SG10202105751VA - Gas flow sputtering device and method for producing sputtering target raw material - Google Patents
Gas flow sputtering device and method for producing sputtering target raw materialInfo
- Publication number
- SG10202105751VA SG10202105751VA SG10202105751VA SG10202105751VA SG10202105751VA SG 10202105751V A SG10202105751V A SG 10202105751VA SG 10202105751V A SG10202105751V A SG 10202105751VA SG 10202105751V A SG10202105751V A SG 10202105751VA SG 10202105751V A SG10202105751V A SG 10202105751VA
- Authority
- SG
- Singapore
- Prior art keywords
- raw material
- gas flow
- producing
- target raw
- sputtering target
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016256657A JP7005896B2 (en) | 2016-12-28 | 2016-12-28 | Gas flow sputtering equipment and manufacturing method of sputtering target raw material |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10202105751VA true SG10202105751VA (en) | 2021-07-29 |
Family
ID=62708037
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10202105751VA SG10202105751VA (en) | 2016-12-28 | 2017-12-11 | Gas flow sputtering device and method for producing sputtering target raw material |
Country Status (5)
Country | Link |
---|---|
JP (2) | JP7005896B2 (en) |
CN (1) | CN110100042B (en) |
SG (1) | SG10202105751VA (en) |
TW (1) | TWI660060B (en) |
WO (1) | WO2018123550A1 (en) |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11504986A (en) * | 1995-05-11 | 1999-05-11 | マテリアルズ リサーチ コーポレーション | Sputtering apparatus in which coolant is isolated and sputtering target thereof |
JP2004183022A (en) | 2002-12-02 | 2004-07-02 | Ulvac Japan Ltd | Target device and sputtering system |
JP2009066497A (en) | 2007-09-12 | 2009-04-02 | Bridgestone Corp | Photocatalyst thin film of titanium oxide and its production method |
JP5460619B2 (en) * | 2011-01-13 | 2014-04-02 | 住友重機械工業株式会社 | Target and film forming apparatus provided with the same |
JP2013147711A (en) | 2012-01-20 | 2013-08-01 | Renesas Electronics Corp | Vapor deposition apparatus |
SG11201401542YA (en) | 2012-03-15 | 2014-11-27 | Jx Nippon Mining & Metals Corp | Magnetic material sputtering target and manufacturing method thereof |
-
2016
- 2016-12-28 JP JP2016256657A patent/JP7005896B2/en active Active
-
2017
- 2017-12-11 SG SG10202105751VA patent/SG10202105751VA/en unknown
- 2017-12-11 CN CN201780078453.8A patent/CN110100042B/en active Active
- 2017-12-11 WO PCT/JP2017/044448 patent/WO2018123550A1/en active Application Filing
- 2017-12-25 TW TW106145564A patent/TWI660060B/en active
-
2021
- 2021-05-24 JP JP2021087172A patent/JP2021127524A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
TW201827632A (en) | 2018-08-01 |
JP2021127524A (en) | 2021-09-02 |
TWI660060B (en) | 2019-05-21 |
JP7005896B2 (en) | 2022-01-24 |
CN110100042B (en) | 2021-12-07 |
CN110100042A (en) | 2019-08-06 |
JP2018109206A (en) | 2018-07-12 |
WO2018123550A1 (en) | 2018-07-05 |
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