방법, 표시 장치의 제조장치 및 표시 자장치의 제조방법 | |
| US20210359048A1 (en) | Display apparatus and method of manufacturing the same | |
| US20230371312A1 (en) | Display panel and method of manufacturing the same | |
| KR20220037550A (ko) | 디스플레이 장치 및 그 제조방법 | |
| US20210126069A1 (en) | Display apparatus and apparatus and method of manufacturing the same | |
| KR20230054552A (ko) | 마스크 조립체, 표시 장치의 제조 장치 및 표시 장치의 제조 방법 | |
| US20230389397A1 (en) | Display apparatus and electronic apparatus including the same | |
| US20220293893A1 (en) | Method of manufacturing display apparatus | |
| US20230075636A1 (en) | Display device, and apparatus and method of manufacturing the display device | |
| CN114078921A (zh) | 显示设备 | |
| CN117042549A (zh) | 制造显示装置的方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |