CN106094432A - 着色固化性树脂组合物 - Google Patents

着色固化性树脂组合物 Download PDF

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Publication number
CN106094432A
CN106094432A CN201610183723.9A CN201610183723A CN106094432A CN 106094432 A CN106094432 A CN 106094432A CN 201610183723 A CN201610183723 A CN 201610183723A CN 106094432 A CN106094432 A CN 106094432A
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CN
China
Prior art keywords
group
carbon atoms
hydrocarbon group
formula
represented
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610183723.9A
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English (en)
Chinese (zh)
Inventor
朴美阿布拉博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Publication of CN106094432A publication Critical patent/CN106094432A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
CN201610183723.9A 2015-03-30 2016-03-28 着色固化性树脂组合物 Pending CN106094432A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015069574 2015-03-30
JP2015-069574 2015-03-30

Publications (1)

Publication Number Publication Date
CN106094432A true CN106094432A (zh) 2016-11-09

Family

ID=57146457

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610183723.9A Pending CN106094432A (zh) 2015-03-30 2016-03-28 着色固化性树脂组合物

Country Status (4)

Country Link
JP (2) JP2016191915A (enExample)
KR (1) KR102555424B1 (enExample)
CN (1) CN106094432A (enExample)
TW (2) TWI764863B (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108073041A (zh) * 2016-11-16 2018-05-25 东友精细化工有限公司 着色组合物、着色固化性树脂组合物、滤色器和显示装置
CN109426075A (zh) * 2017-08-23 2019-03-05 东友精细化工有限公司 着色固化性树脂组合物、滤色器和显示装置
CN111670409A (zh) * 2018-02-06 2020-09-15 住友化学株式会社 着色感光性树脂组合物
CN113439092A (zh) * 2019-02-18 2021-09-24 住友化学株式会社 着色固化性树脂组合物、滤色器和显示装置
CN113589650A (zh) * 2020-05-02 2021-11-02 罗门哈斯电子材料有限责任公司 涂层组合物及形成电子装置的方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102555416B1 (ko) * 2015-03-30 2023-07-13 스미또모 가가꾸 가부시키가이샤 착색 경화성 수지 조성물
JP6754591B2 (ja) * 2015-03-30 2020-09-16 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色硬化性樹脂組成物
EP3522243A4 (en) 2016-09-29 2019-10-23 FUJIFILM Corporation COMPOSITION FOR FORMING AN ORGANIC SEMICONDUCTOR FILM, ORGANIC SEMICONDUCTOR FILM AND METHOD FOR THE PRODUCTION THEREOF AND ORGANIC SEMICONDUCTOR ELEMENT
CN108663902B (zh) * 2017-03-27 2023-05-09 东友精细化工有限公司 着色树脂组合物、滤色器和显示装置
JP7406193B2 (ja) * 2017-06-15 2023-12-27 学校法人東京理科大学 ナノインプリント用硬化性樹脂組成物、硬化物の製造方法、及び凹凸構造体の製造方法
JP7333221B2 (ja) * 2018-08-08 2023-08-24 住友化学株式会社 着色組成物

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101261446A (zh) * 2007-03-05 2008-09-10 富士胶片株式会社 滤色器用着色感光性组合物、滤色器、其制造方法和液晶显示装置
JP2011028236A (ja) * 2009-06-24 2011-02-10 Sumitomo Chemical Co Ltd 着色感光性組成物
JP2011138094A (ja) * 2009-12-01 2011-07-14 Toyo Ink Sc Holdings Co Ltd カラーフィルタ用青色着色組成物、およびカラーフィルタ
JP2012215850A (ja) * 2011-03-30 2012-11-08 Mitsubishi Chemicals Corp カラーフィルタ用着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌ表示装置
CN103153952A (zh) * 2010-10-05 2013-06-12 巴斯夫欧洲公司 苯并咔唑化合物的肟酯衍生物及其在可光聚合组合物中作为光敏引发剂的用途
JP2014115545A (ja) * 2012-12-12 2014-06-26 Toyo Ink Sc Holdings Co Ltd 感光性着色組成物、およびカラーフィルタ

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5504627B2 (ja) 2008-07-01 2014-05-28 住友化学株式会社 着色感光性樹脂組成物

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101261446A (zh) * 2007-03-05 2008-09-10 富士胶片株式会社 滤色器用着色感光性组合物、滤色器、其制造方法和液晶显示装置
JP2011028236A (ja) * 2009-06-24 2011-02-10 Sumitomo Chemical Co Ltd 着色感光性組成物
JP2011138094A (ja) * 2009-12-01 2011-07-14 Toyo Ink Sc Holdings Co Ltd カラーフィルタ用青色着色組成物、およびカラーフィルタ
CN103153952A (zh) * 2010-10-05 2013-06-12 巴斯夫欧洲公司 苯并咔唑化合物的肟酯衍生物及其在可光聚合组合物中作为光敏引发剂的用途
JP2012215850A (ja) * 2011-03-30 2012-11-08 Mitsubishi Chemicals Corp カラーフィルタ用着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌ表示装置
JP2014115545A (ja) * 2012-12-12 2014-06-26 Toyo Ink Sc Holdings Co Ltd 感光性着色組成物、およびカラーフィルタ

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108073041A (zh) * 2016-11-16 2018-05-25 东友精细化工有限公司 着色组合物、着色固化性树脂组合物、滤色器和显示装置
CN108073041B (zh) * 2016-11-16 2022-04-29 东友精细化工有限公司 着色组合物、着色固化性树脂组合物、滤色器和显示装置
CN109426075A (zh) * 2017-08-23 2019-03-05 东友精细化工有限公司 着色固化性树脂组合物、滤色器和显示装置
CN109426075B (zh) * 2017-08-23 2022-04-29 东友精细化工有限公司 着色固化性树脂组合物、滤色器和显示装置
CN111670409A (zh) * 2018-02-06 2020-09-15 住友化学株式会社 着色感光性树脂组合物
CN113439092A (zh) * 2019-02-18 2021-09-24 住友化学株式会社 着色固化性树脂组合物、滤色器和显示装置
CN113439092B (zh) * 2019-02-18 2023-07-21 住友化学株式会社 着色固化性树脂组合物、滤色器和显示装置
CN113589650A (zh) * 2020-05-02 2021-11-02 罗门哈斯电子材料有限责任公司 涂层组合物及形成电子装置的方法

Also Published As

Publication number Publication date
JP2016191915A (ja) 2016-11-10
TW202221084A (zh) 2022-06-01
JP2020024448A (ja) 2020-02-13
TW201700630A (zh) 2017-01-01
KR20160117265A (ko) 2016-10-10
TWI764863B (zh) 2022-05-21
JP6928634B2 (ja) 2021-09-01
TWI814247B (zh) 2023-09-01
KR102555424B1 (ko) 2023-07-13

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Application publication date: 20161109

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