CN1091522C - 具有梯度指数结构的光学元件和生产这种元件的方法 - Google Patents

具有梯度指数结构的光学元件和生产这种元件的方法 Download PDF

Info

Publication number
CN1091522C
CN1091522C CN97193414A CN97193414A CN1091522C CN 1091522 C CN1091522 C CN 1091522C CN 97193414 A CN97193414 A CN 97193414A CN 97193414 A CN97193414 A CN 97193414A CN 1091522 C CN1091522 C CN 1091522C
Authority
CN
China
Prior art keywords
nano
matrix phase
gradient
scale particle
matrix
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CN97193414A
Other languages
English (en)
Chinese (zh)
Other versions
CN1214773A (zh
Inventor
赫尔穆特·施米特
赫伯特·克鲁格
彼得·W·奥利维拉
斯蒂芬·塞佩沃尔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leibniz Institut fuer Neue Materialien Gemeinnuetzige GmbH
Original Assignee
Leibniz Institut fuer Neue Materialien Gemeinnuetzige GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leibniz Institut fuer Neue Materialien Gemeinnuetzige GmbH filed Critical Leibniz Institut fuer Neue Materialien Gemeinnuetzige GmbH
Publication of CN1214773A publication Critical patent/CN1214773A/zh
Application granted granted Critical
Publication of CN1091522C publication Critical patent/CN1091522C/zh
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0087—Simple or compound lenses with index gradient
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/70—Nanostructure
    • Y10S977/773—Nanoparticle, i.e. structure having three dimensions of 100 nm or less
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/70—Nanostructure
    • Y10S977/778—Nanostructure within specified host or matrix material, e.g. nanocomposite films
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/70—Nanostructure
    • Y10S977/778—Nanostructure within specified host or matrix material, e.g. nanocomposite films
    • Y10S977/779—Possessing nanosized particles, powders, flakes, or clusters other than simple atomic impurity doping
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/70—Nanostructure
    • Y10S977/832—Nanostructure having specified property, e.g. lattice-constant, thermal expansion coefficient
    • Y10S977/834—Optical properties of nanomaterial, e.g. specified transparency, opacity, or index of refraction

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Holo Graphy (AREA)
  • Polymerisation Methods In General (AREA)
  • Optical Integrated Circuits (AREA)
  • Glass Compositions (AREA)
  • Mechanical Coupling Of Light Guides (AREA)
CN97193414A 1996-04-04 1997-04-03 具有梯度指数结构的光学元件和生产这种元件的方法 Expired - Lifetime CN1091522C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19613645A DE19613645A1 (de) 1996-04-04 1996-04-04 Optische Bauteile mit Gradientenstruktur und Verfahren zu deren Herstellung
DE19613645.8 1996-04-04

Publications (2)

Publication Number Publication Date
CN1214773A CN1214773A (zh) 1999-04-21
CN1091522C true CN1091522C (zh) 2002-09-25

Family

ID=7790554

Family Applications (1)

Application Number Title Priority Date Filing Date
CN97193414A Expired - Lifetime CN1091522C (zh) 1996-04-04 1997-04-03 具有梯度指数结构的光学元件和生产这种元件的方法

Country Status (8)

Country Link
US (1) US6236493B1 (enExample)
EP (1) EP0891565B1 (enExample)
JP (1) JP4320456B2 (enExample)
CN (1) CN1091522C (enExample)
AT (1) ATE204991T1 (enExample)
DE (2) DE19613645A1 (enExample)
ES (1) ES2160343T3 (enExample)
WO (1) WO1997038333A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102213779A (zh) * 2010-04-02 2011-10-12 佳能株式会社 透镜和透镜的制备方法

Families Citing this family (91)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19823732A1 (de) * 1998-05-27 1999-12-02 Inst Neue Mat Gemein Gmbh Verfahren zur Herstellung optischer Mehrschichtsysteme
GB9815271D0 (en) 1998-07-14 1998-09-09 Cambridge Display Tech Ltd Particles and devices comprising particles
JP3982953B2 (ja) * 1999-07-28 2007-09-26 触媒化成工業株式会社 抗菌性塗膜および塗膜付基材
DE19952040A1 (de) * 1999-10-28 2001-05-03 Inst Neue Mat Gemein Gmbh Substrat mit einem abriebfesten Diffusionssperrschichtsystem
DE10001135A1 (de) 2000-01-13 2001-07-19 Inst Neue Mat Gemein Gmbh Verfahren zur Herstellung eines mikrostrukturierten Oberflächenreliefs durch Prägen thixotroper Schichten
DE10004132B4 (de) * 2000-01-31 2007-02-01 Few Chemicals Gmbh Beschichtungszusammensetzung zur Herstellung schmutzabweisender Schichten und Zweikomponentensystem sowie deren Verwendung
US7018057B2 (en) * 2000-08-23 2006-03-28 Vtec Technologies, Llc Transparent plastic optical components and abrasion resistant polymer substrates and methods for making the same
EP1195416A3 (de) 2000-10-05 2005-12-28 Degussa AG Polymerisierbare siliciumorganische Nanokapseln
US6695880B1 (en) * 2000-10-24 2004-02-24 Johnson & Johnson Vision Care, Inc. Intraocular lenses and methods for their manufacture
US7323275B2 (en) 2001-02-09 2008-01-29 Dai Nippon Printing Co., Ltd Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording
EP1249470A3 (de) * 2001-03-30 2005-12-28 Degussa AG Hochgefüllte pastöse siliciumorganische Nano- und/oder Mikrohybridkapseln enthaltende Zusammensetzung für kratz- und/oder abriebfeste Beschichtungen
DE10126973B4 (de) * 2001-06-01 2007-04-19 Frischat, Günther Heinz, Prof.Dr. Lichtdurchlässiges Bauelement aus einem thermoplastischen Polymer
JP3717868B2 (ja) * 2001-08-30 2005-11-16 東陶機器株式会社 光触媒性コーティング剤及び光触媒性複合材並びにその製造方法
JP2004269898A (ja) * 2001-08-30 2004-09-30 Toto Ltd 光触媒性コーティング剤及び光触媒性複合材並びにその製造方法
US20030214690A1 (en) * 2001-11-26 2003-11-20 Escuti Michael J. Holographic polymer photonic crystal
DE10161200A1 (de) 2001-12-13 2003-06-26 Clariant Gmbh Kompositmaske zur Herstellung eines Diffusors
DE10200648A1 (de) * 2002-01-10 2003-07-24 Inst Neue Mat Gemein Gmbh Verfahren zur Herstellung Optischer Elemente mit Gradientenstruktur
DE10200760A1 (de) * 2002-01-10 2003-07-24 Clariant Gmbh Nanokompositmaterial zur Herstellung von Brechzahlgradientenfolien
US7128943B1 (en) * 2002-02-20 2006-10-31 University Of South Florida Methods for fabricating lenses at the end of optical fibers in the far field of the fiber aperture
US20030180029A1 (en) * 2002-03-15 2003-09-25 Garito Anthony F. Optical polymer nanocomposite substrates with surface relief structures
DE10213036A1 (de) 2002-03-22 2003-10-02 Clariant Gmbh Kunststofffolie mit Mehrschicht-Interferenzbeschichtung
DE10217151A1 (de) * 2002-04-17 2003-10-30 Clariant Gmbh Nanoimprint-Resist
JP4324344B2 (ja) * 2002-05-02 2009-09-02 富士フイルム株式会社 反射防止フィルムおよびその形成方法、偏光板、画像表示装置
JP4344177B2 (ja) 2002-07-12 2009-10-14 大日本印刷株式会社 体積型ホログラム記録用感光性組成物、体積型ホログラム記録用感光性媒体、及び体積型ホログラム
US6882460B2 (en) * 2002-08-23 2005-04-19 Energy Conversion Devices, Inc. Phase angle controlled stationary elements for long wavelength electromagnetic radiation
US6728456B1 (en) * 2002-10-11 2004-04-27 Eastman Kodak Company Waveguide with nanoparticle induced refractive index gradient
DE10302605B4 (de) * 2003-01-23 2006-05-24 Humboldt-Universität Zu Berlin Anordnung und Verfahren zum Beugen von Lichtwellen an einer Beugungsstruktur
DE10323729A1 (de) 2003-05-26 2004-12-16 Institut Für Neue Materialien Gem. Gmbh Zusammensetzung mit Nichtnewtonschem Verhalten
US7521155B2 (en) * 2003-06-10 2009-04-21 Dai Nippon Printing Co., Ltd. Volume hologram layer and volume hologram transfer foil
DE10326538A1 (de) 2003-06-12 2005-01-05 Institut für Neue Materialien Gemeinnützige GmbH Abriebfeste optische Schichten und Formkörper
US20050036179A1 (en) * 2003-08-13 2005-02-17 General Electric Company Holographic storage medium comprising metal-containing high refractive index region, and storage article containing same
JP2005077740A (ja) * 2003-08-29 2005-03-24 Tdk Corp ホログラム用記録材料、ホログラム用記録媒体、及び、ホログラム用記録材料の製造方法
JP3978729B2 (ja) * 2003-09-26 2007-09-19 康生 富田 ホログラム記録材料組成物及びホログラム記録媒体
US20070105050A1 (en) * 2003-11-05 2007-05-10 Dsm Ip Assets B.V. Method and apparatus for producing microchips
EP1530086A1 (en) * 2003-11-05 2005-05-11 DSM IP Assets B.V. A method and an apparatus for producing micro-chips
US20050208230A1 (en) * 2004-03-16 2005-09-22 Fuji Photo Film, Co., Ltd. Antireflection film, production process of the same, polarizing plate and image displaying apparatus
DE102004012977A1 (de) * 2004-03-17 2005-10-06 Institut für Neue Materialien Gemeinnützige GmbH Kratzfestes optisches Mehrschichtsystem auf einem kristallinen Substrat
US8836331B2 (en) 2004-03-25 2014-09-16 Dai Nippon Printing Co., Ltd. Volume hologram resin composition, surface relief hologram resin composition, and hologram layer, hologram transfer foil and brittle hologram label using the same
US20060019172A1 (en) * 2004-03-25 2006-01-26 Hiroyuki Ohtaki Volume hologram resin composition, surface relief hologram resin composition, and hologram layer, hologram transfer foil and brittle hologram label using the same
JP2006285183A (ja) * 2004-08-25 2006-10-19 Fuji Photo Film Co Ltd 光学素子、および撮影装置
JP2006134492A (ja) * 2004-11-08 2006-05-25 Fujinon Corp 光記録媒体用対物光学系およびこれを用いた光ピックアップ装置
US20060105483A1 (en) * 2004-11-18 2006-05-18 Leatherdale Catherine A Encapsulated light emitting diodes and methods of making
DE102004061323A1 (de) 2004-12-20 2006-06-22 Epg (Engineered Nanoproducts Germany)Gmbh Optische Komponente aus einem anorganisch-organischen Hybridmaterial zur Herstellung von Brechzahlgradientenschichten mit hoher lateraler Auflösung und Verfahren zu ihrer Herstellung
DE102004061324A1 (de) 2004-12-20 2006-06-22 Epg (Engineered Nanoproducts Germany)Gmbh Optische Komponente aus einem anorganisch-organischen Hybridmaterial zur Herstellung von Brechzahlgradientenschichten mit schneller Kinetik und Verfahren zu ihrer Herstellung
DE102005023871A1 (de) * 2005-05-24 2006-11-30 Leibnitz-Institut für neue Materialien Gemeinnützige GmbH Regenerierbare, strukturierte Platte mit Oxidationskatalysatoren
US8718437B2 (en) 2006-03-07 2014-05-06 Qd Vision, Inc. Compositions, optical component, system including an optical component, devices, and other products
WO2007103310A2 (en) 2006-03-07 2007-09-13 Qd Vision, Inc. An article including semiconductor nanocrystals
JP4961829B2 (ja) * 2005-08-09 2012-06-27 ソニー株式会社 ナノ粒子−樹脂複合材料の製造方法
US8849087B2 (en) * 2006-03-07 2014-09-30 Qd Vision, Inc. Compositions, optical component, system including an optical component, devices, and other products
US9874674B2 (en) 2006-03-07 2018-01-23 Samsung Electronics Co., Ltd. Compositions, optical component, system including an optical component, devices, and other products
JP4961828B2 (ja) * 2006-05-12 2012-06-27 ソニー株式会社 ナノ粒子−樹脂複合材料の製造方法
WO2007140350A2 (en) * 2006-05-25 2007-12-06 I2Ic Corporation Method of manufacturing of sheets with varying concentration of particles
US7935212B2 (en) * 2006-07-31 2011-05-03 Essilor International Compagnie Process for transferring onto a surface of an optical article a layer having a variable index of refraction
KR20090045913A (ko) 2006-08-25 2009-05-08 닛산 가가쿠 고교 가부시키 가이샤 유기-지르코니아 복합 미립자를 포함하는 감광성 조성물
DE102006044312A1 (de) 2006-09-18 2008-03-27 Nano-X Gmbh Verfahren zur Beschichtung von Oberflächen und Verwendung des Verfahrens
US8836212B2 (en) 2007-01-11 2014-09-16 Qd Vision, Inc. Light emissive printed article printed with quantum dot ink
WO2008098069A1 (en) * 2007-02-06 2008-08-14 Nanodynamics, Inc. Directed migration of hydrophobic nanomaterials at surfaces
JP2010523771A (ja) * 2007-04-05 2010-07-15 ポリテクニック インスティテュート オブ ニューヨーク ユニバーシティー ナノコンポジットおよびそれらの表面の改良
WO2008150867A2 (en) 2007-05-29 2008-12-11 Innova Materials, Llc Surfaces having particles and related methods
WO2009014707A2 (en) 2007-07-23 2009-01-29 Qd Vision, Inc. Quantum dot light enhancement substrate and lighting device including same
DE102007035387A1 (de) 2007-07-26 2009-01-29 Leibnitz-Institut für neue Materialien Gemeinnützige GmbH Verfahren und Vorrichtung zur Herstellung von strukturierten optischen Materialien
WO2009023169A1 (en) * 2007-08-10 2009-02-19 Nano Terra Inc. Structured smudge-resistant coatings and methods of making and using the same
US8128249B2 (en) 2007-08-28 2012-03-06 Qd Vision, Inc. Apparatus for selectively backlighting a material
JP5115125B2 (ja) * 2007-10-05 2013-01-09 Ｔｄｋ株式会社 ホログラム記録材料及びホログラム記録媒体
JP5115137B2 (ja) * 2007-10-16 2013-01-09 Ｔｄｋ株式会社 ホログラム記録媒体
US20100302487A1 (en) * 2007-12-28 2010-12-02 Storer Joey W Phase compensation film
WO2009085082A1 (en) * 2007-12-28 2009-07-09 Dow Global Technologies Inc. Small scale functional materials
WO2009137053A1 (en) 2008-05-06 2009-11-12 Qd Vision, Inc. Optical components, systems including an optical component, and devices
US9207385B2 (en) 2008-05-06 2015-12-08 Qd Vision, Inc. Lighting systems and devices including same
EP2297762B1 (en) 2008-05-06 2017-03-15 Samsung Electronics Co., Ltd. Solid state lighting devices including quantum confined semiconductor nanoparticles
EP2328731A4 (en) * 2008-08-21 2017-11-01 Tpk Holding Co., Ltd Enhanced surfaces, coatings, and related methods
EP2233976A1 (en) * 2009-03-25 2010-09-29 Sony DADC Austria AG Photopolymerisable system for hologram formation
EP2243622A3 (en) * 2009-04-22 2015-06-03 Canon Kabushiki Kaisha Method for producing optical part
JP5709657B2 (ja) * 2010-06-09 2015-04-30 キヤノン株式会社 有機・無機複合体の製造方法及び光学素子の製造方法
US8749009B2 (en) 2010-08-07 2014-06-10 Innova Dynamics, Inc. Device components with surface-embedded additives and related manufacturing methods
US8368106B2 (en) 2010-11-04 2013-02-05 Industrial Technology Research Institute Gradient composite material and method of manufacturing the same
US9293197B2 (en) 2011-08-15 2016-03-22 Lockheed Martin Corporation Reconfigurable phase change material masks for electro-optical compressive sensing
CN102866439A (zh) * 2012-09-21 2013-01-09 蚌埠玻璃工业设计研究院 一种基于高分子聚合物的cpv技术用梯度折射率透镜及其制备方法
US9340446B1 (en) 2013-02-04 2016-05-17 Lockheed Martin Corporation Optical apparatus and method of forming a gradient index device
EP3024889B1 (en) * 2013-07-25 2025-01-15 Essilor International Hybrid epoxy-acrylic with zirconium oxide nanocomposite for curable coatings
WO2015130260A1 (en) * 2014-02-25 2015-09-03 Empire Technology Development Llc Gradient index (grin) backplane routing
US9829663B2 (en) 2014-02-25 2017-11-28 Empire Technology Development Llc Silicon chip with refractive index gradient for optical communication
CN107530733B (zh) * 2014-06-17 2021-01-05 维帝安特光学有限公司 经校正光色散的消色差梯度折射率光学元件
US10437083B1 (en) 2014-10-20 2019-10-08 Lockheed Martin Corporation Individually addressable infrared mask array
US11465375B2 (en) * 2015-12-15 2022-10-11 Vadient Optics, Llc Nanocomposite refractive index gradient variable focus optic
US9969647B2 (en) 2016-05-17 2018-05-15 Lockheed Martin Energy, Llc Glass composites having a gradient index of refraction and methods for production thereof
US10661476B2 (en) * 2016-05-19 2020-05-26 Cal Poly Corporation Porous nanostructures and methods of fabrication
US9908808B1 (en) 2016-08-18 2018-03-06 Lockheed Martin Corporation Ternary glass materials with low refractive index variability
DE102017214334A1 (de) 2017-08-17 2019-02-21 Technische Universität Dresden Multi-Material-Verbund und Verfahren zu dessen Herstellung
KR102538896B1 (ko) 2020-11-19 2023-06-01 삼성전기주식회사 렌즈 모듈 및 이를 포함하는 카메라 모듈
CN112852239A (zh) * 2020-12-29 2021-05-28 重庆中防德邦防水技术有限公司 一种自主形成梯度分布层的有机/无机复合涂层

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5470910A (en) * 1991-10-10 1995-11-28 Institut Fuer Neue Materialien Gemeinnuetzige Gmbh Composite materials containing nanoscalar particles, process for producing them and their use for optical components

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4173475A (en) * 1977-05-31 1979-11-06 Bell Telephone Laboratories, Incorporated Latent image thick refractive index recordings
US4453805A (en) * 1981-02-19 1984-06-12 Bell Telephone Laboratories, Incorporated Optical grating using a liquid suspension of dielectric particles
US4403031A (en) * 1981-06-25 1983-09-06 Corning Glass Works Method for providing optical patterns in glass
US4514053A (en) * 1983-08-04 1985-04-30 Corning Glass Works Integral photosensitive optical device and method
US4627689A (en) * 1983-12-08 1986-12-09 University Of Pittsburgh Crystalline colloidal narrow band radiation filter
US4632517A (en) * 1983-12-08 1986-12-30 University Of Pittsburgh Crystalline colloidal narrow band radiation filter
US4778744A (en) * 1986-11-21 1988-10-18 Corning Glass Works Method for providing high-intensity optical patterns in glass
IL86636A0 (en) * 1988-06-06 1988-11-30 Israel Atomic Energy Comm Optical glass elements having a graded refraction index for ir light and method for their production
US5104210A (en) * 1989-04-24 1992-04-14 Monsanto Company Light control films and method of making
US5360834A (en) * 1989-08-01 1994-11-01 Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. Process for photoinitiated control of inorganic network formation in the sol-gel process
DE3925462A1 (de) * 1989-08-01 1991-02-07 Fraunhofer Ges Forschung Verfahren zur photoinitiierten steuerung der anorganischen netzwerkbildung beim sol-gel-prozess
US5100589A (en) * 1989-12-04 1992-03-31 Lockheed Missiles & Space Company, Inc. Optical method for altering molecular alignment in selected regions of a non-linear optical polymeric structure
US5158933A (en) * 1990-11-15 1992-10-27 Holtz Ronald L Phase separated composite materials
US5266238A (en) * 1990-12-24 1993-11-30 American Cyanamid Company Narrow band radiation filter films
US5716679A (en) * 1991-09-13 1998-02-10 Institut Fur Neue Materialien Gemeinnutzige Gmbh Optical elements containing nanoscaled particles and having an embossed surface and process for their preparation
DE4130550A1 (de) * 1991-09-13 1993-03-18 Inst Neue Mat Gemein Gmbh Optische elemente und verfahren zu deren herstellung
JP3219437B2 (ja) * 1991-10-28 2001-10-15 オリンパス光学工業株式会社 屈折率分布型光学素子
DE69316792T2 (de) * 1992-06-17 1998-05-28 Nitto Denko Corp Verfahren zur Herstellung von Polymerisation oder vernetzter Rate-distribuierte Produkte und Verfahren zur Herstellung einer Linse, Linsenanordnung oder Lichtwellenleiter durch dieses Verfahren
WO1996000969A1 (de) * 1994-06-29 1996-01-11 Robert Bosch Gmbh Anisotrop leitender kleber und verfahren zur herstellung eines anisotrop leitenden klebers
FR2731081B1 (fr) * 1995-02-27 1997-04-11 Essilor Int Procede d'obtention d'un article transparent a gradient d'indice de refraction
US5849373A (en) * 1996-02-05 1998-12-15 Sandia Corporation Process for the synthesis of nanophase dispersion-strengthened aluminum alloy
US5926740A (en) * 1997-10-27 1999-07-20 Micron Technology, Inc. Graded anti-reflective coating for IC lithography

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5470910A (en) * 1991-10-10 1995-11-28 Institut Fuer Neue Materialien Gemeinnuetzige Gmbh Composite materials containing nanoscalar particles, process for producing them and their use for optical components

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102213779A (zh) * 2010-04-02 2011-10-12 佳能株式会社 透镜和透镜的制备方法
US8582210B2 (en) 2010-04-02 2013-11-12 Canon Kabushiki Kaisha Lens and method for producing lens
CN102213779B (zh) * 2010-04-02 2014-03-26 佳能株式会社 透镜和透镜的制备方法

Also Published As

Publication number Publication date
EP0891565B1 (de) 2001-08-29
ES2160343T3 (es) 2001-11-01
ATE204991T1 (de) 2001-09-15
WO1997038333A1 (de) 1997-10-16
DE59704453D1 (de) 2001-10-04
JP4320456B2 (ja) 2009-08-26
EP0891565A1 (de) 1999-01-20
CN1214773A (zh) 1999-04-21
JP2000508783A (ja) 2000-07-11
DE19613645A1 (de) 1997-10-09
US6236493B1 (en) 2001-05-22

Similar Documents

Publication Publication Date Title
CN1091522C (zh) 具有梯度指数结构的光学元件和生产这种元件的方法
JP4419167B2 (ja) グラジエント構造を有する光学素子の製造方法
CN1253500C (zh) 用于制备具有折射率梯度的薄膜的纳米复合材料
CN1395512A (zh) 通过触变层压花制备微结构表面浮雕的方法
US7763340B2 (en) Dust-proof, light-transmitting member and its use, and imaging apparatus comprising same
BRPI0621423A2 (pt) superfìcie super-hidrofóbica e método para formar a mesma
JP5607915B2 (ja) 撥水撥油樹脂組成物および塗装品
JP2002346469A (ja) 自浄性表面、その製造方法及びその使用
CN1382073A (zh) 包括耐磨扩散阻挡层体系的基材
JPWO2004052640A1 (ja) 機能性皮膜被覆物品、その製造方法及び機能性皮膜形成用塗工材料
JP4497460B2 (ja) 反射防止膜の製造方法
Sato et al. Large-scale formation of fluorosurfactant-doped transparent nanocomposite films showing durable antifogging, oil-repellent, and self-healing properties
CN101870149B (zh) 具有剥离层的成型用模具或电铸母模
JP2012502874A (ja) 屈折率が異なる二つのドメインを有するオブジェクトを分散した状態で含む反射防止コーティング
JPH10245521A (ja) プライマー組成物及び透明被覆物品
JP2019209593A (ja) 樹脂製成形物
JP2001089709A (ja) 有機基材へ光触媒性薄膜を固着させるためのプライマ−組成物、及び光触媒性部材
JPH1158629A (ja) 農業用防曇性フィルム
Zhang Self‐healing Superamphiphobic Surfaces
JP2019178285A (ja) 成形体、微細凹凸構造体及びその製造方法
JP2010030179A (ja) 有機無機複合材料成形体とその製造方法、光学部品およびレンズ
JPWO2009130745A1 (ja) 金平糖状粒子の製造方法
JPWO2009130745A6 (ja) 金平糖状粒子の製造方法
JP2500149C (enExample)

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CX01 Expiry of patent term

Granted publication date: 20020925

CX01 Expiry of patent term