KR102555424B1 - 착색 경화성 수지 조성물 - Google Patents

착색 경화성 수지 조성물 Download PDF

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Publication number
KR102555424B1
KR102555424B1 KR1020160037133A KR20160037133A KR102555424B1 KR 102555424 B1 KR102555424 B1 KR 102555424B1 KR 1020160037133 A KR1020160037133 A KR 1020160037133A KR 20160037133 A KR20160037133 A KR 20160037133A KR 102555424 B1 KR102555424 B1 KR 102555424B1
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carbon atoms
hydrocarbon group
formula
substituent
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Korean (ko)
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KR20160117265A (ko
Inventor
미아 브라보 피아오
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스미또모 가가꾸 가부시키가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
KR1020160037133A 2015-03-30 2016-03-28 착색 경화성 수지 조성물 Active KR102555424B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2015-069574 2015-03-30
JP2015069574 2015-03-30

Publications (2)

Publication Number Publication Date
KR20160117265A KR20160117265A (ko) 2016-10-10
KR102555424B1 true KR102555424B1 (ko) 2023-07-13

Family

ID=57146457

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KR1020160037133A Active KR102555424B1 (ko) 2015-03-30 2016-03-28 착색 경화성 수지 조성물

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JP (2) JP2016191915A (enExample)
KR (1) KR102555424B1 (enExample)
CN (1) CN106094432A (enExample)
TW (2) TWI764863B (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102555416B1 (ko) * 2015-03-30 2023-07-13 스미또모 가가꾸 가부시키가이샤 착색 경화성 수지 조성물
JP6754591B2 (ja) * 2015-03-30 2020-09-16 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色硬化性樹脂組成物
EP3522243A4 (en) 2016-09-29 2019-10-23 FUJIFILM Corporation COMPOSITION FOR FORMING AN ORGANIC SEMICONDUCTOR FILM, ORGANIC SEMICONDUCTOR FILM AND METHOD FOR THE PRODUCTION THEREOF AND ORGANIC SEMICONDUCTOR ELEMENT
JP6931575B2 (ja) * 2016-11-16 2021-09-08 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色組成物、着色硬化性樹脂組成物、カラーフィルタ及び液晶表示装置
CN108663902B (zh) * 2017-03-27 2023-05-09 东友精细化工有限公司 着色树脂组合物、滤色器和显示装置
JP7406193B2 (ja) * 2017-06-15 2023-12-27 学校法人東京理科大学 ナノインプリント用硬化性樹脂組成物、硬化物の製造方法、及び凹凸構造体の製造方法
JP6917950B2 (ja) * 2017-08-23 2021-08-11 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色硬化性樹脂組成物、カラーフィルタ、及び表示装置
JP7315330B2 (ja) * 2018-02-06 2023-07-26 住友化学株式会社 着色感光性樹脂組成物
JP7333221B2 (ja) * 2018-08-08 2023-08-24 住友化学株式会社 着色組成物
JP7499747B2 (ja) * 2019-02-18 2024-06-14 住友化学株式会社 着色硬化性樹脂組成物、カラーフィルタ及び表示装置
US11940732B2 (en) * 2020-05-02 2024-03-26 Rohm And Haas Electronic Materials Llc Coating compositions and methods of forming electronic devices

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011028236A (ja) * 2009-06-24 2011-02-10 Sumitomo Chemical Co Ltd 着色感光性組成物
JP2011138094A (ja) * 2009-12-01 2011-07-14 Toyo Ink Sc Holdings Co Ltd カラーフィルタ用青色着色組成物、およびカラーフィルタ
JP2012215850A (ja) * 2011-03-30 2012-11-08 Mitsubishi Chemicals Corp カラーフィルタ用着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌ表示装置
JP2014115545A (ja) * 2012-12-12 2014-06-26 Toyo Ink Sc Holdings Co Ltd 感光性着色組成物、およびカラーフィルタ

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008250295A (ja) * 2007-03-05 2008-10-16 Fujifilm Corp カラーフィルタ用着色感光性組成物、カラーフィルタ、その製造方法、及び液晶表示装置
JP5504627B2 (ja) 2008-07-01 2014-05-28 住友化学株式会社 着色感光性樹脂組成物
EP2625166B1 (en) * 2010-10-05 2014-09-24 Basf Se Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011028236A (ja) * 2009-06-24 2011-02-10 Sumitomo Chemical Co Ltd 着色感光性組成物
JP2011138094A (ja) * 2009-12-01 2011-07-14 Toyo Ink Sc Holdings Co Ltd カラーフィルタ用青色着色組成物、およびカラーフィルタ
JP2012215850A (ja) * 2011-03-30 2012-11-08 Mitsubishi Chemicals Corp カラーフィルタ用着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌ表示装置
JP2014115545A (ja) * 2012-12-12 2014-06-26 Toyo Ink Sc Holdings Co Ltd 感光性着色組成物、およびカラーフィルタ

Also Published As

Publication number Publication date
JP2016191915A (ja) 2016-11-10
TW202221084A (zh) 2022-06-01
JP2020024448A (ja) 2020-02-13
TW201700630A (zh) 2017-01-01
KR20160117265A (ko) 2016-10-10
CN106094432A (zh) 2016-11-09
TWI764863B (zh) 2022-05-21
JP6928634B2 (ja) 2021-09-01
TWI814247B (zh) 2023-09-01

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