CN111448497A - 光波导上的抗反射涂层 - Google Patents

光波导上的抗反射涂层 Download PDF

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CN111448497A
CN111448497A CN201880079474.6A CN201880079474A CN111448497A CN 111448497 A CN111448497 A CN 111448497A CN 201880079474 A CN201880079474 A CN 201880079474A CN 111448497 A CN111448497 A CN 111448497A
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C·佩罗兹
K·梅塞尔
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Abstract

一种抗反射波导组件包括:具有第一折射率的波导基底,设置在波导的第一表面上的多个衍射光学元件,以及设置在波导的第二表面上的抗反射涂层。该抗反射涂层优选地增加通过施加有该抗反射涂层的表面进入波导的光的吸收,使得光的至少97%被透射。该抗反射涂层由四个材料层组成,这四个材料层具有不同的折射率,其中第一折射率和虚折射率小于1×10‑3,但优选地小于5×10‑4

Description

光波导上的抗反射涂层
相关申请的交叉引用
本申请要求2017年12月10日提交的序列号为62/596,904的美国临时专利申请和2018年10月26日提交的序列号为62/751,240的美国临时专利申请的优先权,上述每个申请的全部内容通过引用并入本文中。
背景技术
诸如窗口或光伏器件(例如,太阳能板)的基底的表面处理受益于分层的抗反射材料的涂层。减少来自撞击玻璃的光的眩光,提高自然光的保持率以降低能源成本,或者增加撞击光伏电池的光的吸收是抗反射涂层的一些使用方式。传统抗反射涂层为相对于基底表面法线基本上垂直的光路提供了益处,但是通常旨在使自由空间光的抗反射性最大化,这些自由空间光预期源于完全位于基底外部的光。传统涂层还寻求提高透射率。除自由空间起源外,某些光学介质操纵光路,因此需要用于优化此类介质的性能的抗反射涂层。
发明内容
本发明的实施例通常涉及用于光波导中的抗反射涂层的特定材料和层厚度。更具体地,本文描述的实施例和技术涉及抗反射涂层,该抗反射涂层必须便于光传播以实现全内反射(TIR),同时使正交角度的光反射或其它自由空间光最小化。本文描述的实施例不涉及寻求光的完全透射。
一些实施例涉及具有第一折射率的波导基底,例如玻璃。基底可以是平面的或圆柱形的(例如光纤)。对于平面基底,在第一表面上设置多个衍射光学元件(例如光栅),并且在相对的表面上设置抗反射涂层。对于圆柱形波导,将抗反射涂层施加到外表面。
在一些实施例中,波导被配置为接收光,并通过全内反射沿轴传播光。在平面波导中,光沿这样的轴在第一方向上行进,当光从该相应表面的衍射光学元件反射时,在基本上正交的方向上耦出(outcouple)光。在圆柱形波导中,光沿着基本平行于波导长度的轴沿波导反射,然后在远端耦出。
此类实施例上的抗反射涂层被配置为使所接收光的s和p偏振态之间的相位延迟最小化,使得光的每个偏振分量通过TIR的反弹角基本相似(similar)。
在一些实施例中,抗反射涂层是单个氟化镁(MgF2)层,其厚度在75纳米(nm)至125纳米之间。在一些实施例中,将二氧化硅(SiO2)层作为外层施加到该涂层上。
在一些实施例中,抗反射涂层具有小于5×10-4的虚折射率值(在本文中可替代地称为吸收系数)k。在一些实施例中,无论包括涂层的层数如何,完整涂层的k值在5×10-4至1×10-3之间。在一些实施例中,涂层是单层材料。在一些实施例中,涂层在两种材料之间交替,其中一种材料具有与第二材料相比较高的折射率。在一些实施例中,使用少于八层的总层数。
在一些实施例中,使用折射率大于2的二氧化钛(TiO2)作为涂层材料;在一些实施例中,折射率在1.45至1.58之间的SiO2与具有二氧化钛的层交替。
这些材料和层选择优化了由光波导输出的光的效率,使相位延迟最小化以减少光学缺陷,例如由此类波导输出的图像中的条纹,并且使常规层的人工和材料成本最小化。
附图说明
图1是示出了抗反射涂层的俯视图,该抗反射涂层关于其使反射光最小化并且使波导中的光吸收最大化的功能而被理解。
图2是示出根据一些实施例的平面波导的俯视图,该平面波导耦出经由全内反射传播通过波导的多个光束。
图3是示出根据一些实施例的多波导堆叠的俯视图,该多波导堆叠耦出作为光捆束的多个光束。
图4是根据一些实施例的具有三个衍射光学元件区域的平面波导的前视图。
图5是示出根据一些实施例的在其跨度上衍射光的正交光瞳扩展器的前视图。
图6A是示出根据一些实施例的通过波导的多个光反弹的俯视图。
图6B是根据一些实施例的透射通过被配置为支持全内反射的波导的能量的干涉仪网络的前视图。
图7是示出根据一些实施例的随抗反射涂层中的层而变化的相位延迟关系的曲线图。
图8A示出了其中抗反射涂层中的层具有不同n值的基底上的用于蓝光(455nm)的目镜设计的捕获图像。
图8B示出了其中抗反射涂层中的层具有不同n值的基底上的用于蓝光(455nm)的目镜设计的模拟图像。
图8C示出了其中抗反射涂层中的层具有不同n值的基底上的用于红光(625nm)的目镜设计的捕获图像。
图8D示出了其中抗反射涂层中的层具有不同n值的基底上的用于红光(625nm)的目镜设计的模拟图像。
图9A至9D是示出根据一些实施例的随抗反射涂层的层数和k值而变化的由波导输出的光能的效率衰减的曲线图。
具体实施方式
抗反射涂层通常被配置为在具有不同折射率的材料层上产生异相反射。通常,单层抗反射涂层寻求的折射率n等于被涂覆的基底的折射率的平方根,其厚度t等于被抗反射涂层定为目标的光的波长λ的四分之一。
等式1 ncoating=√(nsubstrate)
等式2 t=λtarget light/(4·ncoating)
图1示出了抗反射,其中光L 100撞击介质110并反射光R 101,同时透射到介质120并反射光R 103,从而产生与光R 101的相长干涉;剩余的光L 105透射到介质103中。已知许多变型可以提高透射光L 105的总量。例如,利用附加的和/或变化的厚度层实现了用单个涂层提高多个波长的透射的宽带抗反射。
尽管图1所示的涂层布置可以按预期对自由空间光起作用,但是某些光学系统采用波导技术;增强或混合现实系统特别地在出射光瞳扩展器系统中使该技术最大化以传递来自光源的光,经由TIR使该光传播通过波导,然后耦出到用户的眼睛。
图2示出了这种系统的简化形式。示出了一个波导,但是应当理解,其它堆叠在一起的波导(如下面参考图3进一步所述)可以类似地起作用。光400在波导1182的输入表面1382处被注入到波导1182中,并通过TIR在波导1182内传播。输入表面1382可以是由衍射光学元件形成的耦入(incoupling)光栅,从而以支持TIR的角度将光400衍射到波导1382中。在光400撞击耦出衍射光学元件1282的点处,采样部分作为多个出射光束402从波导出射。
每个出射光束是光400的采样子束,并且增加了任一采样子束被观看者的眼睛4看到的可能性。因此重要的是,波导1182保持TIR以在其跨度上产生多个出射光束,否则出射光束402将不会分散,所形成的出射光瞳将只能在眼睛4的某些位置被看到,这限制了该系统的适用性和灵活性。
图2示出了单个波导系统,但是本领域技术人员将理解,如果单个波导1182赋予光400的采样部分,则执行类似功能的其它波导可以赋予其它采样部分以产生丰富的光效果,例如多色分量图像或深度感知。图3示出了这样的多层系统,该系统具有通过TIR传播光的三个波导1210、1220和1230。当每个光路1240、1242和1244分别在位置1212、1222和1232处耦入时,将撞击布置在波导1210、1220、1230上的相应耦出衍射光学元件1214、1224或1234(未示出来自路径1222和1232的耦出光),其在两个方向上衍射多个子束:一个方向朝向观看者(如图2中的眼睛4),由光束3010表示;另一方向在远离观看者的方向上,由光束3020表示。
如果光束3020从随后的波导1220反射,则可能引起不希望的影响,例如与光束3010的干涉,由反射可能引起的任何角度变化导致的模糊度增加等等。在此,施加到波导上与其耦出衍射光学元件相对的表面的抗反射涂层将有利于减少这些影响。然而,试图增加透射的常规涂层将在光路1240、1242和1244通过TIR跨波导1210、1220和1230传播时使这些光路劣化。这种劣化在耦出时引入均匀性混乱,并导致差的图像质量。
采用光瞳扩展器技术的波导光学系统加剧了该问题。在诸如图2所示的光瞳扩展器系统中,光不仅在基本垂直的方向上分布,而且还在与出射光束路径正交的方向上分布。图4示出了设置在波导3704上的正交光瞳扩展器(OPE)3706。图4还示出了用于耦出TIR光的渐进出射光束的出射光瞳扩展器(EPE)3708,其类似于图2所示的耦出衍射光学元件1282,还示出了类似于图2的输入表面1382的耦入光栅(ICG)3702。在图4的波导系统中,光通过耦入光栅耦入到波导,并且朝着正交光瞳扩展器衍射。
图5示出了跨正交光瞳扩展器的光采样。来自图4的耦入光栅的光4410B遇到光栅4420B(例如一系列衍射光学元件),其在第一方向上衍射光的样本,并且在第二方向上衍射相同光的样本4430B;衍射的特定方向随着衍射光学元件的特定几何形状而变化。
图6A示出了该光路的截面图,一个波导包括位于一个表面上的光栅662和位于相对的表面上的抗反射涂层664。当光经由TIR传播通过波导时,光交替地从正交光瞳扩展器以及与正交光瞳扩展器相对的表面反射。本领域技术人员将理解,类似的功能同样发生在波导的出射光瞳扩展器区域。为了减少参考图3的光束3020描述的反射,对该相对表面施加抗反射涂层。累积光干涉仪可以源自这种相互作用,例如图6B所示的晶胞干涉仪(unitcell inferometer)。在图6B中,与正交光瞳扩展器的每次相互作用会把光采样成两条路径,其中在从正交光瞳扩展器的每次连续反射之间存在从抗反射涂层侧进行的反射。从正交光瞳扩展器侧或抗反射侧的每次反射可进一步引起光的偏振变化,使得每个连续反弹扰动偏振态并改变每个输出节点处的能量。
通过将偏振分解为分量s状态和p状态,所得到的电场E是光的振幅A和相位φ的函数,并针对每个s和p路径被示出为如下:
等式3
Figure BDA0002530464580000061
等式4
Figure BDA0002530464580000062
其中i指示输入处的变量值。
每个相互作用(由下面的方向箭头指示,与图6B的输出节点处的光路相关)可以被描述为2×2矩阵乘以等式3和等式4的s元素和p元素的能量,使得
等式5
Figure BDA0002530464580000063
其中向左和向下指示向左和向下衍射的光,如图6B的输出节点662处所示,并且其中η是转换的衍射效率,φ是转换的相移。
此外,从AR涂层的每次反弹都可以用2×2矩阵描述。在平面涂层中,此矩阵的非对角元素为0,并且由于在平面涂层中各层是平行的,因此对角元素的大小必须为1。由于没有从AR涂层的衍射,因此只有以下两个矩阵:AR↓↓和AR←←
等式6
Figure BDA0002530464580000064
等式7
Figure BDA0002530464580000065
现在,使输出节点向下(向着出射光瞳扩展器)传播的电场状态可以与电场输入状态相关。
等式8
Figure BDA0002530464580000066
然而,如果相位延迟(每次反弹时s光路和p光路中每一者的相移之差)为0,使得(θs=θp),则可以简化此等式。在这种情况下,抗反射涂层不再影响能量输出。换言之,等式6和等式7可以分别被替换为:
等式9
Figure BDA0002530464580000071
等式10
Figure BDA0002530464580000072
并且输出被简化为:
等式11
Figure BDA0002530464580000073
因此,如果AR涂层没有相位延迟,则仅将相移赋予输出,而不改变偏振态或大小。如果AR涂层确实具有相位延迟,则改变输出偏振态和大小,并带来负面光学效应。当确定在TIR波导显示器件上的抗反射涂层的层数时,这是至关重要的。图7示出了TIR光在各种入射角下的相位延迟。图8A示出了其中抗反射涂层中的层具有不同n值的基底上的用于蓝光(455nm)的目镜设计的捕获图像。图8B示出了其中抗反射涂层中的层具有不同n值的基底上的用于蓝光(455nm)的目镜设计的模拟图像。图8C示出了其中抗反射涂层中的层具有不同n值的基底上的用于红光(625nm)的目镜设计的捕获图像。图8D示出了其中抗反射涂层中的层具有不同n值的基底上的用于红光(625nm)的目镜设计的模拟图像。相位差的大幅变动会影响出射光束,可以作为图8A至8D所示的“条纹”或均匀性扰动而被观察到。发现四层抗反射涂层具有最好的均匀性,因此优于图7和8A至8D所示的其它涂层。应当理解,调节抗反射层数的效果在每个波长上是一致的,也就是说,尽管图8A至8D示出了用于特定波长光的目镜,但是对于其它未示出的波长(例如绿色)而言,效果是类似的。
为了最小化这种劣化并减少波导间反射量但同时又保持波导内反射,本发明的实施例涉及一种优化的抗反射涂层。这种优化使抗反射材料的折射率与涂层中应用的层的数量和厚度之间达到平衡。这将通过使θs基本等于θp来使相位延迟效应最小化。
在一些实施例中,将抗反射涂层施加到构成增强或混合或虚拟现实设备的目镜的波导堆叠内的波导基底的一侧。优选地,涂层侧与预期放置观看者眼睛的一侧相对,但是涂层侧与观看者眼睛位于同一侧可发挥类似的作用。在一些实施例中,光栅被施加到波导上与涂层侧相对的表面。抗反射涂层优选地减少来自施加抗反射涂层的表面的反射,并增加通过该表面的透射。该抗反射涂层优选地将光透射增加到至少97%。
抗反射涂层包括至少一个层,但是在优选实施例中,少于八个层,并且使具有相对较高的折射率和相对较低的折射率的两种交替的构成材料的层交替。在一些实施例中,组成层之一是二氧化钛(TiO2)。在一些实施例中,组成层之一是二氧化硅(SiO2)。
本领域技术人员将理解其它候选材料,例如SiN、ZrO2、ZnO2、Ta2O5或NB2O5或在可见波长范围内具有低吸收率的其它金属氧化物。诸如TiO2和SiO2这样的材料因其用于实现抗反射的光伏或玻璃处理而在本领域中是公知的。
在一些实施例中,SiO2是多层涂层的最终层(即顶层),作为防护层来应对伴随波导清洁、处理或图案化的任何湿化学物质(硫酸、过氧化氢等)。
材料的折射率n由两个元素构成,即已知的折射率和吸收系数k(或与通过该材料的光的衰减相关的虚折射率),使得n=n+ik。不同材料具有不同吸收系数,不同吸收系数可产生各种各样的结果,当将多种材料层叠在一起以产生涂层的净k值时,这尤其可变。例如,二氧化钛(一种公知的抗反射材料)和氮化硅SiN对于法向入射具有相似的反射光谱,但k值略有不同。尽管在法向/正交光方向上这些可以忽略不计,但是当在两种材料之间比较时,在支持TIR的角度下,表面处的每一次光反弹都会以稍微不同的吸收而衰减。跨TIR系统中的多次反弹操纵光的涂层中的这种吸收系数的略微差异的累积效应会严重影响整体图像质量,尤其是均匀性和效率。
图9A至9D示出了使用由具有各种材料的变化的吸收系数k的材料输出的能量时的光损耗,以输出百分比表示。图9A示出了由EPE输出的光能的损耗随层数的增加和k值的增加而变化。如图所示,在5%的示例性EPE效率的情况下,当净k值小于大约5×10-4时,大多数单层抗反射涂层在TIR系统(例如光波导)中保持该效率。每当层数或净k值增加时,都会使EPE处的能量输出效率呈指数下降。不管层材料或层数如何,情况都是如此,但是衰减程度会变化,如图9B和9C所示。
图9D示出了EPE效率图,该图表明尽管增加的层数对本领域公知的抗反射具有一些益处,但由于损耗增加,对系统性能产生不利影响。
在一些实施例中,使用具有少于八个层的抗反射涂层。在一些实施例中,例如MgF2涂层,仅使用单个层。
根据等式1,目标折射率可通过简单的数学来求解,然而特定k值的累积效应不容易推导,并且在交替的层涂布中,累积目标n也不容易直接得出。例如,如果将二氧化钛之类的常规抗反射涂层材料施加到玻璃基底上,则不满足等式1。玻璃的折射率通常在1.5至1.6之间,因此玻璃上的抗反射涂层的折射率应该在1.22至1.27之间。在本发明的一些实施例中,将MgF2抗反射涂层施加到玻璃基底上(MgF2的折射率为1.38)。
参考图3,可以使用多个波导,使得每个波导被配置为传播特定波长的光。可以基于每个波导的配置波长产生针对该波导的不同的抗反射涂层厚度。例如,在被配置为传播绿光(约520nm)的玻璃上MgF2涂层中,需要94nm的厚度。替代地,对于单层涂层,可以针对任何波导应用75nm至125nm之间的通用厚度(以降低制造应用的复杂性)以普遍反射可见光谱,其中应理解,选定的确切厚度对于由等式2决定的特定波长的光更有利。
本文通篇提及的“一个实施例”、“某些实施例”、“实施例”或类似的术语意味着结合所述实施例描述的特定特征、结构或特性被包括在至少一个实施例中。因此,在整个本说明书中,这些短语在各个地方的出现不一定都指示同一实施例。此外,可以在一个或多个实施例上以任何合适的方式组合特定的特征、结构或特性而没有限制。
本文所示的细节仅作为示例,并且仅用于说明性地讨论本发明的优选实施例,呈现这些细节是为了提供被认为是本发明各种实施例的原理和概念方面的最有用和最容易理解的描述。在这方面,不试图示出比基本理解本发明所需的必要细节更详细的结构细节,结合附图和/或示例进行的描述使本领域技术人员可以容易地了解如何在实践中实现本发明的各种形式。
如本文所使用的,除非另外指明,否则术语“一”和“一个”被理解为意指“一个”、“至少一个”或“一个或多个”。除非上下文另外要求,否则本文中使用的单数形式应包括复数,复数形式应包括单数。
除非上下文另外清楚地要求,否则在整个说明书和权利要求书中,单词“包括”、“包含”等应被理解为包括性含义,而不是排他性或穷举性含义;也就是说,应被理解为“包括但不限于”的含义。本文所使用的术语“或”将被解释为包括性的或意味着任一个或任何组合。因此,“A、B或C”意味着以下任一项:A;B;C;A和B;A和C;B和C;A、B和C。仅当元素、功能、步骤或动作的组合以某种方式固有地相互排斥时,才会出现此定义的例外情况。
使用单数或复数的单词也分别包括复数和单数。另外,当在本公开中使用时,单词“本文”、“上文”和“下文”以及类似含义的词语应该是指本公开整体,而不是指本公开的任何特定部分。
本公开的实施例的描述并非旨在是穷举的或将本公开限于所公开的精确形式。尽管本文出于说明性目的描述了本公开的特定实施例和示例,但是如本领域技术人员将认识到的,在本公开的范围内可以进行各种等效修改。这样的修改可以包括但不限于所公开的实施例中所示的尺寸和/或材料的改变。
本文引用的所有参考文献通过引用并入。如果需要,可以修改本公开的各方面以采用以上参考文献的系统、功能和概念来提供本公开的另外的实施例。可以根据详细描述对本公开进行这些和其它改变。
任何前述实施例的特定元素可以被组合或替换为其它实施例中的元素。此外,尽管已经在这些实施例的上下文中描述了与本公开的某些实施例相关联的优点,但是其它实施例也可以呈现出这些优点,不是所有实施例都需要呈现出落入本公开范围内的这些优点。
因此,应当理解,可以通过所附权利要求书的精神和范围内的修改和变型来实施本发明。描述并非旨在是穷举的或将本发明限于所公开的精确形式。应当理解,可以以修改和变型来实践本发明,并且本发明仅由权利要求及其等同物限制。

Claims (23)

1.一种抗反射波导,包括:
具有第一折射率的平面波导基底;
设置在所述波导的第一表面上的多个衍射光学元件;以及
设置在所述波导的第二表面上的抗反射涂层。
2.根据权利要求1所述的抗反射波导,其中,所述波导是平面的,并且被配置为使光在基本上第一方向上通过全内反射在所述多个衍射光学元件和所述抗反射涂层之间传播,以及使光在与所述第一方向基本正交的第二方向上耦出。
3.根据权利要求2所述的抗反射波导,其中,所述通过全内反射传播的光包括s偏振分量和p偏振分量。
4.根据权利要求3所述的抗反射波导,其中,所述抗反射涂层被配置为减小所述两个分量之间的相位延迟,使得通过所述波导的所述s分量的入射角与所述p分量的入射角基本相似。
5.根据权利要求4所述的抗反射波导,其中,所述抗反射涂层减少从所述第二表面的反射,并且增加通过所述第二表面进入所述波导中的光的透射。
6.根据权利要求5所述的抗反射波导,其中,至少97%的光透射通过所述第二表面。
7.根据权利要求3所述的抗反射波导,其中,所述波导基底是玻璃,并且所述抗反射涂层包括MgF2层。
8.根据权利要求7所述的抗反射波导,其中,所述MgF2层具有75nm至125nm之间的厚度。
9.根据权利要求7所述的抗反射波导,其中,所述抗反射涂层包括SiO2层。
10.根据权利要求8所述的抗反射波导,其中,所述MgF2层紧邻所述第二表面设置。
11.根据权利要求10所述的抗反射波导,其中,SiO2层被设置在所述MgF2层上。
12.根据权利要求11所述的抗反射波导,其中,所述抗反射涂层的总折射率具有小于5×10-4的虚折射率分量值。
13.根据权利要求11所述的抗反射波导,其中,所述抗反射涂层的总折射率具有5×10-4至1×10-3之间的虚折射率分量值。
14.根据权利要求3所述的抗反射波导,其中,所述抗反射涂层包括在第一材料和第二材料之间交替的少于八个层。
15.根据权利要求14所述的抗反射波导,其中,所述抗反射涂层由四个层组成。
16.根据权利要求14所述的抗反射波导,其中,所述第一材料具有与所述第二材料相比较高的折射率。
17.根据权利要求14所述的抗反射波导,其中,所述第一材料是TiO2
18.根据权利要求14所述的抗反射波导,其中每一个TiO2层具有大于2的折射率。
19.根据权利要求14所述的抗反射波导,其中,所述第二材料是SiO2
20.根据权利要求19所述的抗反射波导,其中每一个SiO2层具有1.45至1.58之间的折射率。
21.根据权利要求20所述的抗反射波导,其中,所述抗反射涂层的总折射率具有小于5×10-4的虚折射率分量值。
22.根据权利要求20所述的抗反射波导,其中,所述抗反射涂层的总折射率具有5×10-4至1×10-3之间的虚折射率分量值。
23.根据权利要求1所述的抗反射波导,其中,所述抗反射涂层的总折射率具有小于5×10-4的虚折射率分量值。
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