TWI764863B - 著色硬化性樹脂組合物 - Google Patents

著色硬化性樹脂組合物 Download PDF

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Publication number
TWI764863B
TWI764863B TW105109744A TW105109744A TWI764863B TW I764863 B TWI764863 B TW I764863B TW 105109744 A TW105109744 A TW 105109744A TW 105109744 A TW105109744 A TW 105109744A TW I764863 B TWI764863 B TW I764863B
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TW
Taiwan
Prior art keywords
group
carbon atoms
hydrocarbon group
formula
substituted
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TW105109744A
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English (en)
Chinese (zh)
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TW201700630A (zh
Inventor
米亞 布朗伯 皮艾歐
Original Assignee
日商住友化學股份有限公司
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Publication of TW201700630A publication Critical patent/TW201700630A/zh
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Publication of TWI764863B publication Critical patent/TWI764863B/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
TW105109744A 2015-03-30 2016-03-28 著色硬化性樹脂組合物 TWI764863B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015069574 2015-03-30
JP2015-069574 2015-03-30

Publications (2)

Publication Number Publication Date
TW201700630A TW201700630A (zh) 2017-01-01
TWI764863B true TWI764863B (zh) 2022-05-21

Family

ID=57146457

Family Applications (2)

Application Number Title Priority Date Filing Date
TW105109744A TWI764863B (zh) 2015-03-30 2016-03-28 著色硬化性樹脂組合物
TW111105079A TWI814247B (zh) 2015-03-30 2016-03-28 著色硬化性樹脂組合物

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW111105079A TWI814247B (zh) 2015-03-30 2016-03-28 著色硬化性樹脂組合物

Country Status (4)

Country Link
JP (2) JP2016191915A (enExample)
KR (1) KR102555424B1 (enExample)
CN (1) CN106094432A (enExample)
TW (2) TWI764863B (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102555416B1 (ko) * 2015-03-30 2023-07-13 스미또모 가가꾸 가부시키가이샤 착색 경화성 수지 조성물
JP6754591B2 (ja) * 2015-03-30 2020-09-16 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色硬化性樹脂組成物
EP3522243A4 (en) 2016-09-29 2019-10-23 FUJIFILM Corporation COMPOSITION FOR FORMING AN ORGANIC SEMICONDUCTOR FILM, ORGANIC SEMICONDUCTOR FILM AND METHOD FOR THE PRODUCTION THEREOF AND ORGANIC SEMICONDUCTOR ELEMENT
JP6931575B2 (ja) * 2016-11-16 2021-09-08 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色組成物、着色硬化性樹脂組成物、カラーフィルタ及び液晶表示装置
CN108663902B (zh) * 2017-03-27 2023-05-09 东友精细化工有限公司 着色树脂组合物、滤色器和显示装置
JP7406193B2 (ja) * 2017-06-15 2023-12-27 学校法人東京理科大学 ナノインプリント用硬化性樹脂組成物、硬化物の製造方法、及び凹凸構造体の製造方法
JP6917950B2 (ja) * 2017-08-23 2021-08-11 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色硬化性樹脂組成物、カラーフィルタ、及び表示装置
JP7315330B2 (ja) * 2018-02-06 2023-07-26 住友化学株式会社 着色感光性樹脂組成物
JP7333221B2 (ja) * 2018-08-08 2023-08-24 住友化学株式会社 着色組成物
JP7499747B2 (ja) * 2019-02-18 2024-06-14 住友化学株式会社 着色硬化性樹脂組成物、カラーフィルタ及び表示装置
US11940732B2 (en) * 2020-05-02 2024-03-26 Rohm And Haas Electronic Materials Llc Coating compositions and methods of forming electronic devices

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011138094A (ja) * 2009-12-01 2011-07-14 Toyo Ink Sc Holdings Co Ltd カラーフィルタ用青色着色組成物、およびカラーフィルタ
CN103153952A (zh) * 2010-10-05 2013-06-12 巴斯夫欧洲公司 苯并咔唑化合物的肟酯衍生物及其在可光聚合组合物中作为光敏引发剂的用途

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008250295A (ja) * 2007-03-05 2008-10-16 Fujifilm Corp カラーフィルタ用着色感光性組成物、カラーフィルタ、その製造方法、及び液晶表示装置
JP5504627B2 (ja) 2008-07-01 2014-05-28 住友化学株式会社 着色感光性樹脂組成物
TWI512397B (zh) * 2009-06-24 2015-12-11 Sumitomo Chemical Co Coloring the photosensitive composition
JP2012215850A (ja) * 2011-03-30 2012-11-08 Mitsubishi Chemicals Corp カラーフィルタ用着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌ表示装置
JP5938772B2 (ja) * 2012-12-12 2016-06-22 東洋インキＳｃホールディングス株式会社 感光性着色組成物、およびカラーフィルタ

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011138094A (ja) * 2009-12-01 2011-07-14 Toyo Ink Sc Holdings Co Ltd カラーフィルタ用青色着色組成物、およびカラーフィルタ
CN103153952A (zh) * 2010-10-05 2013-06-12 巴斯夫欧洲公司 苯并咔唑化合物的肟酯衍生物及其在可光聚合组合物中作为光敏引发剂的用途

Also Published As

Publication number Publication date
JP2016191915A (ja) 2016-11-10
TW202221084A (zh) 2022-06-01
JP2020024448A (ja) 2020-02-13
TW201700630A (zh) 2017-01-01
KR20160117265A (ko) 2016-10-10
CN106094432A (zh) 2016-11-09
JP6928634B2 (ja) 2021-09-01
TWI814247B (zh) 2023-09-01
KR102555424B1 (ko) 2023-07-13

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