CN109765754A - 固化性组合物、固化膜形成方法、固化物、已被图案化的固化膜、及透明光学构件 - Google Patents

固化性组合物、固化膜形成方法、固化物、已被图案化的固化膜、及透明光学构件 Download PDF

Info

Publication number
CN109765754A
CN109765754A CN201811344055.9A CN201811344055A CN109765754A CN 109765754 A CN109765754 A CN 109765754A CN 201811344055 A CN201811344055 A CN 201811344055A CN 109765754 A CN109765754 A CN 109765754A
Authority
CN
China
Prior art keywords
group
alkyl
substituent group
methyl
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201811344055.9A
Other languages
English (en)
Chinese (zh)
Inventor
千坂博树
野田国宏
盐田大
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of CN109765754A publication Critical patent/CN109765754A/zh
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/26Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04Homopolymers or copolymers of esters
    • C09D133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09D133/08Homopolymers or copolymers of acrylic acid esters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
CN201811344055.9A 2017-11-10 2018-11-12 固化性组合物、固化膜形成方法、固化物、已被图案化的固化膜、及透明光学构件 Pending CN109765754A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-217614 2017-11-10
JP2017217614A JP7028612B2 (ja) 2017-11-10 2017-11-10 硬化性組成物、硬化膜形成方法、硬化物、パターン化されている硬化膜、及び透明光学部材

Publications (1)

Publication Number Publication Date
CN109765754A true CN109765754A (zh) 2019-05-17

Family

ID=66449550

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201811344055.9A Pending CN109765754A (zh) 2017-11-10 2018-11-12 固化性组合物、固化膜形成方法、固化物、已被图案化的固化膜、及透明光学构件

Country Status (3)

Country Link
JP (1) JP7028612B2 (ja)
KR (1) KR20190053776A (ja)
CN (1) CN109765754A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116601244A (zh) * 2020-12-15 2023-08-15 中央硝子株式会社 光学构件用涂布液、聚合物、固化膜、感光性涂布液、图案固化膜、光学构件、固体摄像元件、显示装置、聚硅氧烷化合物、涂布液中使用的稳定剂、固化膜的制造方法、图案固化膜的制造方法和聚合物的制造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102148772B1 (ko) * 2020-04-09 2020-08-27 로움하이텍 주식회사 신규한 중합체, 이를 포함하는 하층막 형성용 조성물 및 이를 이용한 방법

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013033208A (ja) * 2011-06-28 2013-02-14 Mitsubishi Rayon Co Ltd 光学シートおよび光学シートの製造方法
CN103059620A (zh) * 2011-10-24 2013-04-24 Jsr株式会社 热固性水分捕获体形成用组合物、水分捕获体以及电子设备
JP2015040224A (ja) * 2013-08-20 2015-03-02 大阪ガスケミカル株式会社 フルオレン骨格を有する多官能性(メタ)アクリレート
US20160046552A1 (en) * 2013-03-29 2016-02-18 Tokyo Ohka Kogyo Co., Ltd. Composition containing vinyl-group-containing compound
JPWO2016031415A1 (ja) * 2014-08-27 2017-06-15 富士フイルム株式会社 組成物、膜、光学機器、化合物

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014157676A1 (ja) * 2013-03-29 2014-10-02 東京応化工業株式会社 ビニル基含有フルオレン系化合物
JP6059754B2 (ja) * 2014-03-20 2017-01-11 富士フイルム株式会社 組成物、硬化性組成物、透明膜、固体撮像素子および表示装置
JP6156671B2 (ja) 2015-02-26 2017-07-05 大日本印刷株式会社 透過型スクリーン及びそれを用いたヘッドアップディスプレイ装置
WO2016140245A1 (ja) * 2015-03-02 2016-09-09 富士フイルム株式会社 硬化性組成物、硬化物、光学部材、レンズ及び化合物
JP6118837B2 (ja) * 2015-04-07 2017-04-19 株式会社三共 遊技機
JP2017015824A (ja) 2015-06-29 2017-01-19 Jxエネルギー株式会社 シート状透明積層体、それを備えた透明スクリーン、およびそれを備えた画像投影装置
JP6631092B2 (ja) * 2015-08-24 2020-01-15 三菱ケミカル株式会社 透明光学部材用硬化性樹脂組成物、硬化物、透明光学部材、レンズ及びカメラモジュール
JP2016195917A (ja) * 2016-08-30 2016-11-24 シャープ株式会社 吸込口体およびそれを備えた電気掃除機
JP6882823B2 (ja) * 2016-10-03 2021-06-02 大阪ガスケミカル株式会社 硬化性組成物及びその硬化物
JP6871667B2 (ja) * 2016-10-06 2021-05-12 大阪ガスケミカル株式会社 硬化性組成物及びその硬化物
WO2019026889A1 (ja) * 2017-08-01 2019-02-07 大阪ガスケミカル株式会社 単官能性(メタ)アクリレート及び硬化性組成物

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013033208A (ja) * 2011-06-28 2013-02-14 Mitsubishi Rayon Co Ltd 光学シートおよび光学シートの製造方法
CN103059620A (zh) * 2011-10-24 2013-04-24 Jsr株式会社 热固性水分捕获体形成用组合物、水分捕获体以及电子设备
US20160046552A1 (en) * 2013-03-29 2016-02-18 Tokyo Ohka Kogyo Co., Ltd. Composition containing vinyl-group-containing compound
JP2015040224A (ja) * 2013-08-20 2015-03-02 大阪ガスケミカル株式会社 フルオレン骨格を有する多官能性(メタ)アクリレート
JPWO2016031415A1 (ja) * 2014-08-27 2017-06-15 富士フイルム株式会社 組成物、膜、光学機器、化合物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116601244A (zh) * 2020-12-15 2023-08-15 中央硝子株式会社 光学构件用涂布液、聚合物、固化膜、感光性涂布液、图案固化膜、光学构件、固体摄像元件、显示装置、聚硅氧烷化合物、涂布液中使用的稳定剂、固化膜的制造方法、图案固化膜的制造方法和聚合物的制造方法

Also Published As

Publication number Publication date
KR20190053776A (ko) 2019-05-20
JP2019089873A (ja) 2019-06-13
JP7028612B2 (ja) 2022-03-02

Similar Documents

Publication Publication Date Title
TWI449724B (zh) Alkali-soluble resin and method for producing the same, and a photosensitive resin composition using an alkali-soluble resin
JP2016027384A (ja) ベゼル形成用感光性組成物、ベゼル及び表示装置
KR102326631B1 (ko) 감광성 수지 조성물, 포토스페이서, 컬러 필터용 보호막, 및, 터치 패널의 보호막 혹은 절연막
US10795515B2 (en) Transfer film, electrode protective film for electrostatic capacitance-type input device, laminate, method for manufacturing laminate, and electrostatic capacitance-type input device
JP7099323B2 (ja) 硬化膜の形成方法、感放射線樹脂組成物、硬化膜を備える表示素子及びセンサー
JP2013050712A (ja) 感光性樹脂組成物、硬化物及びスペーサー
TW201430046A (zh) 活性能量線硬化型樹脂組成物及使用其的顯示元件用間隔件及/或彩色濾光片保護膜
TW201430045A (zh) 活性能量線硬化型樹脂組成物及使用其的顯示元件用間隔件及/或彩色濾光片保護膜
JP2008065040A (ja) カラーフィルタ用感光性樹脂組成物
CN109765754A (zh) 固化性组合物、固化膜形成方法、固化物、已被图案化的固化膜、及透明光学构件
CN111983891A (zh) 用于量子点阻挡肋的结构及其制备方法
JP2015152726A (ja) 感光性樹脂組成物
TW202105060A (zh) 用於量子點阻擋肋之結構及其製備方法
CN106796375B (zh) 柱状形成物用树脂组合物、附有柱状形成物的基板的制造方法和附有柱状形成物的基板
TW202012187A (zh) 轉印薄膜、積層體及圖案形成方法
CN106483765B (zh) 感光性树脂组合物及由其形成的光固化图案
CN114302923B (zh) 金属氧化物粒子分散用组合物及金属氧化物粒子的分散方法
TWI829905B (zh) 黑色抗蝕劑用感光性樹脂組成物以及使其硬化而成的遮光膜以及彩色濾光片
CN112469751B (zh) 组合物
CN109154773A (zh) 感光性树脂组合物、转印膜、装饰图案及触摸面板
CN108319111B (zh) 一种用于液晶显示器的感光性树脂组合物
TW202115147A (zh) 黑阻劑用感光性樹脂組成物、該感光性樹脂組成物的製造方法、及使其硬化而成的遮光膜、具有該遮光膜的彩色濾光片及觸控面板、具有該彩色濾光片及觸控面板的顯示裝置
TW201529710A (zh) 活性能量線硬化型樹脂組成物、及使用其之顯示元件用間隔物及/或彩色濾光片保護膜
TW418347B (en) Light-sensitive resin composition and display element using the same
JP2014197153A (ja) 感光性樹脂組成物

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination