CN111200415B - 声表面波器件 - Google Patents

声表面波器件 Download PDF

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Publication number
CN111200415B
CN111200415B CN201911104936.8A CN201911104936A CN111200415B CN 111200415 B CN111200415 B CN 111200415B CN 201911104936 A CN201911104936 A CN 201911104936A CN 111200415 B CN111200415 B CN 111200415B
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CN
China
Prior art keywords
region
bus bar
acoustic wave
surface acoustic
propagation velocity
Prior art date
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Application number
CN201911104936.8A
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English (en)
Chinese (zh)
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CN111200415A (zh
Inventor
松冈直人
中村麻树子
吉元进
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hefei Xintou Microelectronics Co ltd
NDK Saw Devices Inc
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NDK Saw Devices Inc
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Publication of CN111200415A publication Critical patent/CN111200415A/zh
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Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02818—Means for compensation or elimination of undesirable effects
    • H03H9/02834—Means for compensation or elimination of undesirable effects of temperature influence
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/125—Driving means, e.g. electrodes, coils
    • H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves
    • H03H9/14538—Formation
    • H03H9/14541—Multilayer finger or busbar electrode
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/125—Driving means, e.g. electrodes, coils
    • H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves
    • H03H9/14517—Means for weighting
    • H03H9/1452—Means for weighting by finger overlap length, apodisation
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/125—Driving means, e.g. electrodes, coils
    • H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves
    • H03H9/14517—Means for weighting
    • H03H9/14529—Distributed tap
    • H03H9/14532—Series weighting; Transverse weighting
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/125—Driving means, e.g. electrodes, coils
    • H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves
    • H03H9/14544—Transducers of particular shape or position
    • H03H9/14552—Transducers of particular shape or position comprising split fingers
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/125—Driving means, e.g. electrodes, coils
    • H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves
    • H03H9/14544—Transducers of particular shape or position
    • H03H9/1457—Transducers having different finger widths
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/25—Constructional features of resonators using surface acoustic waves

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
CN201911104936.8A 2018-11-16 2019-11-13 声表面波器件 Active CN111200415B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018215986A JP7178881B2 (ja) 2018-11-16 2018-11-16 弾性表面波素子
JP2018-215986 2018-11-16

Publications (2)

Publication Number Publication Date
CN111200415A CN111200415A (zh) 2020-05-26
CN111200415B true CN111200415B (zh) 2024-05-10

Family

ID=70726931

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201911104936.8A Active CN111200415B (zh) 2018-11-16 2019-11-13 声表面波器件

Country Status (4)

Country Link
US (1) US11683019B2 (https=)
JP (2) JP7178881B2 (https=)
CN (1) CN111200415B (https=)
TW (1) TWI762832B (https=)

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US11323096B2 (en) 2018-06-15 2022-05-03 Resonant Inc. Transversely-excited film bulk acoustic resonator with periodic etched holes
US12170516B2 (en) 2018-06-15 2024-12-17 Murata Manufacturing Co., Ltd. Filters using transversly-excited film bulk acoustic resonators with frequency-setting dielectric layers
US12375056B2 (en) 2018-06-15 2025-07-29 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators
US12095446B2 (en) 2018-06-15 2024-09-17 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with optimized electrode thickness, mark, and pitch
US12095441B2 (en) 2018-06-15 2024-09-17 Murata Manufacturing Co., Ltd. Transversely excited film bulk acoustic resonator with recessed interdigital transducer fingers
US12244295B2 (en) 2018-06-15 2025-03-04 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with two-layer electrodes having a narrower top layer
US11916539B2 (en) 2020-02-28 2024-02-27 Murata Manufacturing Co., Ltd. Split-ladder band N77 filter using transversely-excited film bulk acoustic resonators
US12218650B2 (en) 2018-06-15 2025-02-04 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator
US11349452B2 (en) 2018-06-15 2022-05-31 Resonant Inc. Transversely-excited film bulk acoustic filters with symmetric layout
WO2020092414A2 (en) 2018-10-31 2020-05-07 Resonant Inc. Solidly-mounted transversely-excited film bulk acoustic resonator
JP2020145567A (ja) * 2019-03-06 2020-09-10 株式会社村田製作所 弾性波装置
CN118353412A (zh) 2019-04-05 2024-07-16 株式会社村田制作所 横向激励薄膜体声波谐振器封装和方法
CN113940000B (zh) * 2019-06-14 2026-01-23 株式会社村田制作所 弹性波装置
US11652466B2 (en) * 2019-08-29 2023-05-16 Skyworks Solutions, Inc. Suppression of transverse mode spurious signals in surface acoustic wave devices utilizing a dense film above gap region of interdigital transducer electrodes
US11705883B2 (en) * 2019-10-24 2023-07-18 Skyworks Solutions, Inc. Acoustic wave resonator with mass loading strip for suppression of transverse mode
US11936367B2 (en) 2019-10-31 2024-03-19 Skyworks Solutions, Inc. Acoustic wave device with velocity reduction cover
US20210344322A1 (en) * 2020-04-30 2021-11-04 RF360 Europe GmbH Surface acoustic wave electroacoustic device for reduced transversal modes
US10992282B1 (en) 2020-06-18 2021-04-27 Resonant Inc. Transversely-excited film bulk acoustic resonators with electrodes having a second layer of variable width
JP7499624B2 (ja) * 2020-06-30 2024-06-14 ＮＤＫ ＳＡＷ ｄｅｖｉｃｅｓ株式会社 弾性表面波素子
US11742828B2 (en) 2020-06-30 2023-08-29 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with symmetric diaphragm
US11405019B2 (en) 2020-10-05 2022-08-02 Resonant Inc. Transversely-excited film bulk acoustic resonator matrix filters
US11405017B2 (en) 2020-10-05 2022-08-02 Resonant Inc. Acoustic matrix filters and radios using acoustic matrix filters
US12166468B2 (en) 2021-01-15 2024-12-10 Murata Manufacturing Co., Ltd. Decoupled transversely-excited film bulk acoustic resonators for high power filters
US11239816B1 (en) 2021-01-15 2022-02-01 Resonant Inc. Decoupled transversely-excited film bulk acoustic resonators
US12368431B2 (en) 2021-02-22 2025-07-22 Skyworks Solutions, Inc. Acoustic wave filter with multiple acoustic wave devices on a subtrate
US12160220B2 (en) 2021-04-30 2024-12-03 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with oxide strip acoustic confinement structures
US12255607B2 (en) 2021-04-30 2025-03-18 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with buried oxide strip acoustic confinement structures
JP7627611B2 (ja) * 2021-04-30 2025-02-06 太陽誘電株式会社 弾性波共振器、フィルタ、およびマルチプレクサ
US12255630B2 (en) 2021-04-30 2025-03-18 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with oxide strip acoustic confinement structures
US12425000B2 (en) 2021-08-03 2025-09-23 Skyworks Solutions, Inc. Low velocity surface acoustic wave device
CN113839648B (zh) * 2021-09-14 2023-08-29 常州承芯半导体有限公司 声表面波谐振装置及形成方法、滤波装置及射频前端装置
TWI789913B (zh) * 2021-09-16 2023-01-11 台灣嘉碩科技股份有限公司 利用有效反射結構的表面聲波諧振器及濾波器
CN118251837A (zh) * 2021-11-12 2024-06-25 株式会社村田制作所 弹性波装置
US12261591B2 (en) 2021-12-21 2025-03-25 Skyworks Solutions, Inc. Temperature compensated surface acoustic wave devices with multiple buried mass loading strips
US12424999B2 (en) 2021-12-28 2025-09-23 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with gap dielectric stripes in busbar-electrode gaps
US12413196B2 (en) 2022-02-16 2025-09-09 Murata Manufacturing Co., Ltd. Tuning acoustic resonators with back-side coating
US12549151B2 (en) 2022-04-12 2026-02-10 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with thick dielectric layer for improved coupling
CN119605084A (zh) * 2022-08-26 2025-03-11 株式会社村田制作所 弹性波装置
CN119605080A (zh) * 2022-08-26 2025-03-11 株式会社村田制作所 弹性波装置
CN115473506B (zh) * 2022-09-16 2023-08-22 南通大学 一种减小声表面波器件体积的方法
US12489415B2 (en) 2022-10-19 2025-12-02 Murata Manufacturing Co., Ltd. Acoustic resonator lid for thermal transport
CN116208115A (zh) * 2023-02-07 2023-06-02 锐石创芯(重庆)科技有限公司 弹性波装置、弹性波装置的制作方法、滤波器及电子设备
CN117097295B (zh) * 2023-10-17 2024-02-06 深圳新声半导体有限公司 声表面波谐振器装置及其制造方法、滤波器
CN118971832A (zh) * 2024-08-01 2024-11-15 无锡芯卓湖光半导体有限公司 电子设备、电子元器件、声表面波谐振器及其基底和制备方法

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JP2003087083A (ja) * 2001-07-04 2003-03-20 Murata Mfg Co Ltd 弾性表面波用のくし型電極部、弾性表面波装置、通信装置
CN101154935A (zh) * 2006-09-29 2008-04-02 Tdk株式会社 弹性表面波滤波器以及弹性表面波共振器
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US7576471B1 (en) * 2007-09-28 2009-08-18 Triquint Semiconductor, Inc. SAW filter operable in a piston mode
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WO2018003282A1 (ja) * 2016-06-28 2018-01-04 株式会社村田製作所 弾性波装置

Also Published As

Publication number Publication date
US20200162052A1 (en) 2020-05-21
US11683019B2 (en) 2023-06-20
JP7377920B2 (ja) 2023-11-10
TWI762832B (zh) 2022-05-01
JP7178881B2 (ja) 2022-11-28
JP2022126852A (ja) 2022-08-30
JP2020088459A (ja) 2020-06-04
CN111200415A (zh) 2020-05-26
TW202021271A (zh) 2020-06-01

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Address after: No. 63, suzulanqiu CHO, Hakodate, Hokkaido, Japan (042-0958)

Applicant after: NDK sound meter filter Co.,Ltd.

Address before: 1-47-1 Sasazuka, Shibuya-ku, Tokyo, Japan (Postal code: 151-8569)

Applicant before: Nihon Dempa Kogyo Co.,Ltd.

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Address after: No. 63, suzulanqiu CHO, Hakodate, Hokkaido, Japan (042-0958)

Patentee after: NDK sound meter filter Co.,Ltd.

Country or region after: Japan

Patentee after: Hefei Xintou Microelectronics Co.,Ltd.

Country or region after: China

Address before: No. 63, suzulanqiu CHO, Hakodate, Hokkaido, Japan (042-0958)

Patentee before: NDK sound meter filter Co.,Ltd.

Country or region before: Japan

TR01 Transfer of patent right