CN110100042B - 气流溅射装置以及溅射靶原料的制造方法 - Google Patents

气流溅射装置以及溅射靶原料的制造方法 Download PDF

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Publication number
CN110100042B
CN110100042B CN201780078453.8A CN201780078453A CN110100042B CN 110100042 B CN110100042 B CN 110100042B CN 201780078453 A CN201780078453 A CN 201780078453A CN 110100042 B CN110100042 B CN 110100042B
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China
Prior art keywords
sputtering
target
gas flow
flat plate
pair
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Chinese (zh)
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CN110100042A (zh
Inventor
小庄孝志
高见英生
中村祐一郎
武智幹雄
三上智广
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JX Nippon Mining and Metals Corp
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JX Nippon Mining and Metals Corp
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
CN201780078453.8A 2016-12-28 2017-12-11 气流溅射装置以及溅射靶原料的制造方法 Active CN110100042B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016-256657 2016-12-28
JP2016256657A JP7005896B2 (ja) 2016-12-28 2016-12-28 ガスフロースパッタリング装置及びスパッタリングターゲット原料の製造方法
PCT/JP2017/044448 WO2018123550A1 (ja) 2016-12-28 2017-12-11 ガスフロースパッタリング装置及びスパッタリングターゲット原料の製造方法

Publications (2)

Publication Number Publication Date
CN110100042A CN110100042A (zh) 2019-08-06
CN110100042B true CN110100042B (zh) 2021-12-07

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CN201780078453.8A Active CN110100042B (zh) 2016-12-28 2017-12-11 气流溅射装置以及溅射靶原料的制造方法

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JP (2) JP7005896B2 (https=)
CN (1) CN110100042B (https=)
SG (1) SG10202105751VA (https=)
TW (1) TWI660060B (https=)
WO (1) WO2018123550A1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102586745A (zh) * 2011-01-13 2012-07-18 住友重机械工业株式会社 靶及具备该靶的成膜装置
JP2013147711A (ja) * 2012-01-20 2013-08-01 Renesas Electronics Corp 気相成長装置
WO2013136962A1 (ja) * 2012-03-15 2013-09-19 Jx日鉱日石金属株式会社 磁性材スパッタリングターゲット及びその製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU4503696A (en) * 1995-05-11 1996-11-29 Materials Research Corporation Sputtering apparatus with isolated coolant and sputtering ta rget therefor
JP2004183022A (ja) 2002-12-02 2004-07-02 Ulvac Japan Ltd ターゲット装置及びスパッタリング装置
JP2009066497A (ja) 2007-09-12 2009-04-02 Bridgestone Corp 光触媒酸化チタン薄膜及びその製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102586745A (zh) * 2011-01-13 2012-07-18 住友重机械工业株式会社 靶及具备该靶的成膜装置
JP2013147711A (ja) * 2012-01-20 2013-08-01 Renesas Electronics Corp 気相成長装置
WO2013136962A1 (ja) * 2012-03-15 2013-09-19 Jx日鉱日石金属株式会社 磁性材スパッタリングターゲット及びその製造方法

Also Published As

Publication number Publication date
JP2021127524A (ja) 2021-09-02
TW201827632A (zh) 2018-08-01
TWI660060B (zh) 2019-05-21
CN110100042A (zh) 2019-08-06
JP2018109206A (ja) 2018-07-12
SG10202105751VA (en) 2021-07-29
JP7005896B2 (ja) 2022-01-24
WO2018123550A1 (ja) 2018-07-05

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