CN107535078A - 高频模块 - Google Patents
高频模块 Download PDFInfo
- Publication number
- CN107535078A CN107535078A CN201680023133.8A CN201680023133A CN107535078A CN 107535078 A CN107535078 A CN 107535078A CN 201680023133 A CN201680023133 A CN 201680023133A CN 107535078 A CN107535078 A CN 107535078A
- Authority
- CN
- China
- Prior art keywords
- layer
- sealing resin
- resin layer
- circuit board
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 229910010038 TiAl Inorganic materials 0.000 description 5
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- 229910052804 chromium Inorganic materials 0.000 description 5
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- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
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Classifications
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- H—ELECTRICITY
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Abstract
本发明提供一种能够确保屏蔽特性并且能够实现低高度化的高频模块。高频模块1a具备:布线基板2;部件3a,安装于布线基板2的上表面2a;密封树脂层4a,层叠于布线基板2的上表面2a并密封部件3a;第一屏蔽层5,层叠于密封树脂层4a,以便覆盖第一密封树脂层4a的与布线基板2的上表面2a相反的相反面4a1以及周侧面4a2;第二屏蔽层5,层叠于第一屏蔽层5的覆盖密封树脂层4a的周侧面4a2的部分。该情况下,即使在由第一屏蔽层5无法确保用于得到所希望的屏蔽特性的厚度的情况下,也能够由第二屏蔽层6承担该不足的量,因此能够确保所希望的屏蔽特性并且能够实现高频模块1a的低高度化。
Description
技术领域
本发明涉及一种具备覆盖安装于布线基板的部件的密封树脂层和层叠于密封树脂层的屏蔽层的模块。
背景技术
在搭载于便携式终端装置等的高频模块中,有时会设置用于屏蔽电磁波的屏蔽层。在这种高频模块中,有设置屏蔽层,以便安装在布线基板上的部件被模具树脂覆盖,由屏蔽层覆盖该模具树脂的表面的高频模块。屏蔽层以电磁波的屏蔽为目的,通常具有Cu、Al、Ag等的导电膜,但存在这些金属膜均与模具树脂的紧贴强度弱,耐腐蚀性也不充分这样的问题。
因此,在现有技术中提出了与树脂的紧贴性高、耐腐蚀性优异的屏蔽层。例如如图7所示,专利文献1中记载的高频模块100具备树脂基板101、层叠在该树脂基板101的上表面的屏蔽层102,屏蔽层102由在树脂基板101上成膜的紧贴膜102a、在该紧贴膜102a上成膜的导电膜102b、在该导电膜102b上成膜的保护膜102c的3层构造形成。这里,导电膜102b由Cu、Ag、Al中的任一种形成。另外,紧贴膜102a由与树脂基板101的紧贴强度比导电膜102b高的SUS形成。另外,在导电膜102b上成膜的保护膜102c由与导电膜102b相比耐腐蚀性高的SUS形成。通过像这样以3层构造形成屏蔽层102,实现紧贴强度及耐腐蚀性等的提高。
专利文献1:日本特开2007-243122号公报(参照第0019~0026段,图1等)
上述屏蔽层102使用溅射法、蒸镀法等薄膜形成技术而形成。该情况下,通常将树脂基板101的主面配置成与靶、蒸镀源对置来成膜。因此,在安装在布线基板上的部件被模具树脂覆盖且由屏蔽层覆盖该模具树脂的表面地形成屏蔽层的结构中,将模具树脂的顶面配置成与靶、蒸镀源对置来成膜。
根据这样的成膜方法,对于屏蔽层的厚度而言,覆盖模具树脂的顶面的部分比覆盖模具树脂的周侧面的部分厚。因此,若欲确保屏蔽层的周侧面侧的厚度以得到所希望的屏蔽特性,则使顶面侧的厚度不必要地增大,妨碍高频模块的低高度化。
发明内容
本发明是鉴于上述的课题而完成的,目的在于提供一种能够确保屏蔽特性并且能够实现低高度化的高频模块。
为了实现上述的目的,本发明的高频模块的特征在于,具备:布线基板;第一部件,安装于上述布线基板的一个主面;第一密封树脂层,层叠于上述布线基板的上述一个主面并密封上述第一部件;以及层叠于上述第一密封树脂层的屏蔽层,上述屏蔽层具有:第一屏蔽层,层叠于上述第一密封树脂层,以便覆盖上述第一密封树脂层中的与上述布线基板的上述一个主面相反的相反面以及周侧面;第二屏蔽层,层叠于上述第一屏蔽层中的覆盖上述第一密封树脂层的上述周侧面的部分。
该情况下,由于第一密封树脂层的周侧面被第一屏蔽层和第二屏蔽层覆盖,所以即使在由第一屏蔽层无法确保用于得到所希望的屏蔽特性的厚度的情况下,也能够由第二屏蔽层承担该不足的量。另外,由于第二屏蔽层不层叠于第一密封树脂层的与布线基板的一个主面相反的相反面侧,所以第一密封树脂层的上述相反面被第一屏蔽层覆盖。根据该结构,能够确保所希望的屏蔽特性且能够实现高频模块的低高度化。
另外,上述第一屏蔽层也可以具有由金属构成的第一导电膜,上述第二屏蔽层也可以具有由与上述第一导电膜相同的金属构成的第二导电膜。该情况下,能够利用第一屏蔽层和第二屏蔽层来减小热膨胀率的差,因此能够减少热冲击时的两个屏蔽层间的剥离。另外,在以溅射法、蒸镀法等形成两个屏蔽层的情况下,由于能够实现靶、蒸镀源的共用化,因此能够实现两个屏蔽层的形成成本的减少。
另外,上述第一屏蔽层也可以具有由金属构成的第一导电膜,上述第二屏蔽层也可以具有由与上述第一导电膜不同的金属构成的第三导电膜,上述第一导电膜的上述金属以及上述第三导电膜的上述不同的金属中的一方的相对磁导率也可以为1以上。该情况下,例如能够对形成第一导电膜的金属使用电导率高的铜、铝等,能够对形成第二导电膜的金属使用高磁导率的Ni、Co等。根据该结构,能够实现不仅是相对于第二屏蔽层的电场的屏蔽特性的提高,还实现相对于第二屏蔽层的磁场的屏蔽特性的提高。
另外,还可以具备:第二部件,安装于上述布线基板的另一个主面;和第二密封树脂层,层叠于上述布线基板的上述另一个主面并密封上述第二部件,上述第一屏蔽层还可以覆盖上述第二密封树脂层的周侧面,上述第二屏蔽层也可以被设置为除了上述第一屏蔽层中的覆盖上述第一密封树脂层的上述周侧面的部分之外,还覆盖上述第一屏蔽层中的覆盖上述第二密封树脂层的上述周侧面的部分以及上述第二密封树脂层中的与上述布线基板的上述另一个主面相反的相反面。
该情况下,第一密封树脂层的周侧面以及第二密封树脂层的周侧面双方被第一屏蔽层和第二屏蔽层覆盖。即使在由第一、第二屏蔽层中的一方无法确保用于得到所希望的屏蔽特性的厚度的情况下,也能够由另一方的屏蔽层承担该不足的量。另外,第一密封树脂层的与布线基板的一个主面相反的相反面以及第二密封树脂层的与布线基板的另一个主面相反的相反面均仅被第一屏蔽层以及第二屏蔽层中的一方覆盖。因此,能够确保第一密封树脂层以及第二密封树脂层的周侧面侧的屏蔽特性且能够实现高频模块的低高度化。
另外,也可以在上述屏蔽层中的覆盖上述第一密封树脂层的上述相反面的部分的表面露出上述第一屏蔽层。这样一来,能够实现高频模块的低高度化。
另外,也可以具备:布线基板;第一部件,安装于上述布线基板的一个主面;第一密封树脂层,层叠于上述布线基板的上述一个主面并密封上述第一部件;第三屏蔽层,层叠于上述第一密封树脂层的,以便覆盖上述第一密封树脂层中的与上述布线基板的上述一个主面相反的相反面以及周侧面,上述第三屏蔽层也可以具有层叠于上述第一密封树脂层的紧贴膜和层叠于该紧贴膜的导电膜,上述周侧面侧的厚度相对于上述紧贴膜的上述相反面侧的厚度的比例比上述周侧面侧的厚度相对于上述导电膜的上述相反面侧的厚度的比例小。
导电膜的电导率比紧贴膜高的情况较多,该情况下,导电膜的厚度越厚,第三屏蔽层的屏蔽特性就越高。根据该结构,例如若将导电膜与紧贴膜的第一密封树脂层的上述相反面侧的厚度设为相同的厚度,则就第一密封树脂层的周侧面侧的厚度而言,与紧贴膜相比导电膜更厚。因此,在第三屏蔽层中,能够容易提高第一密封树脂层的周侧面侧的屏蔽特性。
根据本发明,第一密封树脂层的周侧面被第一屏蔽层与第二屏蔽层覆盖,因此即使在由第一屏蔽层无法确保用于得到所希望的屏蔽特性的厚度的情况下,也能够由第二屏蔽层承担该不足量。另外,第二屏蔽层不层叠于第一密封树脂层的与布线基板的一个主面相反的相反面侧,因此第一密封树脂层的相反面被第一屏蔽层覆盖。根据该结构,能够确保所希望的屏蔽特性且能够实现高频模块的低高度化。
附图说明
图1是本发明的第一实施方式所涉及的高频模块的剖视图。
图2是图1的A区域的放大图。
图3是本发明的第二实施方式所涉及的高频模块的局部剖视图。
图4是本发明的第三实施方式所涉及的高频模块的剖视图。
图5是本发明的第四实施方式所涉及的高频模块的剖视图。
图6是本发明的第五实施方式所涉及的高频模块的局部剖视图。
图7是用于对现有的屏蔽层进行说明的图。
具体实施方式
<第一实施方式>
参照图1以及图2对本发明的第一实施方式所涉及的高频模块1a进行说明。此外,图1是高频模块的剖视图,图2是图1的A区域的放大图。
如图1所示,本实施方式所涉及的高频模块1a具备:布线基板2、安装于该布线基板2的上表面2a的多个部件3a、密封在布线基板2的上表面2a设置的各部件3a的密封树脂层4a、第一、第二屏蔽层5、6(相当于本发明的“屏蔽层”),例如被搭载于使用高频信号的电子设备的主基板等。
布线基板2例如由低温共烧陶瓷、玻璃环氧树脂等形成,在上表面(相当于本发明的“布线基板的一个主面”)形成各部件3a的安装用的多个焊盘电极7。另外,内部形成有接地用的接地电极8a、8b、各种布线电极(省略图示)以及多个导通孔导体(省略图示)。这里,接地电极8a、8b均被设置为从布线基板2的侧面2b露出。
各焊盘电极7、接地电极8a、8b以及布线电极作为Cu、Al等的布线电极分别由通常采用的金属形成。另外,各导通孔导体由Ag、Cu等金属形成。此外,也可以对各焊盘电极7分别实施Ni/Au电镀。
作为各部件3a可例举由Si、GaAs等半导体形成的半导体元件、片式电感器、片式电容器、片式电阻等芯片部件等。各部件3a分别相当于本发明的“第一部件”。
将密封树脂层4a(相当于本发明的“第一密封树脂层”)设置成覆盖布线基板2的上表面2a和各部件3a。该密封树脂层4a能够由作为环氧树脂等密封树脂而通常采用的树脂形成。
第一屏蔽层5层叠于密封树脂层4a,以便覆盖密封树脂层4a的与布线基板2的上表面2a相反的相反面4a1和周侧面4a2、以及布线基板2的侧面2b。另外,如图2所示,第一屏蔽层5由具有层叠于密封树脂层4a的表面的紧贴膜5a、层叠于紧贴膜5a的导电膜5b(相当于本发明的“第一导电膜”)、层叠于导电膜5b的保护膜5c的多层构造形成,与在布线基板2的侧面2b露出的接地电极8a、8b电连接。
紧贴膜5a是为了提高导电膜5b与密封树脂层4a的紧贴强度而设置的,例如能够由SUS、Ti、Cr、Ni、TiCr、TiAl、NiAl、CrAl、CrNiAl中的任一种金属形成。另外,紧贴膜5a在布线基板2的侧面2b与在该侧面2b露出的接地电极8a、8b电连接。优选紧贴膜5a的密封树脂层4a的上述相反面4a1上的膜厚是0.01μm以上0.5μm以下。此外,在本实施方式中,紧贴膜5a由SUS形成。
导电膜5b是承担第一屏蔽层5的实际的屏蔽功能的层,例如能够由Cu、Ag、Al中的任一种金属形成。导电膜5b的密封树脂层4a的上述相反面4a1上的膜厚优选是3μm以上10μm以下。此外,在本实施方式中,导电膜5b由Cu形成。通过使导电膜5b的厚度是3μm以上,能够利用导电膜5b有效地防止来自高频模块1a的上方的噪声对各部件3a带来影响。另外,通过使导电膜5b的厚度为10μm以下,能够实现高频模块1a的低高度化。
保护膜5c是为了防止导电膜5b被腐蚀、受伤而设置的,例如能够由SUS、Ti、Cr、Ni、TiCr、TiAl、NiAl、CrAl、CrNiAl中的任一种金属形成。优选保护膜5c的密封树脂层4a的上述相反面4a1上的膜厚是0.03μm以上1.5μm以下。此外,在本实施方式中,保护膜5c由SUS形成。
第二屏蔽层6是为了加强第一屏蔽层5而设置的,层叠于第一屏蔽层5,以便覆盖对第一屏蔽层5的密封树脂层4a的周侧面4a2进行覆盖的部分。另外,如图2所示,第二屏蔽层6与第一屏蔽层5相同,由具有层叠于覆盖保护膜5c的密封树脂层4a的周侧面4a2的部分的紧贴膜6a、层叠于紧贴膜6a的导电膜6b(相当于本发明的“第二导电膜”)、层叠于导电膜6b的保护膜6c的多层构造形成。
如图2所示,第二屏蔽层6被设置为覆盖第一屏蔽层5(保护膜5c)的周侧面,不覆盖第一屏蔽层5(保护膜5c)的上表面。因此,第一屏蔽层5在屏蔽层(第一屏蔽层5以及第二屏蔽层6)中位于密封树脂层4a的上述相反面4a1上的部分露出。
第二屏蔽层6的紧贴膜6a能够由与第一屏蔽层5的紧贴膜5a相同的结构来形成,第二屏蔽层6的导电膜6b能够由与第一屏蔽层5的导电膜5b相同的结构来形成,第二屏蔽层6的保护膜6c能够由与第一屏蔽层5的保护膜5c相同的结构来形成。
(高频模块的制造方法)
接下来,对高频模块1a的制造方法进行说明。此外,在本实施方式中,以使用溅射装置而形成第一屏蔽层5以及第二屏蔽层6的高频模块1a的制造方法为例来进行说明。
首先,在由低温共烧陶瓷(LTCC)、玻璃环氧树脂等形成的布线基板2的上表面2a安装各部件3a。此外,使用公知的方法在布线基板2形成焊盘电极7、接地电极8a、8b以及导通孔导体等电极。另外,能够使用焊接安装等一般的表面安装技术来安装各部件3a。此外,在安装各部件3a后,也可以进行助焊剂清洗。
接下来,利用环氧树脂密封各部件3a而形成密封树脂层4a,准备模具构造体,该模具构造体具有布线基板2、安装于布线基板2的上表面2a的部件3a、层叠于该布线基板2的上表面2a以便覆盖布线基板2的上表面2a以及各部件3a的密封树脂层4a。密封树脂层4a能够利用涂覆方式、印刷方式、转移模具方式、压模方式等形成。
此外,为了使高频模块1a的高度均匀,在形成密封树脂层4a之后,可以对密封树脂层4a的与布线基板2的上表面2a相反的相反面4a1进行研磨加工。另外,为了提高密封树脂层4a与布线基板2的紧贴性,可以在形成密封树脂层4a之前进行等离子体蚀刻等干式清洗。另外,在转移模具方式、压模方式等进行各部件3a的树脂密封时使用离型膜的情况下,可以使用使该离型膜的树脂接触面粗糙化的离型膜。该情况下,由于在密封树脂层4a的表面形成凹凸,所以在密封树脂层4a的表面不易附着手上的油等,小伤痕、染污等外观的不良情况也难以被发现。此外,优选该情况下的密封树脂层4a的表面粗糙度Ra是1μm以上10μm以下。
接下来,在由一体地形成多个布线基板2而成的可多分割的集合基板制造高频模块1a的情况下,在形成密封树脂层4a之后,利用切割机、激光、木板加工机(router)等对各个模具构造体进行单片化。该情况下,也可以将集合基板半切。在半切的情况下,能够以集合基板的状态进行第一屏蔽层5以及第二屏蔽层6的成膜,所以可操作性良好。此外,在切割时,形成于布线基板2的接地电极8a、8b分别在布线基板2的侧面2b露出。
接下来,将进行单片化之后的模具构造体排列并支承在溅射用的托盘。该情况下,为了防止基于溅射的膜绕进布线基板2的下表面,可以在布线基板2的下表面粘贴糊状物、胶带。
接下来,将放置了模具构造体的托盘配置于溅射装置的腔室的规定位置,进行腔室内的抽真空。此时,将托盘配置成密封树脂层4a的上述相反面4a1与溅射装置的各靶对置。此外,若考虑到膜的质量则优选极限真空度较低,但伴随于此抽真空的所需时间变长,因此从生产效率方面来看优选设定极限真空度是1×10-3Pa以上1×10-1Pa以下。另外,为了减少抽真空的所需时间,也可以由溅射腔室与真空锁(load lock)腔室(所谓的前腔室)构成腔室内。另外,作为溅射装置能够使用嵌入型、批量型、单片型等。
接下来,根据需要在溅射前进行模具构造体的表面的干式蚀刻。该情况下,对Ar离子枪以所需时间施加电压而利用Ar离子对密封树脂层4a的表面(相反面4a1以及周侧面4a2)以及布线基板2的侧面2b进行干式清洗。这样一来,除了能够除去成为第一屏蔽层5与密封树脂层4a的紧贴力降低的原因的不必要物质之外,还通过使模具构造体的表面粗糙化而产生锚定效应,提高密封树脂层4a与第一屏蔽层5(紧贴膜5a)的紧贴性。
接下来,通过溅射来成膜第一屏蔽层5的紧贴膜5a,以便覆盖密封树脂层4a的表面以及布线基板2的侧面2b。该情况下,作为靶的材料能够使用SUS、Ti、Cr、Ni、TiCr、TiAl、NiAl、CrAl、CrNiAl中的任一种金属。例如在由SUS形成紧贴膜5a的情况下,对SUS靶以所希望时间施加电压来进行溅射。将此时的膜厚(紧贴膜5a中位于密封树脂层4a的相反面4a1上的部分的膜厚)设为0.01μm以上0.5μm以下。投入腔室内的气体使用成为等离子体源的Ar气体。另外,将此时的投入量例如设为30~300sccm。
此外,为了除去靶的表面的氧化物,可以进行预溅射(所谓的在关闭挡板的状态下的溅射)。另外,靶除了金属靶以外,还能够使用烧结靶等。在金属靶中,根据合金的组成有难以形成的,但在烧结靶的情况下,能够以任意组成来调整金属组成比,因此能够容易进行紧贴性、耐腐蚀性的最佳化。
另外,溅射装置的电力方式能够使用DC方式、脉冲方式、RF方式等。在脉冲方式、RF方式的情况下,即使在靶表面有反应物(氧化物、氮化物)成膜而电阻值变高的情况下,也能够稳定地放电。
接下来,以与紧贴膜5a相同的要领,在该紧贴膜5a的表面利用溅射来成膜导电膜5b。该情况下,作为靶的材料能够使用Cu、Ag、Al中的任一种金属。例如在由Cu形成导电膜5b的情况下,对Cu靶以所希望时间施加电压来进行溅射。投入腔室内的气体使用成为等离子体源的Ar气体。另外,将此时的投入量例如设为30~300sccm。另外,与紧贴膜5a相同,也可以对Cu靶进行预溅射。
另外,将托盘配置成密封树脂层4a的上述相反面4a1与各靶对置的情况下,导电膜5b中密封树脂层4a的周侧面4a2上的膜厚为上述相反面4a1上的膜厚的约30%。在导电膜5b的膜厚在密封树脂层4a的上述相反面4a1上为3μm以上10μm以下的情况下,导电膜5b的密封树脂层4a的周侧面4a2上的膜厚为相反面4a1上的约30%的0.9μm以上3μm以下左右。要得到充分的屏蔽效果,导电膜5b通常需要高频的集肤深度δ的2倍以上的厚度。因此,在导电膜5b是Cu的情况下,导电膜5b的厚度需要在2.4GHz频带下为约2.7μm,在5GHz频带下为约1.8μm。
例如若以3μm形成导电膜5b的密封树脂层4a的相反面4a1上的膜厚,则周侧面4a2上的膜厚为约0.9μm。在利用该结构对2.4GHz带的信号进行屏蔽的情况下,导电膜5b的密封树脂层4a的相反面4a1上的膜厚为3μm,从而得到充分的屏蔽功能。与此相对,导电膜5b的密封树脂层4a的周侧面4a2上的膜厚为约0.9μm,要确保充分的屏蔽功能缺少约2μm。因此,在本实施方式中,构成为通过第二屏蔽层6的形成来补充该不足的量。
接下来,以与紧贴膜5a相同的要领,在导电膜5b的表面利用溅射来成膜保护膜5c而完成第一屏蔽层5。该情况下,作为靶的材料能够使用SUS、Ti、Cr、Ni、TiCr、TiAl、NiAl、CrAl、CrNiAl中的任一种金属。另外,将此时的保护膜5c的膜厚(保护膜5c中位于密封树脂层4a的相反面4a1上的部分的膜厚)设为0.03μm以上1.5μm以下。
此外,与导电膜5b的情况相同,紧贴膜5a、保护膜5c中位于密封树脂层4a的周侧面4a2上的部分的膜厚分别为紧贴膜5a、保护膜5c中位于密封树脂层4a的相反面4a1上的部分的约30%。因此,紧贴膜5a中位于密封树脂层4a的周侧面4a2上的部分的膜厚例如为0.003μm以上0.15μm以下,保护膜5c中位于密封树脂层4a的周侧面4a2上的部分的膜厚例如为0.009μm以上0.45μm以下。
此外,作为用于紧贴膜5a的金属的SUS、Ti、Cr、Ni、TiCr、TiAl、NiAl、CrAl、CrNiAl均比用于导电膜5b的金属(Cu、Ag、Al)的比电阻高。因此,随着紧贴膜5a的膜厚变厚,导电膜5b与接地电极8a、8b之间的连接电阻变高,伴随于此,第一屏蔽层5的屏蔽特性降低。另外,导电膜5b是承担实际的屏蔽功能的膜,该膜厚越厚,第一屏蔽层5的屏蔽特性越高。鉴于上述情况,对于第一屏蔽层5的各紧贴膜5a、导电膜5b、保护膜5c的厚度,优选导电膜5b最厚而紧贴膜5a最薄。
接下来,在通过胶带、糊状物等对覆盖第一屏蔽层5的密封树脂层4a的相反面4a1的部分实施掩模的基础上,以与第一屏蔽层5的紧贴膜5a相同的要领对第二屏蔽层6的紧贴膜6a进行成膜。此外,可以对掩模使用金属掩模。
接下来,以与第一屏蔽层5的导电膜5b相同的要领对第二屏蔽层6的导电膜6b进行成膜。优选将此时的导电膜6b的膜厚设为第一屏蔽层5的导电膜5b的膜厚(密封树脂层4a的周侧面4a2侧的膜厚)的不足的量以上。
接下来,以与第一屏蔽层5的保护膜5c相同的要领对第二屏蔽层6的保护膜6c进行成膜。然后,从溅射装置取出托盘并除去掩模,从而完成高频模块1a。
此外,优选分别以与第一屏蔽层5的紧贴膜5a、导电膜5b、保护膜5c相同的金属形成第二屏蔽层6的紧贴膜6a、导电膜6b、保护膜6c。该情况下,能够实现第一屏蔽层5与第二屏蔽层6的靶的共用化,因此能够实现高频模块1a的制造成本的减少。另外,若将第一屏蔽层5与第二屏蔽层6设为相同的结构,则能够减小两个屏蔽层5、6的热膨胀率的差,因此能够减少热冲击时的两个屏蔽层5、6间的剥离。
此外,第一屏蔽层5以及第二屏蔽层6除了溅射装置以外,例如能够使用真空蒸镀装置来形成。
因此,根据上述的实施方式,密封树脂层4a的周侧面4a2被第一屏蔽层5与第二屏蔽层6覆盖,因此即使在由第一屏蔽层5无法确保用于得到所希望的屏蔽特性的厚度的情况下,也能够由第二屏蔽层6承担该不足的量。另外,第二屏蔽层6不层叠于密封树脂层4a的与布线基板2的上表面2a相反的相反面4a1侧,因此密封树脂层4a的相反面4a1上仅被第一屏蔽层5覆盖。根据该结构,能够确保所希望的屏蔽特性并且能够实现高频模块1a的低高度化。
<第二实施方式>
参照图3对本发明的第二实施方式所涉及的高频模块进行说明。此外,图3是高频模块的局部剖视图,是与图2对应的图。
如图3所示,本实施方式所涉及的高频模块1b与参照图1以及图2而说明的第一实施方式的高频模块1a的不同之处在于第二屏蔽层60的结构不同。其它的结构与第一实施方式的高频模块1a相同,因此标注相同的附图标记来省略说明。
该情况下,第二屏蔽层60由层叠于覆盖第一屏蔽层5的密封树脂层4a的周侧面4a2的部分的磁性体膜60a(相当于本发明的“第三导电膜”)和层叠于该磁性体膜60a的保护膜60b构成。磁性体膜60a由与第一屏蔽层5的导电膜5b相比相对磁导率高的金属磁性体形成。例如形成第一屏蔽层5的导电膜5b的金属的Cu的相对磁导率μs是0.999991、Ag的相对磁导率μs是0.9998、Al的相对磁导率μs是1.00002。与此相对,第二屏蔽层60的磁性体膜60a由相对磁导率μs是100~600的Ni、相对磁导率μs是8000的坡莫合金、相对磁导率μs是5000的Fe等的任一种金属形成。例如在第一屏蔽层5的导电膜5b由Cu形成的情况下,第二屏蔽层60的磁性体膜60a由相对磁导率比Cu高的金属(例如相对磁导率μs≥1)形成即可。
保护膜60b例如能够由SUS形成等以与第一屏蔽层5的保护膜5c相同的结构形成。
此外,也可以是由Ni、坡莫合金、Fe等金属磁性体形成第一屏蔽层5的导电膜5b,由Cu、Ag、Al等具有高电导率的金属形成第二屏蔽层60的磁性体膜60a的部分的结构。即,第一屏蔽层5的导电膜5b与第二屏蔽层60的磁性体膜60a的结构也可以相反。另外,在第一实施方式中,也可以由Ni、坡莫合金、Fe等金属磁性体形成第二屏蔽层6的各紧贴膜6a、导电膜6b、保护膜6c的任一个。
根据该结构,密封树脂层4a的周侧面4a2被Cu等具有高电导率的导电膜5b和具有高相对磁导率的磁性体膜60a双方覆盖,因此在密封树脂层4a的周侧面4a2侧,能够提高相对于磁场的屏蔽性。另外,根据这样的结构,要在密封树脂层4a的周侧面4a2侧得到所希望的屏蔽特性,与第一实施方式结构相比,能够使第一屏蔽层5以及第二屏蔽层60的总的膜厚变薄。因此,能够实现高频模块1b的低高度化,并且能够使密封树脂层4a的周侧面4a2侧的第一屏蔽层5与第二屏蔽层60的厚度变薄,相应地实现高频模块1b的小型化。
<第三实施方式>
参照图4对本发明的第三实施方式所涉及的高频模块进行说明。此外,图4是高频模块的剖视图。
如图4所示,本实施方式所涉及的高频模块1c与参照图1以及图2说明的第一实施方式的高频模块1a的不同之处在于:在布线基板2的下表面2c(相当于本发明的“布线基板的另一个主面”)安装部件3b并且该部件3b被密封树脂层4b覆盖;以及第一屏蔽层5及第二屏蔽层6还覆盖布线基板2的下表面2c侧的密封树脂层4b。其它的结构与第一实施方式的高频模块1a相同,因此标注相同的附图标记来省略说明。
部件3b(相当于本发明的“第二部件”)与布线基板2的上表面2a侧的各部件3a相同,由利用Si、GaAs等半导体形成的半导体元件、片式电感器、片式电容器、片式电阻等芯片部件等构成。
将密封树脂层4b(相当于本发明的“第二密封树脂层”,以下有时也称为第二密封树脂层4b)设置成覆盖布线基板2的下表面2c和部件3b。另外,该密封树脂层4b与覆盖布线基板2的上表面2a的整个面的密封树脂层4a(以下,有时也称为第一密封树脂层4a)不同,覆盖布线基板2的下表面2c的一部分,在本实施方式中,不被第二密封树脂层4b覆盖的部分被用作高频模块1c用于与外部连接的空间。这里,第二密封树脂层4b也可以覆盖布线基板2的下表面2c的整个面,第一密封树脂层4a也可以将布线基板2的上表面2a留下一部分而进行局部覆盖。此外,第二密封树脂层4b与第一密封树脂层4a相同,能够由作为环氧树脂等密封树脂而通常采用的树脂形成。
如图4所示,第一屏蔽层5除了第一密封树脂层4a的相反面4a1以及周侧面4a2之外,还覆盖第二密封树脂层4b的周侧面4b2的一部分。第二屏蔽层6除了第一屏蔽层5的覆盖第一密封树脂层4a的周侧面4a2的部分以及覆盖布线基板2的侧面2b的部分之外,还覆盖第二密封树脂层4b的与布线基板2的下表面2c相反的相反面4b1、以及第二密封树脂层4b的周侧面4b2的未被第一屏蔽层5覆盖的部分。此外,第一屏蔽层5、第二屏蔽层6的其它结构与第一实施方式相同。
(高频模块的制造方法)
接下来,对于高频模块1c的制造方法,以与第一实施方式的高频模块1a的制造方法的不同之处为中心来进行说明。
首先,在布线基板2的上下表面2a、2c安装各部件3a、3b,利用第一、第二密封树脂层4a、4b对布线基板2的两个面2a、2c的部件3a、3b进行铸模,由此形成模具构造体。此时,第一密封树脂层4a对布线基板2的上表面2a的整个面进行铸模,第二密封树脂层4b将布线基板2的下表面2c的未安装部件3b的区域的一部分留下而进行局部铸模。第一、第二密封树脂层4a、4b均能够通过涂覆方式、印刷方式、转移模具方式、压模方式等形成。另外,能够以涂覆方式、压模方式形成覆盖布线基板2的上表面2a的整个面的第一密封树脂层4a侧,能够以转移模具方式形成局部地覆盖布线基板2的下表面2c的第二密封树脂层4b侧。
第一屏蔽层5的形成方法与第一实施方式的高频模块1a中的相同,但若将托盘配置成第一密封树脂层4a的相反面4a1与溅射装置的各靶对置,则第二密封树脂层4b的周侧面4b2的一部分也被第一屏蔽层5的各紧贴膜5a、导电膜5b、保护膜5c覆盖。
若第一屏蔽层5的成膜结束,则从溅射装置取出托盘,将模具构造体翻转并放置到托盘。对于布线基板2的下表面2c的不需要第二屏蔽层6成膜的部分,事先使用胶带、糊状物而进行掩模。然后,再次将托盘配置在溅射装置内,并以与第一屏蔽层5相同的要领对第二屏蔽层6的各紧贴膜6a、导电膜6b、保护膜6c进行成膜。此时,将托盘配置成第二密封树脂层4b的相反面4b1与各靶对置。
这样一来,第一屏蔽层5的覆盖第一密封树脂层4a的周侧面4a2的部分和覆盖布线基板2的侧面2b的部分、第二密封树脂层4b的与布线基板2的下表面2c相反的相反面4b1、以及第二密封树脂层4b的周侧面4b2的未被第一屏蔽层5覆盖的部分分别被第二屏蔽层6覆盖。换言之,通过使模具构造体翻转而进行两次成膜,能够利用第一屏蔽层5和第二屏蔽层6双方来覆盖模具构造体的侧面(第一、第二密封树脂层4a、4b各自的周侧面4a2、4b2、布线基板2的侧面2b)。
根据该结构,膜厚形成得比周侧面4a2、4b2厚的第一、第二密封树脂层4a的两个相反面4a1、4b1侧都仅被第一屏蔽层5以及第二屏蔽层6的一方覆盖,与此相对,膜厚较薄的第一、第二密封树脂层4a、4b的周侧面4a2、4b2侧则被第一屏蔽层5以及第二屏蔽层6双方覆盖。因此,能够确保第一以及第二密封树脂层4a、4b的周侧面4a2、4b2侧的屏蔽特性并且能够实现高频模块1c的低高度化。
<第四实施方式>
参照图5对本发明的第四实施方式所涉及的高频模块进行说明。此外,图5是高频模块的剖视图。
如图5所示,本实施方式所涉及的高频模块1d与参照图1以及图2说明的第一实施方式的高频模块1a的不同之处在于:各部件3a被两个密封树脂层4c、4d分开铸模;两个密封树脂层4c、4d分别独立被第一屏蔽层5以及第二屏蔽层6覆盖;以及在布线基板2设置有其它的接地电极8c。其它的结构与第一实施方式的高频模块1a相同,因此标注相同的附图标记来省略说明。
该情况下,第一屏蔽层5覆盖一侧的密封树脂层4c的与布线基板2的上表面2a相反的相反面4c1以及周侧面4c2、另一侧的密封树脂层4d的与布线基板的上表面2a相反的相反面4d1及周侧面4d2、以及布线基板2的侧面2b。
第二屏蔽层6被层叠于第一屏蔽层5,以便覆盖第一屏蔽层5的覆盖一方的密封树脂层4c的周侧面4c2的部分、覆盖另一方的密封树脂层4d的周侧面4d2的部分以及覆盖布线基板2的侧面2b的部分。该情况下,在两个密封树脂层4c、4d之间夹设第一屏蔽层5以及第二屏蔽层6。第一屏蔽层5的位于两个密封树脂层4c、4d间的部分与形成于布线基板2的接地电极8c连接。这里,两个密封树脂层4c、4d分别相当于本发明的“第一密封树脂层”。
此外,这样的构造像第一实施方式那样,通过树脂统一密封各部件3a之后,使用激光、切割机等在规定的部件3a间形成槽。然后,通过以与第一实施方式的高频模块1a相同的方法对第一屏蔽层5以及第二屏蔽层6进行成膜而形成。
根据该结构,除了第一实施方式高频模块1a中得到的效果以外,由于在两个密封树脂层4c、4d间夹设第一屏蔽层5以及第二屏蔽层6,所以能够防止密封在一方的密封树脂层4c的部件3a与密封在另一方的密封树脂层4d的部件3a之间的噪声的相互干扰。
<第五实施方式>
参照图6来说明本发明的第五实施方式所涉及的高频模块。此外,图6是高频模块的局部剖视图,是与图2对应的图。
如图6所示,本实施方式所涉及的高频模块1e与参照图1以及图2说明的第一实施方式的高频模块1a的不同之处在于第三屏蔽层50的结构不同。其它的结构与第一实施方式高频模块1a相同,因此标注相同的附图标记来省略说明。
第三屏蔽层50具有与第一实施方式的第一屏蔽层5大致相同的3层构造。具体而言,如图6所示,第三屏蔽层50由层叠于密封树脂层4a以便覆盖密封树脂层4a的相反面4a1以及周侧面4a2、布线基板2的侧面2b的紧贴膜50a;层叠于紧贴膜50a的导电膜50b;层叠于导电膜50b的保护膜50c构成。第三屏蔽层50的各紧贴膜50a、导电膜50b、保护膜50c是与第一屏蔽层5的各紧贴膜5a、导电膜5b、保护膜5c相同的结构。
另外,第三屏蔽层50被形成为周侧面4a2侧的厚度a2相对于紧贴膜50a的密封树脂层4a的相反面4a1侧的厚度a1的比例比周侧面4a2侧的厚度b2相对于导电膜50b的密封树脂层4a的相反面4a1侧的厚度b1的比例小((a2/a1)<(b2/b1))。
第三屏蔽层50例如能够以如下方式形成。在成膜紧贴膜50a之前,以与第一实施方式的高频模块1a相同的要领形成,导电膜50b也先按照与第一实施方式的第一屏蔽层5的导电膜5b相同的要领成膜。然后,从溅射装置取出托盘并对导电膜5b的覆盖密封树脂层4a的相反面4a1的部分实施掩模,并再次以相同的要领成膜第二次的导电膜50b。这样一来,能够仅使导电膜50b的覆盖密封树脂层4a的周侧面4a2的部分的膜厚增加。然后,除去掩模,以与第一实施方式的第一屏蔽层5相同的要领对保护膜50c进行成膜,而不进行第二屏蔽层6的成膜。
根据该结构,能够不成膜第二屏蔽层6而得到与第一实施方式的高频模块1a相同的效果。
此外,本发明并不限定于上述的各实施方式,只要在不脱离该宗旨,就能够进行上述以外的各种改变。例如在第一实施方式中,也可以是不设置第二屏蔽层6的紧贴膜6a的结构。
工业上的可利用性
本发明能够用于具备覆盖安装于布线基板的部件的密封树脂层和层叠于密封树脂层的屏蔽层的各种高频模块。
附图标记的说明
1a~1e…高频模块;2…布线基板;3a…部件(第一部件);3b…部件(第二部件);4a、4c、4d…密封树脂层(第一密封树脂层);4b…密封树脂层(第二密封树脂层);5…第一屏蔽层;5b…导电膜(第一导电膜);6、60…第二屏蔽层;6b…导电膜(第二导电膜);50…第三屏蔽层;60a…磁性体膜(第三导电膜)。
Claims (6)
1.一种高频模块,其特征在于,具备:
布线基板;
第一部件,安装于所述布线基板的一个主面;
第一密封树脂层,层叠于所述布线基板的所述一个主面并密封所述第一部件;以及
屏蔽层,层叠于所述第一密封树脂层,
所述屏蔽层具有:
第一屏蔽层,层叠于所述第一密封树脂层,以便覆盖所述第一密封树脂层中的与所述布线基板的所述一个主面相反的相反面以及周侧面;和
第二屏蔽层,层叠于所述第一屏蔽层中的覆盖所述第一密封树脂层的所述周侧面的部分。
2.根据权利要求1所述的高频模块,其特征在于,
所述第一屏蔽层具有由金属构成的第一导电膜,
所述第二屏蔽层具有由与所述第一导电膜相同的金属构成的第二导电膜。
3.根据权利要求1所述的高频模块,其特征在于,
所述第一屏蔽层具有由金属构成的第一导电膜,
所述第二屏蔽层具有由与所述第一导电膜不同的金属构成的第三导电膜,
所述第一导电膜的所述金属以及所述第三导电膜的所述不同的金属中的一方的相对磁导率为1以上。
4.根据权利要求1~3中的任意一项所述的高频模块,其特征在于,还具备:
第二部件,安装于所述布线基板的另一个主面;以及
第二密封树脂层,层叠于所述布线基板的所述另一个主面并密封所述第二部件,
所述第一屏蔽层还覆盖所述第二密封树脂层的周侧面,
所述第二屏蔽层被设置为除了所述第一屏蔽层中的覆盖所述第一密封树脂层的所述周侧面的部分之外,还覆盖所述第一屏蔽层中的覆盖所述第二密封树脂层的所述周侧面的部分以及所述第二密封树脂层中的与所述布线基板的所述另一个主面相反的相反面。
5.根据权利要求1~4中的任意一项所述的高频模块,其特征在于,
在所述屏蔽层中的覆盖所述第一密封树脂层的所述相反面的部分的表面露出所述第一屏蔽层。
6.一种高频模块,其特征在于,具备:
布线基板;
第一部件,安装于所述布线基板的一个主面;
第一密封树脂层,层叠于所述布线基板的所述一个主面并密封所述第一部件;以及
第三屏蔽层,层叠于所述第一密封树脂层,以便覆盖所述第一密封树脂层中的与所述布线基板的所述一个主面相反的相反面以及周侧面,
所述第三屏蔽层具有层叠于所述第一密封树脂层的紧贴膜和层叠于该紧贴膜的导电膜,
所述周侧面侧的厚度相对于所述紧贴膜的所述相反面侧的厚度的比例比所述周侧面侧的厚度相对于所述导电膜的所述相反面侧的厚度的比例小。
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US10455748B2 (en) | 2019-10-22 |
US20180077829A1 (en) | 2018-03-15 |
WO2016186103A1 (ja) | 2016-11-24 |
CN107535078B (zh) | 2020-03-31 |
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