CN105826216B - 半导体评价装置、检查用半导体装置及卡盘台的检查方法 - Google Patents

半导体评价装置、检查用半导体装置及卡盘台的检查方法 Download PDF

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CN105826216B
CN105826216B CN201610052913.7A CN201610052913A CN105826216B CN 105826216 B CN105826216 B CN 105826216B CN 201610052913 A CN201610052913 A CN 201610052913A CN 105826216 B CN105826216 B CN 105826216B
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semiconductor
chuck table
inspection
resistor
evaluation apparatus
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CN105826216A (zh
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冈田章
野口贵也
山下钦也
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Rohm Co Ltd
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Rohm Co Ltd
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Engineering & Computer Science (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
CN201610052913.7A 2015-01-26 2016-01-26 半导体评价装置、检查用半导体装置及卡盘台的检查方法 Active CN105826216B (zh)

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JP2015-012196 2015-01-26
JP2015012196A JP6386923B2 (ja) 2015-01-26 2015-01-26 半導体評価装置およびチャックステージの検査方法

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CN105826216A CN105826216A (zh) 2016-08-03
CN105826216B true CN105826216B (zh) 2021-05-04

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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6562896B2 (ja) * 2016-12-22 2019-08-21 三菱電機株式会社 半導体装置の評価装置およびそれを用いた半導体装置の評価方法
JP6719423B2 (ja) * 2017-06-26 2020-07-08 三菱電機株式会社 チャックステージ検査装置およびチャックステージ検査方法
JP6804414B2 (ja) * 2017-09-15 2020-12-23 三菱電機株式会社 半導体装置用評価装置および半導体装置の評価方法
JP7336256B2 (ja) * 2019-05-10 2023-08-31 東京エレクトロン株式会社 載置台及び載置台の作製方法
JP7281981B2 (ja) * 2019-06-27 2023-05-26 東京エレクトロン株式会社 プローバおよびプローブカードのプリヒート方法
DE112022001227T5 (de) * 2021-03-26 2023-12-21 Rohm Co., Ltd. Halbleiterstruktur zur inspektion

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5882938A (en) * 1995-06-13 1999-03-16 Takasago Thermal Engineering Co., Ltd. Apparatus and method for evaluating contamination caused by organic substances deposited on substrate surface
CN1650176A (zh) * 2002-05-01 2005-08-03 Jsr株式会社 测量电阻用的连接件、电路板的电阻测量设备和测量方法
CN103969565A (zh) * 2013-01-28 2014-08-06 三菱电机株式会社 半导体评价装置及半导体评价方法

Family Cites Families (10)

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Publication number Priority date Publication date Assignee Title
JP3237741B2 (ja) 1995-11-30 2001-12-10 東京エレクトロン株式会社 クリーン度の高い検査装置
JP2004288761A (ja) * 2003-03-20 2004-10-14 Renesas Technology Corp 半導体素子のテスト方法
JP4387125B2 (ja) * 2003-06-09 2009-12-16 東京エレクトロン株式会社 検査方法及び検査装置
JP2006170700A (ja) * 2004-12-14 2006-06-29 Sony Corp プローブ校正用治具、校正用治具付きプローブカードおよび半導体ウェハ測定装置
JP2006220505A (ja) * 2005-02-09 2006-08-24 Micronics Japan Co Ltd 校正基板用治具
JP4967472B2 (ja) 2006-06-22 2012-07-04 富士電機株式会社 半導体装置
JP5449719B2 (ja) 2008-08-11 2014-03-19 日本特殊陶業株式会社 配線基板、ic電気特性検査用配線基板、及び配線基板の製造方法
JP2011077077A (ja) 2009-09-29 2011-04-14 Fuji Electric Systems Co Ltd 半導体試験装置
JP5631038B2 (ja) * 2010-04-01 2014-11-26 三菱電機株式会社 半導体装置の製造方法
JP5929612B2 (ja) * 2012-08-08 2016-06-08 三菱電機株式会社 半導体装置の測定方法、測定器

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5882938A (en) * 1995-06-13 1999-03-16 Takasago Thermal Engineering Co., Ltd. Apparatus and method for evaluating contamination caused by organic substances deposited on substrate surface
CN1650176A (zh) * 2002-05-01 2005-08-03 Jsr株式会社 测量电阻用的连接件、电路板的电阻测量设备和测量方法
CN103969565A (zh) * 2013-01-28 2014-08-06 三菱电机株式会社 半导体评价装置及半导体评价方法

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KR20160091841A (ko) 2016-08-03
KR101789911B1 (ko) 2017-10-25
JP2016139646A (ja) 2016-08-04
JP6386923B2 (ja) 2018-09-05
CN105826216A (zh) 2016-08-03

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