JP2016030330A - コーティングされた切削工具、及びコーティングされた切削工具の製造方法 - Google Patents
コーティングされた切削工具、及びコーティングされた切削工具の製造方法 Download PDFInfo
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- 238000005520 cutting process Methods 0.000 title claims abstract description 43
- 238000000034 method Methods 0.000 title claims abstract description 10
- 238000000576 coating method Methods 0.000 claims abstract description 67
- 239000011248 coating agent Substances 0.000 claims abstract description 56
- 239000000758 substrate Substances 0.000 claims abstract description 23
- 239000010410 layer Substances 0.000 claims description 52
- 238000007373 indentation Methods 0.000 claims description 10
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 9
- 238000000151 deposition Methods 0.000 claims description 9
- 229910052718 tin Inorganic materials 0.000 claims description 9
- 230000008021 deposition Effects 0.000 claims description 8
- 239000012790 adhesive layer Substances 0.000 claims description 7
- 230000008020 evaporation Effects 0.000 claims description 6
- 238000001704 evaporation Methods 0.000 claims description 6
- 238000005240 physical vapour deposition Methods 0.000 claims description 5
- 229910052582 BN Inorganic materials 0.000 claims description 4
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 4
- 229910010037 TiAlN Inorganic materials 0.000 claims description 4
- 238000002441 X-ray diffraction Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 229910008482 TiSiN Inorganic materials 0.000 claims description 2
- QRXWMOHMRWLFEY-UHFFFAOYSA-N isoniazide Chemical compound NNC(=O)C1=CC=NC=C1 QRXWMOHMRWLFEY-UHFFFAOYSA-N 0.000 claims description 2
- 238000004544 sputter deposition Methods 0.000 claims description 2
- 239000000203 mixture Substances 0.000 abstract description 28
- 229910052719 titanium Inorganic materials 0.000 description 7
- 239000000463 material Substances 0.000 description 5
- 239000011247 coating layer Substances 0.000 description 4
- 238000003754 machining Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000000712 assembly Effects 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000008199 coating composition Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000005555 metalworking Methods 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 238000010587 phase diagram Methods 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- LLQPHQFNMLZJMP-UHFFFAOYSA-N Fentrazamide Chemical compound N1=NN(C=2C(=CC=CC=2)Cl)C(=O)N1C(=O)N(CC)C1CCCCC1 LLQPHQFNMLZJMP-UHFFFAOYSA-N 0.000 description 1
- 229910000997 High-speed steel Inorganic materials 0.000 description 1
- 229910004349 Ti-Al Inorganic materials 0.000 description 1
- 229910004692 Ti—Al Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 238000001330 spinodal decomposition reaction Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- -1 transition metal nitride Chemical class 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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Abstract
【解決手段】工具は、基材と基材上のコーティングとを有し、コーティングは、TixZryAl(1−x−y)Nからなる層を含み、ここで、0<x≦0.3、0.2≦y≦0.8且つ0.1≦(1−x−y)≦0.7である。更に、そのようなコーティングされた切削工具の製造方法、及び、コーティングされた切削工具を形成する切削用インサートに関する。
【選択図】図1
Description
特許請求の範囲で定義される組成物は、Ti、Zr、及びAlのうちの任意の金属成分並びに/又はNに代わり不可避の不純物(例えば、1〜3%未満)を含み得るが、特許請求される範囲から逸脱することなく本発明の有利な効果を維持する。例えば、Nは1〜3%未満のレベルで元素O、C、又はBに置換され得る。
S2 サンプル2
S3 サンプル3
Claims (19)
- 基材と前記基材上のコーティングとを含むコーティングされた切削工具であって、前記コーティングはTixZryAl(1−x−y)Nからなる層を含み、0<x≦0.3、0.2≦y≦0.8、及び0.1≦(1−x−y)≦0.7である、コーティングされた切削工具。
- x≧0.05、好ましくはx≧0.1である、請求項1に記載のコーティングされた切削工具。
- x≦0.25、好ましくはx≦0.2である、請求項1又は2に記載のコーティングされた切削工具。
- y≦0.6、好ましくはy≦0.4である、請求項1から3の何れか一項に記載のコーティングされた切削工具。
- y≧0.3又はy≧0.4である、請求項1から4の何れか一項に記載のコーティングされた切削工具。
- 前記TixZryAl(1−x−y)N層が立方晶構造を有する、請求項1から5の何れか一項に記載のコーティングされた切削工具。
- 前記TixZryAl(1−x−y)N層が柱状微細構造を有する、請求項1から6の何れか一項に記載のコーティングされた切削工具。
- 前記TixZryAl(1−x−y)N層のX線回折図が(200)面の主要なピークを有する、請求項1から7の何れか一項に記載のコーティングされた切削工具。
- 前記TixZryAl(1−x−y)N層は、アーク蒸着又はスパッタリングなどのPVDによって蒸着される、請求項1から8の何れか一項に記載のコーティングされた切削工具。
- 前記コーティングは、接着層と前記接着層上部の前記TixZryAl(1−x−y)N層とを含む、請求項1から9の何れか一項に記載のコーティングされた切削工具。
- 前記コーティングは、ロックウェル圧痕試験による評価で少なくとも50kg、好ましくは少なくとも100kg、より好ましくは少なくとも150kgの密着性を有する、請求項1から10の何れか一項に記載のコーティングされた切削工具。
- 前記コーティングは、TiN、TiAlN、TiSiN、TiSiCN、TiCrAlN、及びCrAlNからなるグループから選択される一もしくは複数の層又はそれらの組み合わせを更に含む、多層コーティングである、請求項1から11の何れか一項に記載のコーティングされた切削工具。
- 前記コーティングは、0.5μmを上回る及び/又は20μmを下回る、好ましくは10μmを下回る厚さを有する、請求項1から12の何れか一項に記載のコーティングされた切削工具。
- 前記TixZryAl(1−x−y)N層は、5nmを上回る及び/又は20μmを下回る、好ましくは10μmを下回る厚さを有する、請求項1から13の何れか一項に記載のコーティングされた切削工具。
- 前記基材は超硬合金又は多結晶質立方晶窒化ホウ素を含む、請求項1から14の何れか一項に記載のコーティングされた切削工具。
- 請求項1から15の何れか一項に記載のコーティングされた切削工具を形成する、切削用インサート。
- コーティングされた切削工具の製造方法であって、基材を供給することと、TixZryAl(1−x−y)Nからなる層を含むコーティングを蒸着することとを含み、0<x≦0.3、0.2≦y≦0.8、及び0.1≦(1−x−y)≦0.7である、方法。
- 前記層はアーク蒸着によって蒸着される、請求項17に記載の方法。
- 前記層は、カソードと、アノードと、磁力線をターゲット表面から前記アノードまで短い接続で通すことを可能にする磁気的手段とを備える、アーク蒸着源を用いて蒸着される、請求項18に記載の方法。
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