CN107085255B - 光学部件及其制备方法 - Google Patents

光学部件及其制备方法 Download PDF

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Publication number
CN107085255B
CN107085255B CN201710345433.4A CN201710345433A CN107085255B CN 107085255 B CN107085255 B CN 107085255B CN 201710345433 A CN201710345433 A CN 201710345433A CN 107085255 B CN107085255 B CN 107085255B
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China
Prior art keywords
particles
binder
film
layer
substrate
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CN201710345433.4A
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Chinese (zh)
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CN107085255A (zh
Inventor
大金政信
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Canon Inc
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Canon Inc
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Publication of CN107085255A publication Critical patent/CN107085255A/zh
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
    • B05D1/005—Spin coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254—After-treatment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/0236—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element
    • G02B5/0247—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element by means of voids or pores
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0273—Diffusing elements; Afocal elements characterized by the use
    • G02B5/0278—Diffusing elements; Afocal elements characterized by the use used in transmission
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/70—Nanostructure
    • Y10S977/832—Nanostructure having specified property, e.g. lattice-constant, thermal expansion coefficient
    • Y10S977/834—Optical properties of nanomaterial, e.g. specified transparency, opacity, or index of refraction

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
CN201710345433.4A 2011-07-21 2012-07-11 光学部件及其制备方法 Active CN107085255B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011160078 2011-07-21
JP2011-160078 2011-07-21
CN201280036031.1A CN103718065A (zh) 2011-07-21 2012-07-11 光学部件及其制备方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN201280036031.1A Division CN103718065A (zh) 2011-07-21 2012-07-11 光学部件及其制备方法

Publications (2)

Publication Number Publication Date
CN107085255A CN107085255A (zh) 2017-08-22
CN107085255B true CN107085255B (zh) 2021-01-01

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Family Applications (2)

Application Number Title Priority Date Filing Date
CN201280036031.1A Pending CN103718065A (zh) 2011-07-21 2012-07-11 光学部件及其制备方法
CN201710345433.4A Active CN107085255B (zh) 2011-07-21 2012-07-11 光学部件及其制备方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
CN201280036031.1A Pending CN103718065A (zh) 2011-07-21 2012-07-11 光学部件及其制备方法

Country Status (5)

Country Link
US (2) US9715043B2 (enExample)
EP (1) EP2734871B1 (enExample)
JP (1) JP5930897B2 (enExample)
CN (2) CN103718065A (enExample)
WO (1) WO2013011664A1 (enExample)

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JP2013160799A (ja) * 2012-02-01 2013-08-19 Asahi Glass Co Ltd 低反射膜付き物品の製造方法
JP2015004753A (ja) * 2013-06-19 2015-01-08 キヤノン株式会社 光学素子、光学系および光学機器
CN103756395A (zh) * 2014-01-22 2014-04-30 上海赛肯森材料科技有限公司 用于减反射涂料组合物的纳米杂化粒子及其制备方法和用途
JP6274924B2 (ja) * 2014-03-14 2018-02-07 キヤノン株式会社 反射防止膜、光学部材及び光学部材の製造方法
JP2016075869A (ja) * 2014-10-09 2016-05-12 エルジー ディスプレイ カンパニー リミテッド フレキシブル表示装置
JP6532228B2 (ja) 2014-12-10 2019-06-19 キヤノン株式会社 光学部材及び光学部材の製造方法
JP6723705B2 (ja) * 2015-08-31 2020-07-15 キヤノン株式会社 光学部材および撮像機器
KR102294715B1 (ko) * 2016-01-13 2021-08-26 주식회사 엘지화학 반사 방지 필름 및 이의 제조 방법
EP3199984A1 (en) 2016-02-01 2017-08-02 Canon Kabushiki Kaisha Antireflection film, optical member, and method for manufacturing optical member
JP2017167271A (ja) 2016-03-15 2017-09-21 キヤノン株式会社 光学部材及び光学部材の製造方法
JP6768346B2 (ja) * 2016-05-12 2020-10-14 キヤノン株式会社 光学膜
JP6961775B2 (ja) * 2016-05-12 2021-11-05 キヤノン株式会社 光学膜
JP6851511B2 (ja) * 2018-01-30 2021-03-31 富士フイルム株式会社 光学薄膜、光学素子および光学系
KR102518416B1 (ko) 2018-07-31 2023-04-06 삼성디스플레이 주식회사 저굴절층 및 이를 포함하는 전자 장치
JP7301508B2 (ja) 2018-08-08 2023-07-03 キヤノン株式会社 接合レンズ、およびそれを有する光学系、および光学機器、および接合レンズの製造方法
KR102529662B1 (ko) 2018-09-11 2023-05-10 삼성디스플레이 주식회사 전자 장치
JP7238506B2 (ja) * 2019-03-18 2023-03-14 セイコーエプソン株式会社 波長変換素子、光源装置及びプロジェクター
JP7235623B2 (ja) * 2019-09-05 2023-03-08 エルジー ディスプレイ カンパニー リミテッド フレキシブル表示装置
US12077467B2 (en) 2020-09-25 2024-09-03 Canon Kabushiki Kaisha Member with porous layer and coating liquid for forming porous layer
CN114907604A (zh) * 2022-04-29 2022-08-16 深圳市华星光电半导体显示技术有限公司 减反膜及其制作方法以及显示面板

Citations (4)

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EP0778476A2 (en) * 1995-12-07 1997-06-11 Fuji Photo Film Co., Ltd. Anti-reflection film and display device having the same
TW574110B (en) * 2001-10-25 2004-02-01 Matsushita Electric Works Ltd Composite thin film holding substrate, transparent conductive film holding substrate, and panel light emitting body
CN101782663A (zh) * 2009-01-14 2010-07-21 精工爱普生株式会社 光学物品及其制造方法
WO2011027827A1 (ja) * 2009-09-07 2011-03-10 旭硝子株式会社 基材の表面に低反射膜を有する物品

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JP3135944B2 (ja) * 1991-07-19 2001-02-19 ワシ興産株式会社 低反射透明体
US6383559B1 (en) * 1995-12-07 2002-05-07 Fuji Photo Film Co., Ltd. Anti-reflection film and display device having the same
JPH09288201A (ja) 1995-12-07 1997-11-04 Fuji Photo Film Co Ltd 反射防止膜及びそれを用いた画像表示装置
JP3967822B2 (ja) * 1997-04-04 2007-08-29 富士フイルム株式会社 反射防止膜およびそれを用いた画像表示装置
JP3946357B2 (ja) 1997-09-18 2007-07-18 富士フイルム株式会社 反射防止膜およびそれを用いた画像表示装置
JP4046921B2 (ja) 2000-02-24 2008-02-13 触媒化成工業株式会社 シリカ系微粒子、該微粒子分散液の製造方法、および被膜付基材
AU2001282547A1 (en) 2000-08-30 2002-03-13 Nikon Corporation Method of forming optical thin film and optical element provided with optical thin film
WO2003005069A1 (en) * 2001-07-05 2003-01-16 Teijin Dupon Films Japan Limited Antireflection film and method for production thereof
JP2003054996A (ja) 2001-08-10 2003-02-26 Nippon Sheet Glass Co Ltd 反射抑制膜およびこれを備えた透明基体
JP5047488B2 (ja) 2004-11-05 2012-10-10 ペンタックスリコーイメージング株式会社 シリカエアロゲル膜の製造方法
US7982953B2 (en) * 2005-03-07 2011-07-19 Fujifilm Corporation Antireflection film, and polarizing plate and image display device using the same
JP4820716B2 (ja) * 2005-08-30 2011-11-24 富士フイルム株式会社 防眩フィルム、反射防止フィルム、偏光板及び画像表示装置
KR20080059262A (ko) * 2005-09-29 2008-06-26 다이니폰 인사츠 가부시키가이샤 반사 방지막
JP5157143B2 (ja) 2006-12-01 2013-03-06 旭硝子株式会社 反射防止膜付き基体
JP2009073170A (ja) 2007-08-31 2009-04-09 Kaneka Corp 中空粒子からなる被膜を有する被膜付基材
TW200921139A (en) * 2007-11-15 2009-05-16 Daxon Technology Inc Antiglare film and coating composition for antiglare films
JP5175672B2 (ja) 2008-09-26 2013-04-03 富士フイルム株式会社 防眩フィルム、反射防止フィルム、偏光板及び画像表示装置
JP5720247B2 (ja) 2008-10-17 2015-05-20 日立化成株式会社 低屈折率膜及びその製造方法、反射防止膜及びその製造方法、低屈折率膜用コーティング液セット、微粒子積層薄膜付き基材及びその製造方法、並びに光学部材
TWI477615B (zh) 2009-06-05 2015-03-21 住友化學股份有限公司 Production method of inorganic particle composite

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EP0778476A2 (en) * 1995-12-07 1997-06-11 Fuji Photo Film Co., Ltd. Anti-reflection film and display device having the same
TW574110B (en) * 2001-10-25 2004-02-01 Matsushita Electric Works Ltd Composite thin film holding substrate, transparent conductive film holding substrate, and panel light emitting body
CN101782663A (zh) * 2009-01-14 2010-07-21 精工爱普生株式会社 光学物品及其制造方法
WO2011027827A1 (ja) * 2009-09-07 2011-03-10 旭硝子株式会社 基材の表面に低反射膜を有する物品

Also Published As

Publication number Publication date
CN107085255A (zh) 2017-08-22
JP2013041275A (ja) 2013-02-28
CN103718065A (zh) 2014-04-09
US20140153099A1 (en) 2014-06-05
WO2013011664A1 (en) 2013-01-24
EP2734871A1 (en) 2014-05-28
US9715043B2 (en) 2017-07-25
JP5930897B2 (ja) 2016-06-08
US20170285228A1 (en) 2017-10-05
EP2734871B1 (en) 2022-09-07
EP2734871A4 (en) 2015-05-27

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