CN109837512B - Izo靶材及其制造方法 - Google Patents

Izo靶材及其制造方法 Download PDF

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Publication number
CN109837512B
CN109837512B CN201811055653.4A CN201811055653A CN109837512B CN 109837512 B CN109837512 B CN 109837512B CN 201811055653 A CN201811055653 A CN 201811055653A CN 109837512 B CN109837512 B CN 109837512B
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China
Prior art keywords
powder
izo
izo target
target material
segregation
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CN201811055653.4A
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Chinese (zh)
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CN109837512A (zh
Inventor
远藤瑶辅
山本浩由
角田浩二
奈良淳史
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JX Nippon Mining and Metals Corp
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JX Nippon Mining and Metals Corp
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
    • C04B35/457—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates based on tin oxides or stannates
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3284—Zinc oxides, zincates, cadmium oxides, cadmiates, mercury oxides, mercurates or oxide forming salts thereof
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3286—Gallium oxides, gallates, indium oxides, indates, thallium oxides, thallates or oxide forming salts thereof, e.g. zinc gallate
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3293—Tin oxides, stannates or oxide forming salts thereof, e.g. indium tin oxide [ITO]

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Compositions Of Oxide Ceramics (AREA)
CN201811055653.4A 2017-11-27 2018-09-11 Izo靶材及其制造方法 Active CN109837512B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017227269A JP6637948B2 (ja) 2017-11-27 2017-11-27 Ｉｚｏターゲット及びその製造方法
JP2017-227269 2017-11-27

Publications (2)

Publication Number Publication Date
CN109837512A CN109837512A (zh) 2019-06-04
CN109837512B true CN109837512B (zh) 2021-02-12

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CN201811055653.4A Active CN109837512B (zh) 2017-11-27 2018-09-11 Izo靶材及其制造方法

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JP (1) JP6637948B2 (ko)
KR (1) KR102164172B1 (ko)
CN (1) CN109837512B (ko)
TW (1) TWI683018B (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240013218A (ko) * 2021-06-04 2024-01-30 제이엑스금속주식회사 스퍼터링 타깃 및 그 제조 방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006249554A (ja) * 2005-03-14 2006-09-21 Fuji Electric Holdings Co Ltd スパッタリングターゲット及びその調製方法ならびにスパッタ方法
CN101268211A (zh) * 2005-09-20 2008-09-17 出光兴产株式会社 溅射靶、透明导电膜及透明电极
JP2011108873A (ja) * 2009-11-18 2011-06-02 Idemitsu Kosan Co Ltd Ｉｎ−Ｇａ−Ｚｎ系酸化物焼結体スパッタリングターゲット及び薄膜トランジスタ

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2695605B2 (ja) 1992-12-15 1998-01-14 出光興産株式会社 ターゲットおよびその製造方法
JP2000068456A (ja) 1998-08-21 2000-03-03 Nec Corp 半導体装置及び半導体装置の製造方法
KR100603128B1 (ko) * 1999-05-10 2006-07-20 닛코킨조쿠 가부시키가이샤 스퍼터링 타겟트
KR100849258B1 (ko) * 1999-11-25 2008-07-29 이데미쓰 고산 가부시키가이샤 스퍼터링 타겟 및 투명한 도전성 산화물
EP1693483B1 (en) * 2002-08-02 2009-10-07 Idemitsu Kosan Co., Ltd. Sputtering target, sintered article, conductive film fabricated by utilizing the same, organic el device, and substrate for use therein
KR102142845B1 (ko) * 2012-05-31 2020-08-10 이데미쓰 고산 가부시키가이샤 스퍼터링 타겟
JP5695221B2 (ja) * 2012-07-13 2015-04-01 Jx日鉱日石金属株式会社 焼結体及びアモルファス膜
JP2017014534A (ja) * 2013-10-09 2017-01-19 出光興産株式会社 スパッタリングターゲット及びその製造方法
JP6159867B1 (ja) * 2016-12-22 2017-07-05 Ｊｘ金属株式会社 透明導電膜形成用ターゲット、透明導電膜形成用ターゲットの製造方法及び透明導電膜の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006249554A (ja) * 2005-03-14 2006-09-21 Fuji Electric Holdings Co Ltd スパッタリングターゲット及びその調製方法ならびにスパッタ方法
CN101268211A (zh) * 2005-09-20 2008-09-17 出光兴产株式会社 溅射靶、透明导电膜及透明电极
JP2011108873A (ja) * 2009-11-18 2011-06-02 Idemitsu Kosan Co Ltd Ｉｎ−Ｇａ−Ｚｎ系酸化物焼結体スパッタリングターゲット及び薄膜トランジスタ

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KR20190062155A (ko) 2019-06-05
JP6637948B2 (ja) 2020-01-29
TWI683018B (zh) 2020-01-21
CN109837512A (zh) 2019-06-04
JP2019094550A (ja) 2019-06-20
KR102164172B1 (ko) 2020-10-12
TW201925501A (zh) 2019-07-01

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