CN104907227A - 膜形成方法及膜形成装置 - Google Patents
膜形成方法及膜形成装置 Download PDFInfo
- Publication number
- CN104907227A CN104907227A CN201410683427.6A CN201410683427A CN104907227A CN 104907227 A CN104907227 A CN 104907227A CN 201410683427 A CN201410683427 A CN 201410683427A CN 104907227 A CN104907227 A CN 104907227A
- Authority
- CN
- China
- Prior art keywords
- outer edge
- membrane material
- coated
- substrate
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
- B05C9/14—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation involving heating or cooling
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
Abstract
Description
Claims (6)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014047088A JP6085578B2 (ja) | 2014-03-11 | 2014-03-11 | 膜形成方法及び膜形成装置 |
JP2014-047088 | 2014-03-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN104907227A true CN104907227A (zh) | 2015-09-16 |
CN104907227B CN104907227B (zh) | 2017-04-19 |
Family
ID=54076909
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201410683427.6A Active CN104907227B (zh) | 2014-03-11 | 2014-11-24 | 膜形成方法及膜形成装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6085578B2 (zh) |
KR (1) | KR101713813B1 (zh) |
CN (1) | CN104907227B (zh) |
TW (1) | TWI564090B (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109475895A (zh) * | 2016-08-10 | 2019-03-15 | 住友重机械工业株式会社 | 膜形成方法及膜形成装置 |
CN110095935A (zh) * | 2018-01-30 | 2019-08-06 | 住友重机械工业株式会社 | 膜形成方法、膜形成装置及形成有膜的复合基板 |
CN112437698A (zh) * | 2019-06-26 | 2021-03-02 | Abb瑞士股份有限公司 | 涂装机及涂装方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050048195A1 (en) * | 2003-08-26 | 2005-03-03 | Akihiro Yanagita | Dispensing system and method of controlling the same |
KR20080073068A (ko) * | 2007-02-05 | 2008-08-08 | 한국기계연구원 | 대면적 박막 코팅방법 및 그 장치 |
US20100015322A1 (en) * | 2008-07-18 | 2010-01-21 | Cheng Uei Precision Industry Co., Ltd. | Method And Apparatus For Coating A Film On A Substrate |
CN101862724A (zh) * | 2009-04-20 | 2010-10-20 | 精工爱普生株式会社 | 制膜装置及制膜方法 |
CN102861706A (zh) * | 2011-07-08 | 2013-01-09 | 住友重机械工业株式会社 | 薄膜形成方法及薄膜形成装置 |
WO2013011775A1 (ja) * | 2011-07-15 | 2013-01-24 | 住友重機械工業株式会社 | 薄膜形成方法及び薄膜形成装置 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10138349A (ja) * | 1996-11-11 | 1998-05-26 | Meiko:Kk | 積層光造形法 |
JP3985545B2 (ja) * | 2002-02-22 | 2007-10-03 | セイコーエプソン株式会社 | 薄膜形成装置と薄膜形成方法、液晶装置の製造装置と液晶装置の製造方法と液晶装置、及び薄膜構造体の製造装置と薄膜構造体の製造方法と薄膜構造体、及び電子機器 |
JP3988645B2 (ja) * | 2002-03-06 | 2007-10-10 | セイコーエプソン株式会社 | 吐出方法、吐出装置、カラーフィルタの製造方法、エレクトロルミネッセンス装置の製造方法、およびプラズマディスプレイパネルの製造方法 |
JP2003318133A (ja) | 2002-04-22 | 2003-11-07 | Seiko Epson Corp | 膜パターンの形成方法、膜パターン形成装置、導電膜配線、半導体チップの実装構造、半導体装置、発光装置、電気光学装置、電子機器、並びに非接触型カード媒体 |
JP4505191B2 (ja) * | 2003-03-31 | 2010-07-21 | 日立ビアメカニクス株式会社 | 電子回路基板の製造装置 |
JP3874003B2 (ja) * | 2004-10-27 | 2007-01-31 | セイコーエプソン株式会社 | 配線パターン形成方法、及び膜パターン形成方法 |
JP2006126692A (ja) * | 2004-11-01 | 2006-05-18 | Seiko Epson Corp | 薄膜パターン基板、デバイスの製造方法、及び電気光学装置、並びに電子機器 |
JP4179288B2 (ja) * | 2005-02-01 | 2008-11-12 | セイコーエプソン株式会社 | 膜パターン形成方法 |
JP4501987B2 (ja) | 2007-10-30 | 2010-07-14 | セイコーエプソン株式会社 | 膜形成方法 |
JP2010155926A (ja) * | 2008-12-26 | 2010-07-15 | Jsr Corp | 光硬化性液状樹脂組成物およびインクジェット光造形法による立体造形物の製造方法 |
JP2010184214A (ja) | 2009-02-13 | 2010-08-26 | Seiko Epson Corp | 成膜方法 |
JP5890990B2 (ja) * | 2010-11-01 | 2016-03-22 | 株式会社キーエンス | インクジェット光造形法における、光造形品形成用モデル材、光造形品の光造形時の形状支持用サポート材および光造形品の製造方法 |
JP2014036171A (ja) * | 2012-08-10 | 2014-02-24 | Sumitomo Heavy Ind Ltd | 基板製造方法及び薄膜形成装置 |
-
2014
- 2014-03-11 JP JP2014047088A patent/JP6085578B2/ja active Active
- 2014-11-24 TW TW103140645A patent/TWI564090B/zh active
- 2014-11-24 CN CN201410683427.6A patent/CN104907227B/zh active Active
- 2014-11-28 KR KR1020140168740A patent/KR101713813B1/ko active IP Right Grant
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050048195A1 (en) * | 2003-08-26 | 2005-03-03 | Akihiro Yanagita | Dispensing system and method of controlling the same |
KR20080073068A (ko) * | 2007-02-05 | 2008-08-08 | 한국기계연구원 | 대면적 박막 코팅방법 및 그 장치 |
US20100015322A1 (en) * | 2008-07-18 | 2010-01-21 | Cheng Uei Precision Industry Co., Ltd. | Method And Apparatus For Coating A Film On A Substrate |
CN101862724A (zh) * | 2009-04-20 | 2010-10-20 | 精工爱普生株式会社 | 制膜装置及制膜方法 |
CN102861706A (zh) * | 2011-07-08 | 2013-01-09 | 住友重机械工业株式会社 | 薄膜形成方法及薄膜形成装置 |
WO2013011775A1 (ja) * | 2011-07-15 | 2013-01-24 | 住友重機械工業株式会社 | 薄膜形成方法及び薄膜形成装置 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109475895A (zh) * | 2016-08-10 | 2019-03-15 | 住友重机械工业株式会社 | 膜形成方法及膜形成装置 |
CN110095935A (zh) * | 2018-01-30 | 2019-08-06 | 住友重机械工业株式会社 | 膜形成方法、膜形成装置及形成有膜的复合基板 |
CN110095935B (zh) * | 2018-01-30 | 2022-05-10 | 住友重机械工业株式会社 | 膜形成方法、膜形成装置及形成有膜的复合基板 |
CN112437698A (zh) * | 2019-06-26 | 2021-03-02 | Abb瑞士股份有限公司 | 涂装机及涂装方法 |
US11491788B2 (en) | 2019-06-26 | 2022-11-08 | Abb Schweiz Ag | Ink-jet coater and coating method |
Also Published As
Publication number | Publication date |
---|---|
JP6085578B2 (ja) | 2017-02-22 |
TWI564090B (zh) | 2017-01-01 |
TW201534402A (zh) | 2015-09-16 |
CN104907227B (zh) | 2017-04-19 |
KR101713813B1 (ko) | 2017-03-09 |
JP2015167944A (ja) | 2015-09-28 |
KR20150106322A (ko) | 2015-09-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20160701 Address after: Tokyo, Japan, Japan Applicant after: Sumitomo Heavy Machinary Industries Ltd. Applicant after: Meiko Electronics Co., Ltd. Address before: Tokyo, Japan, Japan Applicant before: Sumitomo Heavy Machinary Industries Ltd. |
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GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20170920 Address after: Tokyo, Japan, Japan Patentee after: Sumitomo Heavy Machinary Industries Ltd. Address before: Tokyo, Japan, Japan Co-patentee before: Meiko Electronics Co., Ltd. Patentee before: Sumitomo Heavy Machinary Industries Ltd. |