AU4503696A - Sputtering apparatus with isolated coolant and sputtering ta rget therefor - Google Patents

Sputtering apparatus with isolated coolant and sputtering ta rget therefor

Info

Publication number
AU4503696A
AU4503696A AU45036/96A AU4503696A AU4503696A AU 4503696 A AU4503696 A AU 4503696A AU 45036/96 A AU45036/96 A AU 45036/96A AU 4503696 A AU4503696 A AU 4503696A AU 4503696 A AU4503696 A AU 4503696A
Authority
AU
Australia
Prior art keywords
sputtering
rget
therefor
isolated coolant
sputtering apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU45036/96A
Inventor
Steven D Hurwitt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Materials Research Corp
Original Assignee
Materials Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/439,490 external-priority patent/US6689254B1/en
Application filed by Materials Research Corp filed Critical Materials Research Corp
Publication of AU4503696A publication Critical patent/AU4503696A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3497—Temperature of target
AU45036/96A 1995-05-11 1995-11-27 Sputtering apparatus with isolated coolant and sputtering ta rget therefor Abandoned AU4503696A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US439490 1995-05-11
US08/439,490 US6689254B1 (en) 1990-10-31 1995-05-11 Sputtering apparatus with isolated coolant and sputtering target therefor
PCT/US1995/015422 WO1996036065A1 (en) 1995-05-11 1995-11-27 Sputtering apparatus with isolated coolant and sputtering target therefor

Publications (1)

Publication Number Publication Date
AU4503696A true AU4503696A (en) 1996-11-29

Family

ID=23744912

Family Applications (1)

Application Number Title Priority Date Filing Date
AU45036/96A Abandoned AU4503696A (en) 1995-05-11 1995-11-27 Sputtering apparatus with isolated coolant and sputtering ta rget therefor

Country Status (5)

Country Link
EP (1) EP0824760A1 (en)
JP (1) JPH11504986A (en)
AU (1) AU4503696A (en)
CA (1) CA2218736A1 (en)
WO (1) WO1996036065A1 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005525471A (en) * 2002-05-14 2005-08-25 東京エレクトロン株式会社 Sputtering cathode adapter assembly and method
DE10312631A1 (en) * 2003-03-21 2004-10-07 Interpane Entwicklungs- Und Beratungsgesellschaft Mbh & Co.Kg Magnetron with coolant protection
WO2005007924A1 (en) * 2003-07-07 2005-01-27 Honeywell International Inc. Sputtering target constructions
JP2007520634A (en) * 2004-02-03 2007-07-26 ハネウェル・インターナショナル・インコーポレーテッド Target structure for physical vapor deposition
JP2007051337A (en) * 2005-08-18 2007-03-01 Ulvac Japan Ltd Sputtering electrode and sputtering apparatus provided with the sputtering electrode
JP5364455B2 (en) * 2009-06-08 2013-12-11 昭和電工株式会社 Magnetron sputtering system and in-line film deposition system
US9580795B2 (en) * 2013-03-05 2017-02-28 Applied Materials, Inc. Sputter source for use in a semiconductor process chamber
JP6100189B2 (en) * 2014-03-12 2017-03-22 住友重機械工業株式会社 Deposition equipment
WO2016088284A1 (en) * 2014-12-03 2016-06-09 株式会社アルバック Target assembly
JP7005896B2 (en) * 2016-12-28 2022-01-24 Ｊｘ金属株式会社 Gas flow sputtering equipment and manufacturing method of sputtering target raw material
US11158491B2 (en) * 2017-06-01 2021-10-26 Oerlikon Surface Solutions Ag, Pfäffikon Target assembly for safe and economic evaporation of brittle materials

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3945911A (en) * 1974-08-28 1976-03-23 Shatterproof Glass Corporation Cathodes for sputter-coating glass sheets or other substrates
CH664303A5 (en) * 1985-04-03 1988-02-29 Balzers Hochvakuum HOLDING DEVICE FOR TARGETS FOR CATHODE SPRAYING.
WO1992007970A1 (en) * 1990-10-31 1992-05-14 Materials Research Corporation Magnetron sputter coating method and apparatus with rotating magnet cathode
CH690805A5 (en) * 1993-05-04 2001-01-15 Unaxis Balzers Ag Magnetic-assisted atomization and vacuum treatment system herewith.

Also Published As

Publication number Publication date
CA2218736A1 (en) 1996-11-14
JPH11504986A (en) 1999-05-11
WO1996036065A1 (en) 1996-11-14
EP0824760A1 (en) 1998-02-25

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