CN105312600A - 一种涂层切削工具和一种制造涂层切削工具的方法 - Google Patents

一种涂层切削工具和一种制造涂层切削工具的方法 Download PDF

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CN105312600A
CN105312600A CN201510473621.6A CN201510473621A CN105312600A CN 105312600 A CN105312600 A CN 105312600A CN 201510473621 A CN201510473621 A CN 201510473621A CN 105312600 A CN105312600 A CN 105312600A
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coated cutting
cutting tool
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拉尔斯·约翰逊
罗伯特·皮莱马尔姆
林娜·鲁格斯特伦
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Sandvik Intellectual Property AB
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Abstract

本发明涉及一种涂层切削工具和一种制造涂层切削工具的方法。具体地，本发明涉及一种涂层切削工具，所述涂层切削工具包含基体和在基体上的涂层，其中所述涂层包含由TixZryAl(1-x-y)N组成的层，其中0＜x≤0.3，0.2≤y≤0.8且0.1≤(1-x-y)≤0.7。本发明还涉及制造这种涂层切削工具的方法，以及涉及形成涂层切削工具的切削刀片。

Description

一种涂层切削工具和一种制造涂层切削工具的方法
技术领域
本发明涉及一种用于金属机械加工如切屑形成机械加工的涂层切削工具，所述涂层切削工具包括基体和基体上的涂层，并涉及一种制造这种涂层切削工具的方法。
背景技术
例如切削刀片、铣刀、钻具等的切削工具可被用于材料如金属的切屑形成机械加工。这种切削工具通常由诸如硬质合金、立方氮化硼或高速钢的耐用材料制成。为了改善切削工具的性能，例如磨损性能，这种切削工具通常设置有表面涂层。通过化学气相沉积(CVD)或物理气相沉积(PVD)可将这种涂层沉积在切削工具上。
至今已经使用了不同类型的表面涂层，例如TiN、TiAlN。在利用涂层切削工具进行金属机械加工的过程中，由于机械加工的材料的剪切和摩擦，在切削工具的切削刀片附近区域的温度将会升高。因此涂层处的温度会变得非常高，即1100℃或更高。在800℃～900℃下，立方TiAlN通常分解为立方TiN和立方AlN，然后在大约1000℃下，立方AlN转变为六方纤锌矿结构AlN，这是一种不太期望的相。在EP2628826A1中公开了一种ZrAlN和TiN的交替层的多层涂层。开发这种类型的涂层以提供涂层的高的热稳定性，从而即使经受这种高温也具有高的硬度。
试图进一步开发在经受高温时具有改善性能的表面涂层。特别地，期望提供在高温下具有低的可能性分解为不期望的相(例如六方AlN相)的涂层。因此试图提供一种具有如下涂层的涂层切削工具，所述涂层具有在高温下相对稳定的组成。
发明内容
因此，本发明的目的是提供一种在机械加工操作过程中具有改善性能的涂层切削工具。特别地，目的是提供一种具有如下涂层的切削工具，所述涂层具有在高温下更稳定的组成。
因此，本发明涉及一种涂层切削工具，所述涂层切削工具包含基体和基体上的涂层，其中涂层包含由TixZryAl(1-x-y)N组成的层，其中0＜x≤0.3，0.2≤y≤0.8且0.1≤(1-x-y)≤0.7。
所述涂层的组成将会降低AlN在高温下分解为不期望的相(例如六方AlN相)的可能性。由此获得在高温下、特别是在大约1100℃下更加稳定的涂层组成。
所述涂层可包含由TixZryAl(1-x-y)N组成的层，其中，x≥0.05，优选地，x≥0.1。所述涂层可包含由TixZryAl(1-x-y)N组成的层，其中，x≤0.25，优选地x≤0.2。从而使组成的稳定性进一步增加。
所述涂层可包含由TixZryAl(1-x-y)N组成的层，其中，y≤0.6，优选地y≤0.4。从而可获得具有本文公开的优点的、具有较少量Zr的组成。
所述涂层可包含由TixZryAl(1-x-y)N组成的层，其中，y≥0.3或y≥0.4。从而使组成的稳定性进一步地增加。高Zr的组成可提供对亚稳态分解(亚稳态分解)过程的更好的耐性，在所述亚稳态分解过程中TiN、AlN和ZrN可变得分离。
TixZryAl(1-x-y)N的层可具有立方晶体结构。从而可改善所述切削工具的切削性能，例如寿命和磨损性能。
TixZryAl(1-x-y)N的层可具有柱状微结构。从而可改善涂层的耐凹坑磨损性能，还改善了涂层的硬度。或者，TixZryAl(1-x-y)N的层可具有纳米晶体或无定形结构。
TixZryAl(1-x-y)N的层的X射线衍射图可具有(200)晶面(plane)的主峰(dominantpeak)，即在XRD衍射图中(200)峰可为最高峰。从而晶粒主要取向在所涂覆的层的生长方向的(200)方向。
可通过PVD如电弧蒸发或溅射沉积TixZryAl(1-x-y)N的层。从而该层可具有压应力，改善了所涂覆的层的韧性。通过电弧蒸发，可改善沉积速度并且可改善电离度，生成致密层，改善附着力(adhesion)并且改善所涂覆的层在基体上的几何覆盖。
可使用包含阴极、阳极和磁力装置(magneticmeans)的电弧沉积源(arcdepositionsource)沉积TixZryAl(1-x-y)N的层，所述磁力装置能够使磁场线以短连接(shortconnection)方式从靶材表面导向阳极。在文献US2013/0126347A1中进一步地描述了这种电弧沉积源。从而在要求包含的组成范围内所述层可具有立方晶体结构和柱状微结构。US2013/0126347A1教导了腔室内电离状态可改善涂覆参数，例如沉积速率和涂层质量。
所述涂层可包含粘附层(adhesionlayer)和在所述粘附层之上的TixZryAl(1-x-y)N的层。作为一个实施方式，所述涂层可仅由粘附层和在所述粘附层之上的TixZryAl(1-x-y)N的层组成。粘附层可以为Ti、TiN、Cr、CrN或任何其它的过渡金属或过渡金属氮化物的层，优选地具有在1nm～200nm范围的厚度，如5nm～10nm。
所述涂层可具有由洛氏(Rockwell)压痕试验评价的至少50kg，优选地至少100kg，更优选地至少150kg的附着强度(adhesivestrength)。由如在VDI3198中描述的洛氏C压痕试验步骤可对附着力进行评价，但其中压痕载荷可在50kg～150kg的范围内变化。根据VDI3198中描述的标准，可将涂层所通过的压痕试验的压痕载荷取作涂层的附着强度。
所述涂层可以为多层涂层，所述多层涂层还包含一个或多个选自TiN、TiAlN、TiSiN、TiSiCN、TiCrAlN和CrAlN或其组合的层。涂层可包含一个或多个具有如下组成的层，所述组成至少包含第一元素和第二元素，所述第一元素选自Ti、Al、Cr、Si、V、Nb、Ta、Mo和W，所述第二元素选自B、C、N和O。涂层可具有大于0.5μm和/或小于20μm、优选地小于10μm的厚度。从而可将涂层的性能优化至特定的应用需求。
TixZryAl(1-x-y)N的层可具有大于5nm和/或小于20μm、优选地小于10μm的厚度。从而涂层基本可由一层TiZrAlN形成，或者由一层或多层TiZrAlN与其它涂覆层的组合形成。
所述基体可包含硬质合金或多晶立方氮化硼。这些是具有良好的切削性能、适用于切削工具的硬质材料。所述切削工具可以为切削刀片、铣刀或钻具的形式，优选地用于诸如金属的材料的切屑形成机械加工。
另一个目的是提供一种制造具有涂层的切削工具的方法，所述涂层具有在高温下更稳定的组成。
因此，本发明还涉及一种制造涂层切削工具的方法，所述方法包括提供基体，和沉积包含由TixZryAl(1-x-y)N组成的层的涂层，其中0＜x≤0.3，0.2≤y≤0.8且0.1≤(1-x-y)≤0.7。
可通过PVD，优选地通过电弧蒸发，沉积所述层。
所述层可使用包含阴极、阳极和磁力装置的电弧沉积源进行沉积，所述磁力装置能够使磁场线以短连接方式从靶材表面导向阳极。在文献US2013/0126347A1中对这种电弧沉积源进行了进一步地描述。
附图说明
图1示出了表明所要求保护组成的实例的TiN-ZrN-AlN的拟三元相图。
图2示出了本文公开的涂层的三种组成的X射线衍射图。
图3示出了两种不同组成的沉积原样态(as-deposited)的和退火的涂层的X射线衍射图。
具体实施方式
定义
权利要求中限定的组成可包含不可避免的杂质(例如低于1原子％～3原子％(at.％))，其取代任何金属元素Ti、Zr和Al和/或N，同时保持本发明的有益效果并且不背离要求保护的范围。例如，N可以由低于1原子％～3原子％的含量的元素O、C或B取代。
公开了一种涂层切削工具的实施方式，所述涂层切削工具具有硬质合金基体和在基体上的包含TixZryAl(1-x-y)N的层的涂层。这种层在本文中被称为TiZrAlN层。组成中Ti的量(即x)在0＜x≤0.3的范围内，优选其中x≥0.05，更优选其中x≥0.1。组成中Zr的量(即y)在0.2≤y≤0.8的范围内。组成中Al的量(即1-x-y)在0.1≤(1-x-y)≤0.7的范围内。TiZrAlN的层具有立方晶体结构和柱状微结构。
TiZrAlN的层通过电弧蒸发沉积在包含硬质合金或多晶立方氮化硼的基体上。任选地，涂层包含5nm～10nm厚的Ti、TiN、Cr或CrN的粘附层和在所述粘附层之上的TiZrAlN层。涂层的厚度在0.5μm～20μm之间，通常在10μm以下。TiZrAlN层可以是多层涂层中的一层，所述多层涂层在多层的不同层之间具有组成变化。或者涂层可由TiZrAlN层组成，其可与粘附层组合。
通过如在VDI3198中描述的洛氏C压痕试验步骤可确定涂层的附着力，但其中压痕载荷可在50kg～150kg的范围内变化。根据VDI3198中描述的标准，可将涂层所通过的压痕试验的压痕载荷取作涂层的附着强度。使用此方法，所述涂层可具有至少50kg，优选地至少100kg，更优选地至少150kg的附着力。
在图1中，示出了TiN-ZrN-AlN体系的拟三元相图。如图中所示，图的各个角对应于TiN、ZrN和AlN的纯组分。图中平行于各自的对边的各条线表示各组分的10％的间隔。
实施例
在图1中，公开了所要求保护的范围内的组成的三个实施例。在表1中示出了各个实施例中的TiZrAlN层的组成和厚度。
TiN(％) ZrN(％) AlN(％) 厚度/μm
S1/试样1 30 24 46 9.5
S2/试样2 21 48 31 13
S3/试样3 13 69 18 8
表1：试样涂层S1、S2、S3。
试样涂层都由双阴极组件沉积，一个阴极具有Ti0.33Al0.67-靶材，一个阴极具有Zr靶材。将硬质合金基体放置在沉积室中的不同位置处，从而获得沉积的TiZrAlN层的组成变化。
在具有高级等离子体优化器升级版(AdvancedPlasmaOptimizerupgrade)的OerlikonBalzerINNOVA系统内对基体进行涂布。将基体放入装备有两个阴极组件的真空室内。将所述腔室抽至高真空(低于10-2Pa)。通过位于腔室内的加热器将所述腔室加热至350℃～500℃，在此特定的情况下为400℃。然后在Ar辉光放电下将基体蚀刻25分钟。将阴极平行放置在腔室内。两个阴极都设置有在其附近的环状的阳极(如在US2013/0126347A1中公开的)，具有提供磁场的系统，所述磁场具有从靶材表面出发并且进入阳极的磁场线(参见US2013/0126347A1)。将腔室压力(反应压力)设定为氮气N23.5Pa，且将-30V(相对于腔室壁)的负电压施加至基体组件。使阴极在160A的电弧放电模式下各自运行60分钟。随着两个阴极蒸发不同的靶材材料，在试样组件上形成组分梯度，使得靠近Zr靶材放置的基体试样富含Zr，且靠近Ti-Al靶材放置的试样富含Ti和Al。
用X射线能量色散谱(EDX)确定了试样的组成。S1的组成为Ti0.30Zr0.24Al0.46N，S2的组成为Ti0.21Zr0.48Al0.31N，S3的组成为Ti0.13Zr0.69Al0.18N。
图2示出了表1中公开的三种涂层的X射线衍射图。试样都示出了立方结构的TiZrAlN。它们都具有来自(200)晶面的主峰。除此之外，还可看到来自(111)、(220)和(311)晶面的峰。由于涂层之间的晶格参数的变化，在(200)峰的位置有位移。
将试样进行热处理以评价在高温下的性能。这通过在1100℃下退火两个小时而完成。通过具有Bragg-Brantano设置的X射线衍射仪表征了沉积原样态的涂层和退火的涂层的结构。图3示出了沉积原样态的和退火的Ti0.13Zr0.69Al0.18N(S3)和Ti0.30Zr0.24Al0.46N(S1)的这种X射线衍射图。对于沉积原样态的试样，来自立方TiZrAlN相的(200)峰对于S3被确定在2θ＝40.8°处，而对于S1被确定在2θ＝42.08°处，而其它的峰(标记为“s”)源自硬质合金基体中的相。对于S3，在退火之前和之后结构上没有明显的变化。(200)峰的小的位移可能是由于应力弛豫。因此，组成非常稳定。在S1涂层的退火后，由于具有在较低角度处的(200)衍射峰的另一立方相的形成，立方(200)峰是不对称的。这对应于具有如下晶格参数的相，所述晶格参数接近于ZrN的晶格参数。因此涂层主要具有立方微结构。因此，涂层内的组成向较不期望的相如六方w-AlN的分解是少的，或者至少是慢的。

Claims (19)

1.一种涂层切削工具，所述涂层切削工具包含基体和在所述基体上的涂层，其中所述涂层包含由TixZryAl(1-x-y)N组成的层，其中0＜x≤0.3，0.2≤y≤0.8且0.1≤(1-x-y)≤0.7。
2.根据权利要求1所述的涂层切削工具，其中x≥0.05，优选地x≥0.1。
3.根据权利要求1或2所述的涂层切削工具，其中x≤0.25，优选地x≤0.2。
4.根据前述权利要求中的任一项所述的涂层切削工具，其中y≤0.6，优选地y≤0.4。
5.根据前述权利要求中的任一项所述的涂层切削工具，其中y≥0.3或y≥0.4。
6.根据前述权利要求中的任一项所述的涂层切削工具，其中TixZryAl(1-x-y)N的所述层具有立方晶体结构。
7.根据前述权利要求中的任一项所述的涂层切削工具，其中TixZryAl(1-x-y)N的所述层具有柱状微结构。
8.根据前述权利要求中的任一项所述的涂层切削工具，其中TixZryAl(1-x-y)N的所述层的X射线衍射图具有(200)晶面的主峰。
9.根据前述权利要求中的任一项所述的涂层切削工具，其中通过PVD例如电弧蒸发或溅射沉积TixZryAl(1-x-y)N的所述层。
10.根据前述权利要求中的任一项所述的涂层切削工具，其中所述涂层包含粘附层和在所述粘附层之上的TixZryAl(1-x-y)N的所述层。
11.根据前述权利要求中的任一项所述的涂层切削工具，其中如由洛氏压痕试验所评价的，所述涂层具有至少50kg、优选地至少100kg、更优选地至少150kg的附着力。
12.根据前述权利要求中的任一项所述的涂层切削工具，其中所述涂层为多层涂层，所述多层涂层还包含一个或多个选自TiN、TiAlN、TiSiN、TiSiCN、TiCrAlN和CrAlN或其组合的层。
13.根据前述权利要求中的任一项所述的涂层切削工具，其中所述涂层具有大于0.5μm和/或小于20μm、优选地小于10μm的厚度。
14.根据前述权利要求中的任一项所述的涂层切削工具，其中TixZryAl(1-x-y)N的所述层具有大于5nm和/或小于20μm、优选地小于10μm的厚度。
15.根据前述权利要求中的任一项所述的涂层切削工具，其中所述基体包含硬质合金或多晶立方氮化硼。
16.一种切削刀片，所述切削刀片形成根据前述权利要求中的任一项所述的涂层切削工具。
17.一种制造涂层切削工具的方法，所述方法包括提供基体，和沉积包含由TixZryAl(1-x-y)N组成的层的涂层，其中0＜x≤0.3，0.2≤y≤0.8且0.1≤(1-x-y)≤0.7。
18.根据权利要求17所述的方法，其中通过电弧蒸发沉积所述层。
19.根据权利要求18所述的方法，其中使用电弧沉积源沉积所述层，所述电弧沉积源包含阴极、阳极和磁力装置，所述磁力装置能够使磁场线以短连接方式从靶材表面导向所述阳极。
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CN109695023A (zh) * 2018-12-13 2019-04-30 上海航天设备制造总厂有限公司 一种空间机构件固体抗菌硬质涂层及其制备方法
CN109695023B (zh) * 2018-12-13 2020-07-17 上海航天设备制造总厂有限公司 一种空间机构件固体抗菌硬质涂层及其制备方法
CN114026269A (zh) * 2019-06-28 2022-02-08 瓦尔特公开股份有限公司 涂覆的切削工具
CN114026269B (zh) * 2019-06-28 2024-01-09 瓦尔特公开股份有限公司 涂覆的切削工具
CN113088895A (zh) * 2021-04-01 2021-07-09 九牧厨卫股份有限公司 一种装饰性低温硬质涂层及其镀膜方法和应用

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RU2015131332A (ru) 2017-02-03
RU2015131332A3 (zh) 2018-12-29
BR102015018142B1 (pt) 2022-04-05
KR102436934B1 (ko) 2022-08-25
US9758859B2 (en) 2017-09-12
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