CN108329424B - 光固化性组合物及由该光固化性组合物形成的光固化膜 - Google Patents

光固化性组合物及由该光固化性组合物形成的光固化膜 Download PDF

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CN108329424B
CN108329424B CN201810041645.8A CN201810041645A CN108329424B CN 108329424 B CN108329424 B CN 108329424B CN 201810041645 A CN201810041645 A CN 201810041645A CN 108329424 B CN108329424 B CN 108329424B
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meth
chemical formula
photocurable composition
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functional
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CN108329424A (zh
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金圣彬
赵庸桓
朴汉雨
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Dongwoo Fine Chem Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D135/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least another carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D135/02—Homopolymers or copolymers of esters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/844—Encapsulations
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/103—Esters of polyhydric alcohols or polyhydric phenols of trialcohols, e.g. trimethylolpropane tri(meth)acrylate

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Electroluminescent Light Sources (AREA)
  • Polymerisation Methods In General (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Materials For Photolithography (AREA)
CN201810041645.8A 2017-01-18 2018-01-16 光固化性组合物及由该光固化性组合物形成的光固化膜 Active CN108329424B (zh)

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KR10-2017-0008504 2017-01-18
KR1020170008504A KR102554567B1 (ko) 2017-01-18 2017-01-18 광경화성 조성물 및 이로부터 형성된 광경화 막

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JP7236672B2 (ja) * 2018-12-25 2023-03-10 パナソニックＩｐマネジメント株式会社 封止材の製造方法、及び発光装置の製造方法
JP7236671B2 (ja) * 2018-12-25 2023-03-10 パナソニックＩｐマネジメント株式会社 発光素子封止用組成物、及び発光装置
WO2020162104A1 (ja) * 2019-02-04 2020-08-13 セントラル硝子株式会社 有機発光素子封止用組成物、および該組成物を用いた有機発光素子封止膜、並びにその形成方法
CN113248652B (zh) * 2020-11-11 2022-09-16 浙江华显光电科技有限公司 一种用于密封有机发光器件的光固化性组合物
KR20230041335A (ko) * 2021-09-17 2023-03-24 코오롱인더스트리 주식회사 봉지재 조성물 및 발광 소자

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CN1730502A (zh) * 2005-08-16 2006-02-08 广东鸿昌化工有限公司 一种常温自交联含氟丙烯酸微乳液及其制备方法
JP2010209250A (ja) * 2009-03-11 2010-09-24 Fujifilm Corp 光硬化性組成物、これを用いた硬化物およびその製造方法、ならびに液晶表示装置用部材
CN104640884A (zh) * 2012-09-24 2015-05-20 佳能株式会社 光固化性组合物和使用所述组合物的膜的制造方法
CN104737271A (zh) * 2012-10-09 2015-06-24 佳能株式会社 光固化性组合物和膜的制造方法
JP2016002704A (ja) * 2014-06-17 2016-01-12 コニカミノルタ株式会社 ３ｄ造形用組成液、３ｄ造形用インクセットおよび３ｄ造形物の製造方法
CN105829100A (zh) * 2013-12-17 2016-08-03 旭硝子株式会社 负型感光性树脂组合物、树脂固化膜、分隔壁和光学元件

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CN1046545A (zh) * 1989-02-17 1990-10-31 斯韦德罗有限公司 能形成透明耐磨涂层的可着色、可辐射固化的涂层组合物
CN1730502A (zh) * 2005-08-16 2006-02-08 广东鸿昌化工有限公司 一种常温自交联含氟丙烯酸微乳液及其制备方法
JP2010209250A (ja) * 2009-03-11 2010-09-24 Fujifilm Corp 光硬化性組成物、これを用いた硬化物およびその製造方法、ならびに液晶表示装置用部材
CN104640884A (zh) * 2012-09-24 2015-05-20 佳能株式会社 光固化性组合物和使用所述组合物的膜的制造方法
CN104737271A (zh) * 2012-10-09 2015-06-24 佳能株式会社 光固化性组合物和膜的制造方法
CN105829100A (zh) * 2013-12-17 2016-08-03 旭硝子株式会社 负型感光性树脂组合物、树脂固化膜、分隔壁和光学元件
JP2016002704A (ja) * 2014-06-17 2016-01-12 コニカミノルタ株式会社 ３ｄ造形用組成液、３ｄ造形用インクセットおよび３ｄ造形物の製造方法

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KR20180085181A (ko) 2018-07-26
JP2018173622A (ja) 2018-11-08
CN108329424A (zh) 2018-07-27
KR102554567B1 (ko) 2023-07-11
JP6535767B2 (ja) 2019-06-26

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