TWI660060B - 氣流濺鍍裝置及濺鍍靶材原料的製造方法 - Google Patents

氣流濺鍍裝置及濺鍍靶材原料的製造方法 Download PDF

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Publication number
TWI660060B
TWI660060B TW106145564A TW106145564A TWI660060B TW I660060 B TWI660060 B TW I660060B TW 106145564 A TW106145564 A TW 106145564A TW 106145564 A TW106145564 A TW 106145564A TW I660060 B TWI660060 B TW I660060B
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TW
Taiwan
Prior art keywords
sputtering
target
flat
pair
airflow
Prior art date
Application number
TW106145564A
Other languages
English (en)
Chinese (zh)
Other versions
TW201827632A (zh
Inventor
Takashi Kosho
小庄孝志
Hideo Takami
高見英生
Yuichiro Nakamura
中村祐一郎
Mikio TAKECHI
武智幹雄
Tomohiro Mikami
三上智廣
Original Assignee
Jx Nippon Mining & Metals Corporation
日商Ｊｘ金屬股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Jx Nippon Mining & Metals Corporation, 日商Ｊｘ金屬股份有限公司 filed Critical Jx Nippon Mining & Metals Corporation
Publication of TW201827632A publication Critical patent/TW201827632A/zh
Application granted granted Critical
Publication of TWI660060B publication Critical patent/TWI660060B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
TW106145564A 2016-12-28 2017-12-25 氣流濺鍍裝置及濺鍍靶材原料的製造方法 TWI660060B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-256657 2016-12-28
JP2016256657A JP7005896B2 (ja) 2016-12-28 2016-12-28 ガスフロースパッタリング装置及びスパッタリングターゲット原料の製造方法

Publications (2)

Publication Number Publication Date
TW201827632A TW201827632A (zh) 2018-08-01
TWI660060B true TWI660060B (zh) 2019-05-21

Family

ID=62708037

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106145564A TWI660060B (zh) 2016-12-28 2017-12-25 氣流濺鍍裝置及濺鍍靶材原料的製造方法

Country Status (5)

Country Link
JP (2) JP7005896B2 (https=)
CN (1) CN110100042B (https=)
SG (1) SG10202105751VA (https=)
TW (1) TWI660060B (https=)
WO (1) WO2018123550A1 (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009066497A (ja) * 2007-09-12 2009-04-02 Bridgestone Corp 光触媒酸化チタン薄膜及びその製造方法
JP2012144793A (ja) * 2011-01-13 2012-08-02 Sumitomo Heavy Ind Ltd ターゲット、およびこれを備えた成膜装置
JP2013147711A (ja) * 2012-01-20 2013-08-01 Renesas Electronics Corp 気相成長装置
WO2013136962A1 (ja) * 2012-03-15 2013-09-19 Jx日鉱日石金属株式会社 磁性材スパッタリングターゲット及びその製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU4503696A (en) * 1995-05-11 1996-11-29 Materials Research Corporation Sputtering apparatus with isolated coolant and sputtering ta rget therefor
JP2004183022A (ja) 2002-12-02 2004-07-02 Ulvac Japan Ltd ターゲット装置及びスパッタリング装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009066497A (ja) * 2007-09-12 2009-04-02 Bridgestone Corp 光触媒酸化チタン薄膜及びその製造方法
JP2012144793A (ja) * 2011-01-13 2012-08-02 Sumitomo Heavy Ind Ltd ターゲット、およびこれを備えた成膜装置
JP2013147711A (ja) * 2012-01-20 2013-08-01 Renesas Electronics Corp 気相成長装置
WO2013136962A1 (ja) * 2012-03-15 2013-09-19 Jx日鉱日石金属株式会社 磁性材スパッタリングターゲット及びその製造方法

Also Published As

Publication number Publication date
JP2021127524A (ja) 2021-09-02
TW201827632A (zh) 2018-08-01
CN110100042A (zh) 2019-08-06
JP2018109206A (ja) 2018-07-12
CN110100042B (zh) 2021-12-07
SG10202105751VA (en) 2021-07-29
JP7005896B2 (ja) 2022-01-24
WO2018123550A1 (ja) 2018-07-05

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